JP2011505377A5 - - Google Patents

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Publication number
JP2011505377A5
JP2011505377A5 JP2010536215A JP2010536215A JP2011505377A5 JP 2011505377 A5 JP2011505377 A5 JP 2011505377A5 JP 2010536215 A JP2010536215 A JP 2010536215A JP 2010536215 A JP2010536215 A JP 2010536215A JP 2011505377 A5 JP2011505377 A5 JP 2011505377A5
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JP
Japan
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composition
poloxamer
treatment
thermosensitive polymer
kit
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JP2010536215A
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English (en)
Japanese (ja)
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JP5613567B2 (ja
JP2011505377A (ja
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Priority claimed from PCT/US2008/085114 external-priority patent/WO2009070793A1/en
Publication of JP2011505377A publication Critical patent/JP2011505377A/ja
Publication of JP2011505377A5 publication Critical patent/JP2011505377A5/ja
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Publication of JP5613567B2 publication Critical patent/JP5613567B2/ja
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JP2010536215A 2007-11-29 2008-12-01 精製逆感熱性ポリマーを使用する内視鏡的粘膜切除 Active JP5613567B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US99104907P 2007-11-29 2007-11-29
US60/991,049 2007-11-29
PCT/US2008/085114 WO2009070793A1 (en) 2007-11-29 2008-12-01 Endoscopic mucosal resectioning using purified inverse thermosensitive polymers

Related Child Applications (1)

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JP2014113975A Division JP6049658B2 (ja) 2007-11-29 2014-06-02 精製逆感熱性ポリマーを使用する内視鏡的粘膜切除

Publications (3)

Publication Number Publication Date
JP2011505377A JP2011505377A (ja) 2011-02-24
JP2011505377A5 true JP2011505377A5 (enExample) 2012-06-07
JP5613567B2 JP5613567B2 (ja) 2014-10-22

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Family Applications (2)

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JP2010536215A Active JP5613567B2 (ja) 2007-11-29 2008-12-01 精製逆感熱性ポリマーを使用する内視鏡的粘膜切除
JP2014113975A Active JP6049658B2 (ja) 2007-11-29 2014-06-02 精製逆感熱性ポリマーを使用する内視鏡的粘膜切除

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JP2014113975A Active JP6049658B2 (ja) 2007-11-29 2014-06-02 精製逆感熱性ポリマーを使用する内視鏡的粘膜切除

Country Status (5)

Country Link
US (2) US20110052490A1 (enExample)
EP (1) EP2219546B1 (enExample)
JP (2) JP5613567B2 (enExample)
CN (1) CN107029277A (enExample)
WO (1) WO2009070793A1 (enExample)

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CN104835850B (zh) 2009-07-10 2018-10-26 株式会社半导体能源研究所 半导体器件
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CN107731931B (zh) 2009-10-21 2021-03-23 株式会社半导体能源研究所 显示装置和包括显示装置的电子设备
KR102321812B1 (ko) 2009-10-29 2021-11-03 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
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JP5784479B2 (ja) 2010-12-28 2015-09-24 株式会社半導体エネルギー研究所 半導体装置
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KR20130043063A (ko) 2011-10-19 2013-04-29 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 반도체 장치의 제작 방법
US8962386B2 (en) 2011-11-25 2015-02-24 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the same
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JP2014027263A (ja) 2012-06-15 2014-02-06 Semiconductor Energy Lab Co Ltd 半導体装置およびその作製方法
KR102072340B1 (ko) 2012-11-08 2020-01-31 가부시키가이샤 한도오따이 에네루기 켄큐쇼 금속 산화물 막 및 금속 산화물 막의 형성 방법
KR102442752B1 (ko) 2013-05-20 2022-09-14 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
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TWI667520B (zh) 2013-08-28 2019-08-01 日商半導體能源研究所股份有限公司 顯示裝置
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JP2016001712A (ja) 2013-11-29 2016-01-07 株式会社半導体エネルギー研究所 半導体装置の作製方法
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JP6736321B2 (ja) 2015-03-27 2020-08-05 株式会社半導体エネルギー研究所 半導体装置の製造方法
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