JP2013040158A - シラノール基を有するトリアリールアミン誘導体 - Google Patents
シラノール基を有するトリアリールアミン誘導体 Download PDFInfo
- Publication number
- JP2013040158A JP2013040158A JP2011252662A JP2011252662A JP2013040158A JP 2013040158 A JP2013040158 A JP 2013040158A JP 2011252662 A JP2011252662 A JP 2011252662A JP 2011252662 A JP2011252662 A JP 2011252662A JP 2013040158 A JP2013040158 A JP 2013040158A
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- JP
- Japan
- Prior art keywords
- group
- general formula
- carbon atoms
- represented
- triarylamine derivative
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 125000005259 triarylamine group Chemical group 0.000 title claims abstract description 58
- 125000005372 silanol group Chemical group 0.000 title claims abstract description 27
- 229910010272 inorganic material Inorganic materials 0.000 claims abstract description 47
- 239000011147 inorganic material Substances 0.000 claims abstract description 47
- 125000001424 substituent group Chemical group 0.000 claims abstract description 39
- 150000002430 hydrocarbons Chemical class 0.000 claims abstract description 23
- 229910003471 inorganic composite material Inorganic materials 0.000 claims abstract description 19
- 125000004122 cyclic group Chemical group 0.000 claims abstract description 17
- 239000013067 intermediate product Substances 0.000 claims abstract description 13
- 239000004215 Carbon black (E152) Substances 0.000 claims abstract description 7
- 229930195733 hydrocarbon Natural products 0.000 claims abstract description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 30
- 150000001875 compounds Chemical class 0.000 claims description 28
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 21
- 229910052710 silicon Inorganic materials 0.000 claims description 21
- 239000010703 silicon Substances 0.000 claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 125000005843 halogen group Chemical group 0.000 claims description 16
- 238000004519 manufacturing process Methods 0.000 claims description 16
- 239000003153 chemical reaction reagent Substances 0.000 claims description 15
- 229910052757 nitrogen Inorganic materials 0.000 claims description 15
- 125000004986 diarylamino group Chemical group 0.000 claims description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 11
- 125000003277 amino group Chemical group 0.000 claims description 11
- 125000003545 alkoxy group Chemical group 0.000 claims description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 125000004104 aryloxy group Chemical group 0.000 claims description 9
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 229910052801 chlorine Inorganic materials 0.000 claims description 6
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 claims description 5
- 239000007795 chemical reaction product Substances 0.000 claims description 5
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 229920005989 resin Polymers 0.000 abstract description 13
- 239000011347 resin Substances 0.000 abstract description 13
- 239000003960 organic solvent Substances 0.000 abstract description 5
- 238000002360 preparation method Methods 0.000 abstract description 3
- 238000000746 purification Methods 0.000 abstract description 3
- 239000011521 glass Substances 0.000 description 29
- 239000000243 solution Substances 0.000 description 27
- -1 triphenylamine compound Chemical class 0.000 description 26
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 21
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 21
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 18
- 239000002904 solvent Substances 0.000 description 17
- 239000003054 catalyst Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 15
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 239000010408 film Substances 0.000 description 11
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 10
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- 230000005525 hole transport Effects 0.000 description 8
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 7
- ABRVLXLNVJHDRQ-UHFFFAOYSA-N [2-pyridin-3-yl-6-(trifluoromethyl)pyridin-4-yl]methanamine Chemical compound FC(C1=CC(=CC(=N1)C=1C=NC=CC=1)CN)(F)F ABRVLXLNVJHDRQ-UHFFFAOYSA-N 0.000 description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 6
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- ZVNOSCMBXPCDBY-UHFFFAOYSA-N 3-[hydroxy-di(propan-2-yl)silyl]-n,n-diphenylaniline Chemical compound CC(C)[Si](O)(C(C)C)C1=CC=CC(N(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 ZVNOSCMBXPCDBY-UHFFFAOYSA-N 0.000 description 5
- 229910052738 indium Inorganic materials 0.000 description 5
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 5
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 229910001868 water Inorganic materials 0.000 description 5
- 239000011787 zinc oxide Substances 0.000 description 5
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 4
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 4
- 125000001309 chloro group Chemical group Cl* 0.000 description 4
- GSENNYNYEKCQGA-UHFFFAOYSA-N dichloro-di(propan-2-yl)silane Chemical compound CC(C)[Si](Cl)(Cl)C(C)C GSENNYNYEKCQGA-UHFFFAOYSA-N 0.000 description 4
- 238000004128 high performance liquid chromatography Methods 0.000 description 4
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 4
- 108091008695 photoreceptors Proteins 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 4
- 229910001887 tin oxide Inorganic materials 0.000 description 4
- 238000004506 ultrasonic cleaning Methods 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- WSNKEJIFARPOSQ-UHFFFAOYSA-N 3-[4-(aminomethyl)-6-(trifluoromethyl)pyridin-2-yl]oxy-N-(1-benzothiophen-2-ylmethyl)benzamide Chemical compound NCC1=CC(=NC(=C1)C(F)(F)F)OC=1C=C(C(=O)NCC2=CC3=C(S2)C=CC=C3)C=CC=1 WSNKEJIFARPOSQ-UHFFFAOYSA-N 0.000 description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000005370 alkoxysilyl group Chemical group 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 238000007664 blowing Methods 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000013076 target substance Substances 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- KLJVVMZZFMUFJY-UHFFFAOYSA-N 6-hydroxysilyl-N-[4-[4-(N-[6-hydroxysilyl-1,5-di(propan-2-yl)cyclohexa-2,4-dien-1-yl]anilino)phenyl]phenyl]-N-phenyl-1,5-di(propan-2-yl)cyclohexa-2,4-dien-1-amine Chemical compound C(C)(C)C1(C(C(=CC=C1)C(C)C)[SiH2]O)N(C1=CC=C(C=C1)C1=CC=C(N(C2=CC=CC=C2)C2(C(C(=CC=C2)C(C)C)[SiH2]O)C(C)C)C=C1)C1=CC=CC=C1 KLJVVMZZFMUFJY-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- ZVQWFGFPUWGXBY-UHFFFAOYSA-N CCC(C)[SiH](Cl)C(C)CC Chemical compound CCC(C)[SiH](Cl)C(C)CC ZVQWFGFPUWGXBY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 2
- ZRALSGWEFCBTJO-UHFFFAOYSA-N Guanidine Chemical compound NC(N)=N ZRALSGWEFCBTJO-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- IGSUJBNDAWQLST-UHFFFAOYSA-N chloro-di(propan-2-yl)silicon Chemical compound CC(C)[Si](Cl)C(C)C IGSUJBNDAWQLST-UHFFFAOYSA-N 0.000 description 2
- IPAIXTZQWAGRPZ-UHFFFAOYSA-N chloro-methyl-phenylsilicon Chemical compound C[Si](Cl)C1=CC=CC=C1 IPAIXTZQWAGRPZ-UHFFFAOYSA-N 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 125000006165 cyclic alkyl group Chemical group 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- JAONJTDQXUSBGG-UHFFFAOYSA-N dialuminum;dizinc;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Al+3].[Al+3].[Zn+2].[Zn+2] JAONJTDQXUSBGG-UHFFFAOYSA-N 0.000 description 2
- IESPKCNRKMAVIB-UHFFFAOYSA-N dichloro(dicyclohexyl)silane Chemical compound C1CCCCC1[Si](Cl)(Cl)C1CCCCC1 IESPKCNRKMAVIB-UHFFFAOYSA-N 0.000 description 2
- DRMVGLWQJKLGKR-UHFFFAOYSA-N dichloro(dicyclopentyl)silane Chemical compound C1CCCC1[Si](Cl)(Cl)C1CCCC1 DRMVGLWQJKLGKR-UHFFFAOYSA-N 0.000 description 2
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 2
- ZVMRWPHIZSSUKP-UHFFFAOYSA-N dicyclohexyl(dimethoxy)silane Chemical compound C1CCCCC1[Si](OC)(OC)C1CCCCC1 ZVMRWPHIZSSUKP-UHFFFAOYSA-N 0.000 description 2
- JWCYDYZLEAQGJJ-UHFFFAOYSA-N dicyclopentyl(dimethoxy)silane Chemical compound C1CCCC1[Si](OC)(OC)C1CCCC1 JWCYDYZLEAQGJJ-UHFFFAOYSA-N 0.000 description 2
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 2
- VHPUZTHRFWIGAW-UHFFFAOYSA-N dimethoxy-di(propan-2-yl)silane Chemical compound CO[Si](OC)(C(C)C)C(C)C VHPUZTHRFWIGAW-UHFFFAOYSA-N 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 2
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 2
- 235000019341 magnesium sulphate Nutrition 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- PFAUUICEGIRNHU-UHFFFAOYSA-N methyl(phenylmethoxy)silicon Chemical compound C[Si]OCC1=CC=CC=C1 PFAUUICEGIRNHU-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- AOJFQRQNPXYVLM-UHFFFAOYSA-N pyridin-1-ium;chloride Chemical compound [Cl-].C1=CC=[NH+]C=C1 AOJFQRQNPXYVLM-UHFFFAOYSA-N 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 238000010898 silica gel chromatography Methods 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 2
- 239000011343 solid material Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- TWRVYXVQOJCHIF-UHFFFAOYSA-N tert-butyl-chloro-methylsilane Chemical compound C[SiH](Cl)C(C)(C)C TWRVYXVQOJCHIF-UHFFFAOYSA-N 0.000 description 2
- WUHJOAPDGMVQFK-UHFFFAOYSA-N tert-butyl-methoxy-methylsilane Chemical compound CO[SiH](C)C(C)(C)C WUHJOAPDGMVQFK-UHFFFAOYSA-N 0.000 description 2
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 238000001269 time-of-flight mass spectrometry Methods 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
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- CCERQOYLJJULMD-UHFFFAOYSA-M magnesium;carbanide;chloride Chemical compound [CH3-].[Mg+2].[Cl-] CCERQOYLJJULMD-UHFFFAOYSA-M 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
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- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- HYXGAEYDKFCVMU-UHFFFAOYSA-N scandium oxide Chemical compound O=[Sc]O[Sc]=O HYXGAEYDKFCVMU-UHFFFAOYSA-N 0.000 description 1
- 150000004819 silanols Chemical class 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000011973 solid acid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- UUCCCPNEFXQJEL-UHFFFAOYSA-L strontium dihydroxide Chemical compound [OH-].[OH-].[Sr+2] UUCCCPNEFXQJEL-UHFFFAOYSA-L 0.000 description 1
- 229910001866 strontium hydroxide Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- NKPKJTMIQFJZOJ-UHFFFAOYSA-N tert-butyl-hydroxy-methylsilane Chemical compound C[SiH](O)C(C)(C)C NKPKJTMIQFJZOJ-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- TVBIVRGNYNBFCD-UHFFFAOYSA-N triethylazanium;trifluoromethanesulfonate Chemical compound CC[NH+](CC)CC.[O-]S(=O)(=O)C(F)(F)F TVBIVRGNYNBFCD-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- AHZJKOKFZJYCLG-UHFFFAOYSA-K trifluoromethanesulfonate;ytterbium(3+) Chemical compound [Yb+3].[O-]S(=O)(=O)C(F)(F)F.[O-]S(=O)(=O)C(F)(F)F.[O-]S(=O)(=O)C(F)(F)F AHZJKOKFZJYCLG-UHFFFAOYSA-K 0.000 description 1
- JPJIEXKLJOWQQK-UHFFFAOYSA-K trifluoromethanesulfonate;yttrium(3+) Chemical compound [Y+3].[O-]S(=O)(=O)C(F)(F)F.[O-]S(=O)(=O)C(F)(F)F.[O-]S(=O)(=O)C(F)(F)F JPJIEXKLJOWQQK-UHFFFAOYSA-K 0.000 description 1
- FTVLMFQEYACZNP-UHFFFAOYSA-N trimethylsilyl trifluoromethanesulfonate Chemical compound C[Si](C)(C)OS(=O)(=O)C(F)(F)F FTVLMFQEYACZNP-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0836—Compounds with one or more Si-OH or Si-O-metal linkage
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/16—Catalysts comprising hydrides, coordination complexes or organic compounds containing coordination complexes
- B01J31/22—Organic complexes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B61/00—Other general methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/04—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of carbon-silicon compounds, carbon or silicon
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/40—Organosilicon compounds, e.g. TIPS pentacene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
- H10K50/15—Hole transporting layers
Abstract
【解決手段】一般式(1)で表されるシラノール基を有するトリアリールアミン誘導体。
(一般式(1)中、R1、R4、R6、R9、R11、R14中、少なくとも一つはSiR16R17OH(式中、R16、R17はそれぞれ独立に、炭素数1〜20の直鎖、分岐、もしくは環状の一価炭化水素基を示す。)で表される置換基である。)
【選択図】なし
Description
ルアミノ基、炭素数1〜20の直鎖、分岐、もしくは環状の1価炭化水素基(置換基として一般式(2)で表されるジアリールアミノ基が含まれていてもよい。)、炭素数1〜20のアルコキシ基、炭素数6〜20のアリーロキシ基、ハロゲン原子、水素原子、アミノ基から選択される置換基を表す。ただし、R1、R4、R6、R9、R11、R14中、少なくとも一つはSiR16R17OH(式中、R16、R17はそれぞれ独立に、炭素数1〜20の直鎖、分岐、もしくは環状の一価炭化水素基を示す。)で表される置換基を含む。]
。R1〜R15を構成する炭素数6〜20のアリーロキシ基の例としては、フェノキシ基、p−メチルフェノキシ基、ナフトキシ基等が挙げられる。
すなわち、R1a、R4a、R6a、R9a、R11a、R14aの少なくとも一つがハロゲン原子を含む。ここで、R1a、R4a、R6a、R9a、R11a、R14aの少なくとも一つがハロゲン原子である場合がある。あるいは、目的物質である一般式(1)で表される化合物が上記一般式(2)で表される置換基を有する場合であって、かつ、一般式(2)中の置換基R22、R24、R27、R29のいずれかがSiR16R17OHである場合、出発物質である一般式(3)の化合物においては、対応するジアリール
アミノ基の、R22、R24、R27、R29に対応する置換基のいずれかがハロゲン原子である。
R16R17OHで表される置換基が存在する場合、対応するR1b〜R15bでは、SiR16R17OHに替えて、SiR16R17X(X=Cl又はH)を含む。すなわち、R1b、R4b、R6b、R9b、R11b、R14bの少なくとも一つがSiR16R17Xである場合がある。あるいは、目的物質である一般式(1)で表される化合物が上記一般式(2)で表される置換基を有する場合であって、かつ、一般式(2)中の置換基R22、R24、R27、R29のいずれかがSiR16R17OHである場合、中間生成物である一般式(4)の化合物においては、対応するジアリールアミノ基の、R22、R24、R27、R29に対応する置換基のいずれかがSiR16R17Xである。
、銀、真鍮、ステンレススチール等の金属、酸化ケイ素、酸化ゲルマニウム、酸化チタン、酸化亜鉛、酸化ジルコニウム、酸化スズ、酸化アルミニウム、酸化マグネシウム、酸化インジウム、チタン酸バリウム、チタン酸ジルコン酸鉛、酸化インジウムスズ、酸化アルミニウム亜鉛、酸化インジウム亜鉛、酸化インジウムガリウム亜鉛、フッ素ドープ酸化スズ等の金属酸化物、ソーダライムガラス、ホウケイ酸ガラス等のガラス等が挙げられる。なかでも酸化インジウムスズ、酸化インジウム亜鉛、酸化アルミニウム亜鉛、酸化亜鉛、酸化インジウムガリウム亜鉛、フッ素ドープ酸化スズ等の透明導電性酸化物が好ましく、酸化インジウムスズが特に好ましい。
のように、無機材料を親水化処理する工程は、任意選択的な前処理工程ということができ、無機複合材料の製造方法においては、かかる工程を含まないこともある。
ウ素、トリス(ペンタフルオロフェニル)ボラン、イットリウムトリフレート、イッテルビウムトリフレート、トリメチルシリルトリフレート、tert−ブチルジメチルシリルトリフレート等のルイス酸、活性白土、陽イオン交換樹脂等の固体酸、水酸化ナトリウム、水酸化リチウム、水酸化カリウム、水酸化ルビジウム、水酸化セシウム、ナトリウムメトキシド、ナトリウムエトキシド、カリウムメトキシド、ナトリウムフェノキシド、カリウムtert−ブトキシド、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、炭酸水素ナトリウム、硫酸水素カリウム、リン酸カリウム、リン酸二水素ナトリウム等のアルカリ金属塩、水酸化マグネシウム、水酸化カルシウム、水酸化バリウム、水酸化ストロンチウム、酸化マグネシウム、酸化カルシウム等のアルカリ土類金属塩、酸化アルミニウム、酸化スズ、酸化亜鉛、酸化ジルコニウム、酸化チタン、酸化イットリウム、酸化スカンジウム等の金属酸化物、アンモニア、トリメチルアミン、ジエチルアミン、トリエチルアミン、トリブチルアミン、ピロリジン、ピペリジン、ピペラジン、1,4−ジアザビシクロ[2.2.2]オクタン、1,8−ジアザビシクロ[5.4.0]ウンデセン、ヘキサメチレンテトラミン、グアニジン等の窒素化合物、塩化アンモニウム、硫酸アンモニウム、トリエチルアミントリフルオロメタンスルホン酸塩、ピリジン塩酸塩、トリブチルホスフォニウムテトラフルオロボレート、水酸化テトラメチルアンモニウム、水酸化テトラブチルアンモニウム等のオニウム塩等が挙げられる。触媒の使用量は任意であり、結合形成速度に応じて決定することができるが、式(1)で表されるトリアリールアミン誘導体に対するモル比が、0.0001〜10の比率となるように添加することが好ましい。
窒素雰囲気下、m−ブロモトリフェニルアミン976.0mg(3.01mmol)をテトラヒドロフラン溶媒中、−78℃で1.67mMのn−ブチルリチウム2.0ml(3.34mmol)を加えて30分攪拌後、ジイソプロピルジクロロシラン881.3mg(4.79mmol)を加えて徐々に昇温し、終夜で攪拌した。得られた溶液に、水とトルエンを加えた後、分液操作により有機層を抽出した。得られた溶液を硫酸マグネシウムにより乾燥し、ロータリーエバポレーターにて減圧濃縮した後、HPLCにより精製して黄色液体950.6mg(2.53mmol)を収率84.1%で得た。この液体のGC−MSスペクトルを測定した結果、m−(ヒドロキシジイソプロピルシリル)フェニルジフェニルアミンであることが確認された。
GC−MS m/z:375 (M+)
窒素雰囲気下、N,N’−ビス(m−ブロモフェニル)−N,N’−ジフェニルベンジジン654.2mg(1.01mmol)をテトラヒドロフラン溶媒中、−78℃で1.65mMのn−ブチルリチウム1.5ml(2.48mmol)を加えて30分攪拌後、ジイソプロピルジクロロシラン743.9mg(4.04mmol)を加えて徐々に昇温し、終夜で攪拌した。得られた溶液に、水とトルエンを加えた後、分液操作により有機層を抽出した。得られた溶液を硫酸マグネシウムにより乾燥し、ロータリーエバポレーターにて減圧濃縮した後、HPLC及びGPCにより精製して無色液体365.9mg(0.49mmol)を収率48.4%で得た。この液体のMALDI−TOFMSスペクトルを測定した結果、N,N’−ビス(m−ジイソプロピルヒドロキシシリルフェニル)−N,N’−ジフェニルベンジジンであることが確認された。
1H - NMR(600 MHz, d in CDCl3) : 0.91 (d,J=7.3 Hz, 12H), 1.00 (d,J=7.3 Hz,12H), 1.12(sept,J=7.3Hz,2H), 6.98 (t,J=6.9Hz, 2H) , 7.05−7.15(m,10H),
7.17− 7.27 (m,10H), 7.29(s,2H),7.41(d, J=7.
8Hz, 4H)
MALDI−TOFMS m/z:749 (M+)
実施例1で合成したm−(ヒドロキシジイソプロピルシリル)フェニルジフェニルアミンをアセトニトリルと混合して、無色透明の1mMアセトニトリル溶液を調製した。表面を10分間UVオゾン処理したスライドガラスをこの溶液に3分間浸漬した後引き上げて、溶媒を揮発させた。次いで、このスライドガラスを180℃のホットプレート上で5分間加熱した後、室温に冷却し、0.25mmol/L 硫酸/エタノール中で15分間超音波洗浄して基板と結合していない化合物1−1を除去した。エタノール中で5分間さらに超音波洗浄し、室温で窒素を吹き付けて乾燥させた。
実施例1で合成したm−(ヒドロキシジイソプロピルシリル)フェニルジフェニルアミンをアセトニトリルと混合して、無色透明の1mMアセトニトリル溶液を調製した。表面を10分間UVオゾン処理したITO(酸化インジウムスズ)膜付きガラスをこの溶液に
3分間浸漬した後引き上げて、溶媒を揮発させた。次いで、このITO膜付きガラスを180℃のホットプレート上で10分間加熱した後、室温に冷却し、0.25mmol/L 硫酸/エタノール中で15分間超音波洗浄して基板と結合していない化合物1−1を除去した。エタノール中で5分間さらに超音波洗浄し、室温で窒素を吹き付けて乾燥させた。得られた試料表面のXPS測定の結果を表2に示す。
実施例2で合成したN,N’−ビス(m−ジイソプロピルヒドロキシシリルフェニル)−N,N’−ジフェニルベンジジンをアセトニトリルと混合して、無色透明の0.5mMアセトニトリル溶液を調製した。ITO(酸化インジウムスズ)膜表面を10分間UVオゾン処理したITO膜付きガラスをこの溶液に5分間浸漬した後引き上げて、溶媒を揮発させた。次いで、このITO膜付きガラスを180℃のホットプレート上で30分間加熱した後、室温に冷却し、0.25mmol/L 硫酸/エタノール中で15分間超音波洗浄して基板と結合していない化合物を除去した。エタノール中で5分間さらに超音波洗浄し、室温で窒素を吹き付けて乾燥させた。
Claims (7)
- 下記一般式(1)で表される、シラノール基を有するトリアリールアミン誘導体。
ルアミノ基、炭素数1〜20の直鎖、分岐、もしくは環状の1価炭化水素基(置換基として一般式(2)で表されるジアリールアミノ基が含まれていてもよい。)、炭素数1〜20のアルコキシ基、炭素数6〜20のアリーロキシ基、ハロゲン原子、水素原子、アミノ基から選択される置換基を表す。ただし、R1、R4、R6、R9、R11、R14中、少なくとも一つはSiR16R17OH(式中、R16、R17はそれぞれ独立に、炭素数1〜20の直鎖、分岐、もしくは環状の一価炭化水素基を含む。)で表される置換基を含む。]
- 上記一般式(1)において、R16及びR17の一方もしくは両方が炭素数3〜20の分岐、もしくは環状の一価炭化水素基である請求項1記載のシラノール基を有するトリアリールアミン誘導体。
- 請求項1または2に記載のシラノール基を有するトリアリールアミン誘導体を、無機材料の表面に結合させてなる無機複合材料。
- 前記無機材料が、透明導電性酸化物である、請求項5に記載の無機複合材料。
- 請求項5に記載の無機複合材料の製造方法であって、
請求項1に記載のシラノール基を有するトリアリールアミン誘導体を無機材料と接触させる工程を含む、方法。
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Also Published As
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TWI526450B (zh) | 2016-03-21 |
US8575384B2 (en) | 2013-11-05 |
CN102558213B (zh) | 2015-04-15 |
EP2457917B1 (en) | 2014-06-18 |
KR20120059405A (ko) | 2012-06-08 |
KR101648991B1 (ko) | 2016-08-17 |
TW201235356A (en) | 2012-09-01 |
US20120149913A1 (en) | 2012-06-14 |
EP2457917A1 (en) | 2012-05-30 |
JP5762932B2 (ja) | 2015-08-12 |
CN102558213A (zh) | 2012-07-11 |
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