JP2012505299A5 - - Google Patents

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Publication number
JP2012505299A5
JP2012505299A5 JP2011531273A JP2011531273A JP2012505299A5 JP 2012505299 A5 JP2012505299 A5 JP 2012505299A5 JP 2011531273 A JP2011531273 A JP 2011531273A JP 2011531273 A JP2011531273 A JP 2011531273A JP 2012505299 A5 JP2012505299 A5 JP 2012505299A5
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JP
Japan
Prior art keywords
thermal interface
interface material
polymer matrix
polymer
matrix comprises
Prior art date
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Application number
JP2011531273A
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English (en)
Japanese (ja)
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JP5325987B2 (ja
JP2012505299A (ja
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Publication date
Priority claimed from US12/342,322 external-priority patent/US8138239B2/en
Application filed filed Critical
Publication of JP2012505299A publication Critical patent/JP2012505299A/ja
Publication of JP2012505299A5 publication Critical patent/JP2012505299A5/ja
Application granted granted Critical
Publication of JP5325987B2 publication Critical patent/JP5325987B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011531273A 2008-12-23 2009-12-09 ポリマーサーマルインターフェイス材料 Active JP5325987B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/342,322 2008-12-23
US12/342,322 US8138239B2 (en) 2008-12-23 2008-12-23 Polymer thermal interface materials
PCT/US2009/067274 WO2010074970A2 (en) 2008-12-23 2009-12-09 Polymer thermal interface materials

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013151959A Division JP5837007B2 (ja) 2008-12-23 2013-07-22 ポリマーサーマルインターフェイス材料

Publications (3)

Publication Number Publication Date
JP2012505299A JP2012505299A (ja) 2012-03-01
JP2012505299A5 true JP2012505299A5 (enExample) 2013-02-28
JP5325987B2 JP5325987B2 (ja) 2013-10-23

Family

ID=42266562

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2011531273A Active JP5325987B2 (ja) 2008-12-23 2009-12-09 ポリマーサーマルインターフェイス材料
JP2013151959A Active JP5837007B2 (ja) 2008-12-23 2013-07-22 ポリマーサーマルインターフェイス材料

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2013151959A Active JP5837007B2 (ja) 2008-12-23 2013-07-22 ポリマーサーマルインターフェイス材料

Country Status (10)

Country Link
US (1) US8138239B2 (enExample)
JP (2) JP5325987B2 (enExample)
KR (1) KR101280663B1 (enExample)
CN (1) CN102171310B (enExample)
BR (1) BRPI0918187B1 (enExample)
DE (1) DE112009002321B4 (enExample)
GB (1) GB2478209B (enExample)
SG (1) SG172367A1 (enExample)
TW (1) TWI420625B (enExample)
WO (1) WO2010074970A2 (enExample)

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Publication number Priority date Publication date Assignee Title
JP5239768B2 (ja) * 2008-11-14 2013-07-17 富士通株式会社 放熱材料並びに電子機器及びその製造方法
US8138239B2 (en) 2008-12-23 2012-03-20 Intel Corporation Polymer thermal interface materials
US20110265979A1 (en) * 2010-04-30 2011-11-03 Sihai Chen Thermal interface materials with good reliability
CN203932096U (zh) 2011-02-18 2014-11-05 3M创新有限公司 柔性发光半导体装置以及用于支承并电连接发光半导体装置的柔性制品
EP2784808B8 (en) * 2011-11-21 2016-08-24 Panasonic Intellectual Property Management Co., Ltd. Electrical component resin, semiconductor device, and substrate
US9063700B2 (en) 2012-08-31 2015-06-23 Apple Inc. Low-force gap-filling conductive structures
KR101465616B1 (ko) * 2012-10-26 2014-11-27 엔트리움 주식회사 열 계면 물질(접착제) 및 이를 포함하는 반도체 칩 패키지
US9899294B2 (en) * 2013-08-12 2018-02-20 Samsung Electronics Co., Ltd. Thermal interface material layer and package-on-package device including the same
EP3077578A4 (en) 2013-12-05 2017-07-26 Honeywell International Inc. Stannous methansulfonate solution with adjusted ph
TWI657132B (zh) 2013-12-19 2019-04-21 Henkel IP & Holding GmbH 具有基質及經密封相變材料分散於其中之組合物及以其組裝之電子裝置
WO2015105204A1 (ko) * 2014-01-07 2015-07-16 엔트리움 주식회사 열 계면 물질 및 이를 포함하는 반도체 칩 패키지
PL3166999T3 (pl) 2014-07-07 2023-07-03 Honeywell International Inc. Materiał termoprzewodzący ze zmiataczem jonów
CN112080258A (zh) 2014-12-05 2020-12-15 霍尼韦尔国际公司 具有低热阻的高性能热界面材料
US10312177B2 (en) 2015-11-17 2019-06-04 Honeywell International Inc. Thermal interface materials including a coloring agent
WO2017152353A1 (en) 2016-03-08 2017-09-14 Honeywell International Inc. Phase change material
US10501671B2 (en) 2016-07-26 2019-12-10 Honeywell International Inc. Gel-type thermal interface material
US11041103B2 (en) 2017-09-08 2021-06-22 Honeywell International Inc. Silicone-free thermal gel
US10428256B2 (en) 2017-10-23 2019-10-01 Honeywell International Inc. Releasable thermal gel
US10567084B2 (en) * 2017-12-18 2020-02-18 Honeywell International Inc. Thermal interface structure for optical transceiver modules
US11072706B2 (en) 2018-02-15 2021-07-27 Honeywell International Inc. Gel-type thermal interface material
KR102152376B1 (ko) * 2018-09-11 2020-09-04 엔트리움 주식회사 방열 입자 및 이를 이용한 열 계면 물질
US11373921B2 (en) 2019-04-23 2022-06-28 Honeywell International Inc. Gel-type thermal interface material with low pre-curing viscosity and elastic properties post-curing

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DE2854385C2 (de) * 1978-12-16 1982-04-15 Preh, Elektrofeinmechanische Werke, Jakob Preh, Nachf. Gmbh & Co, 8740 Bad Neustadt Gedruckte Schaltung
US5738936A (en) * 1996-06-27 1998-04-14 W. L. Gore & Associates, Inc. Thermally conductive polytetrafluoroethylene article
JP3746915B2 (ja) 1999-06-21 2006-02-22 富士通株式会社 高熱伝導性組成物
US6391442B1 (en) 1999-07-08 2002-05-21 Saint-Gobain Performance Plastics Corporation Phase change thermal interface material
US6673434B2 (en) 1999-12-01 2004-01-06 Honeywell International, Inc. Thermal interface materials
JP3928943B2 (ja) * 2002-07-03 2007-06-13 信越化学工業株式会社 放熱部材、その製造方法及びその敷設方法
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CN100376655C (zh) * 2004-06-30 2008-03-26 鸿富锦精密工业(深圳)有限公司 热介面材料
CN101035876A (zh) * 2004-08-23 2007-09-12 莫门蒂夫性能材料股份有限公司 导热性组合物及其制备方法
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US8138239B2 (en) 2008-12-23 2012-03-20 Intel Corporation Polymer thermal interface materials

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