JP2011520609A5 - - Google Patents
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- JP2011520609A5 JP2011520609A5 JP2011510619A JP2011510619A JP2011520609A5 JP 2011520609 A5 JP2011520609 A5 JP 2011520609A5 JP 2011510619 A JP2011510619 A JP 2011510619A JP 2011510619 A JP2011510619 A JP 2011510619A JP 2011520609 A5 JP2011520609 A5 JP 2011520609A5
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- gas
- contactor
- electrical conductivity
- flow rate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007789 gas Substances 0.000 claims description 156
- 239000007788 liquid Substances 0.000 claims description 155
- 239000012528 membrane Substances 0.000 claims description 57
- 238000002309 gasification Methods 0.000 claims description 45
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 43
- 230000008859 change Effects 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 22
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 21
- 239000001569 carbon dioxide Substances 0.000 claims description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 230000007935 neutral effect Effects 0.000 claims description 3
- 238000002955 isolation Methods 0.000 claims description 2
- 239000012527 feed solution Substances 0.000 claims 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 98
- 230000008569 process Effects 0.000 description 10
- 238000010586 diagram Methods 0.000 description 9
- 239000012510 hollow fiber Substances 0.000 description 6
- 238000012423 maintenance Methods 0.000 description 6
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 230000004044 response Effects 0.000 description 4
- 229920001774 Perfluoroether Polymers 0.000 description 3
- 230000000875 corresponding effect Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 3
- 238000010790 dilution Methods 0.000 description 3
- 239000012895 dilution Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000002351 wastewater Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000003631 expected effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Applications Claiming Priority (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US5422308P | 2008-05-19 | 2008-05-19 | |
| US61/054,223 | 2008-05-19 | ||
| US8253508P | 2008-07-22 | 2008-07-22 | |
| US61/082,535 | 2008-07-22 | ||
| US9523008P | 2008-09-08 | 2008-09-08 | |
| US61/095,230 | 2008-09-08 | ||
| US10150108P | 2008-09-30 | 2008-09-30 | |
| US61/101,501 | 2008-09-30 | ||
| PCT/US2009/044343 WO2009143056A1 (en) | 2008-05-19 | 2009-05-18 | Gasification systems and methods for making bubble free solutions of gas in liquid |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011520609A JP2011520609A (ja) | 2011-07-21 |
| JP2011520609A5 true JP2011520609A5 (https=) | 2014-08-14 |
Family
ID=41340494
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011510619A Pending JP2011520609A (ja) | 2008-05-19 | 2009-05-18 | 液体内のガス無気泡溶液を作成するガス化システムおよび方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US8844909B2 (https=) |
| JP (1) | JP2011520609A (https=) |
| KR (1) | KR20110008319A (https=) |
| CN (2) | CN104722239A (https=) |
| DE (1) | DE112009001233T5 (https=) |
| TW (1) | TW201004707A (https=) |
| WO (1) | WO2009143056A1 (https=) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010234298A (ja) * | 2009-03-31 | 2010-10-21 | Kurita Water Ind Ltd | ガス溶解水供給装置及びガス溶解水の製造方法 |
| US8438969B2 (en) * | 2010-05-06 | 2013-05-14 | Dr Pepper/Seven Up, Inc. | Apparatus and method for dissolving gases in a beverage |
| US9403102B2 (en) * | 2012-02-13 | 2016-08-02 | United Technologies Corporation | Heat exchange system configured with a membrane contactor |
| JP5914037B2 (ja) * | 2012-02-23 | 2016-05-11 | 東京エレクトロン株式会社 | 冷却システム、冷却システムを備える基板処理装置及び冷却方法 |
| CN102692926B (zh) * | 2012-06-05 | 2014-10-22 | 哈尔滨工程大学 | 基于tms320c6713的船舶航向模糊pid融合控制器及控制方法 |
| GB2506689A (en) * | 2012-10-08 | 2014-04-09 | Odour Services Internat Ltd | Air pollution control apparatus and method of use |
| EP2961269B1 (en) * | 2013-02-28 | 2021-09-15 | Hemanext Inc. | Gas depletion device for blood products |
| WO2015175790A1 (en) * | 2014-05-15 | 2015-11-19 | Tokyo Electron Limited | Method and apparatus for increased recirculation and filtration in a photoresist dispense system |
| AU2015100137A4 (en) * | 2015-01-12 | 2015-03-05 | Macau University Of Science And Technology | Optimization of Start-up Transient Processes for Dual-Armed Cluster Tools with Wafer Revisiting |
| JP6993626B2 (ja) * | 2015-04-10 | 2022-01-13 | タカラベルモント株式会社 | 炭酸水生成装置 |
| US10792623B2 (en) | 2015-04-13 | 2020-10-06 | Dic Corporation | Device for adjusting specific resistance value and method for adjusting specific resistance value |
| FR3036629B1 (fr) * | 2015-05-29 | 2019-06-21 | Nicolas POURTAUD | Dispositif de regulation de la concentration d'un gaz dans un liquide |
| US10732099B2 (en) * | 2016-01-06 | 2020-08-04 | Tokushima University | Gas analysis device and gas analysis method using laser beam |
| US10228355B2 (en) | 2016-05-06 | 2019-03-12 | Board Of Regents, The University Of Texas System | Volatile eluent preparation |
| CN106474768B (zh) * | 2016-09-12 | 2019-01-29 | 华中科技大学 | 一种高精度耐腐蚀的自动配液换液装置 |
| WO2018085892A1 (en) * | 2016-11-11 | 2018-05-17 | PTI Pacific Pty Ltd | Modular system for gassing and degassing liquids |
| KR102447374B1 (ko) * | 2016-11-11 | 2022-09-23 | 엠케이에스 인스트루먼츠, 인코포레이티드 | 암모니아 가스가 용해되어 있는 탈이온수를 포함하는 전도성 액체를 생성하기 위한 시스템들 및 방법 |
| WO2018183477A1 (en) * | 2017-03-28 | 2018-10-04 | Flow Control Llc. | Gas/liquid infusion system with intelligent level management and adjustable absorption output |
| CN108854609B (zh) * | 2017-05-10 | 2025-08-12 | 青岛经济技术开发区海尔热水器有限公司 | 一种微气泡水生产装置 |
| JP7052423B2 (ja) * | 2018-03-02 | 2022-04-12 | 栗田工業株式会社 | オゾン溶解水の製造装置及びこれを用いたオゾン溶解水の製造方法 |
| WO2020210243A1 (en) * | 2019-04-08 | 2020-10-15 | Mks Instruments, Inc. | Systems and methods for generating a dissolved ammonia solution with reduced dissolved carrier gas and oxygen content |
| JP7240260B2 (ja) * | 2019-06-04 | 2023-03-15 | 株式会社荏原製作所 | ガス溶解液供給装置およびガス溶解液供給方法 |
| CN110773012A (zh) * | 2019-12-02 | 2020-02-11 | 杭州老板电器股份有限公司 | 微纳米气泡制备装置及其制备方法 |
| KR20240124920A (ko) * | 2021-12-14 | 2024-08-19 | 엠케이에스 인스트루먼츠 인코포레이티드 | 용해된 암모니아 전달 시스템 및 사용 방법 |
| CN118893499B (zh) * | 2024-09-12 | 2025-11-14 | 福建理工大学 | 一种基于pid控制气体辅助抛光系统的设计方法 |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3751879A (en) * | 1971-04-26 | 1973-08-14 | Instrumentation Specialties Co | Apparatus for reducing the dissolved gas concentration in a liquid |
| DE68926421T2 (de) * | 1988-08-20 | 1996-09-12 | Nitto Denko Corp | Verfahren zur Entfernung von gelösten Gasen aus einer Flüssigkeit |
| US5565149A (en) | 1995-03-15 | 1996-10-15 | Permea, Inc. | Control of dissolved gases in liquids |
| US5766479A (en) * | 1995-08-07 | 1998-06-16 | Zenon Environmental Inc. | Production of high purity water using reverse osmosis |
| JPH10324502A (ja) * | 1997-05-21 | 1998-12-08 | Dainippon Ink & Chem Inc | 超純水の炭酸ガス付加装置及び付加方法 |
| US6582496B1 (en) | 2000-01-28 | 2003-06-24 | Mykrolis Corporation | Hollow fiber membrane contactor |
| US6328905B1 (en) | 1999-08-12 | 2001-12-11 | Advanced Micro Devices, Inc. | Residue removal by CO2 water rinse in conjunction with post metal etch plasma strip |
| US6982006B1 (en) * | 1999-10-19 | 2006-01-03 | Boyers David G | Method and apparatus for treating a substrate with an ozone-solvent solution |
| US6805791B2 (en) * | 2000-09-01 | 2004-10-19 | Applied Science And Technology, Inc. | Ozonated water flow and concentration control apparatus |
| US6884359B2 (en) * | 2000-09-27 | 2005-04-26 | Dainippon Ink And Chemicals, Inc. | Apparatus and method for controlling resistivity of ultra pure water |
| JP2002233878A (ja) | 2001-02-06 | 2002-08-20 | Roki Techno Co Ltd | 給水配管の殺菌洗浄方法 |
| CN100469425C (zh) | 2001-08-28 | 2009-03-18 | 三菱丽阳株式会社 | 碳酸泉和碳酸水的制造装置及制造方法、及其应用的气体浓度控制方法和膜组件 |
| JP2003154242A (ja) * | 2001-11-26 | 2003-05-27 | Texas Instr Japan Ltd | 流体混合装置 |
| DE60316264T2 (de) * | 2002-03-19 | 2008-05-29 | Entegris, Inc., Chaska | Hohlfasermembrankontaktvorrichtung und -verfahren |
| JP4319445B2 (ja) * | 2002-06-20 | 2009-08-26 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| JP2004130205A (ja) | 2002-10-10 | 2004-04-30 | Fuji Electric Systems Co Ltd | オゾン含有水を用いたろ過膜の逆洗方法および逆洗装置 |
| EP1615713A4 (en) | 2003-04-22 | 2006-11-02 | Entegris Inc | ACCORDION CONSTRUCTION FOR PASSING THROUGH A GASEOUS TRANSFER MEMBRANE |
| JP4330959B2 (ja) * | 2003-09-05 | 2009-09-16 | 株式会社東芝 | 半導体基板の洗浄方法および洗浄装置、半導体基板、ならびに半導体装置 |
| US7273549B2 (en) * | 2004-01-23 | 2007-09-25 | Geoscience Support Services Inc. | Membrane contactor apparatus including a module having hollow fiber membranes |
| TW200526717A (en) | 2004-01-27 | 2005-08-16 | Mykrolis Corp | Process for removing microbubbles from a liquid |
| JP4470101B2 (ja) | 2004-03-24 | 2010-06-02 | 栗田工業株式会社 | 窒素溶解超純水の製造方法 |
| US20050279207A1 (en) | 2004-06-16 | 2005-12-22 | Advanced Technology Materials, Inc. | Liquid delivery system |
| CN101484861B (zh) * | 2006-05-05 | 2013-11-06 | 普拉斯科能源Ip控股公司毕尔巴鄂-沙夫豪森分公司 | 气体均化系统 |
| CN101522561A (zh) * | 2006-05-05 | 2009-09-02 | 普拉斯科能源Ip控股公司毕尔巴鄂-沙夫豪森分公司 | 使用等离子体炬热的气体重整系统 |
| JP2007319843A (ja) | 2006-06-05 | 2007-12-13 | Kurita Water Ind Ltd | 気体溶解モジュール |
| US7641795B2 (en) * | 2006-06-05 | 2010-01-05 | Celgard Llc | Membrane contactor |
| KR20090034344A (ko) * | 2006-07-21 | 2009-04-07 | 엔테그리스, 아이엔씨. | 침지액을 조절하기 위한 장치 및 방법 |
| JP4931201B2 (ja) | 2006-10-13 | 2012-05-16 | 独立行政法人産業技術総合研究所 | 極微小気泡を含む水の製造方法および極微小気泡を含む水 |
| EP2104648B1 (en) * | 2006-10-17 | 2013-04-17 | MKS Instruments, Inc. | System and method for carbonation of deionized water |
| JP2008155186A (ja) * | 2006-12-26 | 2008-07-10 | Nomura Micro Sci Co Ltd | オゾン水の製造方法及び製造装置 |
-
2009
- 2009-05-18 JP JP2011510619A patent/JP2011520609A/ja active Pending
- 2009-05-18 DE DE112009001233T patent/DE112009001233T5/de not_active Withdrawn
- 2009-05-18 TW TW98116469A patent/TW201004707A/zh unknown
- 2009-05-18 US US12/993,791 patent/US8844909B2/en not_active Expired - Fee Related
- 2009-05-18 WO PCT/US2009/044343 patent/WO2009143056A1/en not_active Ceased
- 2009-05-18 KR KR1020107027647A patent/KR20110008319A/ko not_active Ceased
- 2009-05-18 CN CN201510020227.7A patent/CN104722239A/zh active Pending
- 2009-05-18 CN CN200980118387.8A patent/CN102036742B/zh not_active Expired - Fee Related
-
2014
- 2014-08-19 US US14/462,950 patent/US20140357734A1/en not_active Abandoned
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