WO2009069695A1 - 透明導電膜およびその製造方法 - Google Patents
透明導電膜およびその製造方法 Download PDFInfo
- Publication number
- WO2009069695A1 WO2009069695A1 PCT/JP2008/071537 JP2008071537W WO2009069695A1 WO 2009069695 A1 WO2009069695 A1 WO 2009069695A1 JP 2008071537 W JP2008071537 W JP 2008071537W WO 2009069695 A1 WO2009069695 A1 WO 2009069695A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- transparent electroconductive
- electroconductive film
- transparent
- hydrogen
- containing carbon
- Prior art date
Links
- 239000012789 electroconductive film Substances 0.000 title abstract 6
- 238000000034 method Methods 0.000 title abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 4
- 229910052799 carbon Inorganic materials 0.000 abstract 4
- 229910052739 hydrogen Inorganic materials 0.000 abstract 4
- 239000001257 hydrogen Substances 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 3
- 238000002834 transmittance Methods 0.000 abstract 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 abstract 2
- 230000007613 environmental effect Effects 0.000 abstract 1
- 239000011787 zinc oxide Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Laminated Bodies (AREA)
- Non-Insulated Conductors (AREA)
- Physical Vapour Deposition (AREA)
Abstract
高い耐環境変動性と高い光線透過率とを同時に達成可能な透明導電膜とその製造方法を提供する。 透明導電膜は、透明基板上において1層以上の透明導電性酸化物層と、その上の複数層の水素含有カーボン層を含む透明導電膜であり、透明導電性酸化物層の少なくとも1層は酸化亜鉛を含み、水素含有カーボン層は複数層形成されてよく、その少なくとも1層は屈折率が1.25~1.85、1層以上の透明導電性酸化物層が堆積された透明基板の光線透過率をT0としかつ複数層の水素含有カーボン層まで堆積された透明基板の光線透過率をT1とした場合に波長550nmの光に関してT1/T0≧1.02の関係が成り立つことであることがさらに好ましい透明導電膜となる。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08855605A EP2216791A4 (en) | 2007-11-30 | 2008-11-27 | TRANSPARENT ELECTRO-CONDUCTIVE FILM AND PROCESS FOR PRODUCING THE TRANSPARENT ELECTRO-CONTAINING FILM |
US12/734,667 US20100310863A1 (en) | 2007-11-30 | 2008-11-27 | Transparent electroconductive film and method for producing the same |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-310486 | 2007-11-30 | ||
JP2007310486A JP5192792B2 (ja) | 2007-11-30 | 2007-11-30 | 透明導電膜とその製造方法 |
JP2008078785A JP5478833B2 (ja) | 2008-03-25 | 2008-03-25 | 透明導電膜の製造方法ならびにそれにより作製された透明導電膜 |
JP2008-078785 | 2008-03-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009069695A1 true WO2009069695A1 (ja) | 2009-06-04 |
Family
ID=40678587
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/071537 WO2009069695A1 (ja) | 2007-11-30 | 2008-11-27 | 透明導電膜およびその製造方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20100310863A1 (ja) |
EP (1) | EP2216791A4 (ja) |
WO (1) | WO2009069695A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009193675A (ja) * | 2008-02-12 | 2009-08-27 | Kaneka Corp | 透明導電膜 |
JP2009193673A (ja) * | 2008-02-12 | 2009-08-27 | Kaneka Corp | 透明導電膜の製造方法 |
JP2011003848A (ja) * | 2009-06-22 | 2011-01-06 | Kaneka Corp | 結晶シリコン系太陽電池 |
US20120200928A1 (en) * | 2009-10-08 | 2012-08-09 | Lg Innotek Co., Ltd. | Plate Member For Touch Panel and Method of Manufacturing the Same |
CN114300562A (zh) * | 2021-12-30 | 2022-04-08 | 天合光能股份有限公司 | 一种大尺寸双玻组件封边方法 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101381817B1 (ko) * | 2011-06-30 | 2014-04-07 | 삼성디스플레이 주식회사 | 터치 스크린 패널 |
CN102810347A (zh) * | 2012-03-30 | 2012-12-05 | 梧州三和新材料科技有限公司 | 一种应用于非金属材料的碳—金属嵌渗式导电膜制备方法 |
US8679987B2 (en) * | 2012-05-10 | 2014-03-25 | Applied Materials, Inc. | Deposition of an amorphous carbon layer with high film density and high etch selectivity |
FR2993395A1 (fr) * | 2012-07-12 | 2014-01-17 | St Microelectronics Crolles 2 | Procede de traitement d'un substrat, en particulier pour la protection de couches antireflets |
US10435567B2 (en) * | 2014-02-11 | 2019-10-08 | The Mackinac Technology Company | Fluorinated and hydrogenated diamond-like carbon materials for anti-reflective coatings |
US10650935B2 (en) | 2017-08-04 | 2020-05-12 | Vitro Flat Glass Llc | Transparent conductive oxide having an embedded film |
CN108598198A (zh) * | 2018-04-26 | 2018-09-28 | 上海空间电源研究所 | 一种耐原子氧柔性高透明导电封装材料 |
CN110938804B (zh) * | 2019-12-03 | 2022-06-03 | 中国建筑材料科学研究总院有限公司 | 宽光谱无定形碳膜、光学薄膜及其制备方法 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63102109A (ja) * | 1986-10-17 | 1988-05-07 | 旭硝子株式会社 | 透明電導膜 |
JPH06278244A (ja) * | 1993-01-29 | 1994-10-04 | Mitsui Toatsu Chem Inc | 積層体 |
JPH09156023A (ja) * | 1995-12-05 | 1997-06-17 | Mitsui Toatsu Chem Inc | 透明導電性積層体 |
JP2001283643A (ja) | 2000-03-31 | 2001-10-12 | Toyobo Co Ltd | 透明導電性フィルム、透明導電性シートおよびタッチパネル |
JP2003034860A (ja) | 2001-07-24 | 2003-02-07 | Bridgestone Corp | 透明導電フィルム及びタッチパネル |
JP2003109434A (ja) | 2001-06-27 | 2003-04-11 | Bridgestone Corp | 透明導電フィルム及びタッチパネル |
JP2003113471A (ja) * | 2001-10-03 | 2003-04-18 | Japan Science & Technology Corp | ダイヤモンド様炭素膜透明導電積層体及びその製造方法 |
JP2007122568A (ja) * | 2005-10-31 | 2007-05-17 | Matsushita Electric Ind Co Ltd | 抵抗膜式タッチパネルおよびその製造方法 |
JP2009016179A (ja) * | 2007-07-04 | 2009-01-22 | Kaneka Corp | 透明導電膜とその製造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5266409A (en) * | 1989-04-28 | 1993-11-30 | Digital Equipment Corporation | Hydrogenated carbon compositions |
TW250618B (ja) * | 1993-01-27 | 1995-07-01 | Mitsui Toatsu Chemicals |
-
2008
- 2008-11-27 EP EP08855605A patent/EP2216791A4/en not_active Withdrawn
- 2008-11-27 US US12/734,667 patent/US20100310863A1/en not_active Abandoned
- 2008-11-27 WO PCT/JP2008/071537 patent/WO2009069695A1/ja active Application Filing
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63102109A (ja) * | 1986-10-17 | 1988-05-07 | 旭硝子株式会社 | 透明電導膜 |
JPH06278244A (ja) * | 1993-01-29 | 1994-10-04 | Mitsui Toatsu Chem Inc | 積層体 |
JPH09156023A (ja) * | 1995-12-05 | 1997-06-17 | Mitsui Toatsu Chem Inc | 透明導電性積層体 |
JP2001283643A (ja) | 2000-03-31 | 2001-10-12 | Toyobo Co Ltd | 透明導電性フィルム、透明導電性シートおよびタッチパネル |
JP2003109434A (ja) | 2001-06-27 | 2003-04-11 | Bridgestone Corp | 透明導電フィルム及びタッチパネル |
JP2003034860A (ja) | 2001-07-24 | 2003-02-07 | Bridgestone Corp | 透明導電フィルム及びタッチパネル |
JP2003113471A (ja) * | 2001-10-03 | 2003-04-18 | Japan Science & Technology Corp | ダイヤモンド様炭素膜透明導電積層体及びその製造方法 |
JP2007122568A (ja) * | 2005-10-31 | 2007-05-17 | Matsushita Electric Ind Co Ltd | 抵抗膜式タッチパネルおよびその製造方法 |
JP2009016179A (ja) * | 2007-07-04 | 2009-01-22 | Kaneka Corp | 透明導電膜とその製造方法 |
Non-Patent Citations (5)
Title |
---|
"DLC Maku Handbook", 2006, NT.S. INC., pages: 495FF |
"Kagakubinran-kisohen", vol. II, 2004, CHEMICAL SOCIETY OF JAPAN, pages: 557 |
"Tomeidodenmaku", 2005, CMC PUBLISHING, INC., pages: 17 |
J. KRC ET AL., PROGRESS IN PHOTOVOLTAICS, vol. 11, 2003, pages 15 |
See also references of EP2216791A4 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009193675A (ja) * | 2008-02-12 | 2009-08-27 | Kaneka Corp | 透明導電膜 |
JP2009193673A (ja) * | 2008-02-12 | 2009-08-27 | Kaneka Corp | 透明導電膜の製造方法 |
JP2011003848A (ja) * | 2009-06-22 | 2011-01-06 | Kaneka Corp | 結晶シリコン系太陽電池 |
US20120200928A1 (en) * | 2009-10-08 | 2012-08-09 | Lg Innotek Co., Ltd. | Plate Member For Touch Panel and Method of Manufacturing the Same |
CN114300562A (zh) * | 2021-12-30 | 2022-04-08 | 天合光能股份有限公司 | 一种大尺寸双玻组件封边方法 |
CN114300562B (zh) * | 2021-12-30 | 2023-06-23 | 天合光能股份有限公司 | 一种大尺寸双玻组件封边方法 |
Also Published As
Publication number | Publication date |
---|---|
EP2216791A1 (en) | 2010-08-11 |
US20100310863A1 (en) | 2010-12-09 |
EP2216791A4 (en) | 2011-07-13 |
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