CN101959980A - 抗反射涂料组合物 - Google Patents

抗反射涂料组合物 Download PDF

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Publication number
CN101959980A
CN101959980A CN2008800158821A CN200880015882A CN101959980A CN 101959980 A CN101959980 A CN 101959980A CN 2008800158821 A CN2008800158821 A CN 2008800158821A CN 200880015882 A CN200880015882 A CN 200880015882A CN 101959980 A CN101959980 A CN 101959980A
Authority
CN
China
Prior art keywords
acid
antireflective coating
glycoluril
coating composition
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2008800158821A
Other languages
English (en)
Chinese (zh)
Inventor
庄弘
单槛会
向中
吴恒鹏
殷建
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EMD Performance Materials Corp
Original Assignee
AZ Electronic Materials USA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AZ Electronic Materials USA Corp filed Critical AZ Electronic Materials USA Corp
Publication of CN101959980A publication Critical patent/CN101959980A/zh
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/26—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers and other compounds
    • C08G65/2603—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers and other compounds the other compounds containing oxygen
    • C08G65/2615—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers and other compounds the other compounds containing oxygen the other compounds containing carboxylic acid, ester or anhydride groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/16—Dicarboxylic acids and dihydroxy compounds
    • C08G63/20—Polyesters having been prepared in the presence of compounds having one reactive group or more than two reactive groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L67/00—Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Polyethers (AREA)
  • Materials For Photolithography (AREA)
CN2008800158821A 2007-05-14 2008-05-09 抗反射涂料组合物 Pending CN101959980A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/747,936 US20080286689A1 (en) 2007-05-14 2007-05-14 Antireflective Coating Compositions
US11/747,936 2007-05-14
PCT/IB2008/001208 WO2008139320A2 (en) 2007-05-14 2008-05-09 Antireflective coating compositions

Publications (1)

Publication Number Publication Date
CN101959980A true CN101959980A (zh) 2011-01-26

Family

ID=40002704

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2008800158821A Pending CN101959980A (zh) 2007-05-14 2008-05-09 抗反射涂料组合物

Country Status (7)

Country Link
US (1) US20080286689A1 (enExample)
EP (1) EP2152822A2 (enExample)
JP (1) JP2010527042A (enExample)
KR (1) KR20100021457A (enExample)
CN (1) CN101959980A (enExample)
TW (1) TW200916543A (enExample)
WO (1) WO2008139320A2 (enExample)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103370653A (zh) * 2011-02-08 2013-10-23 Az电子材料美国公司 底层涂料组合物及制造微电子器件的方法
CN105745213A (zh) * 2013-11-25 2016-07-06 四国化成工业株式会社 具有官能团的甘脲类及其利用
CN106647170A (zh) * 2015-10-31 2017-05-10 罗门哈斯电子材料韩国有限公司 与外涂布光致抗蚀剂一起使用的涂料组合物
CN109735280A (zh) * 2019-01-04 2019-05-10 中国科学技术大学 紫外光响应性聚合物粘合剂及其制备方法和用途
CN112680052A (zh) * 2020-12-23 2021-04-20 上海飞凯光电材料股份有限公司 一种抗反射涂料组合物及其应用
CN113929900A (zh) * 2021-10-15 2022-01-14 厦门恒坤新材料科技股份有限公司 一种聚醚高聚物和抗反射涂层溶液及其制备方法
CN114853993A (zh) * 2022-05-27 2022-08-05 中国科学院长春应用化学研究所 一种增塑成核双功能聚乳酸改性剂及其制备方法、改性聚乳酸
CN115948095A (zh) * 2023-02-10 2023-04-11 厦门恒坤新材料科技股份有限公司 一种抗反射涂料组合物及其制备方法以及光刻胶图案的形成方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2251742B1 (en) 2008-02-21 2012-05-16 Nissan Chemical Industries, Ltd. Composition for forming resist underlayer film and method for forming resist pattern using the same
KR100894218B1 (ko) * 2008-04-11 2009-04-22 금호석유화학 주식회사 흡광제 및 이를 포함하는 유기 반사 방지막 조성물
US8445181B2 (en) * 2010-06-03 2013-05-21 Az Electronic Materials Usa Corp. Antireflective coating composition and process thereof
US20130189533A1 (en) * 2010-10-14 2013-07-25 Nissan Chemical Industries, Ltd. Resist underlayer film forming composition for lithography containing polyether structure-containing resin
US9793268B2 (en) 2014-01-24 2017-10-17 Taiwan Semiconductor Manufacturing Company, Ltd. Method and structure for gap filling improvement
TWI592760B (zh) * 2014-12-30 2017-07-21 羅門哈斯電子材料韓國有限公司 與經外塗佈之光致抗蝕劑一起使用之塗層組合物
CN106479329A (zh) * 2015-08-31 2017-03-08 罗门哈斯电子材料有限责任公司 与外涂布光致抗蚀剂一起使用的涂料组合物
KR102675074B1 (ko) * 2020-11-20 2024-06-12 삼성에스디아이 주식회사 레지스트 하층막용 조성물 및 이를 이용한 패턴형성방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1168401A (zh) * 1996-04-25 1997-12-24 赫司特日本有限公司 抗反射涂层的成份
CN1714316A (zh) * 2002-11-21 2005-12-28 Az电子材料美国公司 光刻胶用抗反射组合物
WO2006030320A2 (en) * 2004-09-15 2006-03-23 Az Electronic Materials Usa Corp. Antireflective compositions for photoresists

Family Cites Families (11)

* Cited by examiner, † Cited by third party
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US7361444B1 (en) * 1998-02-23 2008-04-22 International Business Machines Corporation Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
TW591341B (en) * 2001-09-26 2004-06-11 Shipley Co Llc Coating compositions for use with an overcoated photoresist
WO2003034152A1 (en) * 2001-10-10 2003-04-24 Nissan Chemical Industries, Ltd. Composition for forming antireflection film for lithography
US20040067437A1 (en) * 2002-10-06 2004-04-08 Shipley Company, L.L.C. Coating compositions for use with an overcoated photoresist
KR20040044369A (ko) * 2002-11-20 2004-05-28 쉬플리 캄파니, 엘.엘.씨. 다층 포토레지스트 시스템
KR20040044368A (ko) * 2002-11-20 2004-05-28 쉬플리 캄파니, 엘.엘.씨. 다층 포토레지스트 시스템
US7081511B2 (en) * 2004-04-05 2006-07-25 Az Electronic Materials Usa Corp. Process for making polyesters
CN100503756C (zh) * 2004-05-18 2009-06-24 罗姆及海斯电子材料有限公司 与上涂光致抗蚀剂一起使用的涂料组合物
EP1691238A3 (en) * 2005-02-05 2009-01-21 Rohm and Haas Electronic Materials, L.L.C. Coating compositions for use with an overcoated photoresist
TWI340296B (en) * 2005-03-20 2011-04-11 Rohm & Haas Elect Mat Coating compositions for use with an overcoated photoresist
US7638262B2 (en) * 2006-08-10 2009-12-29 Az Electronic Materials Usa Corp. Antireflective composition for photoresists

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1168401A (zh) * 1996-04-25 1997-12-24 赫司特日本有限公司 抗反射涂层的成份
CN1714316A (zh) * 2002-11-21 2005-12-28 Az电子材料美国公司 光刻胶用抗反射组合物
WO2006030320A2 (en) * 2004-09-15 2006-03-23 Az Electronic Materials Usa Corp. Antireflective compositions for photoresists

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103370653B (zh) * 2011-02-08 2016-06-08 默克专利有限公司 底层涂料组合物及制造微电子器件的方法
CN103370653A (zh) * 2011-02-08 2013-10-23 Az电子材料美国公司 底层涂料组合物及制造微电子器件的方法
CN105745213A (zh) * 2013-11-25 2016-07-06 四国化成工业株式会社 具有官能团的甘脲类及其利用
CN106647170A (zh) * 2015-10-31 2017-05-10 罗门哈斯电子材料韩国有限公司 与外涂布光致抗蚀剂一起使用的涂料组合物
CN106647170B (zh) * 2015-10-31 2021-05-04 罗门哈斯电子材料韩国有限公司 与外涂布光致抗蚀剂一起使用的涂料组合物
CN109735280A (zh) * 2019-01-04 2019-05-10 中国科学技术大学 紫外光响应性聚合物粘合剂及其制备方法和用途
CN109735280B (zh) * 2019-01-04 2020-06-09 中国科学技术大学 紫外光响应性聚合物粘合剂及其制备方法和用途
KR102501048B1 (ko) 2020-12-23 2023-02-17 파이쳄 코포레이션 반사 방지 페인트 조성물과 그 응용, 및 코팅 제품
CN112680052A (zh) * 2020-12-23 2021-04-20 上海飞凯光电材料股份有限公司 一种抗反射涂料组合物及其应用
KR20220091424A (ko) * 2020-12-23 2022-06-30 파이쳄 코포레이션 반사 방지 페인트 조성물과 그 응용, 및 코팅 제품
US11767435B2 (en) 2020-12-23 2023-09-26 Phichem Corporation Anti-reflection coating composition and use thereof
CN113929900A (zh) * 2021-10-15 2022-01-14 厦门恒坤新材料科技股份有限公司 一种聚醚高聚物和抗反射涂层溶液及其制备方法
CN113929900B (zh) * 2021-10-15 2023-07-04 厦门恒坤新材料科技股份有限公司 一种聚醚高聚物和抗反射涂层溶液及其制备方法
CN114853993A (zh) * 2022-05-27 2022-08-05 中国科学院长春应用化学研究所 一种增塑成核双功能聚乳酸改性剂及其制备方法、改性聚乳酸
CN114853993B (zh) * 2022-05-27 2024-08-23 中国科学院长春应用化学研究所 一种增塑成核双功能聚乳酸改性剂及其制备方法、改性聚乳酸
CN115948095A (zh) * 2023-02-10 2023-04-11 厦门恒坤新材料科技股份有限公司 一种抗反射涂料组合物及其制备方法以及光刻胶图案的形成方法
CN115948095B (zh) * 2023-02-10 2023-09-12 厦门恒坤新材料科技股份有限公司 一种抗反射涂料组合物及其制备方法以及光刻胶图案的形成方法

Also Published As

Publication number Publication date
EP2152822A2 (en) 2010-02-17
TW200916543A (en) 2009-04-16
WO2008139320A8 (en) 2009-12-17
KR20100021457A (ko) 2010-02-24
WO2008139320A3 (en) 2009-08-27
WO2008139320A2 (en) 2008-11-20
JP2010527042A (ja) 2010-08-05
US20080286689A1 (en) 2008-11-20

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Application publication date: 20110126