JP2011073914A - ポリシリコン金属汚染防止方法 - Google Patents
ポリシリコン金属汚染防止方法 Download PDFInfo
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- JP2011073914A JP2011073914A JP2009226630A JP2009226630A JP2011073914A JP 2011073914 A JP2011073914 A JP 2011073914A JP 2009226630 A JP2009226630 A JP 2009226630A JP 2009226630 A JP2009226630 A JP 2009226630A JP 2011073914 A JP2011073914 A JP 2011073914A
- Authority
- JP
- Japan
- Prior art keywords
- polysilicon
- resin sheet
- resin
- metal
- metal contamination
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/03—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/02—Apparatus characterised by being constructed of material selected for its chemically-resistant properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B07—SEPARATING SOLIDS FROM SOLIDS; SORTING
- B07B—SEPARATING SOLIDS FROM SOLIDS BY SIEVING, SCREENING, SIFTING OR BY USING GAS CURRENTS; SEPARATING BY OTHER DRY METHODS APPLICABLE TO BULK MATERIAL, e.g. LOOSE ARTICLES FIT TO BE HANDLED LIKE BULK MATERIAL
- B07B13/00—Grading or sorting solid materials by dry methods, not otherwise provided for; Sorting articles otherwise than by indirectly controlled devices
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/005—Transport systems
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/007—Apparatus for preparing, pre-treating the source material to be used for crystal growth
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/02—Apparatus characterised by their chemically-resistant properties
- B01J2219/0204—Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components
- B01J2219/0245—Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components of synthetic organic material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49826—Assembling or joining
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49826—Assembling or joining
- Y10T29/49947—Assembling or joining by applying separate fastener
- Y10T29/49963—Threaded fastener
- Y10T29/49964—At least one part nonmetallic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/1352—Polymer or resin containing [i.e., natural or synthetic]
- Y10T428/1355—Elemental metal containing [e.g., substrate, foil, film, coating, etc.]
- Y10T428/1359—Three or more layers [continuous layer]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24008—Structurally defined web or sheet [e.g., overall dimension, etc.] including fastener for attaching to external surface
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
- Silicon Compounds (AREA)
- Laminated Bodies (AREA)
- Photovoltaic Devices (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
【解決手段】ポリシリコンが接触する金属部材の表面に樹脂製カバーを設けることにより、ポリシリコンと金属部材との接触によるポリシリコンの金属汚染を防止する方法において、樹脂製カバー3として、2枚の樹脂シート3a,3bを重ねて設けることを特徴とする。
【選択図】図2
Description
本発明の他の目的は、樹脂製カバーの摩耗を速やかに知見することができ、品質管理作業の負担を軽減することが可能なポリシリコンの金属汚染防止方法を提供することにある。
前記樹脂製カバーとして、2枚の樹脂シートを重ねて設けることを特徴とするポリシリコン金属汚染防止方法が提供される。
尚、上側樹脂シート3aの半透明の程度は、一般に、曇り度(ヘイズ)が20乃至90程度の範囲とすることが、上側樹脂シートの摩耗を、下側樹脂シートの色調が透過する度合いにより明瞭に確認することができ、交換時期を認識し易いため好ましい。即ち、上側樹脂シートの透明性が高く、下側樹脂シート3bの色調を始めから認識できる場合には、摩耗の進行度合いを認識することができないし、その不透明の度合いが高すぎる場合には、上側樹脂シート3aが摩耗し、下側樹脂シート3bの表面が露出するまで、上側樹脂シート3aの交換時期を認識することができないからである。
3:樹脂製カバー
3a:上側樹脂シート
3b:下側樹脂シート
5:樹脂製ボルト
Claims (5)
- ポリシリコンが接触する金属部材の表面に樹脂製カバーを設けることにより、ポリシリコンと金属部材との接触によるポリシリコンの金属汚染を防止する方法において、
前記樹脂製カバーとして、2枚の樹脂シートを重ねて設けることを特徴とするポリシリコン金属汚染防止方法。 - 前記樹脂製カバーを、樹脂製ボルトを用いて、2枚の樹脂シートを脱着自在に金属基板表面に取り付ける請求項1に記載のポリシリコン金属汚染防止方法。
- 前記2枚の樹脂シートとして、互いに柔軟性の異なるものを使用し、柔軟性の高い樹脂シートを下側に配置する請求項1または2に記載のポリシリコン金属汚染防止方法。
- 前記2枚の樹脂シートとして、互いに色調の異なるものを使用するポリシリコン金属汚染防止方法。
- 前記2枚の樹脂シートにおいて、下側樹脂シートとは色調の異なる上側樹脂シートとして、半透明のものを使用する請求項4に記載のポリシリコン金属汚染防止方法。
Priority Applications (12)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009226630A JP5455530B2 (ja) | 2009-09-30 | 2009-09-30 | ポリシリコン金属汚染防止方法 |
CN201410213828.5A CN103964442A (zh) | 2009-09-30 | 2010-09-17 | 多晶硅金属污染防止方法 |
US13/394,009 US9828250B2 (en) | 2009-09-30 | 2010-09-17 | Method of preventing polysilicon from being contaminated with metals |
CN201610131592.XA CN105752990A (zh) | 2009-09-30 | 2010-09-17 | 多晶硅金属污染防止方法和被多晶硅接触的构件 |
PCT/JP2010/066187 WO2011040269A1 (ja) | 2009-09-30 | 2010-09-17 | ポリシリコン金属汚染防止方法 |
MYPI2012000784A MY161117A (en) | 2009-09-30 | 2010-09-17 | Method of preventing polysilicon from being contaminated with metals |
CN2010800407268A CN102510835A (zh) | 2009-09-30 | 2010-09-17 | 多晶硅金属污染防止方法 |
RU2012116510/05A RU2012116510A (ru) | 2009-09-30 | 2010-09-17 | Способ предотвращения загрязнения поликремния металлами |
EP10820388.6A EP2484635A4 (en) | 2009-09-30 | 2010-09-17 | METHOD FOR PREVENTING METAL CONTAMINATION OF POLYSILICON |
KR20127005465A KR20120090953A (ko) | 2009-09-30 | 2010-09-17 | 폴리실리콘 금속 오염 방지 방법 |
TW103134726A TW201505851A (zh) | 2009-09-30 | 2010-09-20 | 多晶矽之金屬污染防止方法 |
TW099131800A TWI482735B (zh) | 2009-09-30 | 2010-09-20 | Method for preventing metal contamination of polysilicon |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009226630A JP5455530B2 (ja) | 2009-09-30 | 2009-09-30 | ポリシリコン金属汚染防止方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013242516A Division JP2014088311A (ja) | 2013-11-25 | 2013-11-25 | ポリシリコン金属汚染防止方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011073914A true JP2011073914A (ja) | 2011-04-14 |
JP5455530B2 JP5455530B2 (ja) | 2014-03-26 |
Family
ID=43826093
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009226630A Active JP5455530B2 (ja) | 2009-09-30 | 2009-09-30 | ポリシリコン金属汚染防止方法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US9828250B2 (ja) |
EP (1) | EP2484635A4 (ja) |
JP (1) | JP5455530B2 (ja) |
KR (1) | KR20120090953A (ja) |
CN (3) | CN105752990A (ja) |
MY (1) | MY161117A (ja) |
RU (1) | RU2012116510A (ja) |
TW (2) | TW201505851A (ja) |
WO (1) | WO2011040269A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013015119A1 (ja) * | 2011-07-25 | 2013-01-31 | 株式会社トクヤマ | ポリシリコン受け容器 |
JP2015535512A (ja) * | 2012-11-09 | 2015-12-14 | アールイーシー シリコン インコーポレイテッド | 多結晶シリコンの金属接触汚染を緩和する容器及び方法 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102014217179A1 (de) | 2014-08-28 | 2016-03-03 | Wacker Chemie Ag | Kunststoffsubstrate mit Siliciumbeschichtung |
US10005614B2 (en) | 2016-02-25 | 2018-06-26 | Hemlock Semiconductor Operations Llc | Surface conditioning of conveyor materials or contact surfaces |
CN108288598A (zh) * | 2018-01-17 | 2018-07-17 | 内蒙古日月太阳能科技有限责任公司 | 用于光伏晶体硅太阳电池的石墨舟的降温处理装置 |
US20220089341A1 (en) * | 2019-01-25 | 2022-03-24 | Tokuyama Corporation | Polycrystalline Silicon Lump, Packaging Body Thereof, and Method for Producing Same |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0348481U (ja) * | 1989-09-12 | 1991-05-09 | ||
JPH06100312A (ja) * | 1992-09-18 | 1994-04-12 | Toagosei Chem Ind Co Ltd | 顆粒状多結晶シリコン抜き出し装置 |
JPH11169795A (ja) * | 1997-12-17 | 1999-06-29 | Tokuyama Corp | 選別装置 |
JP2007051061A (ja) * | 2005-08-18 | 2007-03-01 | Wacker Chemie Ag | シリコンを粉砕する方法および装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4792493A (en) | 1986-10-07 | 1988-12-20 | Bertram Richard L | Corrosion resistant coating and liner combination |
JPS6474309A (en) * | 1987-09-14 | 1989-03-20 | Maezawa Kasei Kogyo Kk | Bolt made of plastic |
JPH03279288A (ja) * | 1990-03-29 | 1991-12-10 | Osaka Titanium Co Ltd | シリコン原料供給装置 |
JP2500556B2 (ja) * | 1991-11-27 | 1996-05-29 | 東洋製罐株式会社 | 耐衝撃性に優れたラミネ―ト絞り容器及びその製造法 |
US5626907A (en) * | 1994-02-26 | 1997-05-06 | E. I. Dupont De Nemours And Company | Process for coating metal surfaces with a fluororesin using a primer |
CA2191935C (en) * | 1995-12-04 | 2006-04-11 | Akio Kotani | Antifouling wall structure, method of constructing antifouling wall and antifouling wall panel transporter therefor |
US20020081435A1 (en) | 2000-12-21 | 2002-06-27 | Dimitris Katsamberis | Coated article with epoxy urethane based polymeric basecoat |
US20040000746A1 (en) * | 2002-06-28 | 2004-01-01 | Montagna John C. | Method of manufacturing laminated bed and bed liner |
CN2589063Y (zh) * | 2002-12-24 | 2003-12-03 | 陈定 | 大型壳体防护衬里安装结构 |
JP2005142319A (ja) | 2003-11-06 | 2005-06-02 | Renesas Technology Corp | 半導体装置の製造方法 |
US7270706B2 (en) * | 2004-10-04 | 2007-09-18 | Dow Corning Corporation | Roll crusher to produce high purity polycrystalline silicon chips |
WO2007069921A1 (en) * | 2005-12-16 | 2007-06-21 | Skellerup Industries Limited | Chutes and modules therefor |
-
2009
- 2009-09-30 JP JP2009226630A patent/JP5455530B2/ja active Active
-
2010
- 2010-09-17 CN CN201610131592.XA patent/CN105752990A/zh active Pending
- 2010-09-17 EP EP10820388.6A patent/EP2484635A4/en not_active Withdrawn
- 2010-09-17 RU RU2012116510/05A patent/RU2012116510A/ru not_active Application Discontinuation
- 2010-09-17 CN CN2010800407268A patent/CN102510835A/zh active Pending
- 2010-09-17 US US13/394,009 patent/US9828250B2/en active Active
- 2010-09-17 KR KR20127005465A patent/KR20120090953A/ko not_active Application Discontinuation
- 2010-09-17 WO PCT/JP2010/066187 patent/WO2011040269A1/ja active Application Filing
- 2010-09-17 CN CN201410213828.5A patent/CN103964442A/zh active Pending
- 2010-09-17 MY MYPI2012000784A patent/MY161117A/en unknown
- 2010-09-20 TW TW103134726A patent/TW201505851A/zh unknown
- 2010-09-20 TW TW099131800A patent/TWI482735B/zh not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0348481U (ja) * | 1989-09-12 | 1991-05-09 | ||
JPH06100312A (ja) * | 1992-09-18 | 1994-04-12 | Toagosei Chem Ind Co Ltd | 顆粒状多結晶シリコン抜き出し装置 |
JPH11169795A (ja) * | 1997-12-17 | 1999-06-29 | Tokuyama Corp | 選別装置 |
JP2007051061A (ja) * | 2005-08-18 | 2007-03-01 | Wacker Chemie Ag | シリコンを粉砕する方法および装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013015119A1 (ja) * | 2011-07-25 | 2013-01-31 | 株式会社トクヤマ | ポリシリコン受け容器 |
JP2015535512A (ja) * | 2012-11-09 | 2015-12-14 | アールイーシー シリコン インコーポレイテッド | 多結晶シリコンの金属接触汚染を緩和する容器及び方法 |
Also Published As
Publication number | Publication date |
---|---|
CN102510835A (zh) | 2012-06-20 |
TW201132584A (en) | 2011-10-01 |
US20120156413A1 (en) | 2012-06-21 |
TW201505851A (zh) | 2015-02-16 |
JP5455530B2 (ja) | 2014-03-26 |
MY161117A (en) | 2017-04-14 |
TWI482735B (zh) | 2015-05-01 |
WO2011040269A1 (ja) | 2011-04-07 |
CN105752990A (zh) | 2016-07-13 |
EP2484635A1 (en) | 2012-08-08 |
RU2012116510A (ru) | 2013-10-27 |
EP2484635A4 (en) | 2015-08-26 |
KR20120090953A (ko) | 2012-08-17 |
CN103964442A (zh) | 2014-08-06 |
US9828250B2 (en) | 2017-11-28 |
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