JP2010521801A - 広バンドギャップ半導体デバイス - Google Patents
広バンドギャップ半導体デバイス Download PDFInfo
- Publication number
- JP2010521801A JP2010521801A JP2009550894A JP2009550894A JP2010521801A JP 2010521801 A JP2010521801 A JP 2010521801A JP 2009550894 A JP2009550894 A JP 2009550894A JP 2009550894 A JP2009550894 A JP 2009550894A JP 2010521801 A JP2010521801 A JP 2010521801A
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- iii
- support structure
- crystal support
- contact region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title description 3
- 239000013078 crystal Substances 0.000 claims abstract description 264
- 239000000758 substrate Substances 0.000 claims abstract description 33
- 230000007547 defect Effects 0.000 claims description 57
- 238000000034 method Methods 0.000 claims description 17
- 238000001514 detection method Methods 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 2
- 238000000059 patterning Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 28
- 125000004429 atom Chemical group 0.000 description 23
- 238000004519 manufacturing process Methods 0.000 description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- 239000012790 adhesive layer Substances 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000001451 molecular beam epitaxy Methods 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000010408 film Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000002086 nanomaterial Substances 0.000 description 4
- 230000005693 optoelectronics Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- -1 for example Substances 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010960 commercial process Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 229920005570 flexible polymer Polymers 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
- C30B23/025—Epitaxial-layer growth characterised by the substrate
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C30B29/403—AIII-nitrides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C30B29/403—AIII-nitrides
- C30B29/406—Gallium nitride
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02373—Group 14 semiconducting materials
- H01L21/02381—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/0242—Crystalline insulating materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02494—Structure
- H01L21/02513—Microstructure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/0254—Nitrides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
- H01L21/02639—Preparation of substrate for selective deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
- H01L21/02647—Lateral overgrowth
- H01L21/0265—Pendeoepitaxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/15—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
- H01L27/153—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars
- H01L27/156—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars two-dimensional arrays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
- H01L33/0066—Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound
- H01L33/007—Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound comprising nitride compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Recrystallisation Techniques (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Abstract
Description
Claims (10)
- 結晶支持構造をその上に有する基板と、
前記結晶支持構造の1つの単一接触領域上のIII−V結晶とを備え、前記接触領域の面積が、前記III−V結晶の表面積の約50パーセント以下であるデバイス。 - 前記結晶支持構造の柱状のものが、前記結晶支持構造の前記柱状のものの上にある前記III−V結晶の個々のものの横方向厚さの約10パーセント以下の直径を有する、請求項1に記載のデバイス。
- 前記III−V結晶が、複数の前記接触領域に接する1つの一体化層である、請求項1に記載のデバイス。
- 前記デバイスが、発光デバイス、光検出デバイスまたはトランジスタ・デバイスとして動作するように構成される、請求項1に記載のデバイス。
- III−V結晶であって、前記III−V結晶の中心にある欠陥領域を除いて、一様な結晶方位を有するIII−V結晶を備え、前記欠陥領域が前記III−V結晶の全体積の約10パーセント未満を占める、デバイス。
- 前記欠陥領域の欠陥密度が、約1×108cm−2以上であり、前記欠陥領域以外で前記III−V結晶の欠陥密度が約1×107cm−2未満である、請求項5に記載のデバイス。
- 基板上に結晶支持構造を形成するステップであって、前記結晶支持構造の各々が所定の接触領域を有するステップと、
前記結晶支持構造の1つの前記接触領域上にIII−V結晶を成長させるステップとを含み、前記接触領域の面積が前記成長III−V結晶の表面積の約50パーセント以下である、デバイス製造方法。 - 前記結晶支持構造を形成する前記ステップは、前記結晶支持構造の各々が約1mm以下の少なくとも1つの横方向寸法をそれぞれ有するように、前記基板をパターン形成しエッチングするステップを含む、請求項7に記載の方法。
- 前記III−V結晶を成長させる前記ステップが、前記III−V結晶の縦方向成長よりも速い前記III−V結晶の横方向成長を助長する比のIII族原子とV族原子に前記接触領域をさらすステップを含む、請求項7に記載の方法。
- 前記結晶支持構造上で成長する複数の前記III−V結晶が融合して一体化III−V層を形成するまで、前記さらすステップを延長することをさらに含む、請求項9に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/676,329 US7692198B2 (en) | 2007-02-19 | 2007-02-19 | Wide-bandgap semiconductor devices |
PCT/US2008/002143 WO2008103331A2 (en) | 2007-02-19 | 2008-02-19 | Wide-bandgap semiconductor devices |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2010521801A true JP2010521801A (ja) | 2010-06-24 |
Family
ID=39382051
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009550894A Pending JP2010521801A (ja) | 2007-02-19 | 2008-02-19 | 広バンドギャップ半導体デバイス |
Country Status (6)
Country | Link |
---|---|
US (2) | US7692198B2 (ja) |
EP (1) | EP2113040A2 (ja) |
JP (1) | JP2010521801A (ja) |
KR (1) | KR101293333B1 (ja) |
CN (1) | CN101622689B (ja) |
WO (1) | WO2008103331A2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017535051A (ja) * | 2014-09-25 | 2017-11-24 | インテル・コーポレーション | 自立シリコンメサ上のiii−nエピタキシャル素子構造 |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7692198B2 (en) * | 2007-02-19 | 2010-04-06 | Alcatel-Lucent Usa Inc. | Wide-bandgap semiconductor devices |
US8367520B2 (en) * | 2008-09-22 | 2013-02-05 | Soitec | Methods and structures for altering strain in III-nitride materials |
FR2936904B1 (fr) * | 2008-10-03 | 2011-01-14 | Soitec Silicon On Insulator | Procedes et structures pour alterer la contrainte dans des materiaux nitrure iii. |
WO2010053963A1 (en) * | 2008-11-07 | 2010-05-14 | The Regents Of The University Of California | Controlling relative growth rates of different exposed crystallographic facets of a group-iii nitride crystal during the ammonothermal growth of a group-iii nitride crystal |
KR101640830B1 (ko) * | 2009-08-17 | 2016-07-22 | 삼성전자주식회사 | 기판 구조체 및 그 제조 방법 |
US9012253B2 (en) * | 2009-12-16 | 2015-04-21 | Micron Technology, Inc. | Gallium nitride wafer substrate for solid state lighting devices, and associated systems and methods |
US8105852B2 (en) * | 2010-01-15 | 2012-01-31 | Koninklijke Philips Electronics N.V. | Method of forming a composite substrate and growing a III-V light emitting device over the composite substrate |
TWI562195B (en) * | 2010-04-27 | 2016-12-11 | Pilegrowth Tech S R L | Dislocation and stress management by mask-less processes using substrate patterning and methods for device fabrication |
DE102010027411A1 (de) * | 2010-07-15 | 2012-01-19 | Osram Opto Semiconductors Gmbh | Halbleiterbauelement, Substrat und Verfahren zur Herstellung einer Halbleiterschichtenfolge |
KR102248478B1 (ko) | 2014-09-18 | 2021-05-06 | 인텔 코포레이션 | 실리콘 cmos-호환가능 반도체 디바이스들에서의 결함 전파 제어를 위한 경사 측벽 패싯들을 가지는 우르자이트 이종에피택셜 구조체들 |
EP3221886A4 (en) | 2014-11-18 | 2018-07-11 | Intel Corporation | Cmos circuits using n-channel and p-channel gallium nitride transistors |
EP3235005A4 (en) | 2014-12-18 | 2018-09-12 | Intel Corporation | N-channel gallium nitride transistors |
US10211327B2 (en) | 2015-05-19 | 2019-02-19 | Intel Corporation | Semiconductor devices with raised doped crystalline structures |
EP3314659A4 (en) | 2015-06-26 | 2019-01-23 | INTEL Corporation | HETEROSEPITAXIAL STRUCTURES WITH STABLE SUBSTRATE INTERFACE MATERIAL AT HIGH TEMPERATURE |
WO2017111869A1 (en) | 2015-12-24 | 2017-06-29 | Intel Corporation | Transition metal dichalcogenides (tmdcs) over iii-nitride heteroepitaxial layers |
WO2019066953A1 (en) | 2017-09-29 | 2019-04-04 | Intel Corporation | REDUCED CONTACT RESISTANCE GROUP III (N-N) NITRIDE DEVICES AND METHODS OF MAKING SAME |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11145516A (ja) * | 1997-11-07 | 1999-05-28 | Toyoda Gosei Co Ltd | 窒化ガリウム系化合物半導体の製造方法 |
JP2000331937A (ja) * | 1999-03-17 | 2000-11-30 | Mitsubishi Cable Ind Ltd | 半導体基材及びその作製方法 |
US6261929B1 (en) * | 2000-02-24 | 2001-07-17 | North Carolina State University | Methods of forming a plurality of semiconductor layers using spaced trench arrays |
JP2001345282A (ja) * | 2000-03-31 | 2001-12-14 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体の製造方法及びiii族窒化物系化合物半導体素子 |
JP2002252422A (ja) * | 2001-02-27 | 2002-09-06 | Sanyo Electric Co Ltd | 窒化物系半導体素子および窒化物半導体の形成方法 |
JP2003063895A (ja) * | 2001-06-13 | 2003-03-05 | Nichia Chem Ind Ltd | 窒化物半導体基板、及びその製造方法 |
JP2004158500A (ja) * | 2002-11-01 | 2004-06-03 | Nichia Chem Ind Ltd | 窒化物半導体、窒化物半導体基板、窒化物半導体素子及びそれらの製造方法 |
US20040157358A1 (en) * | 2001-08-01 | 2004-08-12 | Kazumasa Hiramatsu | Group III nitride semiconductor film and its production method |
JP2006120841A (ja) * | 2004-10-21 | 2006-05-11 | Toyoda Gosei Co Ltd | 半導体の製造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6265289B1 (en) | 1998-06-10 | 2001-07-24 | North Carolina State University | Methods of fabricating gallium nitride semiconductor layers by lateral growth from sidewalls into trenches, and gallium nitride semiconductor structures fabricated thereby |
US6177688B1 (en) * | 1998-11-24 | 2001-01-23 | North Carolina State University | Pendeoepitaxial gallium nitride semiconductor layers on silcon carbide substrates |
KR100677683B1 (ko) * | 1999-03-17 | 2007-02-05 | 미츠비시 덴센 고교 가부시키가이샤 | 반도체 기재와 그 제조 방법 및 반도체 결정의 제조 방법 |
US6599362B2 (en) | 2001-01-03 | 2003-07-29 | Sandia Corporation | Cantilever epitaxial process |
JP4876319B2 (ja) * | 2001-03-09 | 2012-02-15 | ソニー株式会社 | 表示装置およびその製造方法 |
JP4201541B2 (ja) * | 2002-07-19 | 2008-12-24 | 豊田合成株式会社 | 半導体結晶の製造方法及びiii族窒化物系化合物半導体発光素子の製造方法 |
WO2004099473A1 (en) * | 2003-05-06 | 2004-11-18 | Canon Kabushiki Kaisha | Semiconductor substrate, semiconductor device, light emitting diode and producing method therefor |
US7067328B2 (en) * | 2003-09-25 | 2006-06-27 | Nanosys, Inc. | Methods, devices and compositions for depositing and orienting nanostructures |
TWI442456B (zh) * | 2004-08-31 | 2014-06-21 | Sophia School Corp | 發光元件 |
GB2436398B (en) | 2006-03-23 | 2011-08-24 | Univ Bath | Growth method using nanostructure compliant layers and HVPE for producing high quality compound semiconductor materials |
US7692198B2 (en) * | 2007-02-19 | 2010-04-06 | Alcatel-Lucent Usa Inc. | Wide-bandgap semiconductor devices |
-
2007
- 2007-02-19 US US11/676,329 patent/US7692198B2/en not_active Expired - Fee Related
-
2008
- 2008-02-19 CN CN2008800055149A patent/CN101622689B/zh not_active Expired - Fee Related
- 2008-02-19 JP JP2009550894A patent/JP2010521801A/ja active Pending
- 2008-02-19 EP EP08725743A patent/EP2113040A2/en not_active Withdrawn
- 2008-02-19 WO PCT/US2008/002143 patent/WO2008103331A2/en active Application Filing
- 2008-02-19 KR KR1020097017227A patent/KR101293333B1/ko not_active IP Right Cessation
-
2009
- 2009-12-10 US US12/635,436 patent/US20100105197A1/en not_active Abandoned
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11145516A (ja) * | 1997-11-07 | 1999-05-28 | Toyoda Gosei Co Ltd | 窒化ガリウム系化合物半導体の製造方法 |
JP2000331937A (ja) * | 1999-03-17 | 2000-11-30 | Mitsubishi Cable Ind Ltd | 半導体基材及びその作製方法 |
US6261929B1 (en) * | 2000-02-24 | 2001-07-17 | North Carolina State University | Methods of forming a plurality of semiconductor layers using spaced trench arrays |
JP2001345282A (ja) * | 2000-03-31 | 2001-12-14 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体の製造方法及びiii族窒化物系化合物半導体素子 |
JP2002252422A (ja) * | 2001-02-27 | 2002-09-06 | Sanyo Electric Co Ltd | 窒化物系半導体素子および窒化物半導体の形成方法 |
JP2003063895A (ja) * | 2001-06-13 | 2003-03-05 | Nichia Chem Ind Ltd | 窒化物半導体基板、及びその製造方法 |
US20040157358A1 (en) * | 2001-08-01 | 2004-08-12 | Kazumasa Hiramatsu | Group III nitride semiconductor film and its production method |
JP2004158500A (ja) * | 2002-11-01 | 2004-06-03 | Nichia Chem Ind Ltd | 窒化物半導体、窒化物半導体基板、窒化物半導体素子及びそれらの製造方法 |
JP2006120841A (ja) * | 2004-10-21 | 2006-05-11 | Toyoda Gosei Co Ltd | 半導体の製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017535051A (ja) * | 2014-09-25 | 2017-11-24 | インテル・コーポレーション | 自立シリコンメサ上のiii−nエピタキシャル素子構造 |
Also Published As
Publication number | Publication date |
---|---|
KR101293333B1 (ko) | 2013-08-06 |
US20080197358A1 (en) | 2008-08-21 |
KR20090112708A (ko) | 2009-10-28 |
WO2008103331A2 (en) | 2008-08-28 |
WO2008103331A3 (en) | 2008-11-06 |
EP2113040A2 (en) | 2009-11-04 |
CN101622689A (zh) | 2010-01-06 |
US20100105197A1 (en) | 2010-04-29 |
CN101622689B (zh) | 2011-05-18 |
US7692198B2 (en) | 2010-04-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2010521801A (ja) | 広バンドギャップ半導体デバイス | |
US10879065B2 (en) | III-V compound semiconductors in isolation regions and method forming same | |
US9947829B2 (en) | Substrate with buffer layer for oriented nanowire growth | |
CN101443887B (zh) | Gan纳米线的脉冲式生长及在族ⅲ氮化物半导体衬底材料中的应用和器件 | |
JP6219905B2 (ja) | 半導体薄膜構造及びその形成方法 | |
US8435820B2 (en) | Patterned substrate for hetero-epitaxial growth of group-III nitride film | |
US20080261403A1 (en) | Method for obtaining high-quality boundary for semiconductor devices fabricated on a partitioned substrate | |
TWI440073B (zh) | 電路結構的製造方法 | |
US9711352B2 (en) | Large-area, laterally-grown epitaxial semiconductor layers | |
US8334156B2 (en) | Nitride semiconductor single crystal substrate, and methods of fabricating the same and a vertical nitride semiconductor light emitting diode using the same | |
KR100809235B1 (ko) | 질화물 반도체 발광소자 제조방법 | |
US7651927B2 (en) | Semiconductor device and method for fabricating the same | |
US20160133792A1 (en) | Semiconductor substrate and method of fabricating the same | |
KR100809234B1 (ko) | 질화물 반도체 발광소자 제조방법 | |
JP2011192752A (ja) | 半導体素子の製造方法 | |
US20060269745A1 (en) | Nano wires and method of manufacturing the same | |
US20210183652A1 (en) | Method of forming gallium nitride film over soi substrate | |
RU2758776C2 (ru) | Способ изготовления наноколончатой гетероструктуры на основе соединений iii-n | |
KR101761833B1 (ko) | 반도체 기판, 그 제조 방법, 반도체 디바이스 및 그 제조 방법 | |
EP4345922A1 (en) | Gan-on-si epiwafer comprising a strain-decoupling sub-stack | |
JP5437121B2 (ja) | 半導体素子の製造方法 | |
BRPI0708752A2 (pt) | crescimento pulsado de nanofio de gan e aplicações em materiais e dispositivos de substrato semicondutor de nitreto do grupo iii |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100521 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20120531 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120618 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20120710 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20120918 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20120925 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20121218 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130219 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20130517 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20130524 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20130919 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140120 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20140127 |
|
A912 | Re-examination (zenchi) completed and case transferred to appeal board |
Free format text: JAPANESE INTERMEDIATE CODE: A912 Effective date: 20140404 |