JP2010153173A5 - - Google Patents
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- Publication number
- JP2010153173A5 JP2010153173A5 JP2008329386A JP2008329386A JP2010153173A5 JP 2010153173 A5 JP2010153173 A5 JP 2010153173A5 JP 2008329386 A JP2008329386 A JP 2008329386A JP 2008329386 A JP2008329386 A JP 2008329386A JP 2010153173 A5 JP2010153173 A5 JP 2010153173A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- dielectric film
- refractive index
- substrate
- dielectric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 239000000758 substrate Substances 0.000 claims 21
- 229910052581 Si3N4 Inorganic materials 0.000 claims 4
- 230000008021 deposition Effects 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 4
- 239000000463 material Substances 0.000 claims 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 4
- 238000000034 method Methods 0.000 claims 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008329386A JP2010153173A (ja) | 2008-12-25 | 2008-12-25 | 成膜用基板および発光装置の作製方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008329386A JP2010153173A (ja) | 2008-12-25 | 2008-12-25 | 成膜用基板および発光装置の作製方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010153173A JP2010153173A (ja) | 2010-07-08 |
| JP2010153173A5 true JP2010153173A5 (enExample) | 2012-01-19 |
Family
ID=42572050
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008329386A Withdrawn JP2010153173A (ja) | 2008-12-25 | 2008-12-25 | 成膜用基板および発光装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2010153173A (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013020768A (ja) * | 2011-07-08 | 2013-01-31 | Ulvac Japan Ltd | レーザ転写装置 |
| JP2013020767A (ja) * | 2011-07-08 | 2013-01-31 | Ulvac Japan Ltd | 有機発光デバイスの製造装置及びその製造方法 |
| KR101615332B1 (ko) | 2012-03-06 | 2016-04-26 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치의 화소 배열 구조 |
| US10832616B2 (en) | 2012-03-06 | 2020-11-10 | Samsung Display Co., Ltd. | Pixel arrangement structure for organic light emitting diode display |
| KR101427593B1 (ko) | 2013-04-26 | 2014-08-07 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 |
| JP6140548B2 (ja) * | 2013-06-25 | 2017-05-31 | 株式会社アルバック | レーザ転写装置 |
| CN114709342A (zh) * | 2022-04-01 | 2022-07-05 | 江西兆驰半导体有限公司 | 一种钙钛矿led及其制作方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0634390B2 (ja) * | 1986-05-21 | 1994-05-02 | 日産自動車株式会社 | Ｅｌ表示装置 |
| JPH0614248B2 (ja) * | 1988-12-06 | 1994-02-23 | 旭硝子株式会社 | 帯電防止効果を有する反射防止多層膜付パネル及びその製造方法 |
| TW501379B (en) * | 2000-07-25 | 2002-09-01 | Eastman Kodak Co | Method of making organic electroluminescent device using laser transfer |
| JP2002289348A (ja) * | 2001-03-27 | 2002-10-04 | Sharp Corp | ドナーシートの製造方法及び有機エレクトロルミネッセンス素子 |
| JP2003177229A (ja) * | 2001-12-11 | 2003-06-27 | Fuji Photo Film Co Ltd | カラーフィルター付回路基板の形成方法及びカラーフィルター付回路基板 |
| JP2003257637A (ja) * | 2002-03-04 | 2003-09-12 | Sharp Corp | 有機ｌｅｄ素子の製造方法と製造装置 |
| JP2004138762A (ja) * | 2002-10-17 | 2004-05-13 | Dainippon Printing Co Ltd | シリカ薄膜とその製造装置、及びシリカ薄膜を用いた透明積層フィルム |
| US6790594B1 (en) * | 2003-03-20 | 2004-09-14 | Eastman Kodak Company | High absorption donor substrate coatable with organic layer(s) transferrable in response to incident laser light |
| JP2007322572A (ja) * | 2006-05-31 | 2007-12-13 | Omron Corp | 反射防止光学素子 |
| US20080049431A1 (en) * | 2006-08-24 | 2008-02-28 | Heather Debra Boek | Light emitting device including anti-reflection layer(s) |
| JP2008066147A (ja) * | 2006-09-07 | 2008-03-21 | Fuji Electric Holdings Co Ltd | 蒸着によるパターン形成方法、該方法を含む色変換フィルタ基板およびカラー有機ｅｌ素子の製造方法 |
-
2008
- 2008-12-25 JP JP2008329386A patent/JP2010153173A/ja not_active Withdrawn
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