JP2010527042A5 - - Google Patents
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- Publication number
- JP2010527042A5 JP2010527042A5 JP2010507998A JP2010507998A JP2010527042A5 JP 2010527042 A5 JP2010527042 A5 JP 2010527042A5 JP 2010507998 A JP2010507998 A JP 2010507998A JP 2010507998 A JP2010507998 A JP 2010507998A JP 2010527042 A5 JP2010527042 A5 JP 2010527042A5
- Authority
- JP
- Japan
- Prior art keywords
- aromatic
- substituted
- hydroxy
- useful
- moiety
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002253 acid Substances 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- -1 anthracyl Chemical group 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- PWMWNFMRSKOCEY-UHFFFAOYSA-N 1-Phenyl-1,2-ethanediol Chemical compound OCC(O)C1=CC=CC=C1 PWMWNFMRSKOCEY-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 125000004018 acid anhydride group Chemical group 0.000 description 1
- 150000001454 anthracenes Chemical class 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- VPVSTMAPERLKKM-UHFFFAOYSA-N glycoluril Chemical compound N1C(=O)NC2NC(=O)NC21 VPVSTMAPERLKKM-UHFFFAOYSA-N 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/747,936 US20080286689A1 (en) | 2007-05-14 | 2007-05-14 | Antireflective Coating Compositions |
| PCT/IB2008/001208 WO2008139320A2 (en) | 2007-05-14 | 2008-05-09 | Antireflective coating compositions |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010527042A JP2010527042A (ja) | 2010-08-05 |
| JP2010527042A5 true JP2010527042A5 (enExample) | 2011-05-19 |
Family
ID=40002704
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010507998A Pending JP2010527042A (ja) | 2007-05-14 | 2008-05-09 | 反射防止コーティング組成物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20080286689A1 (enExample) |
| EP (1) | EP2152822A2 (enExample) |
| JP (1) | JP2010527042A (enExample) |
| KR (1) | KR20100021457A (enExample) |
| CN (1) | CN101959980A (enExample) |
| TW (1) | TW200916543A (enExample) |
| WO (1) | WO2008139320A2 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009104685A1 (ja) | 2008-02-21 | 2009-08-27 | 日産化学工業株式会社 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
| KR100894218B1 (ko) * | 2008-04-11 | 2009-04-22 | 금호석유화학 주식회사 | 흡광제 및 이를 포함하는 유기 반사 방지막 조성물 |
| US8445181B2 (en) * | 2010-06-03 | 2013-05-21 | Az Electronic Materials Usa Corp. | Antireflective coating composition and process thereof |
| WO2012050064A1 (ja) * | 2010-10-14 | 2012-04-19 | 日産化学工業株式会社 | ポリエーテル構造を含有する樹脂を含むリソグラフィー用レジスト下層膜形成組成物 |
| US8465902B2 (en) * | 2011-02-08 | 2013-06-18 | Az Electronic Materials Usa Corp. | Underlayer coating composition and processes thereof |
| TWI685495B (zh) * | 2013-11-25 | 2020-02-21 | 日商四國化成工業股份有限公司 | 含有縮水甘油基乙炔脲類的組成物 |
| US9793268B2 (en) * | 2014-01-24 | 2017-10-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and structure for gap filling improvement |
| TWI592760B (zh) * | 2014-12-30 | 2017-07-21 | 羅門哈斯電子材料韓國有限公司 | 與經外塗佈之光致抗蝕劑一起使用之塗層組合物 |
| TWI659991B (zh) * | 2015-08-31 | 2019-05-21 | Rohm And Haas Electronic Materials Llc | 與外塗佈光致抗蝕劑一起使用的塗料組合物 |
| TWI646397B (zh) * | 2015-10-31 | 2019-01-01 | 南韓商羅門哈斯電子材料韓國公司 | 與外塗佈光致抗蝕劑一起使用的塗料組合物 |
| CN109735280B (zh) * | 2019-01-04 | 2020-06-09 | 中国科学技术大学 | 紫外光响应性聚合物粘合剂及其制备方法和用途 |
| KR102675074B1 (ko) * | 2020-11-20 | 2024-06-12 | 삼성에스디아이 주식회사 | 레지스트 하층막용 조성물 및 이를 이용한 패턴형성방법 |
| CN112680052B (zh) * | 2020-12-23 | 2022-06-28 | 上海飞凯材料科技股份有限公司 | 一种抗反射涂料组合物及其应用 |
| CN113929900B (zh) * | 2021-10-15 | 2023-07-04 | 厦门恒坤新材料科技股份有限公司 | 一种聚醚高聚物和抗反射涂层溶液及其制备方法 |
| CN114853993B (zh) * | 2022-05-27 | 2024-08-23 | 中国科学院长春应用化学研究所 | 一种增塑成核双功能聚乳酸改性剂及其制备方法、改性聚乳酸 |
| CN115948095B (zh) * | 2023-02-10 | 2023-09-12 | 厦门恒坤新材料科技股份有限公司 | 一种抗反射涂料组合物及其制备方法以及光刻胶图案的形成方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3694703B2 (ja) * | 1996-04-25 | 2005-09-14 | Ａｚエレクトロニックマテリアルズ株式会社 | 反射防止コーティング用組成物 |
| US7361444B1 (en) * | 1998-02-23 | 2008-04-22 | International Business Machines Corporation | Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof |
| TW591341B (en) * | 2001-09-26 | 2004-06-11 | Shipley Co Llc | Coating compositions for use with an overcoated photoresist |
| WO2003034152A1 (en) * | 2001-10-10 | 2003-04-24 | Nissan Chemical Industries, Ltd. | Composition for forming antireflection film for lithography |
| US20040067437A1 (en) * | 2002-10-06 | 2004-04-08 | Shipley Company, L.L.C. | Coating compositions for use with an overcoated photoresist |
| EP1422566A1 (en) * | 2002-11-20 | 2004-05-26 | Shipley Company, L.L.C. | Multilayer photoresist systems |
| KR20040044369A (ko) * | 2002-11-20 | 2004-05-28 | 쉬플리 캄파니, 엘.엘.씨. | 다층 포토레지스트 시스템 |
| US7264913B2 (en) * | 2002-11-21 | 2007-09-04 | Az Electronic Materials Usa Corp. | Antireflective compositions for photoresists |
| US7081511B2 (en) * | 2004-04-05 | 2006-07-25 | Az Electronic Materials Usa Corp. | Process for making polyesters |
| CN100503756C (zh) * | 2004-05-18 | 2009-06-24 | 罗姆及海斯电子材料有限公司 | 与上涂光致抗蚀剂一起使用的涂料组合物 |
| US7691556B2 (en) * | 2004-09-15 | 2010-04-06 | Az Electronic Materials Usa Corp. | Antireflective compositions for photoresists |
| EP1691238A3 (en) * | 2005-02-05 | 2009-01-21 | Rohm and Haas Electronic Materials, L.L.C. | Coating compositions for use with an overcoated photoresist |
| TWI340296B (en) * | 2005-03-20 | 2011-04-11 | Rohm & Haas Elect Mat | Coating compositions for use with an overcoated photoresist |
| US7638262B2 (en) * | 2006-08-10 | 2009-12-29 | Az Electronic Materials Usa Corp. | Antireflective composition for photoresists |
-
2007
- 2007-05-14 US US11/747,936 patent/US20080286689A1/en not_active Abandoned
-
2008
- 2008-04-28 TW TW097115584A patent/TW200916543A/zh unknown
- 2008-05-09 WO PCT/IB2008/001208 patent/WO2008139320A2/en not_active Ceased
- 2008-05-09 CN CN2008800158821A patent/CN101959980A/zh active Pending
- 2008-05-09 EP EP08750949A patent/EP2152822A2/en not_active Withdrawn
- 2008-05-09 JP JP2010507998A patent/JP2010527042A/ja active Pending
- 2008-05-09 KR KR1020097026097A patent/KR20100021457A/ko not_active Withdrawn
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