JP2010281876A - 光学素子及びそれを有する光学系 - Google Patents

光学素子及びそれを有する光学系 Download PDF

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Publication number
JP2010281876A
JP2010281876A JP2009132941A JP2009132941A JP2010281876A JP 2010281876 A JP2010281876 A JP 2010281876A JP 2009132941 A JP2009132941 A JP 2009132941A JP 2009132941 A JP2009132941 A JP 2009132941A JP 2010281876 A JP2010281876 A JP 2010281876A
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JP
Japan
Prior art keywords
layer
optical element
antireflection
optical
grating
Prior art date
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Pending
Application number
JP2009132941A
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English (en)
Japanese (ja)
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JP2010281876A5 (enExample
Inventor
Takehiko Nakai
中井　　武彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2009132941A priority Critical patent/JP2010281876A/ja
Priority to US12/792,344 priority patent/US20100302642A1/en
Publication of JP2010281876A publication Critical patent/JP2010281876A/ja
Publication of JP2010281876A5 publication Critical patent/JP2010281876A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP2009132941A 2009-06-02 2009-06-02 光学素子及びそれを有する光学系 Pending JP2010281876A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009132941A JP2010281876A (ja) 2009-06-02 2009-06-02 光学素子及びそれを有する光学系
US12/792,344 US20100302642A1 (en) 2009-06-02 2010-06-02 Optical element and optical system including the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009132941A JP2010281876A (ja) 2009-06-02 2009-06-02 光学素子及びそれを有する光学系

Publications (2)

Publication Number Publication Date
JP2010281876A true JP2010281876A (ja) 2010-12-16
JP2010281876A5 JP2010281876A5 (enExample) 2012-07-19

Family

ID=43219914

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009132941A Pending JP2010281876A (ja) 2009-06-02 2009-06-02 光学素子及びそれを有する光学系

Country Status (2)

Country Link
US (1) US20100302642A1 (enExample)
JP (1) JP2010281876A (enExample)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010213502A (ja) * 2009-03-11 2010-09-24 Omron Corp 充電制御装置および方法、並びにプログラム
JP2012203354A (ja) * 2011-03-28 2012-10-22 Dainippon Printing Co Ltd 反射防止フィルム製造用金型の製造方法
JP2012208257A (ja) * 2011-03-29 2012-10-25 Kuraray Co Ltd 反射防止構造及び光学部材
JP2013231780A (ja) * 2012-04-27 2013-11-14 Kuraray Co Ltd 反射防止構造及び光学部材
JP2013231779A (ja) * 2012-04-27 2013-11-14 Kuraray Co Ltd 反射防止構造及び光学部材
JP2014122971A (ja) * 2012-12-20 2014-07-03 Nidec Sankyo Corp レンズユニット
JP2015212809A (ja) * 2014-04-18 2015-11-26 王子ホールディングス株式会社 光学素子
JP2017129763A (ja) * 2016-01-21 2017-07-27 リコーインダストリアルソリューションズ株式会社 反射率調整光学素子および光学装置
JP2017203934A (ja) * 2016-05-13 2017-11-16 凸版印刷株式会社 反射型フォトマスク
JP2020106628A (ja) * 2018-12-27 2020-07-09 株式会社タムロン 反射防止構造体付き光学素子、その製造方法、製造用金型の製造方法及び撮像装置

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5780973B2 (ja) * 2012-01-24 2015-09-16 富士フイルム株式会社 反射防止膜
JP2014145868A (ja) * 2013-01-29 2014-08-14 Ricoh Co Ltd 光学素子、モールド、光学装置
CN108254811A (zh) * 2018-01-19 2018-07-06 电子科技大学 一种具有三台阶抗反射结构的红外光学窗口及其制备方法
CN109085667B (zh) * 2018-07-05 2019-12-06 华中科技大学 一种超表面消色差线偏光透镜
DE102020112403B4 (de) 2020-05-07 2022-03-31 Precitec Gmbh & Co. Kg Laserbearbeitungsvorrichtung zum Bearbeiten von Werkstücken mittels eines Laserstrahls

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005173120A (ja) * 2003-12-10 2005-06-30 Fuji Photo Film Co Ltd 低反射構造体および低反射構造体の作製方法
WO2006059686A1 (ja) * 2004-12-03 2006-06-08 Sharp Kabushiki Kaisha 反射防止材、光学素子、および表示装置ならびにスタンパの製造方法およびスタンパを用いた反射防止材の製造方法
JP2006251318A (ja) * 2005-03-10 2006-09-21 Matsushita Electric Ind Co Ltd 反射防止構造体を有する部材の製造方法
JP2007240854A (ja) * 2006-03-08 2007-09-20 Nissan Motor Co Ltd 反射防止構造体
WO2008001936A1 (en) * 2006-06-30 2008-01-03 Panasonic Corporation Antireflection structure and method for producing the same

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001272505A (ja) * 2000-03-24 2001-10-05 Japan Science & Technology Corp 表面処理方法
JP2002182003A (ja) * 2000-12-14 2002-06-26 Canon Inc 反射防止機能素子、光学素子、光学系および光学機器
JP4197100B2 (ja) * 2002-02-20 2008-12-17 大日本印刷株式会社 反射防止物品
JP3870111B2 (ja) * 2002-03-13 2007-01-17 キヤノン株式会社 走査光学系及びそれを用いた画像形成装置
US7268948B2 (en) * 2004-03-31 2007-09-11 Canon Kabushiki Kaisha Optical element and optical scanning device using the same
KR100584403B1 (ko) * 2004-04-01 2006-05-26 삼성전자주식회사 회절 격자와 그를 이용한 레이저 텔레비젼
US8133538B2 (en) * 2006-03-17 2012-03-13 Canon Kabushiki Kaisha Method of producing mold having uneven structure
US7713768B2 (en) * 2006-06-14 2010-05-11 Kanagawa Academy Of Science And Technology Anti-reflective film and production method thereof, and stamper for producing anti-reflective film and production method thereof
CN101398496A (zh) * 2007-09-24 2009-04-01 鸿富锦精密工业（深圳）有限公司 滤光片
BRPI0721635A2 (pt) * 2007-09-28 2014-02-25 Toppan Printing Co Ltd Representação e artigo rotulado.
US8338802B2 (en) * 2010-08-27 2012-12-25 Rensselaer Polytechnic Institute Terahertz radiation anti-reflection devices and methods for handling terahertz radiation

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005173120A (ja) * 2003-12-10 2005-06-30 Fuji Photo Film Co Ltd 低反射構造体および低反射構造体の作製方法
WO2006059686A1 (ja) * 2004-12-03 2006-06-08 Sharp Kabushiki Kaisha 反射防止材、光学素子、および表示装置ならびにスタンパの製造方法およびスタンパを用いた反射防止材の製造方法
JP2006251318A (ja) * 2005-03-10 2006-09-21 Matsushita Electric Ind Co Ltd 反射防止構造体を有する部材の製造方法
JP2007240854A (ja) * 2006-03-08 2007-09-20 Nissan Motor Co Ltd 反射防止構造体
WO2008001936A1 (en) * 2006-06-30 2008-01-03 Panasonic Corporation Antireflection structure and method for producing the same

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010213502A (ja) * 2009-03-11 2010-09-24 Omron Corp 充電制御装置および方法、並びにプログラム
JP2012203354A (ja) * 2011-03-28 2012-10-22 Dainippon Printing Co Ltd 反射防止フィルム製造用金型の製造方法
JP2012208257A (ja) * 2011-03-29 2012-10-25 Kuraray Co Ltd 反射防止構造及び光学部材
JP2013231780A (ja) * 2012-04-27 2013-11-14 Kuraray Co Ltd 反射防止構造及び光学部材
JP2013231779A (ja) * 2012-04-27 2013-11-14 Kuraray Co Ltd 反射防止構造及び光学部材
JP2014122971A (ja) * 2012-12-20 2014-07-03 Nidec Sankyo Corp レンズユニット
JP2015212809A (ja) * 2014-04-18 2015-11-26 王子ホールディングス株式会社 光学素子
JP2017129763A (ja) * 2016-01-21 2017-07-27 リコーインダストリアルソリューションズ株式会社 反射率調整光学素子および光学装置
JP2017203934A (ja) * 2016-05-13 2017-11-16 凸版印刷株式会社 反射型フォトマスク
JP2020106628A (ja) * 2018-12-27 2020-07-09 株式会社タムロン 反射防止構造体付き光学素子、その製造方法、製造用金型の製造方法及び撮像装置
JP7204479B2 (ja) 2018-12-27 2023-01-16 株式会社タムロン 反射防止構造体付き光学素子、その製造方法、製造用金型の製造方法及び撮像装置

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