JP2013086038A - 水素透過用合金膜 - Google Patents
水素透過用合金膜 Download PDFInfo
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- JP2013086038A JP2013086038A JP2011229910A JP2011229910A JP2013086038A JP 2013086038 A JP2013086038 A JP 2013086038A JP 2011229910 A JP2011229910 A JP 2011229910A JP 2011229910 A JP2011229910 A JP 2011229910A JP 2013086038 A JP2013086038 A JP 2013086038A
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- hydrogen
- alloy film
- alloy
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- hydrogen permeation
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- 239000001257 hydrogen Substances 0.000 title claims abstract description 128
- 229910052739 hydrogen Inorganic materials 0.000 title claims abstract description 128
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 title claims abstract description 123
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 55
- 239000000956 alloy Substances 0.000 title claims abstract description 55
- 229910001257 Nb alloy Inorganic materials 0.000 claims abstract description 41
- 239000007789 gas Substances 0.000 claims abstract description 31
- 229910001252 Pd alloy Inorganic materials 0.000 claims abstract description 16
- 230000001590 oxidative effect Effects 0.000 claims abstract description 12
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 9
- 229910052719 titanium Inorganic materials 0.000 claims description 9
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- 229910052758 niobium Inorganic materials 0.000 claims description 5
- 239000010408 film Substances 0.000 description 86
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 40
- 239000012528 membrane Substances 0.000 description 24
- 238000000034 method Methods 0.000 description 23
- 239000010955 niobium Substances 0.000 description 19
- 238000010438 heat treatment Methods 0.000 description 15
- 229910052751 metal Inorganic materials 0.000 description 15
- 239000002184 metal Substances 0.000 description 14
- 239000012466 permeate Substances 0.000 description 14
- 238000000926 separation method Methods 0.000 description 11
- 239000010409 thin film Substances 0.000 description 11
- 239000010936 titanium Substances 0.000 description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- 238000004381 surface treatment Methods 0.000 description 10
- 230000007423 decrease Effects 0.000 description 9
- 239000000446 fuel Substances 0.000 description 8
- 150000002431 hydrogen Chemical class 0.000 description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 230000035699 permeability Effects 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 150000002739 metals Chemical class 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000006104 solid solution Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical group N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 2
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000002803 fossil fuel Substances 0.000 description 2
- 239000003502 gasoline Substances 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 239000003350 kerosene Substances 0.000 description 2
- 239000003915 liquefied petroleum gas Substances 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- -1 naphtha Substances 0.000 description 2
- 239000003345 natural gas Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 238000000629 steam reforming Methods 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910004337 Ti-Ni Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910011209 Ti—Ni Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000003034 coal gas Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000009849 deactivation Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 229910001651 emery Inorganic materials 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- 239000000295 fuel oil Substances 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000002407 reforming Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
- Hydrogen, Water And Hydrids (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
【解決手段】 本発明の水素透過用合金膜は、酸化性ガスで表面処理されたNb合金膜と、該Nb合金膜の両面に設けられたPd若しくはPd合金層と、を有する。
【選択図】 図1
Description
Nbを40mol%、Tiを30mol%、及びNiを30mol%の割合で配合し、不活性雰囲気下(Ar)でアーク溶解して、Nb−Ti−Ni合金のインゴットを作製した。得られたインゴットをワイヤーカットして、厚さ1mmのディスク状(直径約10mm)のNb合金膜を切り出した。
比較例の水素透過用合金膜について、下記の水素透過試験により水素透過係数を測定した。
(水素透過試験)
水素透過装置の非透過側にガス供給ラインをつなぎ、流量コントローラーを設置した。セラミック管状炉で温度コントロールし、SUS管の繋目のVCR内に水素透過用合金膜を、金属製パッキンを用いて固定した。透過側出口には流量計を設置し、水素透過量を測定した。具体的には、水素透過用合金膜の両側(非透過側及び透過側)を拡散ポンプにより排気して3×10−4Pa以下の真空にした後、試験温度(400℃(673K)、450℃(723K)、500℃(773K)、550℃(823K)、600℃(873K))に加熱した。その後、純水素(99.99999%)を非透過側に0.4MPa、透過側に0.1MPa導入し、流量法により非透過側圧力P1及び透過側圧力P2を測定した。なお、用いた流量計及び試験時の条件は以下のとおりである。
流量計:コフロック製3300型、水素用、フルスケール1cc/分
供給側圧力:0.4MPa
透過側圧力:0.1MPa
透過面積:φ5.6mm(24.6mm2)
水素供給方法:流通式
使用ガス:純水素(99.99999%)
J:水素透過速度(molH2/m2・s)、Q:水素透過量(mol/s)、S:透過面積、P1:非透過側圧力、P2:透過側圧力、d:膜厚、φ:水素透過係数
比較例と同様にして厚さ1mmのディスク状(直径約10mm)のNb合金膜を切り出した。次に、切り出したNb合金膜を電気炉内で、以下の条件で表面処理した。
(1)大気中、300℃で1時間加熱
(2)大気中、400℃で1時間加熱
(3)大気中、500℃で1時間加熱
(4)大気中、600℃で1時間加熱
(5)大気中、700℃で1時間加熱
(6)大気中、300℃で2時間加熱
(7)大気中、400℃で2時間加熱
(8)大気中、500℃で2時間加熱
(9)大気中、600℃で2時間加熱
(10)大気中、700℃で2時間加熱
試験温度を500℃に設定して上記と同様に水素透過試験を行った。得られた結果を表1に示す。
Claims (3)
- 酸化性ガスで表面処理されたNb合金膜と、該Nb合金膜の両面に設けられたPd若しくはPd合金層と、を有する、水素透過用合金膜。
- 前記Nb合金膜が、Nbを30〜50mol%、Tiを20〜40mol%、及び、Niを20〜40mol%含む合金からなり、厚みが1〜10000μmである、請求項1に記載の水素透過用合金膜。
- 前記Pd層若しくはPd合金層の厚みが1〜1000nmである、請求項1又は2に記載の水素透過用合金膜。
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JP2011229910A JP2013086038A (ja) | 2011-10-19 | 2011-10-19 | 水素透過用合金膜 |
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JP2011229910A JP2013086038A (ja) | 2011-10-19 | 2011-10-19 | 水素透過用合金膜 |
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JP2013086038A true JP2013086038A (ja) | 2013-05-13 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021031733A (ja) * | 2019-08-27 | 2021-03-01 | 国立大学法人金沢大学 | 水素分離合金 |
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JPH07185277A (ja) * | 1993-11-08 | 1995-07-25 | Bend Res Inc | 水素分離用複合金属膜 |
JPH11276866A (ja) * | 1998-03-31 | 1999-10-12 | Tokyo Gas Co Ltd | 水素透過膜及びその作製方法 |
JP2003224206A (ja) * | 2002-01-29 | 2003-08-08 | Fujitsu Ltd | 半導体装置及びその製造方法 |
JP2004188347A (ja) * | 2002-12-12 | 2004-07-08 | Sumitomo Electric Ind Ltd | 水素分離構造体およびその製造方法 |
JP2006272167A (ja) * | 2005-03-29 | 2006-10-12 | Japan Steel Works Ltd:The | 水素透過膜 |
JP2007044593A (ja) * | 2005-08-08 | 2007-02-22 | Toyota Motor Corp | 水素透過膜および水素透過膜の製造方法 |
JP2007237074A (ja) * | 2006-03-08 | 2007-09-20 | Mitsubishi Materials Corp | すぐれた水素透過分離性能を発揮する水素透過分離薄膜 |
JP2008063630A (ja) * | 2006-09-08 | 2008-03-21 | Kitami Institute Of Technology | 複相水素透過合金の製造方法および複相水素透過合金 |
JP2009000659A (ja) * | 2007-06-22 | 2009-01-08 | Tokyo Gas Co Ltd | 水素透過膜モジュール |
-
2011
- 2011-10-19 JP JP2011229910A patent/JP2013086038A/ja active Pending
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07185277A (ja) * | 1993-11-08 | 1995-07-25 | Bend Res Inc | 水素分離用複合金属膜 |
JPH11276866A (ja) * | 1998-03-31 | 1999-10-12 | Tokyo Gas Co Ltd | 水素透過膜及びその作製方法 |
JP2003224206A (ja) * | 2002-01-29 | 2003-08-08 | Fujitsu Ltd | 半導体装置及びその製造方法 |
JP2004188347A (ja) * | 2002-12-12 | 2004-07-08 | Sumitomo Electric Ind Ltd | 水素分離構造体およびその製造方法 |
JP2006272167A (ja) * | 2005-03-29 | 2006-10-12 | Japan Steel Works Ltd:The | 水素透過膜 |
JP2007044593A (ja) * | 2005-08-08 | 2007-02-22 | Toyota Motor Corp | 水素透過膜および水素透過膜の製造方法 |
JP2007237074A (ja) * | 2006-03-08 | 2007-09-20 | Mitsubishi Materials Corp | すぐれた水素透過分離性能を発揮する水素透過分離薄膜 |
JP2008063630A (ja) * | 2006-09-08 | 2008-03-21 | Kitami Institute Of Technology | 複相水素透過合金の製造方法および複相水素透過合金 |
JP2009000659A (ja) * | 2007-06-22 | 2009-01-08 | Tokyo Gas Co Ltd | 水素透過膜モジュール |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021031733A (ja) * | 2019-08-27 | 2021-03-01 | 国立大学法人金沢大学 | 水素分離合金 |
JP7359381B2 (ja) | 2019-08-27 | 2023-10-11 | 国立大学法人金沢大学 | 水素分離合金 |
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