JP2010522977A5 - - Google Patents

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Publication number
JP2010522977A5
JP2010522977A5 JP2010500260A JP2010500260A JP2010522977A5 JP 2010522977 A5 JP2010522977 A5 JP 2010522977A5 JP 2010500260 A JP2010500260 A JP 2010500260A JP 2010500260 A JP2010500260 A JP 2010500260A JP 2010522977 A5 JP2010522977 A5 JP 2010522977A5
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JP
Japan
Prior art keywords
optical
optical element
mirror
correction light
correction
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JP2010500260A
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English (en)
Japanese (ja)
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JP2010522977A (ja
JP5329520B2 (ja
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Priority claimed from PCT/EP2008/053577 external-priority patent/WO2008116886A1/de
Publication of JP2010522977A publication Critical patent/JP2010522977A/ja
Publication of JP2010522977A5 publication Critical patent/JP2010522977A5/ja
Application granted granted Critical
Publication of JP5329520B2 publication Critical patent/JP5329520B2/ja
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JP2010500260A 2007-03-27 2008-03-26 低角度で入射する補正光を用いる補正光学素子 Active JP5329520B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102007014699.1 2007-03-27
DE102007014699 2007-03-27
PCT/EP2008/053577 WO2008116886A1 (de) 2007-03-27 2008-03-26 Korrektur optischer elemente mittels flach eingestrahltem korrekturlicht

Publications (3)

Publication Number Publication Date
JP2010522977A JP2010522977A (ja) 2010-07-08
JP2010522977A5 true JP2010522977A5 (OSRAM) 2011-04-07
JP5329520B2 JP5329520B2 (ja) 2013-10-30

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ID=39645288

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010500260A Active JP5329520B2 (ja) 2007-03-27 2008-03-26 低角度で入射する補正光を用いる補正光学素子

Country Status (5)

Country Link
US (4) US8760744B2 (OSRAM)
JP (1) JP5329520B2 (OSRAM)
KR (1) KR101492287B1 (OSRAM)
DE (1) DE102008016011A1 (OSRAM)
WO (1) WO2008116886A1 (OSRAM)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101492287B1 (ko) 2007-03-27 2015-02-11 칼 짜이스 에스엠테 게엠베하 편평하게 조사된 보정광을 이용한 광학 소자의 보정
US20100290020A1 (en) * 2009-05-15 2010-11-18 Shinichi Mori Optical apparatus, exposure apparatus, exposure method, and method for producing device
DE102010041298A1 (de) 2010-09-24 2012-03-29 Carl Zeiss Smt Gmbh EUV-Mikrolithographie-Projektionsbelichtungsanlage mit einer Heizlichtquelle
DE102012216284A1 (de) * 2011-09-27 2013-03-28 Carl Zeiss Smt Gmbh Mikrolithographische Projektionsbelichtungsanlage
DE102011088740A1 (de) * 2011-12-15 2013-01-17 Carl Zeiss Smt Gmbh Optisches System, sowie Verfahren zum Manipulieren des thermischen Zustandes eines optischen Elementes in einer mikrolithographischen Projektionsbelichtungsanlage
DE102014203189A1 (de) * 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Spiegel-Array
JP6757751B2 (ja) 2015-07-02 2020-09-23 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ タイムシフト型の曝露を使用する不均一パターンの補正
DE102016213025A1 (de) 2016-07-18 2016-09-08 Carl Zeiss Smt Gmbh Steuerung für Mikrospiegelanordnungen in Lithographiesystemen
JP6827785B2 (ja) 2016-11-30 2021-02-10 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
US11079564B2 (en) * 2017-07-20 2021-08-03 Cymer, Llc Methods and apparatuses for aligning and diagnosing a laser beam
DE102021102254A1 (de) * 2021-02-01 2022-08-04 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Optoelektronische anordnung
DE102021201689A1 (de) * 2021-02-23 2022-08-25 Carl Zeiss Smt Gmbh Optische Baugruppe, Verfahren zur Deformation eines optischen Elements und Projektionsbelichtungsanlage
DE102022212570A1 (de) 2022-11-24 2023-12-14 Carl Zeiss Smt Gmbh Heizvorrichtung und optisches System, insbesondere EUV-Lithographiesystem

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JP2006073584A (ja) * 2004-08-31 2006-03-16 Nikon Corp 露光装置及び方法並びにデバイス製造方法
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JP2006128194A (ja) * 2004-10-26 2006-05-18 Canon Inc 露光装置及びデバイス製造方法
US20080204682A1 (en) * 2005-06-28 2008-08-28 Nikon Corporation Exposure method and exposure apparatus, and device manufacturing method
KR101492287B1 (ko) * 2007-03-27 2015-02-11 칼 짜이스 에스엠테 게엠베하 편평하게 조사된 보정광을 이용한 광학 소자의 보정
WO2009152959A1 (en) 2008-06-17 2009-12-23 Carl Zeiss Smt Ag Projection exposure apparatus for semiconductor lithography comprising a device for the thermal manipulation of an optical element
US20100290020A1 (en) * 2009-05-15 2010-11-18 Shinichi Mori Optical apparatus, exposure apparatus, exposure method, and method for producing device
DE102010041528A1 (de) * 2010-09-28 2012-03-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit
DE102011004375B3 (de) * 2011-02-18 2012-05-31 Carl Zeiss Smt Gmbh Vorrichtung zur Führung von elektromagnetischer Strahlung in eine Projektionsbelichtungsanlage
WO2013044936A1 (en) 2011-09-29 2013-04-04 Carl Zeiss Smt Gmbh Projection objective of a microlithographic projection exposure apparatus

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