JP2011521773A - ユーティリティガスストリームから油を除去するための方法および装置 - Google Patents
ユーティリティガスストリームから油を除去するための方法および装置 Download PDFInfo
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- JP2011521773A JP2011521773A JP2011507503A JP2011507503A JP2011521773A JP 2011521773 A JP2011521773 A JP 2011521773A JP 2011507503 A JP2011507503 A JP 2011507503A JP 2011507503 A JP2011507503 A JP 2011507503A JP 2011521773 A JP2011521773 A JP 2011521773A
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Abstract
【選択図】図6
Description
この出願は2008年4月30日に出願された、米国仮特許出願第61/125,939号の利益を主張する。
密封ガスの供給源には、排気圧力が密封された圧縮器の吸気圧力(すなわち、圧縮器の中の乾燥ガス密封部を形成するために必要な圧力)より大きい限り、ガス生産プロセスまたは処理プロセス中の圧縮器の排気などのすべての好都合な抽出ポイントを含むことができる。ガスの圧力を低くする(たとえば、密封部の両端で調整する)場合には、密封ガスの一部が凝結するように温度を下げる。
油吸着ステップ中に平行チャネル接触器500Aを移動する吸着先端の形状はモデル化される。このモデリングでは吸着剤505の中の油の負荷を予測するために競合ラングミュア等温式が使用される。目的の吸着剤に対しては、油の吸着強度(たとえば選択性)が大きいことが予期されるので、吸着先端に類似する急峻な波、つまり衝撃波が接触器500Aの中を移動する。この種の動作によって接触器500Aの中の吸着剤の体積を効率的に使用することができ、要求される吸着剤の体積を最小化し、吸着サイクル長を最大化することができる。
油が、か焼できる条件を確立するために、約1,900グラム/モルのポリグリコール圧縮器油をメソポーラスMCM−41ゼオライトの2グラムサンプルに充填した。MCM−41ゼオライトを初期湿潤度に近い量のポリグリコール油に接触させることによって、ゼオライトを充填した。このために要求される油は約0.24グラムである。ゼオライトに吸着されない油の量をさらに減らすために、サンプルを真空オーブンに入れ、125℃で12時間、1水銀柱ミリメートル(mmHg)未満である約0.00133バールの圧力に保持した。サンプルを真空オーブンから取り出すと、吸着された油の量はサンプル質量の10質量%よりも多いことが分かった。か焼によって除去されたこの油の速度を測定するために、熱重量分析(TGA)実験が実施された。MCM−41材料を含む一群の油が約2ミリグラムから約25ミリグラム(mg)のサンプルに分けられ、繰り返しTGAの中に置かれた。TGAは空気で動作させ、それぞれのサンプルは、TGAに搬入した後に重量が既知の白金皿上に125℃で1時間を超える時間そのままにさせた。それぞれのサンプルに対して、か焼が観察される温度まで徐々に上昇させ、重量減少速度を記録した。それぞれのサンプルは、か焼温度で30分を超えて保持され、次に+温度が550℃より高い最終的な温度まで上昇させた。300℃という低い温度で、すべての油が1分未満で燃焼した、すなわちか焼した。これはサンプルを加熱して、か焼温度にするために必要なおおよその時間である。これらの迅速な反応速度および完全な油の除去は、か焼温度が325℃、350℃、375℃、400℃および450℃の実験で観察された。225℃から275℃の間の温度ではゆっくりではあるが、安定した、か焼による油の減少が観察された。この重量減少が、か焼によることを証明するために、空気ではなく窒素を使用してTGAプロトコルが繰り返された。窒素では、数日にわたる範囲の時定数での、とてもゆっくりとした重量減少が記録された。予想されるように温度の上昇にともなって重量減少速度が上昇した。
この実施例では、330baraに圧縮された約5MMSCFD燃料ガスから約2グラム/分で圧縮器油を除去する接触器を示す。圧縮器からストリ−ムが排気されると、温度は85℃から115℃の範囲になる。燃料ガスは以下の表に示す組成を有する。燃料ガスを圧縮器から排気される温度に近い温度で乾燥密封部に供給すると、密封面の両端で膨張するので2相領域には入らない。ガスが密封面の両端間で膨張すると発生する唯一の液体は圧縮器油に由来する。この実施例では、圧縮器油は数平均分子量数が1,900グラム/モルのポリグリコールである。
Claims (44)
- ガス供給ストリ−ムを処理するシステムであって、
表面積が大きい固体を含有する少なくとも一つの構造化吸着床を含むスイング吸着ユニットにガス供給ストリ−ムを通過させるように構成されるガス供給ストリ−ムインレットを含む選択的成分除去システムを含み、
前記ガス供給ストリ−ムは、多量の油滴および多量の油蒸気を含有し、圧力が少なくとも約1,000重量ポンド毎平方インチであり、前記少なくとも一つの構造化吸着床は少なくとも前記多量の油滴の一部および少なくとも前記多量の油蒸気の一部を除去し、実質的に油を含有しないガスアウトレットストリ−ムを供給するように構成され、前記少なくとも一つの構造化吸着床は動的スイング吸着プロセスによって再生されるシステム。 - 請求項1のシステムにおいて、
前記動的スイング吸着プロセスは、か焼プロセス、温度スイングプロセス、圧力スイングプロセス、不活性物質によるパージプロセス、およびこれらの任意の組み合わせからなる群から選択されるシステム。 - 請求項2のシステムにおいて、
前記システムはラングミュアの等温式によってモデル化される急峻な吸着先端の中の前記多量の油滴および前記多量の油蒸気を除去するように構成されるシステム。 - 請求項3のシステムにおいて、
前記少なくとも一つの構造化吸着床は前記構造化吸着床の温度を少なくとも約250℃に上昇させて再生させるシステム。 - 請求項2のシステムにおいて、
前記構造化吸着床は熱波プロセスによって再生されるシステム。 - 請求項2のシステムにおいて、
前記構造化吸着床は、前記ガス供給ストリ−ムの流れ方向に並流させて、向流させて、または直交させて(たとえば交差させて)流したガスまたは流体によって再生されるシステム。 - 請求項1のシステムにおいて、
さらに前記スイング吸着ユニットの周囲を実質的に覆う流体不透過性収容部を含むシステム。 - 請求項7のシステムにおいて、
前記流体不透過性収容部は約10,000重量ポンド毎平方インチにいたるまで動作可能であるシステム。 - 請求項2のシステムにおいて、
前記構造化吸着床は、平行チャネル接触器、構造化フロースルー吸着接触器、フロースルー吸着剤、およびこれらの任意の組み合わせからなる群から選択されるシステム。 - 請求項9のシステムにおいて、
さらに、少なくとも2つの構造化吸着床を収容するように構成されるセグメント化された接触器を含み、一対の構造化吸着床のそれぞれが密封部によって分離されるシステム。 - 請求項1のシステムにおいて、
前記油は実質的に無灰油であるシステム。 - 請求項1のシステムにおいて、
前記油はエチレンオキシドおよびプロピレンオキシドのランダムコポリマーを含む合成物であるシステム。 - 請求項12のシステムにおいて、
前記エチレンオキシドおよびプロピレンオキシドのランダムコポリマーの平均分子量は約1,200グラム/モルより大きく、約2,500グラム/モル以下であるシステム。 - 請求項1のシステムにおいて、
さらに前記少なくとも一つの構造化吸着床と動作可能に係合する冷却ジャケットを含むシステム。 - 請求項2のシステムにおいて、
さらに、間接吸着床電気加熱器、直接吸着床電気加熱器、直接ガス加熱流体、または、これらの任意の組み合わせからなる群から選択される加熱器を含むシステム。 - 請求項1のシステムにおいて、
さらに、前記実質的に油を含まないガスアウトレットストリ−ムを冷却する冷却流体を使用するように構成される熱交換器を含むシステム。 - 請求項1のシステムにおいて、
さらに、前記実質的に油を含まないガスアウトレットストリ−ムを保持するように構成される蓄圧器を含むシステム。 - 請求項1のシステムにおいて、
前記表面積が大きい固体はアルミナ、メソポーラス固体、およびマイクロポーラス固体からなる群から選択されるシステム。 - 請求項18のシステムにおいて、
前記表面積が大きい固体は、アルミナ、炭素、活性炭、炭、カチオン性のゼオライト、高シリカ質のゼオライト、高シリカ質の規則性メソポーラス材料、ゾルゲル材料、ALPO材料(主にアルミニウム、リンおよび酸素を含むマイクロポーラスおよびメソポーラス材料)、SAPO材料(主にシリコン、アルミニウム、リンおよび酸素を含むマイクロポーラスおよびメソポーラス材料)、MOF材料(金属有機骨格を含むマイクロポーラスおよびメソポーラス材料)およびZIF材料(ゼオライト型イミダゾレート骨格を含むマイクロポーラスおよびメソポーラス材料)からなる群から選択されるシステム。 - 請求項18のシステムにおいて、
前記表面積が大きい固体の表面積は1グラム当たり約10平方メートル(m2/gm)よりも広いシステム。 - 請求項3のシステムにおいて、
前記油が99.99999パーセントを超えて前記ガス供給ストリ−ムから除去されるシステム。 - 請求項18のシステムにおいて、
前記表面積が大きい固体はSi対Alの比が約50:1を超える12〜14員環ゼオライトであるシステム。 - 請求項18のシステムにおいて、
前記表面積が大きい固体はM41Sファミリーの規則性メソポーラス材料であるシステム。 - 請求項1のシステムにおいて、
さらに調節ユニットを含むシステム。 - ガス供給ストリ−ムを処理する方法であって、
多量の油を含むガス供給ストリ−ムを供給するステップと、
ユーティリティ要素で使用するためのユーティリティストリ−ムを形成するために、少なくとも一つのスイング吸着プロセスユニットを含む選択的成分除去システムを使用して、前記ガス供給ストリ−ムの一部を処理するステップであって、前記少なくとも一つのスイング吸着プロセスユニットが、表面積が大きい固体を含み、かつ、少なくとも前記多量の油の一部を除去するように構成される構造化吸着床を含むステップと、
か焼プロセスで前記スイング吸着プロセスユニットを再生するステップと、
前記ユーティリティストリ−ムを前記ユーティリティ要素に供給するステップであって、前記ユーティリティストリ−ムは前記ユーティリティ要素に適合するステップと、
前記ユーティリティ要素の中で前記ユーティリティストリ−ムを利用するステップとを含む方法。 - 請求項25の方法において、
前記ガス供給ストリ−ムは、少なくとも一つの炭化水素成分を含む方法。 - 請求項25の方法において、
前記ガス供給ストリ−ムは圧縮器の排気ストリ−ムである方法。 - 請求項25の方法において、
前記ガス供給ストリ−ムは高圧プロセスストリ−ムである方法。 - 請求項25から28の何れか一項に記載の方法において、
前記ガス供給ストリ−ムは前記ガス供給ストリ−ムの臨界点を超える圧力である方法。 - 請求項28の方法において、
前記ガス供給ストリ−ムは少なくとも約100バールから少なくとも約500バールの間の圧力である方法。 - 請求項28の方法において、
前記ガス供給ストリ−ムは少なくとも約200バールから少なくとも約320バールの間の圧力である方法。 - 請求項25から31の何れか一項に記載の方法において、
前記少なくとも一つのユーティリティ要素の少なくとも一つは、圧縮器、圧縮器群、ターボエキスパンダ圧縮器、ターボエキスパンダ発電機、ポンプ、燃焼式蒸気ボイラー、燃焼式プロセス加熱器、ガス機関、密封された直接駆動電動機、磁気軸受を備えるターボ機械、およびガスタービンからなる群から選択される方法。 - 請求項32の方法において、
第1のユーティリティストリ−ムは、前記少なくとも一つのユーティリティ要素の中の乾燥ガス密封部、迷路状密封部、または機械的密封部の少なくとも一つのために乾燥密封ガスとして利用される方法。 - 請求項33の方法において、
前記少なくとも一つのスイング吸着プロセスユニットは、圧力スイング吸着(PSA)ユニット、温度スイング吸着(TSA)ユニット、分圧スイングまたは置換パージ吸着(PPSA)ユニット、高速サイクル温度スイング吸着(RCTSA)ユニット、高速サイクル圧力スイング吸着(RCPSA)ユニット、高速サイクル分圧スイングまたは置換パージ吸着(RCPPSA)ユニット、小型PSA、小型TSA、小型PPSA、および、これらの任意の組み合わせからなる一群のユニットから選択される方法。 - 請求項34の方法において、
選択的成分除去システム(SCRS)はさらに、吸収ユニット、膜分離ユニット、モレキュラーシーブ、蒸留塔、およびグリコール接触器の少なくとも一つを含む方法。 - 構造化吸着接触器であって、
インレット端部と、
アウトレット端部と、
前記インレット端部から前記アウトレット端部まで延在する複数の開口フローチャネルとを含み、
前記複数の開口フローチャネルの一部は前記インレット端部で密封され、残りの前記複数のフローチャネルは前記アウトレット端部で密封され、前記開口フローチャネルの表面は、混合物の第1の成分に対する選択性が前記混合物の第2の成分に対する選択性より大きい構造化吸着材料を含む接触器。 - 請求項36の接触器において、
前記接触器は、直径が約20オングストロームより大きく約1マイクロメートル未満の細孔の開口細孔体積の約20体積パーセント未満である接触器。 - 請求項36の構造化吸着接触器において、
前記吸着材料はCH4に対する選択性よりも油に対する選択性の方が約10よりも大きい接触器。 - 請求項36の吸着接触器において、
前記吸着材料は、アルミナ、メソポーラス固体、およびマイクロポーラス固体からなる群から選択される表面積が大きい固体材料を含む接触器。 - 請求項39の吸着接触器において、
前記吸着材料は、ゼオライト、チタノシリケート、フェロシリケート、スタンノシリケート、アルミノホスフェート(ALPO)、シリカアルミノホスフェート(SAPO)、マイクロポーラスおよびメソポーラス活性炭、メソポーラス材料、構造化メソポーラス材料、および炭素モレキュラーシーブからなる群から選択される構造化マイクロポーラス吸着剤である接触器。 - 請求項40の吸着接触器において、
前記構造化マイクロポーラス吸着剤はMFI、フォージャサイト、およびベータからなる群から選択されるゼオライトである接触器。 - 請求項41の吸着接触器において、
前記構造化メソポーラス吸着剤はM41Sファミリーから選択される接触器。 - 請求項42の吸着接触器において、
前記構造化マイクロポーラス吸着剤は、炭素、活性炭、炭、カチオン性のゼオライト、高シリカ質のゼオライト、高シリカ質の規則性メソポーラス材料、ゾルゲル材料、アルミノホスフェート(ALPO)、シリコアルミノホスフェート(SAPO)、金属有機骨格(MOF)材料、およびゼオライト型イミダゾレート骨格(ZIF)材料からなる群から選択されるモレキュラーシーブを含む接触器。 - 請求項43の吸着接触器において、
前記構造化マイクロポーラス吸着剤はSi対Alの比が約50:1を超える12〜14員環ゼオライトである接触器。
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AU2009241530B2 (en) | 2015-02-12 |
AU2009241530A1 (en) | 2009-11-05 |
EP2276550A1 (en) | 2011-01-26 |
JP5577324B2 (ja) | 2014-08-20 |
EP3144050B1 (en) | 2018-12-05 |
MY158840A (en) | 2016-11-15 |
WO2009134543A1 (en) | 2009-11-05 |
CA2721724C (en) | 2016-06-28 |
EA022697B1 (ru) | 2016-02-29 |
US10035096B2 (en) | 2018-07-31 |
CA2721724A1 (en) | 2009-11-05 |
AU2009241530C1 (en) | 2016-12-01 |
US20150328578A1 (en) | 2015-11-19 |
EP3144050A1 (en) | 2017-03-22 |
SG189782A1 (en) | 2013-05-31 |
EP2276550A4 (en) | 2012-02-29 |
EA201071255A1 (ru) | 2011-04-29 |
US9126138B2 (en) | 2015-09-08 |
US20110031103A1 (en) | 2011-02-10 |
BRPI0911224A2 (pt) | 2015-09-29 |
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