JP2012044035A5 - - Google Patents

Download PDF

Info

Publication number
JP2012044035A5
JP2012044035A5 JP2010184889A JP2010184889A JP2012044035A5 JP 2012044035 A5 JP2012044035 A5 JP 2012044035A5 JP 2010184889 A JP2010184889 A JP 2010184889A JP 2010184889 A JP2010184889 A JP 2010184889A JP 2012044035 A5 JP2012044035 A5 JP 2012044035A5
Authority
JP
Japan
Prior art keywords
manufacturing apparatus
semiconductor manufacturing
frequency power
chamber
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010184889A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012044035A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2010184889A priority Critical patent/JP2012044035A/ja
Priority claimed from JP2010184889A external-priority patent/JP2012044035A/ja
Publication of JP2012044035A publication Critical patent/JP2012044035A/ja
Publication of JP2012044035A5 publication Critical patent/JP2012044035A5/ja
Pending legal-status Critical Current

Links

JP2010184889A 2010-08-20 2010-08-20 半導体製造装置 Pending JP2012044035A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010184889A JP2012044035A (ja) 2010-08-20 2010-08-20 半導体製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010184889A JP2012044035A (ja) 2010-08-20 2010-08-20 半導体製造装置

Publications (2)

Publication Number Publication Date
JP2012044035A JP2012044035A (ja) 2012-03-01
JP2012044035A5 true JP2012044035A5 (enExample) 2013-09-05

Family

ID=45899990

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010184889A Pending JP2012044035A (ja) 2010-08-20 2010-08-20 半導体製造装置

Country Status (1)

Country Link
JP (1) JP2012044035A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021220329A1 (ja) * 2020-04-27 2021-11-04 株式会社日立ハイテク プラズマ処理装置
CN118235528A (zh) 2022-10-19 2024-06-21 株式会社日立高新技术 等离子处理装置
CN116390320A (zh) * 2023-05-30 2023-07-04 安徽农业大学 一种电子回旋共振放电装置及应用

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH065386A (ja) * 1992-06-19 1994-01-14 Kobe Steel Ltd 電子サイクロトロン共鳴装置
JPH09289099A (ja) * 1996-02-20 1997-11-04 Hitachi Ltd プラズマ処理方法および装置
JP2000331998A (ja) * 1999-05-21 2000-11-30 Hitachi Ltd プラズマ処理装置
JP2005019346A (ja) * 2003-06-30 2005-01-20 Tokyo Electron Ltd プラズマ処理装置、これに用いるプラズマ放射アンテナ及び導波管
JP4718189B2 (ja) * 2005-01-07 2011-07-06 東京エレクトロン株式会社 プラズマ処理方法
JP4864661B2 (ja) * 2006-11-22 2012-02-01 東京エレクトロン株式会社 太陽電池の製造方法及び太陽電池の製造装置

Similar Documents

Publication Publication Date Title
TWI740035B (zh) 具有局部勞侖茲力的模組化微波源
JP6698033B2 (ja) プラズマ処理装置およびプラズマ処理方法
JP2013084653A5 (enExample)
WO2014052719A3 (en) Adjusting energy of a particle beam
WO2011022612A3 (en) Inductive plasma source
JP2013182996A5 (enExample)
WO2014204558A3 (en) Heating plasma for fusion power using magnetic field oscillation
JP2011066033A5 (enExample)
WO2010058930A3 (ko) 전자 맴돌이 공명 이온원 장치 및 그의 제조방법
MX2022008271A (es) Sistema y metodo para generar radiacion electromagnetica de alto voltaje y de frecuencia variable.
JP2016526682A5 (enExample)
TW200632980A (en) Plasma generation apparatus
JP2012044035A5 (enExample)
JP2015050362A5 (enExample)
JP2019061849A5 (enExample)
JP2012182447A5 (ja) 半導体膜の作製方法
JP2011096700A5 (enExample)
JP2012523134A5 (enExample)
WO2011068350A3 (en) Apparatus and method for generating x-ray using electron cyclotron resonance ion source
JP2014135305A5 (enExample)
MY201589A (en) Device for generating plasma having a high range along an axis by electron cyclotron resonance (ecr) from a gaseous medium
JP2011520029A5 (enExample)
US10576297B2 (en) Magnetic flux irradiation devices and components
JP2015022855A5 (enExample)
WO2014204559A3 (en) Heating plasma for fusion power using electromagnetic waves