JP2011517116A5 - - Google Patents
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- Publication number
- JP2011517116A5 JP2011517116A5 JP2011504110A JP2011504110A JP2011517116A5 JP 2011517116 A5 JP2011517116 A5 JP 2011517116A5 JP 2011504110 A JP2011504110 A JP 2011504110A JP 2011504110 A JP2011504110 A JP 2011504110A JP 2011517116 A5 JP2011517116 A5 JP 2011517116A5
- Authority
- JP
- Japan
- Prior art keywords
- chamber liner
- chamber
- liner
- annular
- quadrant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims 5
- 239000000758 substrate Substances 0.000 claims 5
- 238000005530 etching Methods 0.000 claims 2
- 239000012530 fluid Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/099,007 US7987814B2 (en) | 2008-04-07 | 2008-04-07 | Lower liner with integrated flow equalizer and improved conductance |
| US12/099,007 | 2008-04-07 | ||
| PCT/US2009/039662 WO2009126576A2 (en) | 2008-04-07 | 2009-04-06 | Lower liner with integrated flow equalizer and improved conductance |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011517116A JP2011517116A (ja) | 2011-05-26 |
| JP2011517116A5 true JP2011517116A5 (https=) | 2012-05-31 |
| JP5875864B2 JP5875864B2 (ja) | 2016-03-02 |
Family
ID=41132169
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011504110A Active JP5875864B2 (ja) | 2008-04-07 | 2009-04-06 | 統合型流量平衡器と改良されたコンダクタンスとを備える下部ライナ |
Country Status (6)
| Country | Link |
|---|---|
| US (4) | US7987814B2 (https=) |
| JP (1) | JP5875864B2 (https=) |
| KR (4) | KR20100135894A (https=) |
| CN (2) | CN101990789B (https=) |
| TW (4) | TWI435401B (https=) |
| WO (1) | WO2009126576A2 (https=) |
Families Citing this family (70)
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| JP4546303B2 (ja) | 2005-03-24 | 2010-09-15 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| US7762114B2 (en) * | 2005-09-09 | 2010-07-27 | Applied Materials, Inc. | Flow-formed chamber component having a textured surface |
| US7862683B2 (en) * | 2005-12-02 | 2011-01-04 | Tokyo Electron Limited | Chamber dry cleaning |
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2008
- 2008-04-07 US US12/099,007 patent/US7987814B2/en active Active
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2009
- 2009-03-31 TW TW102112934A patent/TWI435401B/zh active
- 2009-03-31 TW TW101140382A patent/TWI397144B/zh active
- 2009-03-31 TW TW098110720A patent/TWI387035B/zh active
- 2009-03-31 TW TW101140384A patent/TWI397145B/zh active
- 2009-04-06 CN CN2009801124193A patent/CN101990789B/zh not_active Expired - Fee Related
- 2009-04-06 WO PCT/US2009/039662 patent/WO2009126576A2/en not_active Ceased
- 2009-04-06 CN CN201310264587.2A patent/CN103402299B/zh not_active Expired - Fee Related
- 2009-04-06 KR KR1020107025094A patent/KR20100135894A/ko not_active Ceased
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