JP2010541196A5 - - Google Patents
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- Publication number
- JP2010541196A5 JP2010541196A5 JP2010525264A JP2010525264A JP2010541196A5 JP 2010541196 A5 JP2010541196 A5 JP 2010541196A5 JP 2010525264 A JP2010525264 A JP 2010525264A JP 2010525264 A JP2010525264 A JP 2010525264A JP 2010541196 A5 JP2010541196 A5 JP 2010541196A5
- Authority
- JP
- Japan
- Prior art keywords
- support
- electrostatic clamp
- clamp
- electrode
- electrostatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/902,501 US7940511B2 (en) | 2007-09-21 | 2007-09-21 | Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp |
| US11/902,501 | 2007-09-21 | ||
| PCT/EP2008/007916 WO2009036995A1 (en) | 2007-09-21 | 2008-09-19 | Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010541196A JP2010541196A (ja) | 2010-12-24 |
| JP2010541196A5 true JP2010541196A5 (https=) | 2011-11-04 |
| JP5524845B2 JP5524845B2 (ja) | 2014-06-18 |
Family
ID=39929545
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010525264A Active JP5524845B2 (ja) | 2007-09-21 | 2008-09-19 | 静電クランプ、リソグラフィ装置および静電クランプを製造する方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US7940511B2 (https=) |
| EP (1) | EP2208224B1 (https=) |
| JP (1) | JP5524845B2 (https=) |
| KR (1) | KR101533014B1 (https=) |
| CN (1) | CN101803001B (https=) |
| NL (1) | NL1035888A1 (https=) |
| TW (1) | TWI446482B (https=) |
| WO (1) | WO2009036995A1 (https=) |
Families Citing this family (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7940511B2 (en) * | 2007-09-21 | 2011-05-10 | Asml Netherlands B.V. | Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp |
| JP2010161319A (ja) * | 2009-01-09 | 2010-07-22 | Nikon Corp | 静電吸着保持装置、露光装置及びデバイスの製造方法 |
| JP5269128B2 (ja) | 2010-03-12 | 2013-08-21 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置および方法 |
| WO2012005294A1 (ja) * | 2010-07-09 | 2012-01-12 | 株式会社クリエイティブ テクノロジー | 静電チャック装置及びその製造方法 |
| WO2012076207A1 (en) * | 2010-12-08 | 2012-06-14 | Asml Holding N.V. | Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp |
| NL2007768A (en) | 2010-12-14 | 2012-06-18 | Asml Netherlands Bv | Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder. |
| EP2490073B1 (en) * | 2011-02-18 | 2015-09-23 | ASML Netherlands BV | Substrate holder, lithographic apparatus, and method of manufacturing a substrate holder |
| WO2012110144A1 (en) * | 2011-02-18 | 2012-08-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method. |
| WO2012123188A1 (en) * | 2011-03-17 | 2012-09-20 | Asml Netherlands B.V. | Electrostatic clamp, lithographic apparatus, and device manufacturing method |
| NL2008630A (en) * | 2011-04-27 | 2012-10-30 | Asml Netherlands Bv | Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder. |
| NL2009487A (en) * | 2011-10-14 | 2013-04-16 | Asml Netherlands Bv | Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder. |
| EP3683627A1 (en) | 2012-02-03 | 2020-07-22 | ASML Netherlands B.V. | Substrate holder and lithographic apparatus |
| EP2839506B1 (en) | 2012-02-29 | 2016-08-24 | ASML Netherlands B.V. | Electrostatic clamp |
| WO2014012749A1 (en) * | 2012-07-17 | 2014-01-23 | Asml Netherlands B.V. | Electrostatic clamp, lithographic apparatus and method |
| US9104113B2 (en) | 2013-01-07 | 2015-08-11 | International Business Machines Corporation | Amplification method for photoresist exposure in semiconductor chip manufacturing |
| US9541846B2 (en) | 2013-09-06 | 2017-01-10 | Taiwan Semiconductor Manufacturing Co., Ltd. | Homogeneous thermal equalization with active device |
| US9101038B2 (en) | 2013-12-20 | 2015-08-04 | Lam Research Corporation | Electrostatic chuck including declamping electrode and method of declamping |
| DE102014008031B4 (de) * | 2014-05-28 | 2020-06-25 | Berliner Glas Kgaa Herbert Kubatz Gmbh & Co. | Elektrostatische Haltevorrichtung mit einer Keramik-Elektrode und Verfahren zur Herstellung einer solchen Haltevorrichtung |
| TWI656596B (zh) | 2014-08-26 | 2019-04-11 | Asml Holding N. V. | 靜電夾具及其製造方法 |
| US10002782B2 (en) | 2014-10-17 | 2018-06-19 | Lam Research Corporation | ESC assembly including an electrically conductive gasket for uniform RF power delivery therethrough |
| EP3262677B1 (en) * | 2015-02-23 | 2025-11-26 | II-VI Delaware, Inc. | Film electrode for electrostatic chuck |
| JP6650345B2 (ja) * | 2016-05-26 | 2020-02-19 | 日本特殊陶業株式会社 | 基板保持装置及びその製造方法 |
| US20180374736A1 (en) * | 2017-06-22 | 2018-12-27 | Applied Materials, Inc. | Electrostatic carrier for die bonding applications |
| DE102018116463A1 (de) * | 2018-07-06 | 2020-01-09 | Berliner Glas Kgaa Herbert Kubatz Gmbh & Co. | Elektrostatische Haltevorrichtung und Verfahren zu deren Herstellung |
| KR102928856B1 (ko) * | 2019-02-08 | 2026-02-20 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치에서 사용하기 위한 컴포넌트, 컴포넌트의 제조 방법, 및 리소그래피 장치에서 테이블을 보호하는 방법 |
| DE102019108855B4 (de) * | 2019-04-04 | 2020-11-12 | Berliner Glas Kgaa Herbert Kubatz Gmbh & Co. | Elektrostatische Haltevorrichtung mit einer Schichtverbund-Elektrodeneinrichtung und Verfahren zu deren Herstellung |
| KR102859857B1 (ko) * | 2019-05-24 | 2025-09-12 | 에이에스엠엘 홀딩 엔.브이. | 리소그래피 장치, 기판 테이블 및 방법 |
| WO2021095492A1 (ja) * | 2019-11-15 | 2021-05-20 | 株式会社堀場エステック | 流体抵抗素子及び流体制御装置 |
| US11817293B2 (en) * | 2020-01-10 | 2023-11-14 | The Research Foundation For The State University Of New York | Photoresist layers of semiconductor components including electric fields, system, and methods of forming same |
| US11538714B2 (en) * | 2020-05-21 | 2022-12-27 | Applied Materials, Inc. | System apparatus and method for enhancing electrical clamping of substrates using photo-illumination |
| US11875967B2 (en) | 2020-05-21 | 2024-01-16 | Applied Materials, Inc. | System apparatus and method for enhancing electrical clamping of substrates using photo-illumination |
| EP3923077A1 (en) * | 2020-06-11 | 2021-12-15 | ASML Netherlands B.V. | Object holder, electrostatic sheet and method for making an electrostatic sheet |
| EP4002010A1 (en) * | 2020-11-18 | 2022-05-25 | ASML Netherlands B.V. | Electrostatic clamp |
| WO2022144144A1 (en) * | 2020-12-29 | 2022-07-07 | Asml Holding N.V. | Vacuum sheet bond fixturing and flexible burl applications for substrate tables |
| EP4053634A1 (en) | 2021-03-02 | 2022-09-07 | ASML Netherlands B.V. | Substrate restraining system |
| TW202243107A (zh) * | 2021-03-18 | 2022-11-01 | 荷蘭商Asml荷蘭公司 | 用於經改良疊對之夾具電極修改 |
| EP4105720A1 (en) * | 2021-06-16 | 2022-12-21 | ASML Netherlands B.V. | Substrate holder and method |
| EP4386478A1 (en) | 2022-12-12 | 2024-06-19 | ASML Netherlands B.V. | Apparatus and method for electrostatically clamping a substrate |
| KR20250123776A (ko) | 2022-12-13 | 2025-08-18 | 에이에스엠엘 네델란즈 비.브이. | 뒤틀린 기판을 클램핑하기 위한 진공 테이블 및 방법 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2106325A (en) * | 1981-09-14 | 1983-04-07 | Philips Electronic Associated | Electrostatic chuck |
| US5880924A (en) * | 1997-12-01 | 1999-03-09 | Applied Materials, Inc. | Electrostatic chuck capable of rapidly dechucking a substrate |
| US6067222A (en) * | 1998-11-25 | 2000-05-23 | Applied Materials, Inc. | Substrate support apparatus and method for fabricating same |
| JP2000340640A (ja) * | 1999-05-31 | 2000-12-08 | Toto Ltd | 非接触型静電吸着装置 |
| US6426790B1 (en) * | 2000-02-28 | 2002-07-30 | Nikon Corporation | Stage apparatus and holder, and scanning exposure apparatus and exposure apparatus |
| JP4467836B2 (ja) * | 2001-06-08 | 2010-05-26 | 株式会社アルバック | 成膜方法 |
| DE10157487C1 (de) * | 2001-11-23 | 2003-06-18 | Sgl Carbon Ag | Faserverstärkter Verbundkörper für Schutzpanzerungen, seine Herstellung und Verwendungen |
| US20030233977A1 (en) | 2002-06-20 | 2003-12-25 | Yeshwanth Narendar | Method for forming semiconductor processing components |
| JP2004031594A (ja) * | 2002-06-25 | 2004-01-29 | Kyocera Corp | 静電チャックおよびその製造方法 |
| US7092231B2 (en) * | 2002-08-23 | 2006-08-15 | Asml Netherlands B.V. | Chuck, lithographic apparatus and device manufacturing method |
| JP4101017B2 (ja) * | 2002-10-24 | 2008-06-11 | 株式会社アルバック | 吸着装置及び吸着方法 |
| JP4383042B2 (ja) * | 2002-12-18 | 2009-12-16 | 日本特殊陶業株式会社 | セラミックス焼結体及びその製造方法 |
| JP4472372B2 (ja) * | 2003-02-03 | 2010-06-02 | 株式会社オクテック | プラズマ処理装置及びプラズマ処理装置用の電極板 |
| KR100512745B1 (ko) * | 2003-07-24 | 2005-09-07 | 삼성전자주식회사 | 정전기 척 |
| JP2005150370A (ja) * | 2003-11-14 | 2005-06-09 | Kyocera Corp | 静電チャック |
| JP2005268720A (ja) * | 2004-03-22 | 2005-09-29 | Disco Abrasive Syst Ltd | エッチング装置 |
| US7133120B2 (en) * | 2004-05-04 | 2006-11-07 | Asml Netherlands B.V. | Lithographic apparatus, article support member, and method |
| US20070097346A1 (en) * | 2005-10-28 | 2007-05-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7564536B2 (en) | 2005-11-08 | 2009-07-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US20070139855A1 (en) * | 2005-12-21 | 2007-06-21 | Asml Netherlands B.V. | Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus |
| US7646581B2 (en) * | 2006-01-31 | 2010-01-12 | Sumitomo Osaka Cement Co., Ltd. | Electrostatic chuck |
| US8325321B2 (en) * | 2006-07-28 | 2012-12-04 | Mapper Lithography Ip B.V. | Lithography system, method of heat dissipation and frame |
| US7940511B2 (en) * | 2007-09-21 | 2011-05-10 | Asml Netherlands B.V. | Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp |
| JP4974873B2 (ja) * | 2007-12-26 | 2012-07-11 | 新光電気工業株式会社 | 静電チャック及び基板温調固定装置 |
-
2007
- 2007-09-21 US US11/902,501 patent/US7940511B2/en active Active
-
2008
- 2008-09-02 NL NL1035888A patent/NL1035888A1/nl active Search and Examination
- 2008-09-19 WO PCT/EP2008/007916 patent/WO2009036995A1/en not_active Ceased
- 2008-09-19 JP JP2010525264A patent/JP5524845B2/ja active Active
- 2008-09-19 TW TW097136226A patent/TWI446482B/zh active
- 2008-09-19 EP EP08802422.9A patent/EP2208224B1/en active Active
- 2008-09-19 KR KR1020107008658A patent/KR101533014B1/ko active Active
- 2008-09-19 CN CN200880107793XA patent/CN101803001B/zh active Active
-
2011
- 2011-03-22 US US13/069,203 patent/US8098475B2/en active Active
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