JP2012518878A5 - - Google Patents

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Publication number
JP2012518878A5
JP2012518878A5 JP2011550593A JP2011550593A JP2012518878A5 JP 2012518878 A5 JP2012518878 A5 JP 2012518878A5 JP 2011550593 A JP2011550593 A JP 2011550593A JP 2011550593 A JP2011550593 A JP 2011550593A JP 2012518878 A5 JP2012518878 A5 JP 2012518878A5
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JP
Japan
Prior art keywords
pump
vacuum chamber
vacuum
turbomolecular
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2011550593A
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English (en)
Japanese (ja)
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JP2012518878A (ja
JP5653941B2 (ja
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Publication date
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Priority claimed from PCT/EP2010/052218 external-priority patent/WO2010094801A1/en
Publication of JP2012518878A publication Critical patent/JP2012518878A/ja
Publication of JP2012518878A5 publication Critical patent/JP2012518878A5/ja
Application granted granted Critical
Publication of JP5653941B2 publication Critical patent/JP5653941B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011550593A 2009-02-22 2010-02-22 真空チャンバー内の真空を実現する方法および設備 Expired - Fee Related JP5653941B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US15441509P 2009-02-22 2009-02-22
US61/154,415 2009-02-22
US28940709P 2009-12-23 2009-12-23
US61/289,407 2009-12-23
US30633310P 2010-02-19 2010-02-19
US61/306,333 2010-02-19
PCT/EP2010/052218 WO2010094801A1 (en) 2009-02-22 2010-02-22 A method and arrangement for realizing a vacuum in a vacuum chamber

Publications (3)

Publication Number Publication Date
JP2012518878A JP2012518878A (ja) 2012-08-16
JP2012518878A5 true JP2012518878A5 (https=) 2013-04-11
JP5653941B2 JP5653941B2 (ja) 2015-01-14

Family

ID=42124236

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011550593A Expired - Fee Related JP5653941B2 (ja) 2009-02-22 2010-02-22 真空チャンバー内の真空を実現する方法および設備

Country Status (7)

Country Link
US (2) US8366423B2 (https=)
EP (1) EP2399272A1 (https=)
JP (1) JP5653941B2 (https=)
KR (1) KR101553802B1 (https=)
CN (1) CN102414775A (https=)
TW (1) TW201100973A (https=)
WO (1) WO2010094801A1 (https=)

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CN103187231A (zh) * 2011-12-30 2013-07-03 北京中科信电子装备有限公司 一种离子注入机自动建立束线与靶室高真空的方法
CN106933063B (zh) * 2012-03-20 2019-01-18 迈普尔平版印刷Ip有限公司 电子射束光刻系统
CN104428866A (zh) * 2012-05-14 2015-03-18 迈普尔平版印刷Ip有限公司 带电粒子光刻系统和射束产生器
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CN103727036B (zh) * 2014-01-18 2015-04-15 淄博水环真空泵厂有限公司 巨型真空室真空度的精确调节系统
CN103727051B (zh) * 2014-01-18 2015-05-13 淄博水环真空泵厂有限公司 大抽气量多支路流量精确控制系统
US10180248B2 (en) 2015-09-02 2019-01-15 ProPhotonix Limited LED lamp with sensing capabilities
CN105931694B (zh) * 2016-05-06 2018-05-22 东莞中子科学中心 一种高性能中子准直器及其组装方法
CN206332060U (zh) * 2016-10-28 2017-07-14 应用材料公司 热学腔室
CN106586282A (zh) * 2016-12-09 2017-04-26 安徽亿瑞深冷能源科技有限公司 一种可独立控制的多真空腔体高温存储设备
US10794536B2 (en) * 2017-11-30 2020-10-06 Cryogenic Fuels Inc. Vacuum acquisition systems and methods
US20220065727A1 (en) * 2020-08-28 2022-03-03 Kla Corporation Coolant Microleak Sensor for a Vacuum System
CN115110040B (zh) * 2022-06-20 2024-05-14 北京维开科技有限公司 一种独立双腔室电子束蒸发镀膜设备
US20240337265A1 (en) * 2023-04-06 2024-10-10 Taiwan Semiconductor Manufacturing Company, Ltd. Cryogenic pump for semiconductor processing
FR3164314A1 (fr) * 2024-07-03 2026-01-09 Pfeiffer Vacuum Equipement et procédé de fabrication
CN119781255A (zh) * 2025-01-24 2025-04-08 中国科学院微电子研究所 光刻机及光刻机污染控制方法

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WO2016158421A1 (ja) 2015-04-03 2016-10-06 株式会社日立ハイテクノロジーズ 光量検出装置、それを用いた免疫分析装置および荷電粒子線装置

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