JP2010125352A5 - - Google Patents

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Publication number
JP2010125352A5
JP2010125352A5 JP2008299657A JP2008299657A JP2010125352A5 JP 2010125352 A5 JP2010125352 A5 JP 2010125352A5 JP 2008299657 A JP2008299657 A JP 2008299657A JP 2008299657 A JP2008299657 A JP 2008299657A JP 2010125352 A5 JP2010125352 A5 JP 2010125352A5
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JP
Japan
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waste water
treatment system
photoresist development
wastewater
anion exchange
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JP2008299657A
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English (en)
Japanese (ja)
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JP2010125352A (ja
JP5256002B2 (ja
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Publication of JP2010125352A5 publication Critical patent/JP2010125352A5/ja
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JP2008299657A 2008-11-25 2008-11-25 フォトレジスト現像排水の排水処理システム Expired - Fee Related JP5256002B2 (ja)

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JP2008299657A JP5256002B2 (ja) 2008-11-25 2008-11-25 フォトレジスト現像排水の排水処理システム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008299657A JP5256002B2 (ja) 2008-11-25 2008-11-25 フォトレジスト現像排水の排水処理システム

Publications (3)

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JP2010125352A JP2010125352A (ja) 2010-06-10
JP2010125352A5 true JP2010125352A5 (https=) 2011-09-22
JP5256002B2 JP5256002B2 (ja) 2013-08-07

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JP2008299657A Expired - Fee Related JP5256002B2 (ja) 2008-11-25 2008-11-25 フォトレジスト現像排水の排水処理システム

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JP (1) JP5256002B2 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6526506B2 (ja) * 2015-07-07 2019-06-05 リファインホールディングス株式会社 アニオン性界面活性剤を含有する水の水処理方法
AU2017366425B2 (en) 2016-09-12 2022-06-02 Aecom (Delaware Corporation) Use of electrochemical oxidation for treatment of per-and polyfluoroalkyl substances (PFAS) in waste generated from sorbent and resin regeneration processes
CA3139440A1 (en) * 2019-06-07 2020-12-10 Yang Chen Pfas treatment scheme using separation and electrochemical elimination
CA3141768A1 (en) * 2019-06-28 2020-12-30 Battelle Memorial Institute Destruction of pfas via an oxidation process and apparatus suitable for transportation to contaminated sites
KR20230048325A (ko) * 2020-08-06 2023-04-11 바텔리 메모리얼 인스티튜트 역삼투법 및 염 분리법을 이용한 pfas의 염 분리 및 분해
TW202423849A (zh) 2022-08-25 2024-06-16 日商東京威力科創股份有限公司 處理系統及處理方法
JP2024151434A (ja) 2023-04-12 2024-10-25 東京エレクトロン株式会社 処理システム及び処理方法
JP2024151433A (ja) 2023-04-12 2024-10-25 東京エレクトロン株式会社 処理システム及び処理方法
US12534390B2 (en) 2023-07-14 2026-01-27 Claros Technologies Inc. Methods and systems of nitrate removal in aqueous systems for improved PFAS destruction
US12545601B2 (en) 2023-07-14 2026-02-10 Claros Technologies Inc. Methods and systems of photosensitizer recovery for improved PFAS destruction
US12351498B2 (en) 2023-07-14 2025-07-08 Claros Technologies Inc. Methods and systems of PFAS destruction using UV irradiation at 222 nanometers
WO2025234057A1 (ja) 2024-05-09 2025-11-13 東京エレクトロン株式会社 処理システム及び処理方法

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3364308B2 (ja) * 1993-12-29 2003-01-08 株式会社東芝 排水処理方法及びその装置
JP3164968B2 (ja) * 1994-06-02 2001-05-14 オルガノ株式会社 テトラアルキルアンモニウムヒドロオキシド含有廃液の処理方法及び装置
JPH0839059A (ja) * 1994-07-28 1996-02-13 Kurita Water Ind Ltd 有機アルカリを含む半導体洗浄排水の回収方法
JP3656338B2 (ja) * 1996-09-13 2005-06-08 オルガノ株式会社 フォトレジスト現像廃液の処理方法
JP3543915B2 (ja) * 1996-11-21 2004-07-21 オルガノ株式会社 フォトレジスト現像廃液の再生処理方法
JP3663804B2 (ja) * 1997-01-24 2005-06-22 オルガノ株式会社 フォトレジスト現像廃液の処理方法
DE19824615A1 (de) * 1998-06-02 1999-12-09 Dyneon Gmbh Verfahren zur Rückgewinnung von fluorierten Alkansäuren aus Abwässern
DE19824614A1 (de) * 1998-06-02 1999-12-09 Dyneon Gmbh Verfahren zur Rückgewinnung von fluorierten Alkansäuren aus Abwässern
JP3801793B2 (ja) * 1998-10-15 2006-07-26 オルガノ株式会社 有機成分の回収装置
JP3968678B2 (ja) * 1998-10-26 2007-08-29 オルガノ株式会社 テトラアルキルアンモニウムイオン含有液の処理方法
DE19932771A1 (de) * 1999-07-14 2001-01-18 Dyneon Gmbh Verfahren zur Eluierung fluorierter Emulgatoren
DE19953285A1 (de) * 1999-11-05 2001-05-10 Dyneon Gmbh Verfahren zur Rückgewinnung fluorierter Emulgatoren
JP2001239142A (ja) * 1999-12-20 2001-09-04 Japan Organo Co Ltd 超臨界水酸化分解処理装置
JP2003190949A (ja) * 2001-12-27 2003-07-08 Tokuyama Corp フォトレジスト現像廃液の再生処理方法
JP2003215810A (ja) * 2002-01-22 2003-07-30 Japan Organo Co Ltd フォトレジスト現像廃液からの現像液の回収方法
JP2004283746A (ja) * 2003-03-24 2004-10-14 Kurita Water Ind Ltd 水溶性樹脂成分含有アルカリ廃液の処理方法および装置
JP3884407B2 (ja) * 2003-06-03 2007-02-21 株式会社東芝 フッ素含有水の処理方法および装置
JP2005175118A (ja) * 2003-12-10 2005-06-30 Japan Organo Co Ltd フォトレジスト現像廃液の再生処理装置
JP2005173402A (ja) * 2003-12-12 2005-06-30 Japan Organo Co Ltd フォトレジスト現像廃液の再生処理装置
JP2005215627A (ja) * 2004-02-02 2005-08-11 Japan Organo Co Ltd レジスト剥離廃液の再生処理方法及び装置
JP4561967B2 (ja) * 2004-05-19 2010-10-13 オルガノ株式会社 テトラアルキルアンモニウムイオン含有排水から水を回収する方法及び装置
EP1700869A1 (en) * 2005-03-11 2006-09-13 3M Innovative Properties Company Recovery of fluorinated surfactants from a basic anion exchange resin having quaternary ammonium groups
RU2388537C2 (ru) * 2005-10-14 2010-05-10 Асахи Гласс Компани, Лимитед Способ регенерации основной анионообменной смолы
US7666929B2 (en) * 2006-05-31 2010-02-23 E.I. Du Pont De Nemours And Company Process for reducing fluorosurfactant content of fluropolymer dispersions using anionic surfactant-treated anion exchange resin
CN101605728B (zh) * 2007-02-16 2013-07-24 3M创新有限公司 用于从水中去除含氟化合物的系统和方法
TWI399342B (zh) * 2007-04-25 2013-06-21 Tokuyama Corp Process for the preparation of waste liquid containing tetraalkylammonium ion
JP4859863B2 (ja) * 2008-03-24 2012-01-25 オルガノ株式会社 水処理方法および水処理装置
JP5298639B2 (ja) * 2008-05-26 2013-09-25 栗田工業株式会社 水溶性樹脂成分含有アルカリ廃液の処理方法および処理装置
JP5051004B2 (ja) * 2008-05-30 2012-10-17 栗田工業株式会社 水溶性樹脂成分含有アルカリ廃液の処理方法および処理装置
JP5062093B2 (ja) * 2008-08-06 2012-10-31 栗田工業株式会社 アミノ基を有する水溶性有機溶媒の回収方法

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