JP2012526295A5 - - Google Patents

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Publication number
JP2012526295A5
JP2012526295A5 JP2012508978A JP2012508978A JP2012526295A5 JP 2012526295 A5 JP2012526295 A5 JP 2012526295A5 JP 2012508978 A JP2012508978 A JP 2012508978A JP 2012508978 A JP2012508978 A JP 2012508978A JP 2012526295 A5 JP2012526295 A5 JP 2012526295A5
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JP
Japan
Prior art keywords
weight
hydroxylamine
alkylpyrrolidone
organic solvent
producing
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Application number
JP2012508978A
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English (en)
Japanese (ja)
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JP2012526295A (ja
JP5836932B2 (ja
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Priority claimed from PCT/EP2010/055205 external-priority patent/WO2010127943A1/en
Publication of JP2012526295A publication Critical patent/JP2012526295A/ja
Publication of JP2012526295A5 publication Critical patent/JP2012526295A5/ja
Application granted granted Critical
Publication of JP5836932B2 publication Critical patent/JP5836932B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012508978A 2009-05-07 2010-04-20 レジストストリッピング組成物及び電気装置を製造するための方法 Expired - Fee Related JP5836932B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17617909P 2009-05-07 2009-05-07
US61/176,179 2009-05-07
PCT/EP2010/055205 WO2010127943A1 (en) 2009-05-07 2010-04-20 Resist stripping compositions and methods for manufacturing electrical devices

Publications (3)

Publication Number Publication Date
JP2012526295A JP2012526295A (ja) 2012-10-25
JP2012526295A5 true JP2012526295A5 (https=) 2013-06-06
JP5836932B2 JP5836932B2 (ja) 2015-12-24

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ID=42271987

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012508978A Expired - Fee Related JP5836932B2 (ja) 2009-05-07 2010-04-20 レジストストリッピング組成物及び電気装置を製造するための方法

Country Status (11)

Country Link
US (1) US9146471B2 (https=)
EP (1) EP2427804B1 (https=)
JP (1) JP5836932B2 (https=)
KR (1) KR101799602B1 (https=)
CN (1) CN102804074B (https=)
IL (1) IL215954A (https=)
MY (1) MY158776A (https=)
RU (1) RU2551841C2 (https=)
SG (2) SG10201402081TA (https=)
TW (1) TWI492001B (https=)
WO (1) WO2010127943A1 (https=)

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KR102794011B1 (ko) 2020-10-30 2025-04-15 주식회사 이엔에프테크놀로지 포토레지스트 제거용 박리액 조성물
KR102933956B1 (ko) * 2021-05-03 2026-03-04 삼성전자주식회사 포토레지스트 박리 조성물과 이를 이용하는 반도체 소자 및 반도체 패키지의 제조 방법
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