JP2010153922A5 - - Google Patents
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- Publication number
- JP2010153922A5 JP2010153922A5 JP2010080762A JP2010080762A JP2010153922A5 JP 2010153922 A5 JP2010153922 A5 JP 2010153922A5 JP 2010080762 A JP2010080762 A JP 2010080762A JP 2010080762 A JP2010080762 A JP 2010080762A JP 2010153922 A5 JP2010153922 A5 JP 2010153922A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- mask
- circuit pattern
- semiconductor wafer
- exposing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims 93
- 229920002120 photoresistant polymer Polymers 0.000 claims 50
- 238000004519 manufacturing process Methods 0.000 claims 31
- 239000007788 liquid Substances 0.000 claims 22
- 238000000034 method Methods 0.000 claims 12
- 239000000126 substance Substances 0.000 claims 10
- 239000000758 substrate Substances 0.000 claims 8
- 230000015572 biosynthetic process Effects 0.000 claims 6
- 239000011248 coating agent Substances 0.000 claims 6
- 238000000576 coating method Methods 0.000 claims 6
- 238000005229 chemical vapour deposition Methods 0.000 claims 5
- 238000013461 design Methods 0.000 claims 5
- 230000003287 optical effect Effects 0.000 claims 5
- 238000005498 polishing Methods 0.000 claims 5
- 238000004544 sputter deposition Methods 0.000 claims 5
- 238000012937 correction Methods 0.000 claims 4
- 238000012545 processing Methods 0.000 claims 4
- 230000010363 phase shift Effects 0.000 claims 3
- 230000005540 biological transmission Effects 0.000 claims 2
- 238000006243 chemical reaction Methods 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 2
- 238000003384 imaging method Methods 0.000 claims 1
- 230000004044 response Effects 0.000 claims 1
- 238000012546 transfer Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010080762A JP2010153922A (ja) | 2004-02-09 | 2010-03-31 | 半導体装置の製造方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004031528 | 2004-02-09 | ||
| JP2010080762A JP2010153922A (ja) | 2004-02-09 | 2010-03-31 | 半導体装置の製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005517741A Division JP4529141B2 (ja) | 2004-02-09 | 2005-02-04 | 露光装置及びそれを用いた半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010153922A JP2010153922A (ja) | 2010-07-08 |
| JP2010153922A5 true JP2010153922A5 (https=) | 2011-12-01 |
Family
ID=34836053
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005517741A Expired - Fee Related JP4529141B2 (ja) | 2004-02-09 | 2005-02-04 | 露光装置及びそれを用いた半導体装置の製造方法 |
| JP2010080762A Pending JP2010153922A (ja) | 2004-02-09 | 2010-03-31 | 半導体装置の製造方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005517741A Expired - Fee Related JP4529141B2 (ja) | 2004-02-09 | 2005-02-04 | 露光装置及びそれを用いた半導体装置の製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US8048614B2 (https=) |
| JP (2) | JP4529141B2 (https=) |
| KR (2) | KR101118834B1 (https=) |
| WO (1) | WO2005076322A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4450769B2 (ja) * | 2005-06-16 | 2010-04-14 | 富士フイルム株式会社 | 画像処理装置、画像描画装置及びシステム |
| JP6474655B2 (ja) * | 2014-09-30 | 2019-02-27 | エイブリック株式会社 | レチクル透過率測定方法、投影露光装置および投影露光方法 |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57153433A (en) * | 1981-03-18 | 1982-09-22 | Hitachi Ltd | Manufacturing device for semiconductor |
| JPS63295350A (ja) | 1987-05-26 | 1988-12-01 | Ozen Corp | シ−ト重複検知装置 |
| JPH0216717A (ja) * | 1988-07-05 | 1990-01-19 | Nikon Corp | パターン投影装置 |
| JPH03137511A (ja) | 1989-10-24 | 1991-06-12 | Nkk Corp | 二重管式連通管 |
| JPH0852997A (ja) | 1991-03-29 | 1996-02-27 | Masaki Kawasaki | 積層板構造の象嵌模様入り製品及びその製造方法 |
| US5391441A (en) * | 1992-02-21 | 1995-02-21 | Hitachi, Ltd. | Exposure mask and method of manufacture thereof |
| JP2753930B2 (ja) * | 1992-11-27 | 1998-05-20 | キヤノン株式会社 | 液浸式投影露光装置 |
| JP3747566B2 (ja) | 1997-04-23 | 2006-02-22 | 株式会社ニコン | 液浸型露光装置 |
| JP3817836B2 (ja) * | 1997-06-10 | 2006-09-06 | 株式会社ニコン | 露光装置及びその製造方法並びに露光方法及びデバイス製造方法 |
| US6184083B1 (en) * | 1997-06-30 | 2001-02-06 | Kabushiki Kaisha Toshiba | Semiconductor device and method of manufacturing the same |
| JPH11260686A (ja) * | 1998-03-11 | 1999-09-24 | Toshiba Corp | 露光方法 |
| AU2747899A (en) * | 1998-03-20 | 1999-10-18 | Nikon Corporation | Photomask and projection exposure system |
| WO1999049504A1 (fr) * | 1998-03-26 | 1999-09-30 | Nikon Corporation | Procede et systeme d'exposition par projection |
| JP2000058436A (ja) * | 1998-08-11 | 2000-02-25 | Nikon Corp | 投影露光装置及び露光方法 |
| JP2000183346A (ja) * | 1998-12-15 | 2000-06-30 | Toshiba Corp | 半導体装置及びその製造方法 |
| TW497165B (en) * | 1999-06-30 | 2002-08-01 | Hitachi Ltd | Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor |
| JP2001117213A (ja) | 1999-08-10 | 2001-04-27 | Nikon Corp | フォトマスク、該フォトマスクの製造方法、該フォトマスクを扱う投影露光装置、及び投影露光方法 |
| JP3495983B2 (ja) * | 2000-12-28 | 2004-02-09 | キヤノン株式会社 | マスク及び投影露光装置 |
| US7092069B2 (en) * | 2002-03-08 | 2006-08-15 | Carl Zeiss Smt Ag | Projection exposure method and projection exposure system |
| DE10258718A1 (de) * | 2002-12-09 | 2004-06-24 | Carl Zeiss Smt Ag | Projektionsobjektiv, insbesondere für die Mikrolithographie, sowie Verfahren zur Abstimmung eines Projektionsobjektives |
| US7014966B2 (en) * | 2003-09-02 | 2006-03-21 | Advanced Micro Devices, Inc. | Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems |
| US20050161644A1 (en) * | 2004-01-23 | 2005-07-28 | Peng Zhang | Immersion lithography fluids |
| CN101727021A (zh) * | 2004-02-13 | 2010-06-09 | 卡尔蔡司Smt股份公司 | 微平版印刷投影曝光装置的投影物镜 |
-
2005
- 2005-02-04 WO PCT/JP2005/001669 patent/WO2005076322A1/ja not_active Ceased
- 2005-02-04 KR KR1020117014358A patent/KR101118834B1/ko not_active Expired - Fee Related
- 2005-02-04 JP JP2005517741A patent/JP4529141B2/ja not_active Expired - Fee Related
- 2005-02-04 KR KR1020067018448A patent/KR101118787B1/ko not_active Expired - Fee Related
-
2006
- 2006-08-09 US US11/463,467 patent/US8048614B2/en active Active
-
2010
- 2010-03-31 JP JP2010080762A patent/JP2010153922A/ja active Pending
- 2010-08-27 US US12/870,752 patent/US20110229824A1/en not_active Abandoned
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