JP2010122660A - 半導体薄膜トランジスタ基板とその製造方法 - Google Patents
半導体薄膜トランジスタ基板とその製造方法 Download PDFInfo
- Publication number
- JP2010122660A JP2010122660A JP2009210111A JP2009210111A JP2010122660A JP 2010122660 A JP2010122660 A JP 2010122660A JP 2009210111 A JP2009210111 A JP 2009210111A JP 2009210111 A JP2009210111 A JP 2009210111A JP 2010122660 A JP2010122660 A JP 2010122660A
- Authority
- JP
- Japan
- Prior art keywords
- color filter
- filter pattern
- dam
- display device
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 70
- 239000010409 thin film Substances 0.000 title claims abstract description 34
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 22
- 239000004065 semiconductor Substances 0.000 title description 11
- 239000010408 film Substances 0.000 claims description 48
- 238000000034 method Methods 0.000 claims description 40
- 230000000903 blocking effect Effects 0.000 claims description 23
- 239000012463 white pigment Substances 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 21
- 230000008569 process Effects 0.000 description 19
- 239000011368 organic material Substances 0.000 description 10
- 229910021417 amorphous silicon Inorganic materials 0.000 description 8
- 230000001681 protective effect Effects 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000012535 impurity Substances 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 5
- 238000001312 dry etching Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 238000001039 wet etching Methods 0.000 description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000007688 edging Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910019923 CrOx Inorganic materials 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 206010047571 Visual impairment Diseases 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/13356—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements
- G02F1/133565—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements inside the LC elements, i.e. between the cell substrates
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/13356—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements
- G02F1/133567—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements on the back side
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
- Optical Filters (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
【解決手段】表示装置は、絶縁基板100、絶縁基板上に形成されたダム120a,120b,120cおよび第1カラーフィルタパターン、およびダムによって区切られて画素領域に形成された第2カラーフィルタパターンを含み、ダムおよび第1カラーフィルタパターンは、同一層に位置する。
【選択図】図1C
Description
このような問題点を解決するために、カラーフィルタと薄膜トランジスタを同一の基板に形成するCOA (color filter on array)構造を適用することが提案されている。このようなCOA構造を適用した液晶表示装置では、薄膜トランジスタとカラーフィルタを同一の基板に形成し、光遮断パターンも薄膜トランジスタ基板上に形成することによって、薄膜トランジスタ基板とカラーフィルタ基板との結合時に発生するずれを最小化して開口率を向上することが可能である。
101 ゲート線
102 ゲート電極
103 ゲート絶縁膜
161a、161b 半導体
110 データ線
111 ドレーン電極
112 ソース電極
114 保護膜
120 ダム
129 接触穴
130 平坦化膜
131、132、133、134 カラーフィルタ
140 光遮断パターン
150 画素電極
Claims (20)
- 絶縁基板と、
前記絶縁基板上に形成されたダムおよび第1カラーフィルタパターンと、
前記ダムによって区切られて画素領域に形成された第2カラーフィルタパターンと、
を含み、前記ダムおよび前記第1カラーフィルタパターンは、同一層に位置する表示装置。 - 前記第2カラーフィルタパターンは、赤色、緑色および青色カラーフィルタパターンを含む請求項1に記載の表示装置。
- 前記第2カラーフィルタパターンは、マゼンタ、シアンおよび黄色カラーフィルタパターンを含む請求項1に記載の表示装置。
- 前記第1カラーフィルタパターンは、白色カラーフィルタパターンを含む請求項2に記載の表示装置。
- 前記第1カラーフィルタパターン上に形成された画素電極をさらに含む請求項4に記載の表示装置。
- 前記第1カラーフィルタパターン上に形成された平坦化膜をさらに含む請求項5に記載の表示装置。
- 前記第1カラーフィルタパターン上に形成された共通電極をさらに含む請求項7に記載の表示装置。
- 前記ダムは、前記信号線の上部および前記光遮断パターンの下部に形成された請求項6に記載の表示装置。
- 前記ダムは、白色顔料を含む請求項8に記載の表示装置。
- 絶縁基板上にダムおよび第1カラーフィルタパターンを形成する段階と、
前記絶縁基板上に前記ダムで区切られた領域内にインクジェット方式によって第2カラーフィルタパターンを形成する段階と、
を含み、前記ダムおよび前記第1カラーフィルタパターンは、同一の段階で形成された表示装置の製造方法。 - 前記第2カラーフィルタパターンは、赤色、緑色および青色カラーフィルタパターンを含む請求項10に記載の表示装置の製造方法。
- 前記第2カラーフィルタパターンは、シアン、マゼンタおよび黄色カラーフィルタパターンを含む請求項10に記載の表示装置の製造方法。
- 前記第1カラーフィルタパターンは、白色カラーフィルタパターンを含む請求項11に記載の表示装置の製造方法。
- 前記ダムは、前記第1カラーフィルタパターンと同一の物質を含む請求項13に記載の表示装置の製造方法。
- 前記第1または第2カラーフィルタパターンのうち少なくとも1つの上に画素電極を形成する段階をさらに含む請求項14に記載の表示装置の製造方法。
- 前記ダム、第1カラーフィルタパターンおよび第2カラーフィルタパターンのうち少なくとも1つと、前記画素電極との間に平坦化膜を形成する段階をさらに含む請求項15に記載の表示装置の製造方法。
- 前記ダム、第1カラーフィルタパターンおよび第2カラーフィルタパターンのうち少なくとも1つの上に光遮断パターンを形成する段階をさらに含む請求項16に記載の表示装置の製造方法。
- 前記ダムは、信号線の上部および前記光遮断パターンの下部に形成された請求項17に記載の表示装置の製造方法。
- 前記ダムは、白色顔料を含む請求項18に記載の表示装置の製造方法。
- 絶縁基板と、
前記絶縁基板上に形成された信号線と、
前記絶縁基板上に形成されたダムおよび第1カラーフィルタパターンと、
前記ダムおよび前記第1カラーフィルタパターンによって区切られて画素領域に形成された第2カラーフィルタパターンと、
前記ダム、前記第1カラーフィルタパターンおよび前記第2カラーフィルタパターン上に形成された平坦化膜と、
前記平坦化膜の一部分に形成された開口部と、
前記開口部を通して前記薄膜トランジスタと電気的に接続される画素電極と、
前記平坦化膜上に形成された光遮断パターンと、
を含み、前記ダムと前記第1カラーフィルタパターンは、同一層に位置する薄膜トランジスタ基板。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2008-0114779 | 2008-11-18 | ||
KR1020080114779A KR101547855B1 (ko) | 2008-11-18 | 2008-11-18 | 반도체 박막 트랜지스터 기판과 그 제조 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010122660A true JP2010122660A (ja) | 2010-06-03 |
JP5519979B2 JP5519979B2 (ja) | 2014-06-11 |
Family
ID=42171759
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009210111A Active JP5519979B2 (ja) | 2008-11-18 | 2009-09-11 | 半導体薄膜トランジスタ基板とその製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8107039B2 (ja) |
JP (1) | JP5519979B2 (ja) |
KR (1) | KR101547855B1 (ja) |
CN (1) | CN101738769B (ja) |
TW (1) | TWI510837B (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018098509A (ja) * | 2016-12-16 | 2018-06-21 | アルモール | 光起電力モジュールの製造方法およびそれによって得られた光起電力モジュール |
JP2021033307A (ja) * | 2019-08-28 | 2021-03-01 | エルジー ディスプレイ カンパニー リミテッド | 表示装置 |
JP2022119832A (ja) * | 2011-05-05 | 2022-08-17 | 株式会社半導体エネルギー研究所 | 表示装置 |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8218111B2 (en) | 2008-11-13 | 2012-07-10 | Samsung Electronics Co., Ltd. | Display device and method for manufacturing the same |
JP5613635B2 (ja) * | 2011-07-21 | 2014-10-29 | 株式会社ジャパンディスプレイ | 表示装置 |
KR20130013959A (ko) * | 2011-07-29 | 2013-02-06 | 삼성디스플레이 주식회사 | 무 안경식 3d 또는 2d/3d 전환 가능한 화소 배치를 가지는 디스플레이 장치 |
JP5734913B2 (ja) * | 2011-08-31 | 2015-06-17 | 富士フイルム株式会社 | 感放射線性組成物、パターン形成方法、カラーフィルタ及びその製造方法、並びに、固体撮像素子 |
TWI462189B (zh) * | 2012-03-14 | 2014-11-21 | Innocom Tech Shenzhen Co Ltd | 薄膜電晶體基板及其製作方法,及具有薄膜電晶體基板的顯示器 |
KR102007905B1 (ko) | 2013-01-03 | 2019-08-07 | 삼성디스플레이 주식회사 | 표시판 및 이를 포함하는 액정 표시 장치 |
KR102135922B1 (ko) * | 2013-12-27 | 2020-07-20 | 엘지디스플레이 주식회사 | 백색 화소를 구비한 평판 표시장치용 칼라 필터 기판 제조 방법 |
KR102122402B1 (ko) * | 2013-12-31 | 2020-06-15 | 엘지디스플레이 주식회사 | 씨오티 구조 액정표시장치 및 이의 제조방법 |
KR102189578B1 (ko) | 2014-07-30 | 2020-12-14 | 삼성디스플레이 주식회사 | 액정 표시 패널 및 그 제조 방법 |
KR102189522B1 (ko) * | 2014-11-25 | 2020-12-14 | 삼성디스플레이 주식회사 | 액정 표시 장치 |
JP6698289B2 (ja) | 2014-07-31 | 2020-05-27 | 三星ディスプレイ株式會社Samsung Display Co.,Ltd. | 液晶表示装置 |
KR102272422B1 (ko) * | 2015-01-14 | 2021-07-02 | 삼성디스플레이 주식회사 | 박막 트랜지스터 기판 및 그 제조 방법 |
KR102358072B1 (ko) | 2015-09-16 | 2022-02-04 | 삼성디스플레이 주식회사 | 반사형 액정 표시 장치 |
KR20180008950A (ko) | 2016-07-14 | 2018-01-25 | 삼성디스플레이 주식회사 | 액정 표시 장치 및 이의 제조 방법 |
KR102291493B1 (ko) | 2016-08-11 | 2021-08-20 | 삼성디스플레이 주식회사 | 컬러 필터 및 이를 포함하는 표시 장치 |
CN107255896A (zh) | 2017-07-27 | 2017-10-17 | 深圳市华星光电技术有限公司 | 一种显示面板、阵列基板及其制造方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10186412A (ja) * | 1996-12-26 | 1998-07-14 | Seiko Epson Corp | アクティブマトリクス液晶表示装置およびその製造方法 |
JP2002131735A (ja) * | 2000-10-20 | 2002-05-09 | Canon Inc | 液晶素子とその製造方法 |
JP2006243171A (ja) * | 2005-03-01 | 2006-09-14 | Sharp Corp | 表示装置用基板 |
JP2007052262A (ja) * | 2005-08-18 | 2007-03-01 | Toshiba Matsushita Display Technology Co Ltd | 液晶表示装置及び液晶表示装置の製造方法 |
JP2007241219A (ja) * | 2005-05-26 | 2007-09-20 | Toshiba Matsushita Display Technology Co Ltd | 液晶表示装置およびその製造方法 |
JP2007264378A (ja) * | 2006-03-29 | 2007-10-11 | Jsr Corp | 4色カラーフィルタの製造方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0740184A3 (en) * | 1995-04-28 | 1998-07-29 | Canon Kabushiki Kaisha | Liquid crystal device, process for producing same and liquid crystal apparatus |
US6022647A (en) * | 1997-10-24 | 2000-02-08 | Canon Kabushiki Kaisha | Method for making color filter substrate, color filter substrate produced by the method, and liquid crystal device using the substrate |
JP2001194521A (ja) * | 2000-01-12 | 2001-07-19 | Hitachi Ltd | カラーフィルタの製造方法、およびこのカラーフィルタを用いた液晶表示装置 |
JP2002098948A (ja) * | 2000-09-20 | 2002-04-05 | Hitachi Ltd | 液晶表示装置の製造方法 |
KR100518051B1 (ko) * | 2001-01-11 | 2005-09-28 | 엔이씨 엘씨디 테크놀로지스, 엘티디. | 능동 매트릭스형 액정 디스플레이 장치와 그 제조 방법 |
KR100397671B1 (ko) * | 2001-03-07 | 2003-09-17 | 엘지.필립스 엘시디 주식회사 | 잉크젯 방식 컬러필터를 가지는 액정표시장치 및 그의제조방법 |
JP2005508653A (ja) * | 2001-11-13 | 2005-04-07 | イェシバ・ユニバーシティ | 新規サイトヒン遺伝子およびこれの使用 |
KR100663030B1 (ko) * | 2004-12-29 | 2006-12-28 | 엘지.필립스 엘시디 주식회사 | 액정표시장치용 컬러필터 기판 및 그 제조방법 |
CN100434982C (zh) * | 2005-05-26 | 2008-11-19 | 东芝松下显示技术有限公司 | 液晶显示装置及其制造方法 |
US7884900B2 (en) * | 2005-05-26 | 2011-02-08 | Toshiba Matsushita Display Technology Co., Ltd. | Liquid crystal display device with partition walls made of color filter layers as a dam for the light shielding material |
KR101192122B1 (ko) | 2005-06-29 | 2012-10-16 | 엘지디스플레이 주식회사 | 컬러필터 어레이 기판 및 그 제조 방법 |
CN1920597A (zh) * | 2005-08-25 | 2007-02-28 | 精工爱普生株式会社 | 彩色滤光基板的制造方法、彩色滤光基板、显示装置及电子设备 |
KR20070037114A (ko) | 2005-09-30 | 2007-04-04 | 엘지.필립스 엘시디 주식회사 | 액정 표시 장치 및 그의 제조 방법 |
TWI351535B (en) * | 2006-09-21 | 2011-11-01 | Chimei Innolux Corp | Color filter substrate and manufacturing method th |
-
2008
- 2008-11-18 KR KR1020080114779A patent/KR101547855B1/ko active IP Right Grant
-
2009
- 2009-06-30 US US12/494,755 patent/US8107039B2/en active Active
- 2009-08-06 TW TW098126618A patent/TWI510837B/zh active
- 2009-09-11 JP JP2009210111A patent/JP5519979B2/ja active Active
- 2009-10-26 CN CN200910180096.3A patent/CN101738769B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10186412A (ja) * | 1996-12-26 | 1998-07-14 | Seiko Epson Corp | アクティブマトリクス液晶表示装置およびその製造方法 |
JP2002131735A (ja) * | 2000-10-20 | 2002-05-09 | Canon Inc | 液晶素子とその製造方法 |
JP2006243171A (ja) * | 2005-03-01 | 2006-09-14 | Sharp Corp | 表示装置用基板 |
JP2007241219A (ja) * | 2005-05-26 | 2007-09-20 | Toshiba Matsushita Display Technology Co Ltd | 液晶表示装置およびその製造方法 |
JP2007052262A (ja) * | 2005-08-18 | 2007-03-01 | Toshiba Matsushita Display Technology Co Ltd | 液晶表示装置及び液晶表示装置の製造方法 |
JP2007264378A (ja) * | 2006-03-29 | 2007-10-11 | Jsr Corp | 4色カラーフィルタの製造方法 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022119832A (ja) * | 2011-05-05 | 2022-08-17 | 株式会社半導体エネルギー研究所 | 表示装置 |
JP7228729B2 (ja) | 2011-05-05 | 2023-02-24 | 株式会社半導体エネルギー研究所 | 表示装置 |
US11942483B2 (en) | 2011-05-05 | 2024-03-26 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
JP2018098509A (ja) * | 2016-12-16 | 2018-06-21 | アルモール | 光起電力モジュールの製造方法およびそれによって得られた光起電力モジュール |
JP2021033307A (ja) * | 2019-08-28 | 2021-03-01 | エルジー ディスプレイ カンパニー リミテッド | 表示装置 |
JP7046130B2 (ja) | 2019-08-28 | 2022-04-01 | エルジー ディスプレイ カンパニー リミテッド | 表示装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20100055883A (ko) | 2010-05-27 |
US20100123860A1 (en) | 2010-05-20 |
TW201020612A (en) | 2010-06-01 |
JP5519979B2 (ja) | 2014-06-11 |
KR101547855B1 (ko) | 2015-08-28 |
CN101738769B (zh) | 2014-11-05 |
TWI510837B (zh) | 2015-12-01 |
US8107039B2 (en) | 2012-01-31 |
CN101738769A (zh) | 2010-06-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5519979B2 (ja) | 半導体薄膜トランジスタ基板とその製造方法 | |
KR101273890B1 (ko) | 씨오티 구조의 액정표시장치와 그 제조방법 | |
KR101578692B1 (ko) | 액정표시장치의 칼라필터 어레이 및 그 제조방법 | |
JP2004070284A (ja) | 画素駆動素子を具備する基板上にカラーフィルタを形成する方法 | |
KR20030018619A (ko) | 액정 표시 장치용 색 필터 기판 및 박막 트랜지스터 기판및 이들의 제조 방법 | |
JP2008225481A (ja) | 液晶表示装置のカラーフィルタ及びその製造方法 | |
KR20080110347A (ko) | 전기 영동 표시 장치 및 그 제조 방법 | |
KR102141410B1 (ko) | 액정표시장치 및 그 제조방법 | |
US7884366B2 (en) | Thin film transistor array panel and method for manufacturing the same | |
KR101483024B1 (ko) | 액정표시장치 및 그 제조방법 | |
JP2007240542A (ja) | 液晶表示素子 | |
KR20070082090A (ko) | 표시 기판 및 이의 제조 방법 | |
US9494838B2 (en) | Liquid crystal display device | |
US7760307B2 (en) | Mother glass for a liquid crystal display with passivation layer and barrier layer and method of fabricating liquid crystal display using the same | |
KR20080003086A (ko) | 액정표시장치의 컬러필터기판 및 그 제조방법 | |
KR100924751B1 (ko) | 액정표시장치 및 그 제조방법 | |
US9671633B2 (en) | Display device and method of manufacturing the same | |
US20150378224A1 (en) | Display panel and method of manufacturing the same | |
KR102398551B1 (ko) | 박막트랜지스터 기판 및 그를 가지는 액정 표시 패널 | |
KR20080057433A (ko) | 액정표시패널 및 그 제조방법 | |
US20120075737A1 (en) | Method of manufacturing color filter and color filter | |
US20230375889A1 (en) | Active matrix substrate, liquid crystal display device, and method for manufacturing active matrix substrate | |
US20070064184A1 (en) | Liquid crystal device, method of manufacturing liquid crystal device, and electronic apparatus | |
KR101017205B1 (ko) | 칼라 필터가 형성된 박막 트랜지스터 기판 및 그 제조 방법 | |
KR101408687B1 (ko) | 액정표시장치용 어레이 기판 및 그 제조방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20120321 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20120321 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20121213 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130218 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130322 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130730 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20130731 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130906 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140325 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140404 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5519979 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |