JP2011054790A5 - - Google Patents

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Publication number
JP2011054790A5
JP2011054790A5 JP2009202843A JP2009202843A JP2011054790A5 JP 2011054790 A5 JP2011054790 A5 JP 2011054790A5 JP 2009202843 A JP2009202843 A JP 2009202843A JP 2009202843 A JP2009202843 A JP 2009202843A JP 2011054790 A5 JP2011054790 A5 JP 2011054790A5
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JP
Japan
Prior art keywords
substrate
processing liquid
nozzle body
processing
width direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009202843A
Other languages
English (en)
Japanese (ja)
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JP2011054790A (ja
JP5352388B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2009202843A priority Critical patent/JP5352388B2/ja
Priority claimed from JP2009202843A external-priority patent/JP5352388B2/ja
Priority to TW099127759A priority patent/TWI431676B/zh
Priority to CN2010102706711A priority patent/CN102001834B/zh
Priority to KR1020100085441A priority patent/KR101153050B1/ko
Publication of JP2011054790A publication Critical patent/JP2011054790A/ja
Publication of JP2011054790A5 publication Critical patent/JP2011054790A5/ja
Application granted granted Critical
Publication of JP5352388B2 publication Critical patent/JP5352388B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009202843A 2009-09-02 2009-09-02 基板の処理装置及び処理方法 Active JP5352388B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2009202843A JP5352388B2 (ja) 2009-09-02 2009-09-02 基板の処理装置及び処理方法
TW099127759A TWI431676B (zh) 2009-09-02 2010-08-19 Substrate processing device and processing method thereof
CN2010102706711A CN102001834B (zh) 2009-09-02 2010-09-01 基板的处理装置及处理方法
KR1020100085441A KR101153050B1 (ko) 2009-09-02 2010-09-01 기판의 처리 장치 및 처리 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009202843A JP5352388B2 (ja) 2009-09-02 2009-09-02 基板の処理装置及び処理方法

Publications (3)

Publication Number Publication Date
JP2011054790A JP2011054790A (ja) 2011-03-17
JP2011054790A5 true JP2011054790A5 (enrdf_load_stackoverflow) 2013-02-14
JP5352388B2 JP5352388B2 (ja) 2013-11-27

Family

ID=43809579

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009202843A Active JP5352388B2 (ja) 2009-09-02 2009-09-02 基板の処理装置及び処理方法

Country Status (4)

Country Link
JP (1) JP5352388B2 (enrdf_load_stackoverflow)
KR (1) KR101153050B1 (enrdf_load_stackoverflow)
CN (1) CN102001834B (enrdf_load_stackoverflow)
TW (1) TWI431676B (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5317304B2 (ja) * 2012-01-31 2013-10-16 株式会社Ｎｓｃ 化学研磨装置
JP2014110592A (ja) * 2012-12-04 2014-06-12 Toshiba Corp 画像処理装置
CN105967529A (zh) * 2016-05-13 2016-09-28 多氟多化工股份有限公司 一种ag玻璃加工流水线及其玻璃输送设备
JP7312738B2 (ja) * 2020-12-11 2023-07-21 芝浦メカトロニクス株式会社 基板処理装置
CN113292246B (zh) * 2021-06-02 2022-05-17 中建材玻璃新材料研究院集团有限公司 一种用于玻璃减薄的连续生产装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3978065B2 (ja) * 2002-03-28 2007-09-19 芝浦メカトロニクス株式会社 基板の処理装置及び処理方法
JP3689390B2 (ja) * 2002-06-25 2005-08-31 松下電工株式会社 基材の液処理方法
JP2004055711A (ja) * 2002-07-18 2004-02-19 Tokyo Kakoki Kk 基板処理装置
JP2004275989A (ja) * 2003-03-19 2004-10-07 Sumitomo Precision Prod Co Ltd 基板処理装置
JP4495618B2 (ja) * 2004-03-29 2010-07-07 芝浦メカトロニクス株式会社 基板の処理装置及び処理方法
JP2006135162A (ja) * 2004-11-08 2006-05-25 Fuji Photo Film Co Ltd 噴霧方法および装置
JP2007088289A (ja) 2005-09-22 2007-04-05 Sharp Corp 基板処理装置および基板処理方法
JP4859242B2 (ja) * 2006-07-27 2012-01-25 芝浦メカトロニクス株式会社 基板の処理装置

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