JP2012109472A5 - - Google Patents
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- Publication number
- JP2012109472A5 JP2012109472A5 JP2010258466A JP2010258466A JP2012109472A5 JP 2012109472 A5 JP2012109472 A5 JP 2012109472A5 JP 2010258466 A JP2010258466 A JP 2010258466A JP 2010258466 A JP2010258466 A JP 2010258466A JP 2012109472 A5 JP2012109472 A5 JP 2012109472A5
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- yttria
- sample
- etching
- chlorine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims description 15
- 238000005530 etching Methods 0.000 claims description 12
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 10
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 10
- 229910052801 chlorine Inorganic materials 0.000 claims description 10
- 239000000460 chlorine Substances 0.000 claims description 10
- 229910052731 fluorine Inorganic materials 0.000 claims description 10
- 239000011737 fluorine Substances 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 238000003672 processing method Methods 0.000 claims description 9
- 238000000034 method Methods 0.000 claims 1
- 230000004075 alteration Effects 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010258466A JP2012109472A (ja) | 2010-11-19 | 2010-11-19 | プラズマ処理方法 |
| TW099144759A TWI445082B (zh) | 2010-11-19 | 2010-12-20 | Plasma processing method |
| US13/011,070 US8486291B2 (en) | 2010-11-19 | 2011-01-21 | Plasma processing method |
| KR1020110006328A KR101190804B1 (ko) | 2010-11-19 | 2011-01-21 | 플라즈마처리방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010258466A JP2012109472A (ja) | 2010-11-19 | 2010-11-19 | プラズマ処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012109472A JP2012109472A (ja) | 2012-06-07 |
| JP2012109472A5 true JP2012109472A5 (enExample) | 2013-11-21 |
Family
ID=46063349
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010258466A Pending JP2012109472A (ja) | 2010-11-19 | 2010-11-19 | プラズマ処理方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8486291B2 (enExample) |
| JP (1) | JP2012109472A (enExample) |
| KR (1) | KR101190804B1 (enExample) |
| TW (1) | TWI445082B (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6273188B2 (ja) | 2013-10-31 | 2018-01-31 | 東京エレクトロン株式会社 | プラズマ処理方法 |
| JP7277334B2 (ja) | 2019-10-07 | 2023-05-18 | 東京エレクトロン株式会社 | 温度計測システム及び温度計測方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3592878B2 (ja) * | 1997-02-20 | 2004-11-24 | 株式会社日立製作所 | プラズマクリーニング方法 |
| JP3594759B2 (ja) | 1997-03-19 | 2004-12-02 | 株式会社日立製作所 | プラズマ処理方法 |
| US6379575B1 (en) * | 1997-10-21 | 2002-04-30 | Applied Materials, Inc. | Treatment of etching chambers using activated cleaning gas |
| JP4351980B2 (ja) * | 2004-09-16 | 2009-10-28 | 株式会社日立ハイテクノロジーズ | プラズマ処理方法 |
| JP2007036139A (ja) * | 2005-07-29 | 2007-02-08 | Sharp Corp | プラズマ処理装置およびプラズマクリーニング終点検出方法 |
| KR100755804B1 (ko) | 2005-12-27 | 2007-09-05 | 주식회사 아이피에스 | 알루미늄 함유 금속막 및 알루미늄 함유 금속 질화막을증착하는 박막 증착 장치의 세정방법 |
| JP2009188257A (ja) | 2008-02-07 | 2009-08-20 | Tokyo Electron Ltd | プラズマエッチング方法及びプラズマエッチング装置並びに記憶媒体 |
| JP5064319B2 (ja) * | 2008-07-04 | 2012-10-31 | 東京エレクトロン株式会社 | プラズマエッチング方法、制御プログラム及びコンピュータ記憶媒体 |
| JP2010153508A (ja) * | 2008-12-24 | 2010-07-08 | Hitachi High-Technologies Corp | 試料のエッチング処理方法 |
-
2010
- 2010-11-19 JP JP2010258466A patent/JP2012109472A/ja active Pending
- 2010-12-20 TW TW099144759A patent/TWI445082B/zh not_active IP Right Cessation
-
2011
- 2011-01-21 KR KR1020110006328A patent/KR101190804B1/ko not_active Expired - Fee Related
- 2011-01-21 US US13/011,070 patent/US8486291B2/en not_active Expired - Fee Related
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