JP2011023425A - ステージ装置、露光装置及びデバイス製造方法 - Google Patents

ステージ装置、露光装置及びデバイス製造方法 Download PDF

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Publication number
JP2011023425A
JP2011023425A JP2009165048A JP2009165048A JP2011023425A JP 2011023425 A JP2011023425 A JP 2011023425A JP 2009165048 A JP2009165048 A JP 2009165048A JP 2009165048 A JP2009165048 A JP 2009165048A JP 2011023425 A JP2011023425 A JP 2011023425A
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JP
Japan
Prior art keywords
reticle
stage
plate member
sealed space
positioning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009165048A
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English (en)
Japanese (ja)
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JP2011023425A5 (enExample
Inventor
Kana Koike
香奈 小池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2009165048A priority Critical patent/JP2011023425A/ja
Priority to US12/835,465 priority patent/US8456618B2/en
Publication of JP2011023425A publication Critical patent/JP2011023425A/ja
Publication of JP2011023425A5 publication Critical patent/JP2011023425A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/62—Holders for the original
    • G03B27/64—Holders for the original using a vacuum or fluid pressure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2009165048A 2009-07-13 2009-07-13 ステージ装置、露光装置及びデバイス製造方法 Pending JP2011023425A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009165048A JP2011023425A (ja) 2009-07-13 2009-07-13 ステージ装置、露光装置及びデバイス製造方法
US12/835,465 US8456618B2 (en) 2009-07-13 2010-07-13 Stage apparatus, exposure apparatus, and method of manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009165048A JP2011023425A (ja) 2009-07-13 2009-07-13 ステージ装置、露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2011023425A true JP2011023425A (ja) 2011-02-03
JP2011023425A5 JP2011023425A5 (enExample) 2012-08-30

Family

ID=43427218

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009165048A Pending JP2011023425A (ja) 2009-07-13 2009-07-13 ステージ装置、露光装置及びデバイス製造方法

Country Status (2)

Country Link
US (1) US8456618B2 (enExample)
JP (1) JP2011023425A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015095494A (ja) * 2013-11-08 2015-05-18 キヤノン株式会社 原版保持装置、露光装置、物品の製造方法、および原版保持方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011023425A (ja) * 2009-07-13 2011-02-03 Canon Inc ステージ装置、露光装置及びデバイス製造方法
JP2012006088A (ja) * 2010-06-22 2012-01-12 Hitachi High-Technologies Corp ワーク端部検出機構及びワーク搬送機構
JP5873251B2 (ja) * 2011-04-28 2016-03-01 キヤノンアネルバ株式会社 基板トレイ及び該トレイを用いた基板処理装置
JP6788125B2 (ja) 2017-02-10 2020-11-18 エーエスエムエル ホールディング エヌ．ブイ． レチクルクランプデバイス
CN116107156B (zh) * 2023-04-11 2023-06-23 深圳市龙图光罩股份有限公司 掩模版刻蚀设备、方法、系统及计算机可读存储介质

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08153665A (ja) * 1994-11-29 1996-06-11 Toshiba Corp 基板の保持装置
JPH1140657A (ja) * 1997-07-23 1999-02-12 Nikon Corp 試料保持装置および走査型露光装置
JPH11226479A (ja) * 1998-02-18 1999-08-24 Dainippon Screen Mfg Co Ltd ステージ旋回装置および基板処理システム
JP2000299370A (ja) * 1999-04-16 2000-10-24 Canon Inc 試料保持装置およびこの保持装置を用いた露光装置
JP2004078108A (ja) * 2002-08-22 2004-03-11 Hitachi Electronics Eng Co Ltd 露光装置のマスク板固定治具
JP2005235890A (ja) * 2004-02-18 2005-09-02 Canon Inc 露光装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6157441A (en) * 1999-03-11 2000-12-05 Olec Corporation Film on glass imaging fixtures and method
JP2011023425A (ja) * 2009-07-13 2011-02-03 Canon Inc ステージ装置、露光装置及びデバイス製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08153665A (ja) * 1994-11-29 1996-06-11 Toshiba Corp 基板の保持装置
JPH1140657A (ja) * 1997-07-23 1999-02-12 Nikon Corp 試料保持装置および走査型露光装置
JPH11226479A (ja) * 1998-02-18 1999-08-24 Dainippon Screen Mfg Co Ltd ステージ旋回装置および基板処理システム
JP2000299370A (ja) * 1999-04-16 2000-10-24 Canon Inc 試料保持装置およびこの保持装置を用いた露光装置
JP2004078108A (ja) * 2002-08-22 2004-03-11 Hitachi Electronics Eng Co Ltd 露光装置のマスク板固定治具
JP2005235890A (ja) * 2004-02-18 2005-09-02 Canon Inc 露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015095494A (ja) * 2013-11-08 2015-05-18 キヤノン株式会社 原版保持装置、露光装置、物品の製造方法、および原版保持方法
US9665015B2 (en) 2013-11-08 2017-05-30 Canon Kabushiki Kaisha Original holding apparatus, exposure apparatus, method of manufacturing article and original holding method

Also Published As

Publication number Publication date
US20110007297A1 (en) 2011-01-13
US8456618B2 (en) 2013-06-04

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