JP2012054425A5 - - Google Patents

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Publication number
JP2012054425A5
JP2012054425A5 JP2010196091A JP2010196091A JP2012054425A5 JP 2012054425 A5 JP2012054425 A5 JP 2012054425A5 JP 2010196091 A JP2010196091 A JP 2010196091A JP 2010196091 A JP2010196091 A JP 2010196091A JP 2012054425 A5 JP2012054425 A5 JP 2012054425A5
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JP
Japan
Prior art keywords
image
pattern
mask
optical system
intensity distribution
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Application number
JP2010196091A
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English (en)
Japanese (ja)
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JP5513324B2 (ja
JP2012054425A (ja
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Priority to JP2010196091A priority Critical patent/JP5513324B2/ja
Priority claimed from JP2010196091A external-priority patent/JP5513324B2/ja
Priority to KR1020110084474A priority patent/KR101419581B1/ko
Priority to TW100130285A priority patent/TWI448835B/zh
Priority to US13/217,558 priority patent/US8811714B2/en
Publication of JP2012054425A publication Critical patent/JP2012054425A/ja
Publication of JP2012054425A5 publication Critical patent/JP2012054425A5/ja
Application granted granted Critical
Publication of JP5513324B2 publication Critical patent/JP5513324B2/ja
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JP2010196091A 2010-09-01 2010-09-01 決定方法、露光方法及びプログラム Expired - Fee Related JP5513324B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2010196091A JP5513324B2 (ja) 2010-09-01 2010-09-01 決定方法、露光方法及びプログラム
KR1020110084474A KR101419581B1 (ko) 2010-09-01 2011-08-24 결정 방법, 노광 방법 및 기억 매체
TW100130285A TWI448835B (zh) 2010-09-01 2011-08-24 決定方法、曝光方法和儲存媒體
US13/217,558 US8811714B2 (en) 2010-09-01 2011-08-25 Method, apparatus and medium for determining the intensity distribution formed on a pupil plane of an illumination optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010196091A JP5513324B2 (ja) 2010-09-01 2010-09-01 決定方法、露光方法及びプログラム

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014055600A Division JP5681309B2 (ja) 2014-03-18 2014-03-18 決定方法、露光方法及びプログラム

Publications (3)

Publication Number Publication Date
JP2012054425A JP2012054425A (ja) 2012-03-15
JP2012054425A5 true JP2012054425A5 (enExample) 2013-10-17
JP5513324B2 JP5513324B2 (ja) 2014-06-04

Family

ID=45697338

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010196091A Expired - Fee Related JP5513324B2 (ja) 2010-09-01 2010-09-01 決定方法、露光方法及びプログラム

Country Status (4)

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US (1) US8811714B2 (enExample)
JP (1) JP5513324B2 (enExample)
KR (1) KR101419581B1 (enExample)
TW (1) TWI448835B (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5539140B2 (ja) * 2010-09-28 2014-07-02 キヤノン株式会社 決定方法、露光方法、プログラム及びコンピュータ
JP5627394B2 (ja) * 2010-10-29 2014-11-19 キヤノン株式会社 マスクのデータ及び露光条件を決定するためのプログラム、決定方法、マスク製造方法、露光方法及びデバイス製造方法
FR2985086B1 (fr) * 2011-12-27 2014-02-28 St Microelectronics Crolles 2 Procede et systeme d'elaboration d'un masque de photolithographie et d'une source lumineuse.
KR101970685B1 (ko) * 2012-08-09 2019-04-19 삼성전자 주식회사 패터닝 방법, 그 패터닝 방법을 이용한 반도체 소자 제조방법, 및 반도체 소자 제조장치
JP6137762B2 (ja) 2012-10-08 2017-05-31 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ装置を作動させる方法
JP6161276B2 (ja) * 2012-12-12 2017-07-12 キヤノン株式会社 測定装置、測定方法、及びプログラム
US8954898B2 (en) * 2013-03-15 2015-02-10 International Business Machines Corporation Source-mask optimization for a lithography process
KR102167646B1 (ko) 2014-04-01 2020-10-19 삼성전자주식회사 프레임 정보를 제공하는 전자 장치 및 방법
US10872418B2 (en) * 2016-10-11 2020-12-22 Kabushiki Kaisha Toshiba Edge detection device, an edge detection method, and an object holding device
CN119395949A (zh) * 2024-11-15 2025-02-07 深圳晶源信息技术有限公司 一种光源确定方法、设备、介质及产品

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5680588A (en) * 1995-06-06 1997-10-21 International Business Machines Corporation Method and system for optimizing illumination in an optical photolithography projection imaging system
US6563566B2 (en) * 2001-01-29 2003-05-13 International Business Machines Corporation System and method for printing semiconductor patterns using an optimized illumination and reticle
US7030966B2 (en) * 2003-02-11 2006-04-18 Asml Netherlands B.V. Lithographic apparatus and method for optimizing an illumination source using photolithographic simulations
US7057709B2 (en) * 2003-12-04 2006-06-06 International Business Machines Corporation Printing a mask with maximum possible process window through adjustment of the source distribution
US7245354B2 (en) * 2004-02-03 2007-07-17 Yuri Granik Source optimization for image fidelity and throughput
JP2009071125A (ja) * 2007-09-14 2009-04-02 Canon Inc 露光条件を決定する方法及びプログラム
DE102008011501A1 (de) * 2008-02-25 2009-08-27 Carl Zeiss Smt Ag Verfahren zum Betreiben eines Beleuchtungssystems einer mikrolithographischen Projektionsbelichtungsanlage
JP5153492B2 (ja) * 2008-07-11 2013-02-27 キヤノン株式会社 露光条件決定方法およびコンピュータプログラム
US8605254B2 (en) * 2009-10-26 2013-12-10 International Business Machines Corporation Constrained optimization of lithographic source intensities under contingent requirements
JP5513325B2 (ja) * 2010-09-01 2014-06-04 キヤノン株式会社 決定方法、露光方法及びプログラム

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