DE112009001233T5 - Begasungssysteme und Verfahren zur Herstellung von blasenfreien Lösungen von Gas in Flüssigkeit - Google Patents

Begasungssysteme und Verfahren zur Herstellung von blasenfreien Lösungen von Gas in Flüssigkeit Download PDF

Info

Publication number
DE112009001233T5
DE112009001233T5 DE112009001233T DE112009001233T DE112009001233T5 DE 112009001233 T5 DE112009001233 T5 DE 112009001233T5 DE 112009001233 T DE112009001233 T DE 112009001233T DE 112009001233 T DE112009001233 T DE 112009001233T DE 112009001233 T5 DE112009001233 T5 DE 112009001233T5
Authority
DE
Germany
Prior art keywords
gas
liquid
contactor
contact side
feed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE112009001233T
Other languages
German (de)
English (en)
Inventor
Yanan Annie Mass. Xia
J. Karl Mass. Niermeyer
Greg T. Wash. Conner
Rosario Mass. Mollica
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Entegris Inc
Original Assignee
Entegris Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Entegris Inc filed Critical Entegris Inc
Publication of DE112009001233T5 publication Critical patent/DE112009001233T5/de
Withdrawn legal-status Critical Current

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/2319Methods of introducing gases into liquid media
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/231Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/29Mixing systems, i.e. flow charts or diagrams
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20Measuring; Control or regulation
    • B01F35/21Measuring
    • B01F35/213Measuring of the properties of the mixtures, e.g. temperature, density or colour
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/231Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
    • B01F23/23105Arrangement or manipulation of the gas bubbling devices
    • B01F23/2312Diffusers
    • B01F23/23124Diffusers consisting of flexible porous or perforated material, e.g. fabric
    • B01F23/231244Dissolving, hollow fiber membranes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00Fluid handling
    • Y10T137/0318Processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Accessories For Mixers (AREA)
DE112009001233T 2008-05-19 2009-05-18 Begasungssysteme und Verfahren zur Herstellung von blasenfreien Lösungen von Gas in Flüssigkeit Withdrawn DE112009001233T5 (de)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US5422308P 2008-05-19 2008-05-19
US61/054,223 2008-05-19
US8253508P 2008-07-22 2008-07-22
US61/082,535 2008-07-22
US9523008P 2008-09-08 2008-09-08
US61/095,230 2008-09-08
US10150108P 2008-09-30 2008-09-30
US61/101,501 2008-09-30
PCT/US2009/044343 WO2009143056A1 (en) 2008-05-19 2009-05-18 Gasification systems and methods for making bubble free solutions of gas in liquid

Publications (1)

Publication Number Publication Date
DE112009001233T5 true DE112009001233T5 (de) 2011-07-21

Family

ID=41340494

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112009001233T Withdrawn DE112009001233T5 (de) 2008-05-19 2009-05-18 Begasungssysteme und Verfahren zur Herstellung von blasenfreien Lösungen von Gas in Flüssigkeit

Country Status (7)

Country Link
US (2) US8844909B2 (https=)
JP (1) JP2011520609A (https=)
KR (1) KR20110008319A (https=)
CN (2) CN104722239A (https=)
DE (1) DE112009001233T5 (https=)
TW (1) TW201004707A (https=)
WO (1) WO2009143056A1 (https=)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010234298A (ja) * 2009-03-31 2010-10-21 Kurita Water Ind Ltd ガス溶解水供給装置及びガス溶解水の製造方法
US8438969B2 (en) * 2010-05-06 2013-05-14 Dr Pepper/Seven Up, Inc. Apparatus and method for dissolving gases in a beverage
US9403102B2 (en) * 2012-02-13 2016-08-02 United Technologies Corporation Heat exchange system configured with a membrane contactor
JP5914037B2 (ja) * 2012-02-23 2016-05-11 東京エレクトロン株式会社 冷却システム、冷却システムを備える基板処理装置及び冷却方法
CN102692926B (zh) * 2012-06-05 2014-10-22 哈尔滨工程大学 基于tms320c6713的船舶航向模糊pid融合控制器及控制方法
GB2506689A (en) * 2012-10-08 2014-04-09 Odour Services Internat Ltd Air pollution control apparatus and method of use
EP2961269B1 (en) * 2013-02-28 2021-09-15 Hemanext Inc. Gas depletion device for blood products
WO2015175790A1 (en) * 2014-05-15 2015-11-19 Tokyo Electron Limited Method and apparatus for increased recirculation and filtration in a photoresist dispense system
AU2015100137A4 (en) * 2015-01-12 2015-03-05 Macau University Of Science And Technology Optimization of Start-up Transient Processes for Dual-Armed Cluster Tools with Wafer Revisiting
JP6993626B2 (ja) * 2015-04-10 2022-01-13 タカラベルモント株式会社 炭酸水生成装置
US10792623B2 (en) 2015-04-13 2020-10-06 Dic Corporation Device for adjusting specific resistance value and method for adjusting specific resistance value
FR3036629B1 (fr) * 2015-05-29 2019-06-21 Nicolas POURTAUD Dispositif de regulation de la concentration d'un gaz dans un liquide
US10732099B2 (en) * 2016-01-06 2020-08-04 Tokushima University Gas analysis device and gas analysis method using laser beam
US10228355B2 (en) 2016-05-06 2019-03-12 Board Of Regents, The University Of Texas System Volatile eluent preparation
CN106474768B (zh) * 2016-09-12 2019-01-29 华中科技大学 一种高精度耐腐蚀的自动配液换液装置
WO2018085892A1 (en) * 2016-11-11 2018-05-17 PTI Pacific Pty Ltd Modular system for gassing and degassing liquids
KR102447374B1 (ko) * 2016-11-11 2022-09-23 엠케이에스 인스트루먼츠, 인코포레이티드 암모니아 가스가 용해되어 있는 탈이온수를 포함하는 전도성 액체를 생성하기 위한 시스템들 및 방법
WO2018183477A1 (en) * 2017-03-28 2018-10-04 Flow Control Llc. Gas/liquid infusion system with intelligent level management and adjustable absorption output
CN108854609B (zh) * 2017-05-10 2025-08-12 青岛经济技术开发区海尔热水器有限公司 一种微气泡水生产装置
JP7052423B2 (ja) * 2018-03-02 2022-04-12 栗田工業株式会社 オゾン溶解水の製造装置及びこれを用いたオゾン溶解水の製造方法
WO2020210243A1 (en) * 2019-04-08 2020-10-15 Mks Instruments, Inc. Systems and methods for generating a dissolved ammonia solution with reduced dissolved carrier gas and oxygen content
JP7240260B2 (ja) * 2019-06-04 2023-03-15 株式会社荏原製作所 ガス溶解液供給装置およびガス溶解液供給方法
CN110773012A (zh) * 2019-12-02 2020-02-11 杭州老板电器股份有限公司 微纳米气泡制备装置及其制备方法
KR20240124920A (ko) * 2021-12-14 2024-08-19 엠케이에스 인스트루먼츠 인코포레이티드 용해된 암모니아 전달 시스템 및 사용 방법
CN118893499B (zh) * 2024-09-12 2025-11-14 福建理工大学 一种基于pid控制气体辅助抛光系统的设计方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6328905B1 (en) 1999-08-12 2001-12-11 Advanced Micro Devices, Inc. Residue removal by CO2 water rinse in conjunction with post metal etch plasma strip
US6805731B2 (en) 1999-01-29 2004-10-19 Mykrolis Corporation Hollow fiber membrane contactor
WO2005072487A2 (en) 2004-01-27 2005-08-11 Entegris, Inc. Process for removing microbubbles from a liquid
WO2006007376A2 (en) 2004-06-16 2006-01-19 Advanced Technology Materials, Inc. Liquid delivery system
US7264006B2 (en) 2000-09-01 2007-09-04 Mks Instruments, Inc. Ozonated water flow and concentration control apparatus and method
US7273549B2 (en) 2004-01-23 2007-09-25 Geoscience Support Services Inc. Membrane contactor apparatus including a module having hollow fiber membranes

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3751879A (en) * 1971-04-26 1973-08-14 Instrumentation Specialties Co Apparatus for reducing the dissolved gas concentration in a liquid
DE68926421T2 (de) * 1988-08-20 1996-09-12 Nitto Denko Corp Verfahren zur Entfernung von gelösten Gasen aus einer Flüssigkeit
US5565149A (en) 1995-03-15 1996-10-15 Permea, Inc. Control of dissolved gases in liquids
US5766479A (en) * 1995-08-07 1998-06-16 Zenon Environmental Inc. Production of high purity water using reverse osmosis
JPH10324502A (ja) * 1997-05-21 1998-12-08 Dainippon Ink & Chem Inc 超純水の炭酸ガス付加装置及び付加方法
US6982006B1 (en) * 1999-10-19 2006-01-03 Boyers David G Method and apparatus for treating a substrate with an ozone-solvent solution
US6884359B2 (en) * 2000-09-27 2005-04-26 Dainippon Ink And Chemicals, Inc. Apparatus and method for controlling resistivity of ultra pure water
JP2002233878A (ja) 2001-02-06 2002-08-20 Roki Techno Co Ltd 給水配管の殺菌洗浄方法
CN100469425C (zh) 2001-08-28 2009-03-18 三菱丽阳株式会社 碳酸泉和碳酸水的制造装置及制造方法、及其应用的气体浓度控制方法和膜组件
JP2003154242A (ja) * 2001-11-26 2003-05-27 Texas Instr Japan Ltd 流体混合装置
DE60316264T2 (de) * 2002-03-19 2008-05-29 Entegris, Inc., Chaska Hohlfasermembrankontaktvorrichtung und -verfahren
JP4319445B2 (ja) * 2002-06-20 2009-08-26 大日本スクリーン製造株式会社 基板処理装置
JP2004130205A (ja) 2002-10-10 2004-04-30 Fuji Electric Systems Co Ltd オゾン含有水を用いたろ過膜の逆洗方法および逆洗装置
EP1615713A4 (en) 2003-04-22 2006-11-02 Entegris Inc ACCORDION CONSTRUCTION FOR PASSING THROUGH A GASEOUS TRANSFER MEMBRANE
JP4330959B2 (ja) * 2003-09-05 2009-09-16 株式会社東芝 半導体基板の洗浄方法および洗浄装置、半導体基板、ならびに半導体装置
JP4470101B2 (ja) 2004-03-24 2010-06-02 栗田工業株式会社 窒素溶解超純水の製造方法
CN101484861B (zh) * 2006-05-05 2013-11-06 普拉斯科能源Ip控股公司毕尔巴鄂-沙夫豪森分公司 气体均化系统
CN101522561A (zh) * 2006-05-05 2009-09-02 普拉斯科能源Ip控股公司毕尔巴鄂-沙夫豪森分公司 使用等离子体炬热的气体重整系统
JP2007319843A (ja) 2006-06-05 2007-12-13 Kurita Water Ind Ltd 気体溶解モジュール
US7641795B2 (en) * 2006-06-05 2010-01-05 Celgard Llc Membrane contactor
KR20090034344A (ko) * 2006-07-21 2009-04-07 엔테그리스, 아이엔씨. 침지액을 조절하기 위한 장치 및 방법
JP4931201B2 (ja) 2006-10-13 2012-05-16 独立行政法人産業技術総合研究所 極微小気泡を含む水の製造方法および極微小気泡を含む水
EP2104648B1 (en) * 2006-10-17 2013-04-17 MKS Instruments, Inc. System and method for carbonation of deionized water
JP2008155186A (ja) * 2006-12-26 2008-07-10 Nomura Micro Sci Co Ltd オゾン水の製造方法及び製造装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6805731B2 (en) 1999-01-29 2004-10-19 Mykrolis Corporation Hollow fiber membrane contactor
US6328905B1 (en) 1999-08-12 2001-12-11 Advanced Micro Devices, Inc. Residue removal by CO2 water rinse in conjunction with post metal etch plasma strip
US7264006B2 (en) 2000-09-01 2007-09-04 Mks Instruments, Inc. Ozonated water flow and concentration control apparatus and method
US7273549B2 (en) 2004-01-23 2007-09-25 Geoscience Support Services Inc. Membrane contactor apparatus including a module having hollow fiber membranes
WO2005072487A2 (en) 2004-01-27 2005-08-11 Entegris, Inc. Process for removing microbubbles from a liquid
WO2006007376A2 (en) 2004-06-16 2006-01-19 Advanced Technology Materials, Inc. Liquid delivery system

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
M. Meyer, Pflügers Archive European Journal of Physiology, Seiten 161-165, Bd. 375, Juli 1978

Also Published As

Publication number Publication date
US20140357734A1 (en) 2014-12-04
US8844909B2 (en) 2014-09-30
WO2009143056A1 (en) 2009-11-26
JP2011520609A (ja) 2011-07-21
TW201004707A (en) 2010-02-01
KR20110008319A (ko) 2011-01-26
CN104722239A (zh) 2015-06-24
US20110180148A1 (en) 2011-07-28
CN102036742B (zh) 2015-02-11
CN102036742A (zh) 2011-04-27

Similar Documents

Publication Publication Date Title
DE112009001233T5 (de) Begasungssysteme und Verfahren zur Herstellung von blasenfreien Lösungen von Gas in Flüssigkeit
DE112012001221B4 (de) System und Verfahren zum wahlweisen Spülen gelöster Gase aus Flüssigkeiten
KR101751626B1 (ko) 유량 조정 기구, 희석 약액 공급 기구, 액처리 장치 및 그 운용 방법
TWI895139B (zh) 產生包含具有氨氣溶於其中的去離子水之導電液體之系統及方法
DE102009051285A1 (de) Vorrichtung zum Steuern der Konzentration eines Materialgases
DE19842668A1 (de) Behandlungsvorrichtung
JP7099172B2 (ja) 電子部品用洗浄水製造システム及び電子部品用洗浄水製造システムの運転方法
JP2024032251A (ja) ウェハ洗浄水供給装置
EP1084002B1 (de) Verfahren und anlage zum reinigen von halbleiterelementen
KR102275626B1 (ko) 희석액 제조장치 및 희석액 제조방법
KR102662465B1 (ko) 기판 처리 장치 및 기판 처리 방법
JPH117324A (ja) 希薄溶液の製造方法および装置
WO2004051722A1 (de) Verfahren zum trocknen von substraten
WO2007034304A1 (en) Point-of-use process control blender systems and corresponding methods
CN110167661A (zh) 规定浓度水的供给方法及装置
JP2018103146A (ja) 希釈液製造装置および希釈液製造方法
JP2018103148A (ja) 希釈液製造装置および希釈液製造方法
JP2018103147A (ja) 希釈液製造装置および希釈液製造方法
WO2021181730A1 (ja) 希薄薬液供給装置
JP7099603B1 (ja) 半導体製造用液体供給装置
US20190367391A1 (en) Ammonia solution production device and ammonia solution production method
JP7049875B2 (ja) 希釈液製造方法および希釈液製造装置
AT526426A4 (de) Behandlungsvorrichtung und Verfahren zur Behandlung von Halbleiterobjekten
CN114340772A (zh) 稀溶液制造装置

Legal Events

Date Code Title Description
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee