JP2010100482A5 - - Google Patents

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Publication number
JP2010100482A5
JP2010100482A5 JP2008273563A JP2008273563A JP2010100482A5 JP 2010100482 A5 JP2010100482 A5 JP 2010100482A5 JP 2008273563 A JP2008273563 A JP 2008273563A JP 2008273563 A JP2008273563 A JP 2008273563A JP 2010100482 A5 JP2010100482 A5 JP 2010100482A5
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JP
Japan
Prior art keywords
silicon
lower opening
crucible
frequency induction
granular
Prior art date
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Granted
Application number
JP2008273563A
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English (en)
Japanese (ja)
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JP2010100482A (ja
JP5168657B2 (ja
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Priority to JP2008273563A priority Critical patent/JP5168657B2/ja
Priority claimed from JP2008273563A external-priority patent/JP5168657B2/ja
Publication of JP2010100482A publication Critical patent/JP2010100482A/ja
Publication of JP2010100482A5 publication Critical patent/JP2010100482A5/ja
Application granted granted Critical
Publication of JP5168657B2 publication Critical patent/JP5168657B2/ja
Expired - Fee Related legal-status Critical Current
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JP2008273563A 2008-10-23 2008-10-23 粒状シリコン製造方法およびその装置 Expired - Fee Related JP5168657B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008273563A JP5168657B2 (ja) 2008-10-23 2008-10-23 粒状シリコン製造方法およびその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008273563A JP5168657B2 (ja) 2008-10-23 2008-10-23 粒状シリコン製造方法およびその装置

Publications (3)

Publication Number Publication Date
JP2010100482A JP2010100482A (ja) 2010-05-06
JP2010100482A5 true JP2010100482A5 (enExample) 2012-02-16
JP5168657B2 JP5168657B2 (ja) 2013-03-21

Family

ID=42291478

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008273563A Expired - Fee Related JP5168657B2 (ja) 2008-10-23 2008-10-23 粒状シリコン製造方法およびその装置

Country Status (1)

Country Link
JP (1) JP5168657B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101258747B1 (ko) 2010-11-19 2013-05-07 박철훈 실리콘 재처리 장치 및 그 방법

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001048697A (ja) * 1999-07-29 2001-02-20 Kyocera Corp 粉状シリコンの溶解方法
JP4126450B2 (ja) * 2002-02-22 2008-07-30 京セラ株式会社 溶解方法
JP2004244276A (ja) * 2003-02-14 2004-09-02 Kyocera Corp 溶解装置
JP2005016855A (ja) * 2003-06-26 2005-01-20 Kyocera Corp 鋳造装置
JP2006206368A (ja) * 2005-01-27 2006-08-10 Fuji Mach Mfg Co Ltd 粒状シリコンの製造方法及び製造装置
WO2008047881A1 (fr) * 2006-10-19 2008-04-24 Kyocera Corporation Procédé et appareil de production de grain de silicium cristallin

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