JP2010527160A5 - - Google Patents

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Publication number
JP2010527160A5
JP2010527160A5 JP2010507832A JP2010507832A JP2010527160A5 JP 2010527160 A5 JP2010527160 A5 JP 2010527160A5 JP 2010507832 A JP2010507832 A JP 2010507832A JP 2010507832 A JP2010507832 A JP 2010507832A JP 2010527160 A5 JP2010527160 A5 JP 2010527160A5
Authority
JP
Japan
Prior art keywords
projection objective
objective according
stray light
substrate
reflective element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010507832A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010527160A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2008/003760 external-priority patent/WO2008138560A1/de
Publication of JP2010527160A publication Critical patent/JP2010527160A/ja
Publication of JP2010527160A5 publication Critical patent/JP2010527160A5/ja
Pending legal-status Critical Current

Links

JP2010507832A 2007-05-14 2008-05-09 マイクロリソグラフィ用投影対物器械及び投影露光装置 Pending JP2010527160A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007024214 2007-05-14
PCT/EP2008/003760 WO2008138560A1 (de) 2007-05-14 2008-05-09 Projektionsobjektiv und projektionsbelichtungsanlage für die mikrolithographie

Publications (2)

Publication Number Publication Date
JP2010527160A JP2010527160A (ja) 2010-08-05
JP2010527160A5 true JP2010527160A5 (enExample) 2011-06-23

Family

ID=39689310

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010507832A Pending JP2010527160A (ja) 2007-05-14 2008-05-09 マイクロリソグラフィ用投影対物器械及び投影露光装置

Country Status (4)

Country Link
US (1) US20100085644A1 (enExample)
JP (1) JP2010527160A (enExample)
DE (1) DE102008001719A1 (enExample)
WO (1) WO2008138560A1 (enExample)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5107526A (en) * 1990-10-31 1992-04-21 The United State Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Water window imaging x-ray microscope
US5274420A (en) * 1992-04-20 1993-12-28 International Business Machines Corporation Beamsplitter type lens elements with pupil-plane stops for lithographic systems
JPH11345761A (ja) * 1998-05-29 1999-12-14 Nikon Corp 走査型露光装置
US6600608B1 (en) * 1999-11-05 2003-07-29 Carl-Zeiss-Stiftung Catadioptric objective comprising two intermediate images
TWI282909B (en) * 1999-12-23 2007-06-21 Asml Netherlands Bv Lithographic apparatus and a method for manufacturing a device
DE10040998A1 (de) * 2000-08-22 2002-03-14 Zeiss Carl Projektionsbelichtungsanlage
US6912049B2 (en) * 2001-12-19 2005-06-28 Nir Diagnostics, Inc. Electromagnetic radiation attenuating and scattering member with improved thermal stability
DE10210899A1 (de) * 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
JP2003322710A (ja) * 2002-05-01 2003-11-14 Canon Inc 光吸収膜、光吸収膜形成方法、露光装置、デバイス製造方法及びデバイス
KR101590743B1 (ko) * 2005-06-02 2016-02-01 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈

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