JP2010527042A - 反射防止コーティング組成物 - Google Patents

反射防止コーティング組成物 Download PDF

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Publication number
JP2010527042A
JP2010527042A JP2010507998A JP2010507998A JP2010527042A JP 2010527042 A JP2010527042 A JP 2010527042A JP 2010507998 A JP2010507998 A JP 2010507998A JP 2010507998 A JP2010507998 A JP 2010507998A JP 2010527042 A JP2010527042 A JP 2010527042A
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JP
Japan
Prior art keywords
group
acid
substituted
coating composition
dianhydride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010507998A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010527042A5 (enExample
Inventor
チャン・ホン
シャン・ジャンフイ
シーアン・チョン
ウー・ヘンペン
イン・ジャン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EMD Performance Materials Corp
Original Assignee
AZ Electronic Materials USA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AZ Electronic Materials USA Corp filed Critical AZ Electronic Materials USA Corp
Publication of JP2010527042A publication Critical patent/JP2010527042A/ja
Publication of JP2010527042A5 publication Critical patent/JP2010527042A5/ja
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/26—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers and other compounds
    • C08G65/2603—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers and other compounds the other compounds containing oxygen
    • C08G65/2615—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers and other compounds the other compounds containing oxygen the other compounds containing carboxylic acid, ester or anhydride groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/16—Dicarboxylic acids and dihydroxy compounds
    • C08G63/20—Polyesters having been prepared in the presence of compounds having one reactive group or more than two reactive groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L67/00—Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Polyethers (AREA)
  • Materials For Photolithography (AREA)
JP2010507998A 2007-05-14 2008-05-09 反射防止コーティング組成物 Pending JP2010527042A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/747,936 US20080286689A1 (en) 2007-05-14 2007-05-14 Antireflective Coating Compositions
PCT/IB2008/001208 WO2008139320A2 (en) 2007-05-14 2008-05-09 Antireflective coating compositions

Publications (2)

Publication Number Publication Date
JP2010527042A true JP2010527042A (ja) 2010-08-05
JP2010527042A5 JP2010527042A5 (enExample) 2011-05-19

Family

ID=40002704

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010507998A Pending JP2010527042A (ja) 2007-05-14 2008-05-09 反射防止コーティング組成物

Country Status (7)

Country Link
US (1) US20080286689A1 (enExample)
EP (1) EP2152822A2 (enExample)
JP (1) JP2010527042A (enExample)
KR (1) KR20100021457A (enExample)
CN (1) CN101959980A (enExample)
TW (1) TW200916543A (enExample)
WO (1) WO2008139320A2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5920588B2 (ja) * 2010-10-14 2016-05-18 日産化学工業株式会社 ポリエーテル構造を含有する樹脂を含むリソグラフィー用レジスト下層膜形成組成物
JP2017078846A (ja) * 2015-08-31 2017-04-27 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ オーバーコートされたフォトレジストと共に使用するためのコーティング組成物

Families Citing this family (14)

* Cited by examiner, † Cited by third party
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EP2251742B1 (en) 2008-02-21 2012-05-16 Nissan Chemical Industries, Ltd. Composition for forming resist underlayer film and method for forming resist pattern using the same
KR100894218B1 (ko) * 2008-04-11 2009-04-22 금호석유화학 주식회사 흡광제 및 이를 포함하는 유기 반사 방지막 조성물
US8445181B2 (en) * 2010-06-03 2013-05-21 Az Electronic Materials Usa Corp. Antireflective coating composition and process thereof
US8465902B2 (en) * 2011-02-08 2013-06-18 Az Electronic Materials Usa Corp. Underlayer coating composition and processes thereof
EP3369735A1 (en) * 2013-11-25 2018-09-05 Shikoku Chemicals Corporation Glycolurils having functional group and use thereof
US9793268B2 (en) 2014-01-24 2017-10-17 Taiwan Semiconductor Manufacturing Company, Ltd. Method and structure for gap filling improvement
TWI592760B (zh) * 2014-12-30 2017-07-21 羅門哈斯電子材料韓國有限公司 與經外塗佈之光致抗蝕劑一起使用之塗層組合物
TWI646397B (zh) * 2015-10-31 2019-01-01 南韓商羅門哈斯電子材料韓國公司 與外塗佈光致抗蝕劑一起使用的塗料組合物
CN109735280B (zh) * 2019-01-04 2020-06-09 中国科学技术大学 紫外光响应性聚合物粘合剂及其制备方法和用途
KR102675074B1 (ko) * 2020-11-20 2024-06-12 삼성에스디아이 주식회사 레지스트 하층막용 조성물 및 이를 이용한 패턴형성방법
CN112680052B (zh) * 2020-12-23 2022-06-28 上海飞凯材料科技股份有限公司 一种抗反射涂料组合物及其应用
CN113929900B (zh) * 2021-10-15 2023-07-04 厦门恒坤新材料科技股份有限公司 一种聚醚高聚物和抗反射涂层溶液及其制备方法
CN114853993B (zh) * 2022-05-27 2024-08-23 中国科学院长春应用化学研究所 一种增塑成核双功能聚乳酸改性剂及其制备方法、改性聚乳酸
CN115948095B (zh) * 2023-02-10 2023-09-12 厦门恒坤新材料科技股份有限公司 一种抗反射涂料组合物及其制备方法以及光刻胶图案的形成方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003177547A (ja) * 2001-09-26 2003-06-27 Shipley Co Llc 上塗りされたフォトレジストとともに使用されるコーティング組成物
JP2006507521A (ja) * 2002-11-21 2006-03-02 エイゼット・エレクトロニック・マテリアルズ・ユーエスエイ・コーポレイション フォトレジスト用の反射防止膜組成物
WO2006030320A2 (en) * 2004-09-15 2006-03-23 Az Electronic Materials Usa Corp. Antireflective compositions for photoresists

Family Cites Families (11)

* Cited by examiner, † Cited by third party
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JP3694703B2 (ja) * 1996-04-25 2005-09-14 Ａｚエレクトロニックマテリアルズ株式会社 反射防止コーティング用組成物
US7361444B1 (en) * 1998-02-23 2008-04-22 International Business Machines Corporation Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
WO2003034152A1 (en) * 2001-10-10 2003-04-24 Nissan Chemical Industries, Ltd. Composition for forming antireflection film for lithography
US20040067437A1 (en) * 2002-10-06 2004-04-08 Shipley Company, L.L.C. Coating compositions for use with an overcoated photoresist
KR20040044369A (ko) * 2002-11-20 2004-05-28 쉬플리 캄파니, 엘.엘.씨. 다층 포토레지스트 시스템
KR20040044368A (ko) * 2002-11-20 2004-05-28 쉬플리 캄파니, 엘.엘.씨. 다층 포토레지스트 시스템
US7081511B2 (en) * 2004-04-05 2006-07-25 Az Electronic Materials Usa Corp. Process for making polyesters
CN100503756C (zh) * 2004-05-18 2009-06-24 罗姆及海斯电子材料有限公司 与上涂光致抗蚀剂一起使用的涂料组合物
EP1691238A3 (en) * 2005-02-05 2009-01-21 Rohm and Haas Electronic Materials, L.L.C. Coating compositions for use with an overcoated photoresist
TWI340296B (en) * 2005-03-20 2011-04-11 Rohm & Haas Elect Mat Coating compositions for use with an overcoated photoresist
US7638262B2 (en) * 2006-08-10 2009-12-29 Az Electronic Materials Usa Corp. Antireflective composition for photoresists

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003177547A (ja) * 2001-09-26 2003-06-27 Shipley Co Llc 上塗りされたフォトレジストとともに使用されるコーティング組成物
JP2006507521A (ja) * 2002-11-21 2006-03-02 エイゼット・エレクトロニック・マテリアルズ・ユーエスエイ・コーポレイション フォトレジスト用の反射防止膜組成物
WO2006030320A2 (en) * 2004-09-15 2006-03-23 Az Electronic Materials Usa Corp. Antireflective compositions for photoresists

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5920588B2 (ja) * 2010-10-14 2016-05-18 日産化学工業株式会社 ポリエーテル構造を含有する樹脂を含むリソグラフィー用レジスト下層膜形成組成物
JP2017078846A (ja) * 2015-08-31 2017-04-27 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ オーバーコートされたフォトレジストと共に使用するためのコーティング組成物

Also Published As

Publication number Publication date
EP2152822A2 (en) 2010-02-17
TW200916543A (en) 2009-04-16
WO2008139320A8 (en) 2009-12-17
KR20100021457A (ko) 2010-02-24
WO2008139320A3 (en) 2009-08-27
WO2008139320A2 (en) 2008-11-20
US20080286689A1 (en) 2008-11-20
CN101959980A (zh) 2011-01-26

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