JP2010107996A5 - - Google Patents

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Publication number
JP2010107996A5
JP2010107996A5 JP2009288151A JP2009288151A JP2010107996A5 JP 2010107996 A5 JP2010107996 A5 JP 2010107996A5 JP 2009288151 A JP2009288151 A JP 2009288151A JP 2009288151 A JP2009288151 A JP 2009288151A JP 2010107996 A5 JP2010107996 A5 JP 2010107996A5
Authority
JP
Japan
Prior art keywords
wavelength
coating
range
irradiation
refractive index
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009288151A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010107996A (ja
JP5097960B2 (ja
Filing date
Publication date
Application filed filed Critical
Publication of JP2010107996A publication Critical patent/JP2010107996A/ja
Publication of JP2010107996A5 publication Critical patent/JP2010107996A5/ja
Application granted granted Critical
Publication of JP5097960B2 publication Critical patent/JP5097960B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2009288151A 1996-03-07 2009-12-18 屈折率を最適化して性能を改善した光吸収性の反射防止層 Expired - Lifetime JP5097960B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US1300796P 1996-03-07 1996-03-07
US60/013,007 1996-03-07

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP9532003A Division JP2000506287A (ja) 1996-03-07 1997-03-06 屈折率を最適化して性能を改善した光吸収性の反射防止層

Publications (3)

Publication Number Publication Date
JP2010107996A JP2010107996A (ja) 2010-05-13
JP2010107996A5 true JP2010107996A5 (enExample) 2011-02-17
JP5097960B2 JP5097960B2 (ja) 2012-12-12

Family

ID=21757832

Family Applications (2)

Application Number Title Priority Date Filing Date
JP9532003A Pending JP2000506287A (ja) 1996-03-07 1997-03-06 屈折率を最適化して性能を改善した光吸収性の反射防止層
JP2009288151A Expired - Lifetime JP5097960B2 (ja) 1996-03-07 2009-12-18 屈折率を最適化して性能を改善した光吸収性の反射防止層

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP9532003A Pending JP2000506287A (ja) 1996-03-07 1997-03-06 屈折率を最適化して性能を改善した光吸収性の反射防止層

Country Status (7)

Country Link
EP (1) EP0885406B1 (enExample)
JP (2) JP2000506287A (enExample)
KR (1) KR100458685B1 (enExample)
CN (1) CN1091264C (enExample)
DE (1) DE69703283T2 (enExample)
TW (1) TW357395B (enExample)
WO (1) WO1997033200A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0885407B1 (en) * 1996-03-07 2001-08-22 Clariant Finance (BVI) Limited Bottom antireflective coatings through refractive index modification by anomalous dispersion
US5733714A (en) * 1996-09-30 1998-03-31 Clariant Finance (Bvi) Limited Antireflective coating for photoresist compositions
US5981145A (en) * 1997-04-30 1999-11-09 Clariant Finance (Bvi) Limited Light absorbing polymers
US5994430A (en) * 1997-04-30 1999-11-30 Clariant Finance Bvi) Limited Antireflective coating compositions for photoresist compositions and use thereof
US20030054117A1 (en) * 2001-02-02 2003-03-20 Brewer Science, Inc. Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
US7544750B2 (en) * 2005-10-13 2009-06-09 International Business Machines Corporation Top antireflective coating composition with low refractive index at 193nm radiation wavelength
FR2894346B1 (fr) * 2005-12-02 2012-03-30 Commissariat Energie Atomique Masque de photolithographie en extreme ultra-violet, a cavites absorbantes
JP2015172606A (ja) * 2012-07-25 2015-10-01 日産化学工業株式会社 リソグラフィー用レジスト上層膜形成組成物及びそれを用いた半導体装置の製造方法
FR3012132B1 (fr) * 2013-10-18 2016-08-05 Centre Nat Rech Scient Procede de fabrication de supports amplificateurs de contraste
CN103941548A (zh) * 2014-04-28 2014-07-23 吴钟达 具有吸光层的感光层结构与使用感光层结构的光刻工艺
CN117024652A (zh) * 2023-08-25 2023-11-10 复旦大学 一种光交联聚合物近红外光子材料及其制备方法和应用

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63110725A (ja) * 1986-10-29 1988-05-16 Nec Corp 半導体装置の製造方法
JP2897569B2 (ja) * 1991-12-30 1999-05-31 ソニー株式会社 レジストパターン形成時に用いる反射防止膜の条件決定方法と、レジストパターン形成方法
JP2829555B2 (ja) * 1992-08-20 1998-11-25 三菱電機株式会社 微細レジストパターンの形成方法
JP3334304B2 (ja) * 1993-11-30 2002-10-15 ソニー株式会社 半導体装置の製造方法
JP3248353B2 (ja) * 1994-06-29 2002-01-21 ソニー株式会社 反射防止膜の設計方法

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