JP2012164454A - 導電性粒子及びこれを用いた異方性導電材料 - Google Patents
導電性粒子及びこれを用いた異方性導電材料 Download PDFInfo
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Abstract
【解決手段】樹脂粒子11と、樹脂粒子表面を被覆する無電解金属めっき層12と、最外層を形成するAuを除く金属スパッタ層13とを有する導電性粒子を用いる。最外層に硬い金属スパッタ層13が形成されているため、配線へ導電性粒子を食い込ませることができ、高い接続信頼性を得ることができる。
【選択図】図1
Description
1.導電性粒子
2.異方性導電材料
3.接続構造体
4.実施例
本発明の具体例として示す導電性粒子は、樹脂粒子と、樹脂粒子表面を被覆する無電解金属めっき層と、最外層を形成するAuを除く金属スパッタ層とを有するものである。なお、本発明の目的を損なわない範囲で、樹脂粒子表面を被覆する無電解金属めっき層と、最外層を形成する金属スパッタ層との間に、無電解金属めっき層又は金属スパッタ層を設けても構わない。
本発明の具体例として示す異方性導電材料は、上述した導電性粒子がバインダ樹脂に分散されたものである。
本発明の具体例として示す接続構造体は、第1の電子部品と第2の電子部品とが、上述した導電性粒子によって電気的に接続されているものである。
以下、本発明の実施例について説明するが、本発明はこれらの実施例に限定されるものではない。
エポキシ接着剤に導電性粒子を分散させて硬化させ、研磨機(丸本ストルアス社製)にて粒子断面を削り出した。この粒子断面をSEM(Scanning Electron Microscope)(キーエンス社製、VE−8800)にて観察し、第1の金属層の厚さ、及び第2の金属層の厚さを測定した。
ガラス基板上に第2の金属層の金属をDCマグネトロンスパッタリング法により成膜した。この金属スパッタ層をビッカース硬さ試験機(ミツトヨ社製、HM−125)により、JIS Z2244に準拠して測定し、これを第2の金属層のビッカース硬さ(Hv)とした。なお、本ビッカース硬さ(Hv)は、試験荷重をKgf単位として算出した。
膜形成樹脂として、フェノキシ樹脂(商品名:PKHH、フェノキシアソシエイツ社製)を25質量部、熱硬化性樹脂として、ナフタレン型2官能エポキシ樹脂(商品名:HP4032D、DIC社製)を10質量部、イミダゾール系硬化剤(HP3941、旭化成ケミカルズ社製(株))を33質量部、エポキシ系シランカップリング剤(商品名:A−187、モメンティブ・パフォーマンス・マテリアルズ(株))を2質量部、及び導電性粒子を30質量部配合し、樹脂組成物を調製した。この樹脂組成物を、剥離処理されたPETにバーコーターを用いて塗布し、70℃のオーブンで5分乾燥させ、厚さ20μmの異方性導電フィルムを作製した。導電性粒子は、後述する実施例1〜10及び比較例1〜7のようにそれぞれ作製した。
異方性導電フィルムを用いて、IC(1.8mm×20mm、t=0.5mm、Au-plated bump 30μm×85μm、h=15μm)と、ガラス基板にITO(Indium Tin Oxide)膜がパターンニングされた厚さ0.7mmのITO配線板又はガラス基板にIZO(Indium Zinc Oxide)膜がパターンニングされた厚さ0.7mmのIZO配線板との接合を行った。
実装体について、初期(Initial)の抵抗と、温度85℃、湿度85%RH、500時間のTHテスト(Thermal Humidity Test)後の抵抗を測定した。測定は、デジタルマルチメータ(デジタルマルチメータ7555、横河電機社製)を用いて4端子法にて電流1mAを流したときの接続抵抗を測定した。
ジビニルベンゼン、スチレン、ブチルメタクリレートの混合比を調整した溶液に、重合開始剤としてベンゾイルパーオキサイドを投入して高速で均一攪拌しながら加熱を行い、重合反応を行うことにより微粒子分散液を得た。前記微粒子分散液をろ過し減圧乾燥することにより微粒子の凝集体であるブロック体を得た。更に、前記ブロック体を粉砕することにより、平均粒子径3.0μmのジビニルベンゼン系樹脂粒子を得た。
[実施例1]
樹脂粒子に無電解Niめっき(第1の金属層)が施された平均粒径3μmのNiめっき樹脂粒子の表面にDCマグネトロンスパッタリング法によりNiスパッタ層(第2の金属層)を形成した。Niめっき樹脂粒子は次のように作製した。上述のように合成した平均粒径3μmのジビニルベンゼン系樹脂粒子5gに、パラジウム触媒を浸漬法により担持させ、この樹脂粒子に対し、硫酸ニッケル六水和物、次亜リン酸ナトリウム、クエン酸ナトリウム、トリエタノールアミン及び硝酸タリウムから調製された無電解ニッケルめっき液(pH12、メッキ液温50℃)を用いて無電解ニッケルめっきを行い、Niめっき層(第1金属層)が表面に形成された導電性粒子を作製した。上記により作成したNiめっき層(第1の金属層)が表面に形成された導電性粒子に、内製したDCマグネトロンスパッタ装置を使用して、真空度1.5Pa、アルゴンガス流量15.0sccm、スパッタリング出力1W/cm2にて、第1の金属層の表面に第2の金属層を形成した。粒子を保持する容器を温度25℃の冷媒にて冷却しながら、第1の金属層の表面に第2の金属層を形成した。
樹脂粒子に無電解Niめっき(第1の金属層)が施された実施例1と同様の平均粒径3μmのNiめっき樹脂粒子の表面にDCマグネトロンスパッタリング法によりRuスパッタ層(第2の金属層)を形成した。
樹脂粒子に無電解Niめっき(第1の金属層)が施された実施例1と同様の平均粒径3μmのNiめっき樹脂粒子の表面にDCマグネトロンスパッタリング法によりRuスパッタ層(第2の金属層)を形成した。
樹脂粒子に無電解Niめっき(第1の金属層)が施された実施例1と同様の平均粒径3μmのNiめっき樹脂粒子の表面にDCマグネトロンスパッタリング法によりRuスパッタ層(第2の金属層)を形成した。
樹脂粒子に無電解Niめっき(第1の金属層)が施された実施例1と同様の平均粒径3μmのNiめっき樹脂粒子の表面にDCマグネトロンスパッタリング法によりRu−Coスパッタ層(第2の金属層)を形成した。
樹脂粒子に無電解Niめっき(第1の金属層)が施された実施例1と同様の平均粒径3μmのNiめっき樹脂粒子の表面にDCマグネトロンスパッタリング法によりWスパッタ層(第2の金属層)を形成した。
樹脂粒子に無電解Niめっき(第1の金属層)が施された実施例1と同様の平均粒径3μmのNiめっき樹脂粒子の表面にDCマグネトロンスパッタリング法によりPdスパッタ層(第2の金属層)を形成した。
樹脂粒子に無電解Niめっき(第1の金属層)が施された実施例1と同様の平均粒径3μmのNiめっき樹脂粒子の表面にDCマグネトロンスパッタリング法によりIrスパッタ層(第2の金属層)を形成した。
樹脂粒子に無電解Niめっき(第1の金属層)が施された実施例1と同様の平均粒径3μmのNiめっき樹脂粒子の表面にDCマグネトロンスパッタリング法によりCoスパッタ層(第2の金属層)を形成した。
樹脂粒子に無電解Niめっき(第1の金属層)が施された実施例1と同様の平均粒径3μmのNiめっき樹脂粒子の表面にDCマグネトロンスパッタリング法によりMoスパッタ層(第2の金属層)を形成した。
樹脂粒子に無電解Niめっき(第1の金属層)が施された実施例1と同様の平均粒径3μmのNiめっき樹脂粒子の表面に無電解めっき法により無電解Auめっき層(第2の金属層)を形成した。
樹脂粒子に無電解Niめっき(第1の金属層)が施された実施例1と同様の平均粒径3μmのNiめっき樹脂粒子の表面に無電解めっき法により無電解Ni−Pめっき層(第2の金属層)を形成した。
樹脂粒子に無電解Niめっき(第1の金属層)が施された実施例1と同様の平均粒径3μmのNiめっき樹脂粒子を用い、第2の金属層を形成しなかった。
平均粒径3μmのジビニルベンゼン系樹脂粒子の表面にDCマグネトロンスパッタリング法によりNiスパッタ層(第1の金属層)を形成し、第2の金属層を形成しなかった。
平均粒径3μmのジビニルベンゼン系樹脂粒子の表面にDCマグネトロンスパッタリング法によりNiスパッタ層(第1の金属層)を形成し、さらにDCマグネトロンスパッタリング法によりNiスパッタ層(第2の金属層)を形成した。
平均粒径3μmのジビニルベンゼン系樹脂粒子の表面にDCマグネトロンスパッタリング法によりNiスパッタ層(第1の金属層)を形成し、Niスパッタ層の表面に無電解めっき法により無電解Niめっき層(第2の金属層)を形成した。
樹脂粒子に無電解Niめっき(第1の金属層)が施された実施例1と同様の平均粒径3μmのNiめっき樹脂粒子の表面にDCマグネトロンスパッタリング法によりAuスパッタ層(第2の金属層)を形成した。
Claims (8)
- 樹脂粒子と、
前記樹脂粒子表面を被覆する無電解金属めっき層と、
最外層を形成するAuを除く金属スパッタ層と
を有する導電性粒子。 - 前記金属スパッタ層は、Ni、Ru、W、Pd、Ir、Co、Mo、Ti、Rh、Pt、又はこれらの1種以上を含む合金からなる請求項1記載の導電性粒子。
- 前記無電解金属めっき層は、無電解Niめっき層である請求項1又は2記載の導電性粒子。
- 前記金属スパッタ層のビッカース硬さ(Hv)が、40〜500である請求項1乃至3のいずれか1項に記載の導電性粒子。
- 前記金属スパッタ層の厚さが、5〜200nmである請求項1乃至4のいずれか1項に記載の導電性粒子。
- バインダ樹脂と、前記バインダ樹脂に分散された導電性粒子とを備え、
前記導電性粒子は、樹脂粒子と、前記樹脂粒子表面を被覆する無電解金属めっき層と、最外層を形成するAuを除く金属スパッタ層とを有する異方性導電材料。 - 樹脂粒子と、前記樹脂粒子表面を被覆する無電解金属めっき層と、最外層を形成するAuを除く金属スパッタ層とを有する導電性粒子によって第1の電子部品と第2の電子部品とが電気的に接続された接続構造体。
- 樹脂粒子と、前記樹脂粒子表面を被覆する無電解金属めっき層と、最外層を形成するAuを除く金属スパッタ層とを有する導電性粒子がバインダ樹脂に分散された異方性導電フィルムを第1の電子部品の端子上に貼付け、
前記異方性導電フィルム上に第2の電子部品を仮配置させ、
前記第2の電子部品上から加熱押圧装置により押圧し、
前記第1の電子部品の端子と、前記第2の電子部品の端子とを接続させる接続方法。
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PCT/JP2012/052547 WO2012105701A1 (ja) | 2011-02-04 | 2012-02-03 | 導電性粒子及びこれを用いた異方性導電材料 |
CN2012800075384A CN103339687A (zh) | 2011-02-04 | 2012-02-03 | 导电性粒子及使用其的各向异性导电材料 |
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Cited By (8)
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JP2016015312A (ja) * | 2014-06-11 | 2016-01-28 | 積水化学工業株式会社 | 導電性粒子、導電性粒子の製造方法、導電材料及び接続構造体 |
WO2016152943A1 (ja) * | 2015-03-23 | 2016-09-29 | デクセリアルズ株式会社 | 導電性粒子、異方性導電接着剤及び接続構造体 |
JP2016219438A (ja) * | 2011-12-21 | 2016-12-22 | 積水化学工業株式会社 | 導電性粒子、導電材料及び接続構造体 |
WO2017142086A1 (ja) * | 2016-02-18 | 2017-08-24 | 積水化学工業株式会社 | 電気モジュール及び電気モジュールの製造方法 |
KR20190065438A (ko) | 2016-12-01 | 2019-06-11 | 데쿠세리아루즈 가부시키가이샤 | 이방성 도전 필름 |
KR20190133023A (ko) | 2017-03-29 | 2019-11-29 | 히타치가세이가부시끼가이샤 | 도전 입자의 선별 방법, 회로 접속 재료, 접속 구조체 및 그의 제조 방법, 그리고 도전 입자 |
JP2020173990A (ja) * | 2019-04-11 | 2020-10-22 | 日立化成株式会社 | 導電粒子の製造方法 |
KR20210054057A (ko) | 2016-12-01 | 2021-05-12 | 데쿠세리아루즈 가부시키가이샤 | 이방성 도전 필름 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015009090A1 (ko) * | 2013-07-19 | 2015-01-22 | 주식회사 엘지화학 | 투명 도전성 박막 형성용 코어-쉘 나노 입자, 및 이를 사용한 투명 도전성 박막의 제조 방법 |
JP6429228B2 (ja) * | 2014-04-24 | 2018-11-28 | タツタ電線株式会社 | 金属被覆樹脂粒子及びそれを用いた導電性接着剤 |
KR101595182B1 (ko) * | 2014-06-11 | 2016-02-17 | 안우영 | 도전볼의 제조방법 |
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09143441A (ja) * | 1995-11-27 | 1997-06-03 | Three Bond Co Ltd | 異方導電性接着剤組成物 |
JP2009032397A (ja) * | 2007-07-24 | 2009-02-12 | Sekisui Chem Co Ltd | 導電性微粒子 |
JP2010080124A (ja) * | 2008-09-24 | 2010-04-08 | Sekisui Chem Co Ltd | 酸化亜鉛微粒子付着樹脂粒子及びその製造方法、並びに導電性粒子及びその製造方法 |
-
2011
- 2011-02-04 JP JP2011022451A patent/JP2012164454A/ja not_active Ceased
-
2012
- 2012-02-03 CN CN2012800075384A patent/CN103339687A/zh active Pending
- 2012-02-03 WO PCT/JP2012/052547 patent/WO2012105701A1/ja active Application Filing
- 2012-02-03 KR KR1020137023157A patent/KR20140045328A/ko not_active Application Discontinuation
- 2012-02-04 TW TW101103661A patent/TW201246235A/zh unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09143441A (ja) * | 1995-11-27 | 1997-06-03 | Three Bond Co Ltd | 異方導電性接着剤組成物 |
JP2009032397A (ja) * | 2007-07-24 | 2009-02-12 | Sekisui Chem Co Ltd | 導電性微粒子 |
JP2010080124A (ja) * | 2008-09-24 | 2010-04-08 | Sekisui Chem Co Ltd | 酸化亜鉛微粒子付着樹脂粒子及びその製造方法、並びに導電性粒子及びその製造方法 |
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JP2016015312A (ja) * | 2014-06-11 | 2016-01-28 | 積水化学工業株式会社 | 導電性粒子、導電性粒子の製造方法、導電材料及び接続構造体 |
WO2016152943A1 (ja) * | 2015-03-23 | 2016-09-29 | デクセリアルズ株式会社 | 導電性粒子、異方性導電接着剤及び接続構造体 |
WO2017142086A1 (ja) * | 2016-02-18 | 2017-08-24 | 積水化学工業株式会社 | 電気モジュール及び電気モジュールの製造方法 |
CN108475583A (zh) * | 2016-02-18 | 2018-08-31 | 积水化学工业株式会社 | 电组件及电组件的制造方法 |
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KR20190065438A (ko) | 2016-12-01 | 2019-06-11 | 데쿠세리아루즈 가부시키가이샤 | 이방성 도전 필름 |
US10985128B2 (en) | 2016-12-01 | 2021-04-20 | Dexerials Corporation | Anisotropic conductive film |
KR20210054057A (ko) | 2016-12-01 | 2021-05-12 | 데쿠세리아루즈 가부시키가이샤 | 이방성 도전 필름 |
KR20190133023A (ko) | 2017-03-29 | 2019-11-29 | 히타치가세이가부시끼가이샤 | 도전 입자의 선별 방법, 회로 접속 재료, 접속 구조체 및 그의 제조 방법, 그리고 도전 입자 |
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JP7292669B2 (ja) | 2019-04-11 | 2023-06-19 | 株式会社レゾナック | 導電粒子の製造方法 |
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