JP2012508456A5 - - Google Patents
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- Publication number
- JP2012508456A5 JP2012508456A5 JP2011534920A JP2011534920A JP2012508456A5 JP 2012508456 A5 JP2012508456 A5 JP 2012508456A5 JP 2011534920 A JP2011534920 A JP 2011534920A JP 2011534920 A JP2011534920 A JP 2011534920A JP 2012508456 A5 JP2012508456 A5 JP 2012508456A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- substrate support
- support
- relative
- sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 239000000758 substrate Substances 0.000 claims 62
- 238000000034 method Methods 0.000 claims 8
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000005286 illumination Methods 0.000 claims 1
- 238000010191 image analysis Methods 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 230000000007 visual effect Effects 0.000 claims 1
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11201508P | 2008-11-06 | 2008-11-06 | |
| US11200808P | 2008-11-06 | 2008-11-06 | |
| US61/112,015 | 2008-11-06 | ||
| US61/112,008 | 2008-11-06 | ||
| US12/611,958 US8314371B2 (en) | 2008-11-06 | 2009-11-04 | Rapid thermal processing chamber with micro-positioning system |
| US12/611,958 | 2009-11-04 | ||
| PCT/US2009/063394 WO2010054076A2 (en) | 2008-11-06 | 2009-11-05 | Rapid thermal processing chamber with micro-positioning system |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012508456A JP2012508456A (ja) | 2012-04-05 |
| JP2012508456A5 true JP2012508456A5 (enExample) | 2012-12-20 |
| JP6079980B2 JP6079980B2 (ja) | 2017-02-15 |
Family
ID=42153545
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011534920A Active JP6079980B2 (ja) | 2008-11-06 | 2009-11-05 | 微小位置決めシステムを備える急速熱処理チャンバ |
Country Status (6)
| Country | Link |
|---|---|
| US (4) | US8314371B2 (enExample) |
| JP (1) | JP6079980B2 (enExample) |
| KR (3) | KR101958823B1 (enExample) |
| CN (1) | CN102210017B (enExample) |
| DE (1) | DE112009002691T5 (enExample) |
| WO (1) | WO2010054076A2 (enExample) |
Families Citing this family (55)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8314371B2 (en) * | 2008-11-06 | 2012-11-20 | Applied Materials, Inc. | Rapid thermal processing chamber with micro-positioning system |
| US8109669B2 (en) * | 2008-11-19 | 2012-02-07 | Applied Materials, Inc. | Temperature uniformity measurement during thermal processing |
| US9282592B2 (en) | 2009-02-27 | 2016-03-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Rotatable heating-cooling plate and element in proximity thereto |
| DE102011007682A1 (de) * | 2011-04-19 | 2012-10-25 | Siltronic Ag | Suszeptor zum Abstützen einer Halbleiterscheibe und Verfahren zum Abscheiden einer Schicht auf einer Vorderseite einer Halbleiterscheibe |
| CN105742201B (zh) * | 2011-08-16 | 2018-07-27 | 应用材料公司 | 用于在腔室内感测基板的方法及设备 |
| JP5676398B2 (ja) * | 2011-08-29 | 2015-02-25 | 株式会社Ｓｅｂａｃｓ | 基板温度測定システム |
| US9548223B2 (en) * | 2011-12-23 | 2017-01-17 | Lam Research Ag | Apparatus for treating surfaces of wafer-shaped articles |
| KR101829676B1 (ko) * | 2011-12-29 | 2018-02-20 | 삼성전자주식회사 | 웨이퍼 열 처리 방법 |
| US9330949B2 (en) * | 2012-03-27 | 2016-05-03 | SCREEN Holdings Co., Ltd. | Heat treatment apparatus for heating substrate by irradiating substrate with flash of light |
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| JP2016501445A (ja) * | 2012-11-21 | 2016-01-18 | イー・ヴィー グループ インコーポレイテッドＥＶ Ｇｒｏｕｐ Ｉｎｃ． | ウェハの収容および載置用の収容具 |
| KR102357780B1 (ko) * | 2013-05-15 | 2022-02-08 | 어플라이드 머티어리얼스, 인코포레이티드 | 램프 가열 어셈블리를 위한 확산기 |
| JP6114668B2 (ja) * | 2013-09-18 | 2017-04-12 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法 |
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| US9892956B1 (en) * | 2016-10-12 | 2018-02-13 | Lam Research Corporation | Wafer positioning pedestal for semiconductor processing |
| US10573549B2 (en) | 2016-12-01 | 2020-02-25 | Lam Research Corporation | Pad raising mechanism in wafer positioning pedestal for semiconductor processing |
| US9960068B1 (en) | 2016-12-02 | 2018-05-01 | Lam Research Corporation | Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processing |
| CN109923659B (zh) * | 2016-11-09 | 2024-03-12 | 东京毅力科创Fsi公司 | 用于在处理室中处理微电子衬底的磁悬浮且旋转的卡盘 |
| NL2017773B1 (en) * | 2016-11-11 | 2018-05-24 | Suss Microtec Lithography Gmbh | Positioning device |
| TWI765936B (zh) | 2016-11-29 | 2022-06-01 | 美商東京威力科創Ｆｓｉ股份有限公司 | 用以對處理腔室中之微電子基板進行處理的平移與旋轉夾頭 |
| WO2018106952A1 (en) | 2016-12-07 | 2018-06-14 | Tel Fsi, Inc. | Wafer edge lift pin design for manufacturing a semiconductor device |
| US9964863B1 (en) * | 2016-12-20 | 2018-05-08 | Applied Materials, Inc. | Post exposure processing apparatus |
| US10655224B2 (en) * | 2016-12-20 | 2020-05-19 | Lam Research Corporation | Conical wafer centering and holding device for semiconductor processing |
| WO2018140789A1 (en) | 2017-01-27 | 2018-08-02 | Tel Fsi, Inc. | Systems and methods for rotating and translating a substrate in a process chamber |
| KR101948522B1 (ko) | 2017-06-05 | 2019-04-29 | 홍승환 | 사이즈 조절이 가능한 웨이퍼용 매거진 |
| JP6948860B2 (ja) * | 2017-07-14 | 2021-10-13 | 株式会社荏原製作所 | 基板保持装置 |
| CN109686677A (zh) * | 2017-10-19 | 2019-04-26 | 德淮半导体有限公司 | 一种半导体加工设备 |
| JP2019079867A (ja) * | 2017-10-20 | 2019-05-23 | 漢民科技股▲分▼有限公司 | 気相成膜装置 |
| CN111937128A (zh) | 2018-02-19 | 2020-11-13 | 东京毅力科创美国制造与工程公司 | 具有可控射束大小的处理喷雾的微电子处理系统 |
| CN111819679A (zh) * | 2018-03-13 | 2020-10-23 | 应用材料公司 | 具有等离子体喷涂涂层的支撑环 |
| KR102433436B1 (ko) | 2018-07-04 | 2022-08-17 | 삼성전자주식회사 | 기판 처리 시스템, 기판 처리 시스템에서의 에지 링 정렬 검사 방법 및 이를 수행하기 위한 원반형 비젼 센서 |
| US11545387B2 (en) * | 2018-07-13 | 2023-01-03 | Tel Manufacturing And Engineering Of America, Inc. | Magnetic integrated lift pin system for a chemical processing chamber |
| US10802475B2 (en) * | 2018-07-16 | 2020-10-13 | Elite Robotics | Positioner for a robotic workcell |
| TWI805795B (zh) | 2018-07-20 | 2023-06-21 | 美商應用材料股份有限公司 | 基板定位設備與方法 |
| TWI794530B (zh) | 2018-07-20 | 2023-03-01 | 美商應用材料股份有限公司 | 基板定位設備及方法 |
| US10876976B2 (en) * | 2018-08-30 | 2020-12-29 | Taiwan Semiconductor Manufacturing Company Ltd. | Apparatus and method for substrate inspection |
| US11404296B2 (en) | 2018-09-04 | 2022-08-02 | Applied Materials, Inc. | Method and apparatus for measuring placement of a substrate on a heater pedestal |
| JP2022520038A (ja) * | 2019-02-08 | 2022-03-28 | ラム リサーチ コーポレーション | 基板位置の検出および調整 |
| KR102640172B1 (ko) | 2019-07-03 | 2024-02-23 | 삼성전자주식회사 | 기판 처리 장치 및 이의 구동 방법 |
| US11342209B2 (en) | 2019-12-09 | 2022-05-24 | Applied Materials, Inc. | Methods and apparatus for measuring edge ring temperature |
| KR102888626B1 (ko) * | 2020-01-23 | 2025-11-19 | 램 리써치 코포레이션 | 자동화된 회전 사전 정렬을 사용한 에지 링 이송 |
| JP7418241B2 (ja) * | 2020-02-27 | 2024-01-19 | 東京エレクトロン株式会社 | 位置決め装置、処理システム及び位置決め方法 |
| US11915953B2 (en) * | 2020-04-17 | 2024-02-27 | Applied Materials, Inc. | Apparatus, systems, and methods of measuring edge ring distance for thermal processing chambers |
| KR102417426B1 (ko) * | 2020-07-09 | 2022-07-06 | 주식회사 한화 | 보호부를 구비한 기판 처리 장치 |
| US11640118B2 (en) * | 2020-08-17 | 2023-05-02 | Tokyo Electron Limited | Method of pattern alignment for field stitching |
| KR20220130621A (ko) * | 2021-03-18 | 2022-09-27 | 에이에스엠 아이피 홀딩 비.브이. | 램프 뱅크 정렬을 갖는 웨이퍼 외곽 에지 온도 측정 시스템 |
| US11721566B2 (en) | 2021-07-13 | 2023-08-08 | Applied Materials, Inc. | Sensor assembly and methods of vapor monitoring in process chambers |
| JP7641878B2 (ja) * | 2021-11-01 | 2025-03-07 | 東京エレクトロン株式会社 | 測定方法及び測定システム |
| KR102742224B1 (ko) * | 2021-12-16 | 2024-12-12 | 에이피시스템 주식회사 | 자기부상 회전 장치 및 이를 이용하는 기판 처리 장치 |
| US11649855B1 (en) | 2022-04-28 | 2023-05-16 | Skf Canada Limited | Contaminant-free work piece processing system |
| US20240153803A1 (en) | 2022-11-07 | 2024-05-09 | Applied Materials, Inc. | Semiconductor process equipment |
| US12273051B2 (en) | 2022-12-14 | 2025-04-08 | Applied Materials, Inc. | Apparatus and method for contactless transportation of a carrier |
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| ATE249838T1 (de) | 1993-05-12 | 2003-10-15 | Chiron Corp | Konserviertes motiv der hepatitis c virus e2/ns1 region |
| JP2908227B2 (ja) * | 1993-12-29 | 1999-06-21 | 日本電気株式会社 | 半導体製造装置 |
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| US5982986A (en) * | 1995-02-03 | 1999-11-09 | Applied Materials, Inc. | Apparatus and method for rotationally aligning and degassing semiconductor substrate within single vacuum chamber |
| JPH10223732A (ja) * | 1996-12-02 | 1998-08-21 | Toyota Autom Loom Works Ltd | 位置ずれ検出装置およびその方法 |
| TW350115B (en) | 1996-12-02 | 1999-01-11 | Toyota Automatic Loom Co Ltd | Misregistration detection device and method thereof |
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| JP4353454B2 (ja) * | 2002-06-21 | 2009-10-28 | 大日本スクリーン製造株式会社 | 熱処理装置 |
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| US7153185B1 (en) | 2003-08-18 | 2006-12-26 | Applied Materials, Inc. | Substrate edge detection |
| US7107125B2 (en) * | 2003-10-29 | 2006-09-12 | Applied Materials, Inc. | Method and apparatus for monitoring the position of a semiconductor processing robot |
| US20050160992A1 (en) * | 2004-01-28 | 2005-07-28 | Applied Materials, Inc. | Substrate gripping apparatus |
| US8658945B2 (en) | 2004-02-27 | 2014-02-25 | Applied Materials, Inc. | Backside rapid thermal processing of patterned wafers |
| US20050223993A1 (en) * | 2004-04-08 | 2005-10-13 | Blomiley Eric R | Deposition apparatuses; methods for assessing alignments of substrates within deposition apparatuses; and methods for assessing thicknesses of deposited layers within deposition apparatuses |
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| KR20080034725A (ko) * | 2006-10-17 | 2008-04-22 | 삼성전자주식회사 | 로드락 챔버 및 로드락 챔버에서의 웨이퍼의 로딩, 언로딩방법 |
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| JP2008188727A (ja) * | 2007-02-06 | 2008-08-21 | Joyo Kogaku Kk | アライメント方法およびその装置 |
| US8057602B2 (en) * | 2007-05-09 | 2011-11-15 | Applied Materials, Inc. | Apparatus and method for supporting, positioning and rotating a substrate in a processing chamber |
| US20090298300A1 (en) * | 2008-05-09 | 2009-12-03 | Applied Materials, Inc. | Apparatus and Methods for Hyperbaric Rapid Thermal Processing |
| US8111978B2 (en) * | 2008-07-11 | 2012-02-07 | Applied Materials, Inc. | Rapid thermal processing chamber with shower head |
| WO2010009050A2 (en) * | 2008-07-15 | 2010-01-21 | Applied Materials, Inc. | Substrate lift pin sensor |
| US8314371B2 (en) * | 2008-11-06 | 2012-11-20 | Applied Materials, Inc. | Rapid thermal processing chamber with micro-positioning system |
| US8461022B2 (en) * | 2009-04-20 | 2013-06-11 | Applied Materials, Inc. | Methods and apparatus for aligning a substrate in a process chamber |
-
2009
- 2009-11-04 US US12/611,958 patent/US8314371B2/en active Active
- 2009-11-05 JP JP2011534920A patent/JP6079980B2/ja active Active
- 2009-11-05 KR KR1020187004614A patent/KR101958823B1/ko active Active
- 2009-11-05 CN CN2009801444721A patent/CN102210017B/zh active Active
- 2009-11-05 DE DE112009002691T patent/DE112009002691T5/de active Granted
- 2009-11-05 KR KR1020117013036A patent/KR101613527B1/ko active Active
- 2009-11-05 KR KR1020167005275A patent/KR101831360B1/ko active Active
- 2009-11-05 WO PCT/US2009/063394 patent/WO2010054076A2/en not_active Ceased
-
2012
- 2012-10-19 US US13/656,158 patent/US9564349B2/en active Active
- 2012-10-19 US US13/656,150 patent/US8900889B2/en active Active
-
2014
- 2014-10-31 US US14/529,848 patent/US9390950B2/en active Active
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