JP2011530003A5 - - Google Patents

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Publication number
JP2011530003A5
JP2011530003A5 JP2011520533A JP2011520533A JP2011530003A5 JP 2011530003 A5 JP2011530003 A5 JP 2011530003A5 JP 2011520533 A JP2011520533 A JP 2011520533A JP 2011520533 A JP2011520533 A JP 2011520533A JP 2011530003 A5 JP2011530003 A5 JP 2011530003A5
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JP
Japan
Prior art keywords
ald
loading
ald reactor
substrate holder
reaction chamber
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JP2011520533A
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English (en)
Japanese (ja)
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JP5683463B2 (ja
JP2011530003A (ja
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Priority claimed from US12/221,268 external-priority patent/US8282334B2/en
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Publication of JP2011530003A publication Critical patent/JP2011530003A/ja
Publication of JP2011530003A5 publication Critical patent/JP2011530003A5/ja
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Publication of JP5683463B2 publication Critical patent/JP5683463B2/ja
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JP2011520533A 2008-08-01 2009-07-07 原子層堆積装置および装填方法 Active JP5683463B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/221,268 US8282334B2 (en) 2008-08-01 2008-08-01 Atomic layer deposition apparatus and loading methods
US12/221,268 2008-08-01
PCT/FI2009/050616 WO2010012863A1 (en) 2008-08-01 2009-07-07 Atomic layer deposition apparatus and loading methods

Publications (3)

Publication Number Publication Date
JP2011530003A JP2011530003A (ja) 2011-12-15
JP2011530003A5 true JP2011530003A5 (https=) 2012-08-23
JP5683463B2 JP5683463B2 (ja) 2015-03-11

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ID=41608537

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011520533A Active JP5683463B2 (ja) 2008-08-01 2009-07-07 原子層堆積装置および装填方法

Country Status (7)

Country Link
US (2) US8282334B2 (https=)
EP (1) EP2310553B1 (https=)
JP (1) JP5683463B2 (https=)
KR (1) KR101614026B1 (https=)
CN (1) CN102112655B (https=)
RU (1) RU2518845C2 (https=)
WO (1) WO2010012863A1 (https=)

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US10041169B2 (en) 2008-05-27 2018-08-07 Picosun Oy System and method for loading a substrate holder carrying a batch of vertically placed substrates into an atomic layer deposition reactor
US8282334B2 (en) 2008-08-01 2012-10-09 Picosun Oy Atomic layer deposition apparatus and loading methods
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TWI461566B (zh) 2011-07-01 2014-11-21 Ind Tech Res Inst 鍍膜用噴灑頭以及鍍膜裝置
CN102354675A (zh) * 2011-11-02 2012-02-15 上海宏力半导体制造有限公司 晶圆垂直加工设备及方法
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CN102618848A (zh) * 2012-05-04 2012-08-01 嘉兴科民电子设备技术有限公司 一种立式原子层沉积设备
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RU2620230C2 (ru) * 2012-11-23 2017-05-23 Пикосан Ой Способ загрузки подложки в реактор асо
CN105463406A (zh) * 2014-09-04 2016-04-06 沈阳拓荆科技有限公司 原子层沉积设备
US20190194809A1 (en) * 2016-09-16 2019-06-27 Picosun Oy Apparatus and methods for atomic layer deposition
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FI130051B (en) * 2019-04-25 2023-01-13 Beneq Oy DEVICE AND METHOD
RU2752059C1 (ru) * 2020-07-14 2021-07-22 Пикосан Ой Устройство для атомно-слоевого осаждения (ald)
CN111676465A (zh) * 2020-07-15 2020-09-18 武汉华星光电半导体显示技术有限公司 Ald沉积装置及ald沉积方法

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