CN102744193B - 电气机械变换器及其制造方法 - Google Patents
电气机械变换器及其制造方法 Download PDFInfo
- Publication number
- CN102744193B CN102744193B CN201210114687.2A CN201210114687A CN102744193B CN 102744193 B CN102744193 B CN 102744193B CN 201210114687 A CN201210114687 A CN 201210114687A CN 102744193 B CN102744193 B CN 102744193B
- Authority
- CN
- China
- Prior art keywords
- silicon
- vibrating membrane
- substrate
- electromechanical transducer
- diaphragm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 31
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 99
- 239000012528 membrane Substances 0.000 claims abstract description 78
- 239000012212 insulator Substances 0.000 claims abstract description 38
- 229910052710 silicon Inorganic materials 0.000 claims description 103
- 239000010703 silicon Substances 0.000 claims description 103
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 102
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 52
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 13
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 9
- 230000003647 oxidation Effects 0.000 claims description 9
- 238000007254 oxidation reaction Methods 0.000 claims description 9
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 9
- 230000004888 barrier function Effects 0.000 claims description 8
- 230000003071 parasitic effect Effects 0.000 abstract description 28
- 230000009467 reduction Effects 0.000 abstract description 26
- 230000035945 sensitivity Effects 0.000 abstract description 15
- 230000008859 change Effects 0.000 description 31
- 230000008569 process Effects 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 11
- 238000005530 etching Methods 0.000 description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- 239000004411 aluminium Substances 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 238000000227 grinding Methods 0.000 description 4
- 238000002955 isolation Methods 0.000 description 4
- 238000001039 wet etching Methods 0.000 description 4
- 238000005452 bending Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000003486 chemical etching Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 108010022579 ATP dependent 26S protease Proteins 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
- B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
- B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
- B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
- B06B1/0292—Electrostatic transducers, e.g. electret-type
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Pressure Sensors (AREA)
- Transducers For Ultrasonic Waves (AREA)
- Micromachines (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011-093370 | 2011-04-19 | ||
| JP2011093370A JP5812660B2 (ja) | 2011-04-19 | 2011-04-19 | 電気機械変換装置及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102744193A CN102744193A (zh) | 2012-10-24 |
| CN102744193B true CN102744193B (zh) | 2015-12-02 |
Family
ID=47020232
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210114687.2A Expired - Fee Related CN102744193B (zh) | 2011-04-19 | 2012-04-18 | 电气机械变换器及其制造方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8875583B2 (enExample) |
| JP (1) | JP5812660B2 (enExample) |
| CN (1) | CN102744193B (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7994877B1 (en) | 2008-11-10 | 2011-08-09 | Hrl Laboratories, Llc | MEMS-based quartz hybrid filters and a method of making the same |
| US8766745B1 (en) | 2007-07-25 | 2014-07-01 | Hrl Laboratories, Llc | Quartz-based disk resonator gyro with ultra-thin conductive outer electrodes and method of making same |
| US10266398B1 (en) | 2007-07-25 | 2019-04-23 | Hrl Laboratories, Llc | ALD metal coatings for high Q MEMS structures |
| US7802356B1 (en) | 2008-02-21 | 2010-09-28 | Hrl Laboratories, Llc | Method of fabricating an ultra thin quartz resonator component |
| JP5511260B2 (ja) * | 2009-08-19 | 2014-06-04 | キヤノン株式会社 | 容量型電気機械変換装置、及びその感度調整方法 |
| US8176607B1 (en) * | 2009-10-08 | 2012-05-15 | Hrl Laboratories, Llc | Method of fabricating quartz resonators |
| US8912711B1 (en) | 2010-06-22 | 2014-12-16 | Hrl Laboratories, Llc | Thermal stress resistant resonator, and a method for fabricating same |
| JP5896665B2 (ja) | 2011-09-20 | 2016-03-30 | キヤノン株式会社 | 電気機械変換装置の製造方法 |
| JP5986441B2 (ja) | 2012-07-06 | 2016-09-06 | キヤノン株式会社 | 静電容量型トランスデューサ |
| US9599470B1 (en) | 2013-09-11 | 2017-03-21 | Hrl Laboratories, Llc | Dielectric high Q MEMS shell gyroscope structure |
| JP6381195B2 (ja) | 2013-10-22 | 2018-08-29 | キヤノン株式会社 | 静電容量型トランスデューサ及びその作製方法 |
| JP2015100472A (ja) | 2013-11-22 | 2015-06-04 | キヤノン株式会社 | 静電容量型トランスデューサの駆動方法および駆動装置 |
| US9977097B1 (en) | 2014-02-21 | 2018-05-22 | Hrl Laboratories, Llc | Micro-scale piezoelectric resonating magnetometer |
| US9991863B1 (en) | 2014-04-08 | 2018-06-05 | Hrl Laboratories, Llc | Rounded and curved integrated tethers for quartz resonators |
| JP6399803B2 (ja) * | 2014-05-14 | 2018-10-03 | キヤノン株式会社 | 力覚センサおよび把持装置 |
| US10308505B1 (en) | 2014-08-11 | 2019-06-04 | Hrl Laboratories, Llc | Method and apparatus for the monolithic encapsulation of a micro-scale inertial navigation sensor suite |
| JP6552177B2 (ja) * | 2014-10-10 | 2019-07-31 | キヤノン株式会社 | 静電容量型トランスデューサ及びその駆動方法 |
| US10031191B1 (en) | 2015-01-16 | 2018-07-24 | Hrl Laboratories, Llc | Piezoelectric magnetometer capable of sensing a magnetic field in multiple vectors |
| US10175307B1 (en) | 2016-01-15 | 2019-01-08 | Hrl Laboratories, Llc | FM demodulation system for quartz MEMS magnetometer |
| JP7127510B2 (ja) * | 2018-11-22 | 2022-08-30 | セイコーエプソン株式会社 | 超音波素子、及び超音波装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2135685A1 (en) * | 2008-06-19 | 2009-12-23 | Hitachi Ltd. | Ultrasonic transducers and methods of manufacturing the same |
| CN101883309A (zh) * | 2009-05-08 | 2010-11-10 | 佳能株式会社 | 电容性机电变换器及其制造方法 |
| CN102015127A (zh) * | 2008-05-02 | 2011-04-13 | 佳能株式会社 | 电容型机电变换器的制造方法和电容型机电变换器 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3945613B2 (ja) * | 2000-07-04 | 2007-07-18 | 日本放送協会 | 圧力センサの製造方法および圧力センサ |
| JP2003153393A (ja) * | 2001-11-16 | 2003-05-23 | Seiko Epson Corp | コンデンサマイクロホンの製造方法、コンデンサマイクロホンおよび電子機器 |
| US6958255B2 (en) * | 2002-08-08 | 2005-10-25 | The Board Of Trustees Of The Leland Stanford Junior University | Micromachined ultrasonic transducers and method of fabrication |
| US7777291B2 (en) * | 2005-08-26 | 2010-08-17 | Smoltek Ab | Integrated circuits having interconnects and heat dissipators based on nanostructures |
| US8372680B2 (en) | 2006-03-10 | 2013-02-12 | Stc.Unm | Three-dimensional, ultrasonic transducer arrays, methods of making ultrasonic transducer arrays, and devices including ultrasonic transducer arrays |
| US8087153B2 (en) * | 2008-06-24 | 2012-01-03 | Canon Kabushiki Kaisha | Manufacturing method of an electromechanical transducer |
| WO2010009058A1 (en) * | 2008-07-15 | 2010-01-21 | Gridshift, Inc. | Electrochemical devices, systems, and methods |
| JP2010098454A (ja) * | 2008-10-15 | 2010-04-30 | Canon Inc | 機械電気変換素子 |
| JP5578810B2 (ja) | 2009-06-19 | 2014-08-27 | キヤノン株式会社 | 静電容量型の電気機械変換装置 |
| JP5414546B2 (ja) * | 2010-01-12 | 2014-02-12 | キヤノン株式会社 | 容量検出型の電気機械変換素子 |
| JP5921079B2 (ja) * | 2011-04-06 | 2016-05-24 | キヤノン株式会社 | 電気機械変換装置及びその作製方法 |
| JP5787586B2 (ja) * | 2011-04-14 | 2015-09-30 | キヤノン株式会社 | 電気機械変換装置 |
| JP6071285B2 (ja) * | 2012-07-06 | 2017-02-01 | キヤノン株式会社 | 静電容量型トランスデューサ |
| JP6057571B2 (ja) * | 2012-07-06 | 2017-01-11 | キヤノン株式会社 | 静電容量型トランスデューサ |
-
2011
- 2011-04-19 JP JP2011093370A patent/JP5812660B2/ja not_active Expired - Fee Related
-
2012
- 2012-03-20 US US13/425,346 patent/US8875583B2/en not_active Expired - Fee Related
- 2012-04-18 CN CN201210114687.2A patent/CN102744193B/zh not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102015127A (zh) * | 2008-05-02 | 2011-04-13 | 佳能株式会社 | 电容型机电变换器的制造方法和电容型机电变换器 |
| EP2135685A1 (en) * | 2008-06-19 | 2009-12-23 | Hitachi Ltd. | Ultrasonic transducers and methods of manufacturing the same |
| CN101883309A (zh) * | 2009-05-08 | 2010-11-10 | 佳能株式会社 | 电容性机电变换器及其制造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012227718A (ja) | 2012-11-15 |
| CN102744193A (zh) | 2012-10-24 |
| US8875583B2 (en) | 2014-11-04 |
| US20120266682A1 (en) | 2012-10-25 |
| JP5812660B2 (ja) | 2015-11-17 |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151202 |
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| CF01 | Termination of patent right due to non-payment of annual fee |