JP2010096866A5 - - Google Patents

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Publication number
JP2010096866A5
JP2010096866A5 JP2008265715A JP2008265715A JP2010096866A5 JP 2010096866 A5 JP2010096866 A5 JP 2010096866A5 JP 2008265715 A JP2008265715 A JP 2008265715A JP 2008265715 A JP2008265715 A JP 2008265715A JP 2010096866 A5 JP2010096866 A5 JP 2010096866A5
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JP
Japan
Prior art keywords
lens
optical system
projection optical
intersection
center position
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Application number
JP2008265715A
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English (en)
Japanese (ja)
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JP2010096866A (ja
JP5253081B2 (ja
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Priority to JP2008265715A priority Critical patent/JP5253081B2/ja
Priority claimed from JP2008265715A external-priority patent/JP5253081B2/ja
Priority to US12/577,635 priority patent/US8432532B2/en
Publication of JP2010096866A publication Critical patent/JP2010096866A/ja
Publication of JP2010096866A5 publication Critical patent/JP2010096866A5/ja
Application granted granted Critical
Publication of JP5253081B2 publication Critical patent/JP5253081B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008265715A 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法 Expired - Fee Related JP5253081B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008265715A JP5253081B2 (ja) 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法
US12/577,635 US8432532B2 (en) 2008-10-14 2009-10-12 Projection optical system with rarefaction compensation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008265715A JP5253081B2 (ja) 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2010096866A JP2010096866A (ja) 2010-04-30
JP2010096866A5 true JP2010096866A5 (https=) 2011-12-01
JP5253081B2 JP5253081B2 (ja) 2013-07-31

Family

ID=42098605

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008265715A Expired - Fee Related JP5253081B2 (ja) 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法

Country Status (2)

Country Link
US (1) US8432532B2 (https=)
JP (1) JP5253081B2 (https=)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10583256B2 (en) 2014-04-25 2020-03-10 Bayer Healthcare Llc Syringe with rolling diaphragm
CA2983589C (en) 2015-04-24 2024-11-12 Bayer Healthcare Llc SYRINGE WITH ROLLING DIAPHRAGM
JP6989595B2 (ja) 2016-09-16 2022-01-05 バイエル・ヘルスケア・エルエルシーBayer HealthCare LLC シリンジ保持要素を有する圧力ジャケット
JP7023947B2 (ja) 2016-10-17 2022-02-22 バイエル・ヘルスケア・エルエルシー シリンジ係合機構を備える流体インジェクタ
WO2018075386A1 (en) 2016-10-17 2018-04-26 Bayer Healthcare Llc Fluid injector with syringe engagement mechanism
DK3681561T3 (da) 2017-09-13 2022-01-24 Bayer Healthcare Llc Forskydelig sprøjtehætte til separat fyldning og fremføring
CA3091343A1 (en) 2018-02-19 2019-08-22 Bayer Healthcare Llc Syringe rolling apparatus and method
AU2019340438A1 (en) 2018-09-11 2021-03-04 Bayer Healthcare Llc Syringe retention feature for fluid injector system
EP4656218A3 (en) 2019-09-10 2026-02-18 Bayer HealthCare LLC Pressure jackets and syringe retention features for angiography fluid injectors
KR20240113619A (ko) 2020-02-21 2024-07-22 바이엘 헬쓰케어 엘엘씨 의료 유체 전달용 유체 경로 커넥터
PH12022552286A1 (en) 2020-02-28 2023-12-18 Bayer Healthcare Llc Fluid mixing set
WO2021188460A1 (en) 2020-03-16 2021-09-23 Bayer Healthcare Llc Stopcock apparatus for angiography injector fluid paths
PH12022553506A1 (en) 2020-06-18 2024-04-29 Bayer Healthcare Llc In-line air bubble suspension apparatus for angiography injector fluid paths
AU2021326454A1 (en) 2020-08-11 2023-03-02 Bayer Healthcare Llc Features for angiography syringe
PH12023551507A1 (en) 2020-12-01 2024-05-13 Bayer Healthcare Llc Cassette for retention of fluid path components for fluid injector system
CN117500538A (zh) 2021-06-17 2024-02-02 拜耳医药保健有限责任公司 用于检测流体注入器装置的管路中的流体类型的系统和方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69933973T2 (de) * 1998-07-29 2007-06-28 Carl Zeiss Smt Ag Katadioptrisches optisches system und damit ausgestattete belichtungsvorrichtung
KR20000034967A (ko) * 1998-11-30 2000-06-26 헨켈 카르스텐 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
US6339505B1 (en) * 2000-06-26 2002-01-15 International Business Machines Corporation Method for radiation projection and lens assembly for semiconductor exposure tools
KR20040004389A (ko) * 2000-10-03 2004-01-13 코닝 인코포레이티드 포토리소그라피 방법 및 시스템
US7190527B2 (en) * 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
DE10210899A1 (de) * 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
KR20040104691A (ko) * 2002-05-03 2004-12-10 칼 짜이스 에스엠테 아게 높은 개구를 갖는 투영 대물렌즈
JP4174400B2 (ja) * 2003-09-24 2008-10-29 信越石英株式会社 シリカガラスの選別方法
JP2005114881A (ja) * 2003-10-06 2005-04-28 Nikon Corp 投影光学系、露光装置、および露光方法
US6992753B2 (en) * 2003-12-24 2006-01-31 Carl Zeiss Smt Ag Projection optical system
DE602005008707D1 (de) 2004-01-14 2008-09-18 Zeiss Carl Smt Ag Catadioptrisches projektionsobjektiv
TWI395069B (zh) 2004-02-18 2013-05-01 尼康股份有限公司 投影光學系統、曝光裝置以及曝光方法
JP2006073687A (ja) 2004-09-01 2006-03-16 Nikon Corp 投影光学系、投影光学系の製造方法、露光装置、および露光方法
JP4868209B2 (ja) 2004-11-10 2012-02-01 株式会社ニコン 投影光学系、露光装置、および露光方法
TW200616043A (en) 2004-11-10 2006-05-16 Nikon Corp Optical projection system, exposure apparatus, exposure method and method of fabricating devices
DE102006027787A1 (de) * 2005-07-05 2007-01-18 Carl Zeiss Smt Ag Projektionsbelichtungsanlage und Betriebsmethode dieser
JP2008063181A (ja) 2006-09-07 2008-03-21 Shin Etsu Chem Co Ltd エキシマレーザー用合成石英ガラス基板及びその製造方法

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