JP2009283456A5 - - Google Patents
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- Publication number
- JP2009283456A5 JP2009283456A5 JP2009102833A JP2009102833A JP2009283456A5 JP 2009283456 A5 JP2009283456 A5 JP 2009283456A5 JP 2009102833 A JP2009102833 A JP 2009102833A JP 2009102833 A JP2009102833 A JP 2009102833A JP 2009283456 A5 JP2009283456 A5 JP 2009283456A5
- Authority
- JP
- Japan
- Prior art keywords
- light
- layer
- manufacturing
- emitting device
- functional
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010410 layer Substances 0.000 claims 12
- 239000000463 material Substances 0.000 claims 9
- 238000004519 manufacturing process Methods 0.000 claims 8
- 238000000034 method Methods 0.000 claims 8
- 239000000758 substrate Substances 0.000 claims 6
- 239000002346 layers by function Substances 0.000 claims 5
- 230000031700 light absorption Effects 0.000 claims 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims 1
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 claims 1
- RRZKHZBOZDIQJG-UHFFFAOYSA-N azane;manganese Chemical compound N.[Mn] RRZKHZBOZDIQJG-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims 1
- 150000002894 organic compounds Chemical class 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 1
- 239000011787 zinc oxide Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009102833A JP5159689B2 (ja) | 2008-04-25 | 2009-04-21 | 発光装置の作製方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008114975 | 2008-04-25 | ||
| JP2008114975 | 2008-04-25 | ||
| JP2009102833A JP5159689B2 (ja) | 2008-04-25 | 2009-04-21 | 発光装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009283456A JP2009283456A (ja) | 2009-12-03 |
| JP2009283456A5 true JP2009283456A5 (enExample) | 2012-06-07 |
| JP5159689B2 JP5159689B2 (ja) | 2013-03-06 |
Family
ID=41215275
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009102833A Expired - Fee Related JP5159689B2 (ja) | 2008-04-25 | 2009-04-21 | 発光装置の作製方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US8293319B2 (enExample) |
| JP (1) | JP5159689B2 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5416987B2 (ja) * | 2008-02-29 | 2014-02-12 | 株式会社半導体エネルギー研究所 | 成膜方法及び発光装置の作製方法 |
| US7993945B2 (en) * | 2008-04-11 | 2011-08-09 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing light-emitting device |
| JP5292263B2 (ja) * | 2008-12-05 | 2013-09-18 | 株式会社半導体エネルギー研究所 | 成膜方法及び発光素子の作製方法 |
| JP5361690B2 (ja) * | 2009-12-11 | 2013-12-04 | 株式会社半導体エネルギー研究所 | 成膜用基板 |
| TWI478333B (zh) * | 2012-01-30 | 2015-03-21 | Ind Tech Res Inst | 雙面發光顯示面板 |
| KR20150056112A (ko) * | 2013-11-14 | 2015-05-26 | 삼성디스플레이 주식회사 | 막 형성용 마스크, 이를 이용한 막 형성 방법 및 유기 발광 표시 장치의 제조 방법 |
| US9595497B2 (en) | 2014-06-13 | 2017-03-14 | Apple Inc. | Display with low reflectivity alignment structures |
| DE102015119327A1 (de) * | 2015-11-10 | 2017-05-11 | Von Ardenne Gmbh | Verfahren, Beschichtungsanordnung und Beschichtungsmaterial-Transfer-Maske |
| KR102772252B1 (ko) * | 2018-12-31 | 2025-02-24 | 삼성디스플레이 주식회사 | 표시 장치 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8824366D0 (en) * | 1988-10-18 | 1988-11-23 | Kodak Ltd | Method of making colour filter array |
| JP3801730B2 (ja) * | 1997-05-09 | 2006-07-26 | 株式会社半導体エネルギー研究所 | プラズマｃｖｄ装置及びそれを用いた薄膜形成方法 |
| US5937272A (en) * | 1997-06-06 | 1999-08-10 | Eastman Kodak Company | Patterned organic layers in a full-color organic electroluminescent display array on a thin film transistor array substrate |
| KR100195176B1 (ko) * | 1997-06-23 | 1999-06-15 | 손욱 | 열전사 필름 |
| US5851709A (en) * | 1997-10-31 | 1998-12-22 | Eastman Kodak Company | Method for selective transfer of a color organic layer |
| US6165543A (en) * | 1998-06-17 | 2000-12-26 | Nec Corporation | Method of making organic EL device and organic EL transfer base plate |
| JP2918037B1 (ja) * | 1998-06-18 | 1999-07-12 | 日本電気株式会社 | カラー有機ｅｌディスプレイとその製造方法 |
| JP3740557B2 (ja) | 1999-03-09 | 2006-02-01 | 独立行政法人産業技術総合研究所 | 有機薄膜作製方法および有機薄膜作製装置 |
| TWI232595B (en) * | 1999-06-04 | 2005-05-11 | Semiconductor Energy Lab | Electroluminescence display device and electronic device |
| US8853696B1 (en) * | 1999-06-04 | 2014-10-07 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device and electronic device |
| SG114589A1 (en) * | 2001-12-12 | 2005-09-28 | Semiconductor Energy Lab | Film formation apparatus and film formation method and cleaning method |
| JP4294305B2 (ja) | 2001-12-12 | 2009-07-08 | 株式会社半導体エネルギー研究所 | 成膜装置および成膜方法 |
| US6555284B1 (en) * | 2001-12-27 | 2003-04-29 | Eastman Kodak Company | In situ vacuum method for making OLED devices |
| US6703179B2 (en) * | 2002-03-13 | 2004-03-09 | Eastman Kodak Company | Transfer of organic material from a donor to form a layer in an OLED device |
| JP2004103406A (ja) | 2002-09-10 | 2004-04-02 | Sony Corp | 薄膜パターン形成方法および装置並びに有機ｅｌ表示装置の製造方法 |
| JP4493926B2 (ja) * | 2003-04-25 | 2010-06-30 | 株式会社半導体エネルギー研究所 | 製造装置 |
| KR100611145B1 (ko) * | 2003-11-25 | 2006-08-09 | 삼성에스디아이 주식회사 | 풀칼라 유기 전계 발광 소자용 도너 필름, 도너 필름의제조 방법 및 이 도너 필름을 사용한 풀칼라 유기 전계발광 소자 |
| US20050145326A1 (en) | 2004-01-05 | 2005-07-07 | Eastman Kodak Company | Method of making an OLED device |
| KR100667069B1 (ko) * | 2004-10-19 | 2007-01-10 | 삼성에스디아이 주식회사 | 도너 기판 및 그를 사용한 유기전계발광표시장치의 제조방법 |
| JP2006344459A (ja) | 2005-06-08 | 2006-12-21 | Sony Corp | 転写方法および転写装置 |
| TWI307612B (en) * | 2005-04-27 | 2009-03-11 | Sony Corp | Transfer method and transfer apparatus |
| JP2006309995A (ja) * | 2005-04-27 | 2006-11-09 | Sony Corp | 転写用基板および表示装置の製造方法ならびに表示装置 |
| JP5013048B2 (ja) * | 2006-04-06 | 2012-08-29 | ソニー株式会社 | 赤色有機発光素子およびこれを備えた表示装置 |
| JP2007311093A (ja) * | 2006-05-17 | 2007-11-29 | Sony Corp | 平面型表示装置、並びに、スペーサ |
| US7575847B2 (en) * | 2006-06-13 | 2009-08-18 | 3M Innovative Properties Company | Low refractive index composition comprising fluoropolyether urethane compound |
| KR101563237B1 (ko) * | 2007-06-01 | 2015-10-26 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 제조장치 및 발광장치 제작방법 |
| KR20090028413A (ko) * | 2007-09-13 | 2009-03-18 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 발광장치 제작방법 및 증착용 기판 |
| KR20090041314A (ko) * | 2007-10-23 | 2009-04-28 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 증착용 기판 및 발광장치의 제조방법 |
| US8153201B2 (en) * | 2007-10-23 | 2012-04-10 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing light-emitting device, and evaporation donor substrate |
| WO2009099002A1 (en) * | 2008-02-04 | 2009-08-13 | Semiconductor Energy Laboratory Co., Ltd. | Deposition method and method for manufacturing light-emitting device |
| US7993945B2 (en) * | 2008-04-11 | 2011-08-09 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing light-emitting device |
| JP5244680B2 (ja) * | 2008-04-14 | 2013-07-24 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
-
2009
- 2009-04-21 JP JP2009102833A patent/JP5159689B2/ja not_active Expired - Fee Related
- 2009-04-24 US US12/429,314 patent/US8293319B2/en not_active Expired - Fee Related
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