JP2012527780A5 - - Google Patents

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Publication number
JP2012527780A5
JP2012527780A5 JP2012512017A JP2012512017A JP2012527780A5 JP 2012527780 A5 JP2012527780 A5 JP 2012527780A5 JP 2012512017 A JP2012512017 A JP 2012512017A JP 2012512017 A JP2012512017 A JP 2012512017A JP 2012527780 A5 JP2012527780 A5 JP 2012527780A5
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JP
Japan
Prior art keywords
metal paste
finger lines
glass frit
printing
inorganic content
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JP2012512017A
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English (en)
Japanese (ja)
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JP2012527780A (ja
JP5898065B2 (ja
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Priority claimed from PCT/US2010/035522 external-priority patent/WO2010135496A1/en
Publication of JP2012527780A publication Critical patent/JP2012527780A/ja
Publication of JP2012527780A5 publication Critical patent/JP2012527780A5/ja
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Publication of JP5898065B2 publication Critical patent/JP5898065B2/ja
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JP2012512017A 2009-05-20 2010-05-20 シリコンウエハの前面上にグリッド電極を形成する方法 Active JP5898065B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17988509P 2009-05-20 2009-05-20
US61/179,885 2009-05-20
PCT/US2010/035522 WO2010135496A1 (en) 2009-05-20 2010-05-20 Process of forming a grid electrode on the front-side of a silicon wafer

Publications (3)

Publication Number Publication Date
JP2012527780A JP2012527780A (ja) 2012-11-08
JP2012527780A5 true JP2012527780A5 (enExample) 2013-07-04
JP5898065B2 JP5898065B2 (ja) 2016-04-06

Family

ID=42271964

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012512017A Active JP5898065B2 (ja) 2009-05-20 2010-05-20 シリコンウエハの前面上にグリッド電極を形成する方法

Country Status (7)

Country Link
US (2) US8486826B2 (enExample)
EP (1) EP2433304A1 (enExample)
JP (1) JP5898065B2 (enExample)
KR (1) KR101322072B1 (enExample)
CN (1) CN102428567B (enExample)
TW (1) TWI504011B (enExample)
WO (1) WO2010135496A1 (enExample)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102365689A (zh) * 2009-03-30 2012-02-29 E.I.内穆尔杜邦公司 金属浆料及其在硅太阳能电池生产中的用途
EP2433304A1 (en) * 2009-05-20 2012-03-28 E. I. du Pont de Nemours and Company Process of forming a grid electrode on the front-side of a silicon wafer
CN102479883A (zh) * 2009-11-27 2012-05-30 无锡尚德太阳能电力有限公司 太阳电池正面电极的形成方法
US20110240124A1 (en) * 2010-03-30 2011-10-06 E.I. Du Pont De Nemours And Company Metal pastes and use thereof in the production of silicon solar cells
EP2657979B1 (en) * 2010-12-24 2017-08-30 Shin-Etsu Chemical Co., Ltd. Method for manufacturing solar cell element
CA2833375A1 (en) 2011-04-18 2012-10-26 Diamir, Llc Methods of using mirna from bodily fluids for early detection and monitoring of mild cognitive impairment (mci) and alzheimer's disease (ad)
JP6027171B2 (ja) * 2011-07-04 2016-11-16 株式会社日立製作所 封着用ガラスフリット、封着用ガラスペースト、導電性ガラスペースト、およびそれらを利用した電気電子部品
CN103165689B (zh) * 2011-12-12 2015-10-28 茂迪股份有限公司 太阳能电池及其制造方法
JP5583196B2 (ja) * 2011-12-21 2014-09-03 パナソニック株式会社 薄膜太陽電池およびその製造方法
CN103171260A (zh) * 2011-12-23 2013-06-26 昆山允升吉光电科技有限公司 一种太阳能电池电极的配套网板及其印刷方法
EP2839510A4 (en) * 2012-04-18 2015-12-02 Heraeus Precious Metals North America Conshohocken Llc PROCESS FOR PRINTING SOLAR CELL CONTACTS
KR101396444B1 (ko) * 2013-05-06 2014-05-22 한화케미칼 주식회사 태양전지의 전극의 제조방법 및 이를 이용한 태양전지
TW201511300A (zh) * 2013-09-11 2015-03-16 Inst Nuclear Energy Res Atomic Energy Council 具有摻雜矽或硼原子之鋁金屬電極之製備方法
KR20150035189A (ko) 2013-09-27 2015-04-06 엘지전자 주식회사 태양 전지
KR101859017B1 (ko) * 2015-12-02 2018-05-17 삼성에스디아이 주식회사 전극 형성 방법, 이로부터 제조된 전극 및 태양 전지
CN105590663B (zh) * 2016-01-07 2017-09-22 清华大学 无铅无铋导电银浆、银栅线的制备方法及硅太阳能电池
JP6810986B2 (ja) * 2016-07-14 2021-01-13 アートビーム株式会社 太陽電池および太陽電池の製造方法
CN110337423A (zh) 2017-03-24 2019-10-15 贺利氏贵金属北美康舍霍肯有限责任公司 用于导电膏组合物的低蚀刻和非接触式玻璃
CN108110087B (zh) * 2017-12-20 2019-12-17 江苏日托光伏科技股份有限公司 一种低线宽mwt硅太阳能电池的制备方法
US20190280133A1 (en) 2018-03-09 2019-09-12 Heraeus Precious Metals North America Conshohocken Llc Seed layer for improved contact on a silicon wafer
KR102576589B1 (ko) * 2018-09-05 2023-09-08 상라오 징코 솔라 테크놀러지 디벨롭먼트 컴퍼니, 리미티드 태양 전지 및 이를 포함하는 태양 전지 패널
CN109539604B (zh) * 2019-01-17 2020-05-29 河北道荣新能源科技有限公司 薄膜光伏发电耦合选择性吸收涂层结构
CN109631353B (zh) * 2019-01-17 2020-05-08 河北道荣新能源科技有限公司 薄膜光伏发电耦合选择性吸收涂层制法及其集热管制法
US20210257505A1 (en) * 2020-02-18 2021-08-19 Dupont Electronics, Inc. Solar cell and method for manufacturing the same
JP2021022735A (ja) * 2020-09-21 2021-02-18 アートビーム株式会社 太陽電池および太陽電池の製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0374244B1 (en) * 1988-06-10 1994-09-28 Mobil Solar Energy Corporation An improved method of fabricating contacts for solar cells
US5178685A (en) * 1991-06-11 1993-01-12 Mobil Solar Energy Corporation Method for forming solar cell contacts and interconnecting solar cells
JP2744847B2 (ja) 1991-06-11 1998-04-28 エイエスイー・アメリカス・インコーポレーテッド 改良された太陽電池及びその製造方法
JP4121928B2 (ja) * 2003-10-08 2008-07-23 シャープ株式会社 太陽電池の製造方法
US7462304B2 (en) * 2005-04-14 2008-12-09 E.I. Du Pont De Nemours And Company Conductive compositions used in the manufacture of semiconductor device
JP5118044B2 (ja) * 2006-08-31 2013-01-16 信越半導体株式会社 半導体基板並びに電極の形成方法及び太陽電池の製造方法
JP5091161B2 (ja) 2006-12-26 2012-12-05 京セラ株式会社 太陽電池素子及び太陽電池素子の製造方法
US8236598B2 (en) * 2007-08-31 2012-08-07 Ferro Corporation Layered contact structure for solar cells
TW200926210A (en) * 2007-09-27 2009-06-16 Murata Manufacturing Co Ag electrode paste, solar battery cell, and process for producing the solar battery cell
US8759144B2 (en) * 2007-11-02 2014-06-24 Alliance For Sustainable Energy, Llc Fabrication of contacts for silicon solar cells including printing burn through layers
JP2009193993A (ja) * 2008-02-12 2009-08-27 Mitsubishi Electric Corp 太陽電池電極の製造方法および太陽電池電極
US8151786B2 (en) * 2009-04-30 2012-04-10 The Brinkmann Corporation Gas cooking appliance having an automatic gas shutoff mechanism
EP2433304A1 (en) * 2009-05-20 2012-03-28 E. I. du Pont de Nemours and Company Process of forming a grid electrode on the front-side of a silicon wafer

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