JP2010515606A5 - - Google Patents

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JP2010515606A5
JP2010515606A5 JP2009545611A JP2009545611A JP2010515606A5 JP 2010515606 A5 JP2010515606 A5 JP 2010515606A5 JP 2009545611 A JP2009545611 A JP 2009545611A JP 2009545611 A JP2009545611 A JP 2009545611A JP 2010515606 A5 JP2010515606 A5 JP 2010515606A5
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smoothing
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  1. 表面処理された3次元物体を形成するための方法であって、
    高速製造された3次元物体であって、組成に熱可塑性材料を含み、高速製造技術による表面効果を含む外表面を有する3次元物体を用意するステップと、
    高速製造された前記3次元物体の前記外表面を、溶剤を用いた平滑化プロセスによって平滑化するステップであって、該溶剤を用いた平滑化プロセスは、平滑化するステップが行われる前の外表面より光沢度がより高い外表面であって溶剤を用いて平滑化された外表面を提供するために表面効果を低減又は除去するための蒸気平滑化プロセスを含むステップと、
    前記溶剤によって平滑化された外表面の少なくとも一部を媒体を用いてブラスト加工するステップであって、その媒体を用いたブラスト加工ステップが行われる前の外表面であって溶剤を用いて平滑化されたその外表面よりも光沢度がより低い、研磨された外表面を提供するステップと、
    を含む、方法。
  2. 前記溶剤を用いた平滑化プロセスは、前記外表面における、前記3次元物体の気孔率を減少させる、請求項1に記載の方法。
  3. 前記溶剤を用いた平滑化プロセスにて、塩化メチレン、臭化n−プロピル、ペルクロロエチレン、トリクロロエチレン、アセトン、メチルエチルケトン、ジメチルアセトアミド、キシレン、トルエン、水、アルコール、およびそれらの組み合わせから成る群から選択される溶剤が使用される、請求項1又は請求項2に記載の方法。
  4. 前記外表面を平滑化するステップに先立って、前記高速製造された3次元物体を、常温を下回る温度に冷却するステップをさらに含む、請求項1ないし請求項3の何れか1項に記載の方法。
  5. 前記高速製造された3次元物体を、フック状部材から懸架するステップをさらに含む、請求項1ないし請求項4の何れか1項に記載の方法。
  6. 前記溶剤によって平滑化された外表面から、少なくとも1つの表面欠陥を研磨除去するステップをさらに含む、請求項1ないし請求項5の何れか1項に記載の方法。
  7. 前記媒体を用いたブラスト加工は、重炭酸ナトリウムを用いたブラスト加工を含む、請求項1ないし請求項6の何れか1項に記載の方法。
  8. 前記3次元物体の外表面の鏡面反射率を監視するステップをさらに含む、請求項1ないし請求項7の何れか1項に記載の方法。
  9. 前記鏡面反射率が所定のレベルに到達すると、前記溶剤を用いた平滑化プロセスを中断する動作と、前記媒体を用いたブラスト加工を中断する動作と、から成る群から選択される動作を実施するステップをさらに含む、請求項8に記載の方法。
  10. 表面処理された3次元物体を形成するための方法であって、
    3次元物体の少なくとも一部を、熱可塑性材料から高速製造技術によって構築するステップであって、前記3次元物体が、高速製造技術による表面効果を含む外表面を有する、ステップと、
    高速製造された3次元物体の外表面を、蒸気平滑化プロセスによって平滑化し、前記表面効果を低減又は除去して前記外表面の鏡面反射率を増加させるステップと、
    溶剤を用いて平滑化された外表面の少なくとも一部を媒体を用いてブラスト加工し、前記外表面の前記鏡面反射率を低減させるステップと、
    を含む、方法。
  11. 前記蒸気平滑化プロセスにて、塩化メチレン、臭化n−プロピル、ペルクロロエチレン、トリクロロエチレン、アセトン、メチルエチルケトン、ジメチルアセトアミド、キシレン、トルエン、水、アルコール、およびそれらの組合せからなる群から選択される溶剤が用いられる、請求項10に記載の方法。
  12. 前記平滑化プロセスは、前記外表面における、前記3次元物体の気孔率を減少させる、請求項10又は請求項11に記載の方法。
  13. 前記外表面の鏡面反射率を監視するステップをさらに含む、請求項10ないし請求項12の何れか1項に記載の方法。
  14. 前記媒体を用いたブラスト加工のプロセスは、重炭酸ナトリウムによるブラスト加工を含む、請求項10ないし請求項13の何れか1項に記載の方法。
JP2009545611A 2007-01-12 2008-01-11 高速製造された3次元物体のための表面処理方法 Active JP5290995B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/652,876 2007-01-12
US11/652,876 US8765045B2 (en) 2007-01-12 2007-01-12 Surface-treatment method for rapid-manufactured three-dimensional objects
PCT/US2008/000430 WO2008088761A1 (en) 2007-01-12 2008-01-11 Surface-treatment method for rapid-manufactured three-dimensional objects

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JP2010515606A JP2010515606A (ja) 2010-05-13
JP2010515606A5 true JP2010515606A5 (ja) 2011-02-17
JP5290995B2 JP5290995B2 (ja) 2013-09-18

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EP (1) EP2121266B1 (ja)
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CN (1) CN101578169B (ja)
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