JP2010097993A5 - - Google Patents

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Publication number
JP2010097993A5
JP2010097993A5 JP2008265261A JP2008265261A JP2010097993A5 JP 2010097993 A5 JP2010097993 A5 JP 2010097993A5 JP 2008265261 A JP2008265261 A JP 2008265261A JP 2008265261 A JP2008265261 A JP 2008265261A JP 2010097993 A5 JP2010097993 A5 JP 2010097993A5
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JP
Japan
Prior art keywords
processing chamber
gas
substrate
supplying
exciting
Prior art date
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Pending
Application number
JP2008265261A
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English (en)
Japanese (ja)
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JP2010097993A (ja
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Priority to JP2008265261A priority Critical patent/JP2010097993A/ja
Priority claimed from JP2008265261A external-priority patent/JP2010097993A/ja
Publication of JP2010097993A publication Critical patent/JP2010097993A/ja
Publication of JP2010097993A5 publication Critical patent/JP2010097993A5/ja
Pending legal-status Critical Current

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JP2008265261A 2008-10-14 2008-10-14 プラズマ処理方法 Pending JP2010097993A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008265261A JP2010097993A (ja) 2008-10-14 2008-10-14 プラズマ処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008265261A JP2010097993A (ja) 2008-10-14 2008-10-14 プラズマ処理方法

Publications (2)

Publication Number Publication Date
JP2010097993A JP2010097993A (ja) 2010-04-30
JP2010097993A5 true JP2010097993A5 (cg-RX-API-DMAC7.html) 2011-11-17

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ID=42259494

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008265261A Pending JP2010097993A (ja) 2008-10-14 2008-10-14 プラズマ処理方法

Country Status (1)

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JP (1) JP2010097993A (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019053925A1 (ja) * 2017-09-12 2019-03-21 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 半導体装置の製造方法、基板処理装置及びプログラム
JP7479257B2 (ja) * 2020-09-16 2024-05-08 東京エレクトロン株式会社 プラズマパージ方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005074016A1 (ja) * 2004-01-28 2005-08-11 Tokyo Electron Limited 基板処理装置の処理室清浄化方法、基板処理装置、および基板処理方法

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