JP2010134462A - 多孔質反射防止層の堆積方法、及び反射防止層を有するガラス - Google Patents
多孔質反射防止層の堆積方法、及び反射防止層を有するガラス Download PDFInfo
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- JP2010134462A JP2010134462A JP2009258024A JP2009258024A JP2010134462A JP 2010134462 A JP2010134462 A JP 2010134462A JP 2009258024 A JP2009258024 A JP 2009258024A JP 2009258024 A JP2009258024 A JP 2009258024A JP 2010134462 A JP2010134462 A JP 2010134462A
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
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- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1262—Process of deposition of the inorganic material involving particles, e.g. carbon nanotubes [CNT], flakes
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
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Abstract
【解決手段】チタン含有前駆物質を使用し、粒子形態の酸化ケイ素からなる粒子、特にナノ粒子をゾル・ゲル溶液に添加する、多孔質反射防止層の堆積方法で、反射防止層2は、ゾル・ゲル法によって生成される二酸化チタンのマトリックス5から成り、酸化ケイ素の粒子6がマトリックス5中に埋め込まれている。
【選択図】図2
Description
ここで、例えば1.0molのアセチルアセトンを、約25分間攪拌しながら1.0molのチタン(IV)エチレート溶液に滴下し、大幅な加熱を開始する。レモンイエローの溶液を室温で45分間攪拌し、その後、5molの水で加水分解する。溶媒及び他の揮発性成分を80℃及び40mbarで減圧除去する。続いて、粉末を4時間125℃で乾燥させる。酸化物量が約56wt%の黄色前駆物質微粉末が得られる。
ここで、例えば1.2molのエトキシ酢酸を、約25分間攪拌しながら1.0molのチタン(IV)プロピレート溶液に滴下し、大幅な加熱を開始する。レモンイエローの溶液を室温で45分間攪拌し、その後、5molの水で加水分解する。溶媒及び他の揮発性成分を80℃及び40mbarで減圧除去する。酸化物量が約50wt%のゲルが得られる。
0=残留物質は認められない
1=残留物質は極めてわずかしか認められない
2=残留物質はわずかしか認めらない
3=残留物質は依然見える
4=残留物質は依然はっきりと見える
5=変化はなく、全ての残留物質が依然見える
2 反射防止層
3 基材ガラス
4 耐食層
5 酸化チタンマトリックス
6 酸化ケイ素粒子
Claims (15)
- ゾル・ゲル法による多孔質反射防止層の堆積方法であって、
チタン含有前駆物質を使用し、及び、粒子、特にナノ粒子をゾル・ゲル溶液に添加することを特徴とする、多孔質反射防止層の堆積方法。 - 前記粒子が粒子形態の酸化ケイ素からなることを特徴とする、請求項1に記載の方法。
- 前記ゾル・ゲル溶液中の粒子と前駆物質との比率が、0.1〜0.9、好ましくは0.7〜0.8であることを特徴とする、請求項1又は2に記載の方法。
- 前記粒子が、1nm〜100nm、好ましくは3nm〜70nm、より好ましくは6nm〜30nmの範囲のサイズを有することを特徴とする、請求項1〜3のいずれか一項に記載の方法。
- 前記ゾル・ゲル層を300℃〜1000℃、好ましくは450℃〜700℃、より好ましくは500℃〜700℃で焼成することを特徴とする、請求項1〜4のいずれか一項に記載の方法。
- 前記反射防止層を、特に該反射防止層を焼成している間に、事前加圧したガラス基材上に堆積させることを特徴とする、請求項1〜5のいずれか一項に記載の方法。
- 前記粒子を懸濁液形態で添加することを特徴とする、請求項1〜6のいずれか一項に記載の方法。
- マトリックス中に含まれる酸化チタンが、ナノ結晶性光触媒活性TiO2であることを特徴とする、請求項1〜7のいずれか一項に記載の方法。
- 特に水による侵食を防ぐのに適した耐食層を、前記基材と前記反射防止層との間に堆積させることを特徴とする、請求項1〜8のいずれか一項に記載の方法。
- 特に太陽エネルギー利用システムのための、且つ特に請求項1〜9のいずれか一項に記載の方法によって製造されるガラスであって、ガラス基材と、ゾル・ゲル法によって該ガラス基材上に堆積される酸化チタン含有多孔質反射防止層からなる、ガラス。
- 前記反射防止層が、ゾル・ゲルプロセスによって少なくとも部分的に生成される酸化チタンと、ナノ粒子、特に酸化ケイ素粒子とからなることを特徴とする、請求項10に記載のガラス。
- 前記反射防止層が、30wt%〜95wt%、好ましくは70wt%〜90wt%の粒子を含有することを特徴とする、請求項10又は11に記載のガラス。
- 耐食層が、前記ガラス基材と前記反射防止層との間に配置されることを特徴とする、請求項10〜12のいずれか一項に記載のガラス。
- 酸化チタンの量が、40wt%未満、好ましくは20wt%未満、及びより好ましくは15wt%未満であることを特徴とする、請求項10〜13のいずれか一項に記載のガラス。
- 前記反射防止層が、1.38未満、好ましくは1.34未満、及びより好ましくは1.30未満の屈折率を有することを特徴とする、請求項10〜14のいずれか一項に記載のガラス。
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WO2012008427A1 (ja) * | 2010-07-12 | 2012-01-19 | セントラル硝子株式会社 | 低反射膜およびその形成方法およびそれを用いた低反射部材、並びに、低反射膜形成用塗布液およびその調製方法およびそれを用いた低反射部材 |
KR101372461B1 (ko) * | 2012-07-26 | 2014-03-12 | 성균관대학교산학협력단 | 반사방지막, 이의 제조 방법 및 이를 이용한 태양전지 |
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DE102008056792B4 (de) | 2018-06-28 |
CN101734865A (zh) | 2010-06-16 |
DE102008056792A1 (de) | 2010-05-20 |
US20100118409A1 (en) | 2010-05-13 |
EP2236472A1 (de) | 2010-10-06 |
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