JP2012503305A5 - - Google Patents

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Publication number
JP2012503305A5
JP2012503305A5 JP2011526508A JP2011526508A JP2012503305A5 JP 2012503305 A5 JP2012503305 A5 JP 2012503305A5 JP 2011526508 A JP2011526508 A JP 2011526508A JP 2011526508 A JP2011526508 A JP 2011526508A JP 2012503305 A5 JP2012503305 A5 JP 2012503305A5
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JP
Japan
Prior art keywords
assembly
exposure apparatus
projection exposure
replaceable assembly
replaceable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011526508A
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English (en)
Japanese (ja)
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JP2012503305A (ja
JP5214031B2 (ja
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Publication date
Priority claimed from DE102008047562A external-priority patent/DE102008047562B4/de
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Publication of JP2012503305A publication Critical patent/JP2012503305A/ja
Publication of JP2012503305A5 publication Critical patent/JP2012503305A5/ja
Application granted granted Critical
Publication of JP5214031B2 publication Critical patent/JP5214031B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011526508A 2008-09-16 2009-09-15 半導体リソグラフィのための投影露光装置における振動減衰方法 Active JP5214031B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102008047562.9 2008-09-16
DE102008047562A DE102008047562B4 (de) 2008-09-16 2008-09-16 Vorrichtung zur Dämpfung von Schwingungen in Projektionsbelichtungsanlagen für die Halbleiterlithographie
PCT/EP2009/061917 WO2010031754A1 (en) 2008-09-16 2009-09-15 Vibration damping in projection exposure apparatuses for semiconductor lithography

Publications (3)

Publication Number Publication Date
JP2012503305A JP2012503305A (ja) 2012-02-02
JP2012503305A5 true JP2012503305A5 (enExample) 2012-11-01
JP5214031B2 JP5214031B2 (ja) 2013-06-19

Family

ID=41228717

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011526508A Active JP5214031B2 (ja) 2008-09-16 2009-09-15 半導体リソグラフィのための投影露光装置における振動減衰方法

Country Status (8)

Country Link
US (1) US8212992B2 (enExample)
EP (1) EP2326989B1 (enExample)
JP (1) JP5214031B2 (enExample)
KR (1) KR101608555B1 (enExample)
CN (1) CN102159996B (enExample)
DE (1) DE102008047562B4 (enExample)
TW (1) TWI610139B (enExample)
WO (1) WO2010031754A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2469340B1 (en) 2010-12-21 2021-01-06 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102015224743A1 (de) * 2015-12-09 2016-10-20 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie mit einem pseudoelastischen Dämpfungselement
DE102020206591A1 (de) * 2020-05-27 2021-12-02 Carl Zeiss Smt Gmbh Schwingungstilger und Verfahren zur Auslegung eines Schwingungstilgers sowie Projektionsbelichtungsanlage für die Halbleiterlithographie
US12000455B2 (en) * 2022-03-10 2024-06-04 Taiwan Semiconductor Manufacturing Company, Ltd. Systems and methods for reducing vibration of apparatuses
DE102022214186A1 (de) * 2022-12-21 2024-06-27 Carl Zeiss Smt Gmbh Optisches system und projektionsbelichtungsanlage

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6420819B1 (en) * 1994-01-27 2002-07-16 Active Control Experts, Inc. Packaged strain actuator
US20030040818A1 (en) 1994-01-27 2003-02-27 Baruch Pletner Method and device for vibration control
JPH1089403A (ja) * 1996-09-10 1998-04-07 Nikon Corp 防振装置
DE19917104A1 (de) * 1999-04-15 2000-10-26 System 3R International Ab Vae Halter zum exakten Positionieren eines Werkstückes
DE10062786A1 (de) * 2000-12-15 2002-06-20 Zeiss Carl System zur Dämpfung von Schwingungen
TWI298427B (en) * 2001-02-13 2008-07-01 Asml Netherlands Bv Damped mount for use in lithographic projection apparatus
DE10106605A1 (de) * 2001-02-13 2002-08-22 Zeiss Carl System zur Beseitigung oder wenigstens Dämpfung von Schwingungen
DE10121346A1 (de) * 2001-05-02 2002-11-07 Zeiss Carl Objektiv, insbesondere Projektionsobjektiv für die Halbleiter-Lithographie
DE10225266A1 (de) 2001-12-19 2003-07-03 Zeiss Carl Smt Ag Abbildungseinrichtung in einer Projektionsbelichtungsanlage
EP1321822A1 (en) * 2001-12-21 2003-06-25 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
DE10229623A1 (de) * 2002-06-28 2004-01-15 Carl Zeiss Jena Gmbh Baugruppe mit einer äußeren Fassung und einem optischen Element
US20040100007A1 (en) 2002-11-21 2004-05-27 Nikon Corporation Vibration damping devices and methods
EP1457825A1 (en) * 2003-03-11 2004-09-15 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
JP4574206B2 (ja) * 2003-04-25 2010-11-04 キヤノン株式会社 駆動装置、それを用いた露光装置、デバイスの製造方法
TW200507066A (en) * 2003-07-25 2005-02-16 Nikon Corp Exposure apparatus
KR101218864B1 (ko) 2005-02-11 2013-01-07 칼 짜이스 에스엠테 게엠베하 광 리소그래피 렌즈 지지 장치용 진동 감쇄 장치
US7607543B2 (en) * 2005-02-27 2009-10-27 Entegris, Inc. Reticle pod with isolation system
US20070097340A1 (en) * 2005-10-31 2007-05-03 Nikon Corporation Active damper with counter mass to compensate for structural vibrations of a lithographic system
US7724351B2 (en) 2006-01-30 2010-05-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and exchangeable optical element
JP5036259B2 (ja) * 2006-09-14 2012-09-26 キヤノン株式会社 除振装置、露光装置及びデバイス製造方法
DE102006046200A1 (de) * 2006-09-29 2008-04-03 Carl Zeiss Smt Ag Verfahren und Vorrichtung zur Positionierung eines Elements in einem optischen System
DE102006050835A1 (de) 2006-10-27 2008-05-08 Carl Zeiss Smt Ag Verfahren und Vorrichtung zum Austausch von Objetkivteilen
US8044373B2 (en) * 2007-06-14 2011-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5641878B2 (ja) 2010-10-29 2014-12-17 キヤノン株式会社 振動制御装置、リソグラフィー装置、および、物品の製造方法

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