JP2012227718A5 - - Google Patents
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- Publication number
- JP2012227718A5 JP2012227718A5 JP2011093370A JP2011093370A JP2012227718A5 JP 2012227718 A5 JP2012227718 A5 JP 2012227718A5 JP 2011093370 A JP2011093370 A JP 2011093370A JP 2011093370 A JP2011093370 A JP 2011093370A JP 2012227718 A5 JP2012227718 A5 JP 2012227718A5
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- substrate
- layer
- vibrating membrane
- electromechanical transducer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 16
- 239000010410 layer Substances 0.000 claims 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 13
- 229910052710 silicon Inorganic materials 0.000 claims 13
- 239000010703 silicon Substances 0.000 claims 13
- 239000012528 membrane Substances 0.000 claims 9
- 238000004519 manufacturing process Methods 0.000 claims 5
- 238000000034 method Methods 0.000 claims 4
- 230000003647 oxidation Effects 0.000 claims 4
- 238000007254 oxidation reaction Methods 0.000 claims 4
- 230000001681 protective effect Effects 0.000 claims 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 3
- 239000012212 insulator Substances 0.000 claims 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims 2
- 238000006243 chemical reaction Methods 0.000 claims 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims 2
- 230000001590 oxidative effect Effects 0.000 claims 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 2
- 238000010292 electrical insulation Methods 0.000 claims 1
- 239000011810 insulating material Substances 0.000 claims 1
- 239000011241 protective layer Substances 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011093370A JP5812660B2 (ja) | 2011-04-19 | 2011-04-19 | 電気機械変換装置及びその製造方法 |
| US13/425,346 US8875583B2 (en) | 2011-04-19 | 2012-03-20 | Electromechanical transducer and method of manufacturing the same |
| CN201210114687.2A CN102744193B (zh) | 2011-04-19 | 2012-04-18 | 电气机械变换器及其制造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011093370A JP5812660B2 (ja) | 2011-04-19 | 2011-04-19 | 電気機械変換装置及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012227718A JP2012227718A (ja) | 2012-11-15 |
| JP2012227718A5 true JP2012227718A5 (enExample) | 2014-06-05 |
| JP5812660B2 JP5812660B2 (ja) | 2015-11-17 |
Family
ID=47020232
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011093370A Expired - Fee Related JP5812660B2 (ja) | 2011-04-19 | 2011-04-19 | 電気機械変換装置及びその製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8875583B2 (enExample) |
| JP (1) | JP5812660B2 (enExample) |
| CN (1) | CN102744193B (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7994877B1 (en) | 2008-11-10 | 2011-08-09 | Hrl Laboratories, Llc | MEMS-based quartz hybrid filters and a method of making the same |
| US8766745B1 (en) | 2007-07-25 | 2014-07-01 | Hrl Laboratories, Llc | Quartz-based disk resonator gyro with ultra-thin conductive outer electrodes and method of making same |
| US10266398B1 (en) | 2007-07-25 | 2019-04-23 | Hrl Laboratories, Llc | ALD metal coatings for high Q MEMS structures |
| US7802356B1 (en) | 2008-02-21 | 2010-09-28 | Hrl Laboratories, Llc | Method of fabricating an ultra thin quartz resonator component |
| JP5511260B2 (ja) * | 2009-08-19 | 2014-06-04 | キヤノン株式会社 | 容量型電気機械変換装置、及びその感度調整方法 |
| US8176607B1 (en) * | 2009-10-08 | 2012-05-15 | Hrl Laboratories, Llc | Method of fabricating quartz resonators |
| US8912711B1 (en) | 2010-06-22 | 2014-12-16 | Hrl Laboratories, Llc | Thermal stress resistant resonator, and a method for fabricating same |
| JP5896665B2 (ja) | 2011-09-20 | 2016-03-30 | キヤノン株式会社 | 電気機械変換装置の製造方法 |
| JP5986441B2 (ja) | 2012-07-06 | 2016-09-06 | キヤノン株式会社 | 静電容量型トランスデューサ |
| US9599470B1 (en) | 2013-09-11 | 2017-03-21 | Hrl Laboratories, Llc | Dielectric high Q MEMS shell gyroscope structure |
| JP6381195B2 (ja) | 2013-10-22 | 2018-08-29 | キヤノン株式会社 | 静電容量型トランスデューサ及びその作製方法 |
| JP2015100472A (ja) | 2013-11-22 | 2015-06-04 | キヤノン株式会社 | 静電容量型トランスデューサの駆動方法および駆動装置 |
| US9977097B1 (en) | 2014-02-21 | 2018-05-22 | Hrl Laboratories, Llc | Micro-scale piezoelectric resonating magnetometer |
| US9991863B1 (en) | 2014-04-08 | 2018-06-05 | Hrl Laboratories, Llc | Rounded and curved integrated tethers for quartz resonators |
| JP6399803B2 (ja) * | 2014-05-14 | 2018-10-03 | キヤノン株式会社 | 力覚センサおよび把持装置 |
| US10308505B1 (en) | 2014-08-11 | 2019-06-04 | Hrl Laboratories, Llc | Method and apparatus for the monolithic encapsulation of a micro-scale inertial navigation sensor suite |
| JP6552177B2 (ja) * | 2014-10-10 | 2019-07-31 | キヤノン株式会社 | 静電容量型トランスデューサ及びその駆動方法 |
| US10031191B1 (en) | 2015-01-16 | 2018-07-24 | Hrl Laboratories, Llc | Piezoelectric magnetometer capable of sensing a magnetic field in multiple vectors |
| US10175307B1 (en) | 2016-01-15 | 2019-01-08 | Hrl Laboratories, Llc | FM demodulation system for quartz MEMS magnetometer |
| JP7127510B2 (ja) * | 2018-11-22 | 2022-08-30 | セイコーエプソン株式会社 | 超音波素子、及び超音波装置 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3945613B2 (ja) * | 2000-07-04 | 2007-07-18 | 日本放送協会 | 圧力センサの製造方法および圧力センサ |
| JP2003153393A (ja) * | 2001-11-16 | 2003-05-23 | Seiko Epson Corp | コンデンサマイクロホンの製造方法、コンデンサマイクロホンおよび電子機器 |
| US6958255B2 (en) * | 2002-08-08 | 2005-10-25 | The Board Of Trustees Of The Leland Stanford Junior University | Micromachined ultrasonic transducers and method of fabrication |
| US7777291B2 (en) * | 2005-08-26 | 2010-08-17 | Smoltek Ab | Integrated circuits having interconnects and heat dissipators based on nanostructures |
| US8372680B2 (en) | 2006-03-10 | 2013-02-12 | Stc.Unm | Three-dimensional, ultrasonic transducer arrays, methods of making ultrasonic transducer arrays, and devices including ultrasonic transducer arrays |
| JP5305993B2 (ja) | 2008-05-02 | 2013-10-02 | キヤノン株式会社 | 容量型機械電気変換素子の製造方法、及び容量型機械電気変換素子 |
| JP2010004199A (ja) | 2008-06-19 | 2010-01-07 | Hitachi Ltd | 超音波トランスデューサおよびその製造方法 |
| US8087153B2 (en) * | 2008-06-24 | 2012-01-03 | Canon Kabushiki Kaisha | Manufacturing method of an electromechanical transducer |
| WO2010009058A1 (en) * | 2008-07-15 | 2010-01-21 | Gridshift, Inc. | Electrochemical devices, systems, and methods |
| JP2010098454A (ja) * | 2008-10-15 | 2010-04-30 | Canon Inc | 機械電気変換素子 |
| JP5377066B2 (ja) | 2009-05-08 | 2013-12-25 | キヤノン株式会社 | 静電容量型機械電気変換素子及びその製法 |
| JP5578810B2 (ja) | 2009-06-19 | 2014-08-27 | キヤノン株式会社 | 静電容量型の電気機械変換装置 |
| JP5414546B2 (ja) * | 2010-01-12 | 2014-02-12 | キヤノン株式会社 | 容量検出型の電気機械変換素子 |
| JP5921079B2 (ja) * | 2011-04-06 | 2016-05-24 | キヤノン株式会社 | 電気機械変換装置及びその作製方法 |
| JP5787586B2 (ja) * | 2011-04-14 | 2015-09-30 | キヤノン株式会社 | 電気機械変換装置 |
| JP6071285B2 (ja) * | 2012-07-06 | 2017-02-01 | キヤノン株式会社 | 静電容量型トランスデューサ |
| JP6057571B2 (ja) * | 2012-07-06 | 2017-01-11 | キヤノン株式会社 | 静電容量型トランスデューサ |
-
2011
- 2011-04-19 JP JP2011093370A patent/JP5812660B2/ja not_active Expired - Fee Related
-
2012
- 2012-03-20 US US13/425,346 patent/US8875583B2/en not_active Expired - Fee Related
- 2012-04-18 CN CN201210114687.2A patent/CN102744193B/zh not_active Expired - Fee Related
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