JP2011174167A5 - - Google Patents

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Publication number
JP2011174167A5
JP2011174167A5 JP2010170331A JP2010170331A JP2011174167A5 JP 2011174167 A5 JP2011174167 A5 JP 2011174167A5 JP 2010170331 A JP2010170331 A JP 2010170331A JP 2010170331 A JP2010170331 A JP 2010170331A JP 2011174167 A5 JP2011174167 A5 JP 2011174167A5
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JP
Japan
Prior art keywords
oxide film
copper
niobium
atoms
less
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JP2010170331A
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English (en)
Japanese (ja)
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JP5641402B2 (ja
JP2011174167A (ja
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Priority claimed from JP2010170331A external-priority patent/JP5641402B2/ja
Priority to JP2010170331A priority Critical patent/JP5641402B2/ja
Priority to KR1020127020398A priority patent/KR20120112716A/ko
Priority to PCT/JP2010/073700 priority patent/WO2011092993A1/ja
Priority to US13/576,567 priority patent/US20120301673A1/en
Priority to CN201080062959.8A priority patent/CN102741448B/zh
Publication of JP2011174167A publication Critical patent/JP2011174167A/ja
Publication of JP2011174167A5 publication Critical patent/JP2011174167A5/ja
Publication of JP5641402B2 publication Critical patent/JP5641402B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
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JP2010170331A 2010-02-01 2010-07-29 酸化物膜及びその製造方法、並びにターゲット及び酸化物焼結体の製造方法 Expired - Fee Related JP5641402B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2010170331A JP5641402B2 (ja) 2010-02-01 2010-07-29 酸化物膜及びその製造方法、並びにターゲット及び酸化物焼結体の製造方法
CN201080062959.8A CN102741448B (zh) 2010-02-01 2010-12-28 氧化物膜及其制造方法、与靶及氧化物烧结体的制造方法
PCT/JP2010/073700 WO2011092993A1 (ja) 2010-02-01 2010-12-28 酸化物膜及びその製造方法、並びにターゲット及び酸化物焼結体の製造方法
US13/576,567 US20120301673A1 (en) 2010-02-01 2010-12-28 Oxide film, process for producing same, target, and process for producing sintered oxide
KR1020127020398A KR20120112716A (ko) 2010-02-01 2010-12-28 산화물 막 및 그 제조 방법, 및 타겟 및 산화물 소결체의 제조 방법

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010020343 2010-02-01
JP2010020343 2010-02-01
JP2010170331A JP5641402B2 (ja) 2010-02-01 2010-07-29 酸化物膜及びその製造方法、並びにターゲット及び酸化物焼結体の製造方法

Publications (3)

Publication Number Publication Date
JP2011174167A JP2011174167A (ja) 2011-09-08
JP2011174167A5 true JP2011174167A5 (enExample) 2013-08-15
JP5641402B2 JP5641402B2 (ja) 2014-12-17

Family

ID=44318992

Family Applications (1)

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JP2010170331A Expired - Fee Related JP5641402B2 (ja) 2010-02-01 2010-07-29 酸化物膜及びその製造方法、並びにターゲット及び酸化物焼結体の製造方法

Country Status (5)

Country Link
US (1) US20120301673A1 (enExample)
JP (1) JP5641402B2 (enExample)
KR (1) KR20120112716A (enExample)
CN (1) CN102741448B (enExample)
WO (1) WO2011092993A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5996227B2 (ja) * 2012-03-26 2016-09-21 学校法人 龍谷大学 酸化物膜及びその製造方法
WO2015170534A1 (ja) * 2014-05-08 2015-11-12 三井金属鉱業株式会社 スパッタリングターゲット材
JP6503928B2 (ja) * 2015-06-29 2019-04-24 コニカミノルタ株式会社 電子写真感光体、画像形成装置および画像形成方法
KR102401226B1 (ko) * 2016-11-17 2022-05-24 니폰 가가쿠 고교 가부시키가이샤 아산화구리 입자, 그의 제조 방법, 광 소결형 조성물, 그것을 사용한 도전막의 형성 방법 및 아산화구리 입자 페이스트
JP7172902B2 (ja) * 2019-07-29 2022-11-16 トヨタ自動車株式会社 酸素吸蔵材
CN111678927A (zh) * 2020-06-08 2020-09-18 首钢集团有限公司 一种钢铁表面氧化物的分析方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3225049B2 (ja) * 1996-11-15 2001-11-05 シチズン時計株式会社 熱電素子の製造方法
JP4446064B2 (ja) * 2004-07-07 2010-04-07 独立行政法人産業技術総合研究所 熱電変換素子及び熱電変換モジュール
US7657377B2 (en) * 2007-05-31 2010-02-02 Cbg Corporation Azimuthal measurement-while-drilling (MWD) tool
JP2009047969A (ja) * 2007-08-21 2009-03-05 Seiko Epson Corp プロジェクタおよび表示装置
JP2009246085A (ja) * 2008-03-31 2009-10-22 Hitachi Ltd 半導体装置およびその製造方法
JP2010031346A (ja) * 2008-07-02 2010-02-12 Central Glass Co Ltd 酸化亜鉛薄膜及び薄膜積層体

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