JP2010050412A - 面発光型半導体レーザ - Google Patents
面発光型半導体レーザ Download PDFInfo
- Publication number
- JP2010050412A JP2010050412A JP2008215775A JP2008215775A JP2010050412A JP 2010050412 A JP2010050412 A JP 2010050412A JP 2008215775 A JP2008215775 A JP 2008215775A JP 2008215775 A JP2008215775 A JP 2008215775A JP 2010050412 A JP2010050412 A JP 2010050412A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- region
- semiconductor laser
- transverse mode
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18322—Position of the structure
- H01S5/1833—Position of the structure with more than one structure
- H01S5/18336—Position of the structure with more than one structure only below the active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/16—Semiconductor lasers with special structural design to influence the modes, e.g. specific multimode
- H01S2301/166—Single transverse or lateral mode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/065—Mode locking; Mode suppression; Mode selection ; Self pulsating
- H01S5/0651—Mode control
- H01S5/0653—Mode suppression, e.g. specific multimode
- H01S5/0655—Single transverse or lateral mode emission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18311—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18316—Airgap confined
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18358—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] containing spacer layers to adjust the phase of the light wave in the cavity
Abstract
【解決手段】基板10側、すなわち光射出側とは反対側に横モード調整層20が設けられている。この横モード調整層20では、発光領域13Aの中央領域との対向領域の、発振波長λにおける反射率が、発光領域13Aの外縁領域との対向領域の、発振波長λにおける反射率よりも高くなっている。これにより、基本横モードの光出力が横モード調整層20によって妨げられる虞がなく、基本横モードのスロープ効率を高く維持することができる。
【選択図】図1
Description
高次横モードの光L2が低反射率層22,23や基板10で反射されて、戻り光となる虞がなくなる。これにより、高次横モードのI−L特性(特に閾値電流)が戻り光によって変動し、ビームプロファイルが変動する虞をなくすることができる。
Claims (10)
- 基板上に、横モード調整層、第一多層膜反射鏡、発光領域を有する活性層および第二多層膜反射鏡を前記基板側からこの順に含むと共に、前記第一多層膜反射鏡内、前記第一多層膜反射鏡と前記活性層との間、前記活性層と前記第二多層膜反射鏡との間、または前記第二多層膜反射鏡内に、前記発光領域との対応領域に電流注入領域が形成された電流狭窄層を含む積層構造を備え、
前記横モード調整層において、前記発光領域の中央との対向領域の発振波長における反射率が、前記発光領域の外縁との対向領域の発振波長における反射率よりも高くなっている面発光型半導体レーザ。 - 前記横モード調整層は、前記発光領域の中央との対向領域に高反射率部材を有する請求項1に記載の面発光型半導体レーザ。
- 前記高反射率部材は金属からなる請求項2に記載の面発光型半導体レーザ。
- 前記横モード調整層は、前記発光領域の外縁との対向領域に低反射率部材を有する請求項1ないし請求項3の少なくとも一項に記載の面発光型半導体レーザ。
- 前記低反射率部材は、前記第二多層膜反射鏡のうち前記横モード調整層側の表面および前記基板のうち前記横モード調整層側の表面のうち少なくとも前記第二多層膜反射鏡のうち前記横モード調整層側の表面に設けられている請求項4に記載の面発光型半導体レーザ。
- 前記低反射率部材の光学膜厚はλ/4(λは発振波長)である請求項4に記載の面発光型半導体レーザ。
- 前記低反射率部材の屈折率は1より大きく、前記第一多層膜反射鏡の屈折率よりも小さい請求項4に記載の面発光型半導体レーザ。
- 前記基板は、前記発振波長λの光を吸収する材料からなる請求項1ないし請求項3の少なくとも一項に記載の面発光型半導体レーザ。
- 前記横モード調整層は、少なくとも前記発光領域との対向領域に空隙を有する請求項1ないし請求項3の少なくとも一項に記載の面発光型半導体レーザ。
- 前記横モード調整層は、前記発光領域との非対向領域に、前記基板に接する第一金属層と、前記第一多層膜反射鏡に接する第二金属層とを有し、
前記第一金属層と前記第二金属層とは貼り合わせによって接合されている請求項9に記載の面発光型半導体レーザ。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008215775A JP4872987B2 (ja) | 2008-08-25 | 2008-08-25 | 面発光型半導体レーザ |
US12/458,962 US8290009B2 (en) | 2008-08-25 | 2009-07-28 | Vertical cavity surface emitting laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008215775A JP4872987B2 (ja) | 2008-08-25 | 2008-08-25 | 面発光型半導体レーザ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010050412A true JP2010050412A (ja) | 2010-03-04 |
JP4872987B2 JP4872987B2 (ja) | 2012-02-08 |
Family
ID=41696351
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008215775A Active JP4872987B2 (ja) | 2008-08-25 | 2008-08-25 | 面発光型半導体レーザ |
Country Status (2)
Country | Link |
---|---|
US (1) | US8290009B2 (ja) |
JP (1) | JP4872987B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021090670A1 (ja) * | 2019-11-06 | 2021-05-14 | ソニーセミコンダクタソリューションズ株式会社 | 面発光レーザ装置 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009010248A (ja) * | 2007-06-29 | 2009-01-15 | Canon Inc | 面発光レーザおよびその製造方法 |
JP5212686B2 (ja) * | 2007-08-22 | 2013-06-19 | ソニー株式会社 | 半導体レーザアレイの製造方法 |
JP4973940B2 (ja) * | 2007-10-15 | 2012-07-11 | ソニー株式会社 | 半導体発光素子の製造方法 |
JP4582237B2 (ja) * | 2008-01-10 | 2010-11-17 | ソニー株式会社 | 面発光型半導体レーザ |
US8077752B2 (en) * | 2008-01-10 | 2011-12-13 | Sony Corporation | Vertical cavity surface emitting laser |
JP4639249B2 (ja) * | 2008-07-31 | 2011-02-23 | キヤノン株式会社 | 面発光レーザの製造方法及び面発光レーザアレイの製造方法、面発光レーザ及び面発光レーザアレイ、面発光レーザアレイを備えている光学機器 |
US8989230B2 (en) | 2009-02-20 | 2015-03-24 | Vixar | Method and apparatus including movable-mirror mems-tuned surface-emitting lasers |
JP5532321B2 (ja) * | 2009-11-17 | 2014-06-25 | 株式会社リコー | 面発光レーザ素子、面発光レーザアレイ、光走査装置及び画像形成装置 |
JP5601014B2 (ja) * | 2010-04-23 | 2014-10-08 | 株式会社リコー | 光デバイス、光走査装置及び画像形成装置 |
US9088134B2 (en) | 2011-07-27 | 2015-07-21 | Vixar Inc. | Method and apparatus including improved vertical-cavity surface-emitting lasers |
JP6183045B2 (ja) * | 2013-08-09 | 2017-08-23 | ソニー株式会社 | 発光素子及びその製造方法 |
US10447011B2 (en) | 2014-09-22 | 2019-10-15 | Hewlett Packard Enterprise Development Lp | Single mode vertical-cavity surface-emitting laser |
WO2016048268A1 (en) | 2014-09-22 | 2016-03-31 | Hewlett Packard Enterprise Development Lp | Single mode vertical-cavity surface-emitting laser |
US10892601B2 (en) * | 2018-05-24 | 2021-01-12 | Stanley Electric Co., Ltd. | Vertical cavity light-emitting element |
Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04275485A (ja) * | 1990-12-19 | 1992-10-01 | American Teleph & Telegr Co <Att> | 垂直キャビティ半導体レーザ装置 |
JPH11121867A (ja) * | 1997-08-15 | 1999-04-30 | Fuji Xerox Co Ltd | 表面発光型半導体レーザ |
JP2001135890A (ja) * | 1999-07-21 | 2001-05-18 | Lucent Technol Inc | 面内注入型垂直キャビティ表面発光レーザ |
JP2001284722A (ja) * | 2000-03-29 | 2001-10-12 | Seiko Epson Corp | 面発光型半導体レーザおよびその製造方法 |
JP2002353562A (ja) * | 2001-05-23 | 2002-12-06 | Canon Inc | 面発光レーザ装置およびその製造方法 |
JP2003115634A (ja) * | 2001-08-02 | 2003-04-18 | Furukawa Electric Co Ltd:The | 面発光レーザ素子 |
JP2003332683A (ja) * | 2002-05-17 | 2003-11-21 | Furukawa Electric Co Ltd:The | 面発光レーザ素子 |
JP2004356271A (ja) * | 2003-05-28 | 2004-12-16 | Matsushita Electric Ind Co Ltd | 面発光型半導体素子およびその製造方法 |
JP2005012000A (ja) * | 2003-06-19 | 2005-01-13 | Yokogawa Electric Corp | 面発光レーザ |
WO2005074080A1 (ja) * | 2004-01-30 | 2005-08-11 | Nec Corporation | 面発光レーザ及びその製造方法 |
JP2006156947A (ja) * | 2004-08-20 | 2006-06-15 | Matsushita Electric Ind Co Ltd | 半導体発光装置 |
JP2006210429A (ja) * | 2005-01-25 | 2006-08-10 | Sony Corp | 面発光型半導体レーザ |
JP2007201398A (ja) * | 2005-07-04 | 2007-08-09 | Sony Corp | 面発光型半導体レーザ |
JP2008016824A (ja) * | 2006-06-08 | 2008-01-24 | Sony Corp | 面発光型半導体レーザおよびその製造方法 |
JP2008147620A (ja) * | 2006-11-14 | 2008-06-26 | Canon Inc | 面発光レーザ装置およびその製造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001210908A (ja) | 1999-11-16 | 2001-08-03 | Furukawa Electric Co Ltd:The | 面発光半導体レーザ素子 |
WO2001037386A1 (fr) | 1999-11-16 | 2001-05-25 | The Furukawa Electric Co., Ltd. | Dispositif laser a semi-conducteur a emission par la surface |
US6529541B1 (en) | 2000-11-13 | 2003-03-04 | Fuji Xerox Co., Ltd. | Surface emitting semiconductor laser |
JP2002208755A (ja) | 2000-11-13 | 2002-07-26 | Fuji Xerox Co Ltd | 面発光型半導体レーザ |
JP4537658B2 (ja) * | 2002-02-22 | 2010-09-01 | 株式会社リコー | 面発光レーザ素子、該面発光レーザ素子を用いた面発光レーザアレイ、電子写真システム、面発光レーザモジュール、光通信システム、光インターコネクションシステム、および面発光レーザ素子の製造方法 |
JP2004288674A (ja) | 2003-03-19 | 2004-10-14 | Fuji Xerox Co Ltd | 面発光型半導体レーザおよびそれを用いた光通信システム |
KR20080049705A (ko) * | 2005-06-08 | 2008-06-04 | 파이어콤스 리미티드 | 면방출 광학 장치 |
JP4650631B2 (ja) * | 2005-11-30 | 2011-03-16 | ソニー株式会社 | 半導体発光装置 |
JP5159363B2 (ja) * | 2007-03-01 | 2013-03-06 | キヤノン株式会社 | 面発光レーザ、面発光レーザアレイおよびそれを用いた画像形成装置 |
JP4992503B2 (ja) * | 2007-03-27 | 2012-08-08 | ソニー株式会社 | 面発光型半導体レーザおよびその製造方法 |
JP4978291B2 (ja) * | 2007-04-19 | 2012-07-18 | ソニー株式会社 | 半導体装置およびその製造方法 |
-
2008
- 2008-08-25 JP JP2008215775A patent/JP4872987B2/ja active Active
-
2009
- 2009-07-28 US US12/458,962 patent/US8290009B2/en active Active
Patent Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04275485A (ja) * | 1990-12-19 | 1992-10-01 | American Teleph & Telegr Co <Att> | 垂直キャビティ半導体レーザ装置 |
JPH11121867A (ja) * | 1997-08-15 | 1999-04-30 | Fuji Xerox Co Ltd | 表面発光型半導体レーザ |
JP2001135890A (ja) * | 1999-07-21 | 2001-05-18 | Lucent Technol Inc | 面内注入型垂直キャビティ表面発光レーザ |
JP2001284722A (ja) * | 2000-03-29 | 2001-10-12 | Seiko Epson Corp | 面発光型半導体レーザおよびその製造方法 |
JP2002353562A (ja) * | 2001-05-23 | 2002-12-06 | Canon Inc | 面発光レーザ装置およびその製造方法 |
JP2003115634A (ja) * | 2001-08-02 | 2003-04-18 | Furukawa Electric Co Ltd:The | 面発光レーザ素子 |
JP2003332683A (ja) * | 2002-05-17 | 2003-11-21 | Furukawa Electric Co Ltd:The | 面発光レーザ素子 |
JP2004356271A (ja) * | 2003-05-28 | 2004-12-16 | Matsushita Electric Ind Co Ltd | 面発光型半導体素子およびその製造方法 |
JP2005012000A (ja) * | 2003-06-19 | 2005-01-13 | Yokogawa Electric Corp | 面発光レーザ |
WO2005074080A1 (ja) * | 2004-01-30 | 2005-08-11 | Nec Corporation | 面発光レーザ及びその製造方法 |
JP2006156947A (ja) * | 2004-08-20 | 2006-06-15 | Matsushita Electric Ind Co Ltd | 半導体発光装置 |
JP2006210429A (ja) * | 2005-01-25 | 2006-08-10 | Sony Corp | 面発光型半導体レーザ |
JP2007201398A (ja) * | 2005-07-04 | 2007-08-09 | Sony Corp | 面発光型半導体レーザ |
JP2008016824A (ja) * | 2006-06-08 | 2008-01-24 | Sony Corp | 面発光型半導体レーザおよびその製造方法 |
JP2008147620A (ja) * | 2006-11-14 | 2008-06-26 | Canon Inc | 面発光レーザ装置およびその製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021090670A1 (ja) * | 2019-11-06 | 2021-05-14 | ソニーセミコンダクタソリューションズ株式会社 | 面発光レーザ装置 |
Also Published As
Publication number | Publication date |
---|---|
US20100046565A1 (en) | 2010-02-25 |
JP4872987B2 (ja) | 2012-02-08 |
US8290009B2 (en) | 2012-10-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4872987B2 (ja) | 面発光型半導体レーザ | |
JP5304694B2 (ja) | 面発光型半導体レーザ | |
JP2006210429A (ja) | 面発光型半導体レーザ | |
JP5376104B2 (ja) | 面発光型半導体レーザ | |
JP5250999B2 (ja) | 面発光型半導体レーザ | |
JP4992503B2 (ja) | 面発光型半導体レーザおよびその製造方法 | |
US7912105B2 (en) | Vertical cavity surface emitting laser | |
JP4626686B2 (ja) | 面発光型半導体レーザ | |
KR100827120B1 (ko) | 수직 단면 발광 레이저 및 그 제조 방법 | |
JP5434201B2 (ja) | 半導体レーザ | |
JP4868004B2 (ja) | 面発光型半導体レーザおよびその製造方法 | |
US20110007769A1 (en) | Laser diode | |
JP5093480B2 (ja) | 面発光型半導体レーザおよびその製造方法 | |
JPWO2005071808A1 (ja) | 面発光レーザ | |
JP2009266919A (ja) | 面発光型半導体レーザおよびその製造方法 | |
JP5812175B1 (ja) | 面発光型半導体レーザ素子および面発光型半導体レーザ素子の製造方法 | |
WO2019171869A1 (ja) | 面発光レーザ | |
JP2010045249A (ja) | 半導体発光素子およびその製造方法 | |
JP2007258581A (ja) | 面発光レーザ素子 | |
JP2009246194A (ja) | 面発光半導体レーザ素子 | |
JP2011061083A (ja) | 半導体レーザ | |
JP2011222721A (ja) | 半導体レーザ | |
JP2007227861A (ja) | 半導体発光素子 | |
JP2006302955A (ja) | 面発光半導体レーザ | |
JP2008205240A (ja) | 面発光型半導体レーザ |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20100527 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100601 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100720 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110127 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20111025 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20111107 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20141202 Year of fee payment: 3 |
|
R151 | Written notification of patent or utility model registration |
Ref document number: 4872987 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20141202 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |