JP2011051878A5 - - Google Patents
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- Publication number
- JP2011051878A5 JP2011051878A5 JP2010114295A JP2010114295A JP2011051878A5 JP 2011051878 A5 JP2011051878 A5 JP 2011051878A5 JP 2010114295 A JP2010114295 A JP 2010114295A JP 2010114295 A JP2010114295 A JP 2010114295A JP 2011051878 A5 JP2011051878 A5 JP 2011051878A5
- Authority
- JP
- Japan
- Prior art keywords
- silica fine
- mesoporous silica
- fine particles
- mesoporous
- molecule
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 62
- 239000000377 silicon dioxide Substances 0.000 claims description 28
- 239000010419 fine particle Substances 0.000 claims description 26
- 125000000524 functional group Chemical group 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 6
- 239000011148 porous material Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 9
- 239000004094 surface-active agent Substances 0.000 claims 9
- 150000003961 organosilicon compounds Chemical class 0.000 claims 8
- 239000002131 composite material Substances 0.000 claims 6
- 238000000034 method Methods 0.000 claims 6
- 230000002209 hydrophobic effect Effects 0.000 claims 5
- 239000002253 acid Substances 0.000 claims 2
- 239000000654 additive Substances 0.000 claims 2
- 230000000996 additive effect Effects 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- 239000003513 alkali Substances 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 239000012295 chemical reaction liquid Substances 0.000 claims 1
- 239000006185 dispersion Substances 0.000 claims 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000000693 micelle Substances 0.000 claims 1
- 238000000465 moulding Methods 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- 239000011859 microparticle Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010114295A JP5624361B2 (ja) | 2009-08-07 | 2010-05-18 | メソポーラスシリカ微粒子の製造方法、メソポーラスシリカ微粒子、メソポーラスシリカ微粒子分散液、メソポーラスシリカ微粒子含有組成物、及びメソポーラスシリカ微粒子含有成型物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009185014 | 2009-08-07 | ||
| JP2009185014 | 2009-08-07 | ||
| JP2010114295A JP5624361B2 (ja) | 2009-08-07 | 2010-05-18 | メソポーラスシリカ微粒子の製造方法、メソポーラスシリカ微粒子、メソポーラスシリカ微粒子分散液、メソポーラスシリカ微粒子含有組成物、及びメソポーラスシリカ微粒子含有成型物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011051878A JP2011051878A (ja) | 2011-03-17 |
| JP2011051878A5 true JP2011051878A5 (enExample) | 2013-04-25 |
| JP5624361B2 JP5624361B2 (ja) | 2014-11-12 |
Family
ID=43544181
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010114295A Active JP5624361B2 (ja) | 2009-08-07 | 2010-05-18 | メソポーラスシリカ微粒子の製造方法、メソポーラスシリカ微粒子、メソポーラスシリカ微粒子分散液、メソポーラスシリカ微粒子含有組成物、及びメソポーラスシリカ微粒子含有成型物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8999052B2 (enExample) |
| EP (1) | EP2463236A4 (enExample) |
| JP (1) | JP5624361B2 (enExample) |
| KR (1) | KR101439216B1 (enExample) |
| CN (1) | CN102574693B (enExample) |
| TW (1) | TW201105581A (enExample) |
| WO (1) | WO2011016277A1 (enExample) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2463236A4 (en) * | 2009-08-07 | 2015-05-06 | Panasonic Corp | METHOD FOR PRODUCING TEN MESOPOROUS SILICON PARTICLES, FINE MESOPOROUS SILICON PARTICLES, LIQUID DISPERSION FROM FINE MESOPOROUS SILICON PARTICLES, COMPOSITION WITH FINE MESOPOROUS SILICON PARTICLES AND MOLDING MATERIALS WITH FINE MESOPOROUS SILICON PARTICLES |
| WO2012038457A1 (en) * | 2010-09-23 | 2012-03-29 | Nanolith Sverige Ab | Manufacture of structures comprising silicon dioxide on a surface |
| KR101918335B1 (ko) * | 2011-08-17 | 2018-11-13 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 나노구조화된 물품 및 이의 제조 방법 |
| JP6004528B2 (ja) * | 2011-08-29 | 2016-10-12 | 地方独立行政法人東京都立産業技術研究センター | 多孔質シリカ内包粒子の製造方法および多孔質シリカ |
| US20130196140A1 (en) * | 2012-01-30 | 2013-08-01 | Guardian Industries Corp. | Coated article with antireflection coating including porous nanoparticles, and/or method of making the same |
| BR112014018980A8 (pt) * | 2012-02-01 | 2017-07-11 | 3M Innovative Properties Company | Materiais nanoestruturados e métodos para a produção dos mesmos |
| US10059622B2 (en) | 2012-05-07 | 2018-08-28 | Guardian Glass, LLC | Anti-reflection glass with tin oxide nanoparticles |
| EP2752386B1 (en) * | 2012-12-13 | 2019-08-28 | Guardian Glass, LLC | Method of making coated article including anti-reflection coating with porosity differences in two layers, and products containing the same |
| EP2752388A1 (en) * | 2012-12-13 | 2014-07-09 | Guardian Industries Corp. | Method of making coated article including anti-reflection coating and products containing the same |
| EP2752387B1 (en) * | 2012-12-13 | 2018-06-27 | Guardian Glass, LLC | Method of making coated article including anti-reflection coating with double coating layers including mesoporous materials, and products containing the same |
| JP6153093B2 (ja) * | 2013-09-03 | 2017-06-28 | 株式会社豊田中央研究所 | 反射防止膜及びその製造方法 |
| JP6323861B2 (ja) * | 2013-09-04 | 2018-05-16 | リコーイメージング株式会社 | 表面修飾メソポーラスシリカナノ粒子の製造方法 |
| JP2017509471A (ja) | 2013-12-11 | 2017-04-06 | スリーエム イノベイティブ プロパティズ カンパニー | 反射防止に有用なシロキサンナノ粒子コーティング |
| CN103738970B (zh) * | 2013-12-25 | 2015-06-24 | 上海纳米技术及应用国家工程研究中心有限公司 | 高透过率纳米多孔气凝胶材料及其制备方法 |
| US10451771B2 (en) * | 2014-11-10 | 2019-10-22 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Antireflection member, transfer member, and method for producing antireflection member |
| CN107207876B (zh) * | 2014-11-26 | 2019-01-01 | 电化株式会社 | 二氧化硅覆盖碳黑及使用其的电极用组合物、二次电池用电极以及二次电池 |
| US10434496B2 (en) | 2016-03-29 | 2019-10-08 | Agilent Technologies, Inc. | Superficially porous particles with dual pore structure and methods for making the same |
| WO2020016034A1 (en) * | 2018-07-17 | 2020-01-23 | Evonik Operations Gmbh | Thermal insulating composition based on fumed silica granulates, processes for its preparation and uses thereof |
| JP7480070B2 (ja) * | 2021-01-15 | 2024-05-09 | 株式会社豊田中央研究所 | 冷却液 |
| CN112920499B (zh) * | 2021-01-31 | 2022-07-12 | 温州强大新材料科技有限公司 | 一种用于防护服和雨衣的eva膜及其制备工艺 |
| CN112919483B (zh) * | 2021-04-13 | 2023-07-18 | 扬州大学 | 一种双模板法制备介孔二氧化硅纳米球的方法 |
| CN119100408B (zh) * | 2024-11-08 | 2025-02-21 | 内蒙古大学 | 一种凹凸曲率可调的介孔SiO2纳米颗粒的制备方法和应用 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19601415A1 (de) * | 1995-02-04 | 1996-08-08 | Degussa | Granulate auf Basis von pyrogen hergestelltem Siliciumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung |
| JP4046921B2 (ja) | 2000-02-24 | 2008-02-13 | 触媒化成工業株式会社 | シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材 |
| WO2001081487A1 (en) * | 2000-04-21 | 2001-11-01 | Science & Technology Corporation @ Unm | Prototyping of patterned functional nanostructures |
| CA2317056A1 (en) * | 2000-08-25 | 2002-02-25 | Universite Laval | Formation of hydrophilic sites in partially silylated micelle templated silica |
| KR100783714B1 (ko) * | 2001-10-25 | 2007-12-07 | 마츠시다 덴코 가부시키가이샤 | 코팅재 조성물 및 그것에 의해 형성된 피막을 가지는 물품 |
| JP2004083307A (ja) | 2002-08-23 | 2004-03-18 | Sumitomo Osaka Cement Co Ltd | シリカ微粒子と低屈折率膜形成用塗料、及び低屈折率膜とその製造方法、並びに反射防止膜 |
| KR100715296B1 (ko) | 2003-07-29 | 2007-05-08 | 가부시끼가이샤 도꾸야마 | 중세공성 실리카 미립자 및 그 제조 방법 |
| JP4519433B2 (ja) | 2003-09-17 | 2010-08-04 | 株式会社トクヤマ | 微粒子状メソポーラスシリカ |
| JP4737922B2 (ja) * | 2003-07-29 | 2011-08-03 | 株式会社トクヤマ | 微粒子状メソポーラスシリカの製造方法 |
| CN1186253C (zh) * | 2003-08-12 | 2005-01-26 | 上海交通大学 | 介孔二氧化硅球形纳米颗粒的制备方法 |
| CN1715184A (zh) * | 2004-06-28 | 2006-01-04 | 中国科学院理化技术研究所 | 球形介孔二氧化硅的制备方法 |
| JP4671216B2 (ja) * | 2004-08-31 | 2011-04-13 | 国立大学法人 宮崎大学 | ミクロ孔を有するメソポーラスシリカナノ粒子及びその製造方法 |
| DK1801145T3 (da) * | 2004-09-13 | 2009-02-16 | Asahi Kasei Chemicals Corp | Fremgangsmåde til fremstilling af et hærdet produkt af lysfölsomt resin |
| US20060130855A1 (en) * | 2004-09-28 | 2006-06-22 | Philip Morris Usa Inc. | Smoking article with mercaptopropyl functionalized sorbent and method |
| CN100384726C (zh) * | 2005-05-19 | 2008-04-30 | 同济大学 | 表面活性可调的纳米多孔二氧化硅气凝胶及其制备方法 |
| JP2007161518A (ja) | 2005-12-13 | 2007-06-28 | Sumitomo Osaka Cement Co Ltd | 低誘電率フィラーと、これを用いた低誘電率組成物および低誘電率膜 |
| US8048394B2 (en) * | 2006-10-31 | 2011-11-01 | Kao Corporation | Mesoporous silica particles |
| US7868198B2 (en) * | 2007-06-15 | 2011-01-11 | Laine Richard M | Multi-functional silsesquioxanes for novel coating applications |
| JP2009040965A (ja) | 2007-08-10 | 2009-02-26 | Panasonic Electric Works Co Ltd | 低誘電率被膜形成用樹脂組成物、低誘電率被膜、低誘電率被膜の製造方法 |
| JP2009040966A (ja) | 2007-08-10 | 2009-02-26 | Panasonic Electric Works Co Ltd | 低熱伝導率被膜形成用樹脂組成物、低熱伝導率被膜、低熱伝導率被膜の製造方法 |
| JP5179115B2 (ja) | 2007-08-10 | 2013-04-10 | パナソニック株式会社 | 低屈折率被膜形成用樹脂組成物、低屈折率被膜、反射防止基材 |
| JP5426869B2 (ja) | 2008-11-19 | 2014-02-26 | パナソニック株式会社 | メソポーラスシリカ微粒子の製造方法、メソポーラスシリカ微粒子含有組成物、及びメソポーラスシリカ微粒子含有成型物 |
| US20110048282A1 (en) * | 2009-07-29 | 2011-03-03 | Quijada Abarca Raul | Hybrid nanoparticles with controlled morphology and their use in thermoplastic polymer matrix nanocomposites |
| EP2463236A4 (en) * | 2009-08-07 | 2015-05-06 | Panasonic Corp | METHOD FOR PRODUCING TEN MESOPOROUS SILICON PARTICLES, FINE MESOPOROUS SILICON PARTICLES, LIQUID DISPERSION FROM FINE MESOPOROUS SILICON PARTICLES, COMPOSITION WITH FINE MESOPOROUS SILICON PARTICLES AND MOLDING MATERIALS WITH FINE MESOPOROUS SILICON PARTICLES |
-
2010
- 2010-05-18 EP EP10806277.9A patent/EP2463236A4/en not_active Withdrawn
- 2010-05-18 JP JP2010114295A patent/JP5624361B2/ja active Active
- 2010-05-18 US US13/389,095 patent/US8999052B2/en active Active
- 2010-05-18 KR KR1020127006057A patent/KR101439216B1/ko not_active Expired - Fee Related
- 2010-05-18 CN CN201080035044.8A patent/CN102574693B/zh active Active
- 2010-05-18 WO PCT/JP2010/058367 patent/WO2011016277A1/ja not_active Ceased
- 2010-05-19 TW TW099115926A patent/TW201105581A/zh unknown
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