JP2012526830A5 - - Google Patents

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Publication number
JP2012526830A5
JP2012526830A5 JP2012510961A JP2012510961A JP2012526830A5 JP 2012526830 A5 JP2012526830 A5 JP 2012526830A5 JP 2012510961 A JP2012510961 A JP 2012510961A JP 2012510961 A JP2012510961 A JP 2012510961A JP 2012526830 A5 JP2012526830 A5 JP 2012526830A5
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Japan
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substituted
alkyl
unsubstituted aryl
hydrogen
hso
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JP2012510961A
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Japanese (ja)
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JP5619149B2 (ja
JP2012526830A (ja
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Priority claimed from US12/465,042 external-priority patent/US8258346B2/en
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Publication of JP2012526830A publication Critical patent/JP2012526830A/ja
Publication of JP2012526830A5 publication Critical patent/JP2012526830A5/ja
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Publication of JP5619149B2 publication Critical patent/JP5619149B2/ja
Expired - Fee Related legal-status Critical Current
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JP2012510961A 2009-05-13 2010-05-12 表面改質六方晶窒化ホウ素粒子 Expired - Fee Related JP5619149B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/465,042 US8258346B2 (en) 2009-05-13 2009-05-13 Surface modified hexagonal boron nitride particles
US12/465,042 2009-05-13
PCT/US2010/034462 WO2010132512A2 (en) 2009-05-13 2010-05-12 Surface modified hexagonal boron nitride particles

Publications (3)

Publication Number Publication Date
JP2012526830A JP2012526830A (ja) 2012-11-01
JP2012526830A5 true JP2012526830A5 (enExample) 2013-06-20
JP5619149B2 JP5619149B2 (ja) 2014-11-05

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012510961A Expired - Fee Related JP5619149B2 (ja) 2009-05-13 2010-05-12 表面改質六方晶窒化ホウ素粒子

Country Status (6)

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US (1) US8258346B2 (enExample)
EP (1) EP2429943A4 (enExample)
JP (1) JP5619149B2 (enExample)
KR (1) KR20120024756A (enExample)
CN (1) CN102421701B (enExample)
WO (1) WO2010132512A2 (enExample)

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JP6632636B2 (ja) * 2016-01-26 2020-01-22 富士フイルム株式会社 表面修飾無機物およびその製造方法、樹脂組成物、熱伝導材料、ならびにデバイス
WO2017158919A1 (ja) * 2016-03-14 2017-09-21 ナミックス株式会社 窒化ホウ素フィラ―、樹脂組成物、フィルム、窒化ホウ素フィラ―の製造方法
CN109135267B (zh) * 2017-06-15 2021-04-27 中国科学院化学研究所 一种表面胺基化的氮化硼/尼龙复合材料及其制备方法和用途
US11034847B2 (en) 2017-07-14 2021-06-15 Samsung Electronics Co., Ltd. Hardmask composition, method of forming pattern using hardmask composition, and hardmask formed from hardmask composition
KR102293461B1 (ko) * 2017-07-14 2021-08-25 후지필름 가부시키가이샤 표면 수식 무기 질화물, 조성물, 열전도 재료, 열전도층 부착 디바이스
KR102433666B1 (ko) 2017-07-27 2022-08-18 삼성전자주식회사 하드마스크 조성물, 이를 이용한 패턴의 형성방법 및 상기 하드마스크 조성물을 이용하여 형성된 하드마스크
KR102486388B1 (ko) 2017-07-28 2023-01-09 삼성전자주식회사 그래핀 양자점의 제조방법, 상기 제조방법에 따라 얻어진 그래핀 양자점을 포함한 하드마스크 조성물, 이를 이용한 패턴의 형성방법 및 상기 하드마스크 조성물을 이용하여 형성된 하드마스크
CN109401360B (zh) * 2017-08-18 2020-08-21 中国科学院化学研究所 一种对高温结构陶瓷材料进行表面改性的方法
CN107827770A (zh) * 2017-11-14 2018-03-23 西北工业大学 一种脂肪链接枝的六方氮化硼纳米复合材料及其制备方法
EP3916773A4 (en) 2019-01-23 2022-03-23 FUJIFILM Corporation COMPOSITION, THERMOCONDUCTIVE SHEET AND DEVICE EQUIPPED WITH A THERMOCONDUCTIVE LAYER
WO2020158259A1 (ja) 2019-02-01 2020-08-06 富士フイルム株式会社 熱伝導材料形成用組成物、熱伝導材料
KR102122019B1 (ko) 2019-04-26 2020-06-11 서울대학교산학협력단 질화붕소를 포함하는 폴리올레핀 나노복합재료 및 그 제조방법
KR102291752B1 (ko) * 2020-12-18 2021-08-24 한국기초과학지원연구원 산기 치환 표면 개질 질화붕소, 이의 제조방법 및 이를 함유한 방열성 조성물
CN116694106A (zh) * 2023-06-07 2023-09-05 安徽建筑大学 一种功能化氮化硼及基于其的阻燃导热硅橡胶

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