JP2010008419A - Mems構造内の多段式のプルーフマス運動の減速 - Google Patents
Mems構造内の多段式のプルーフマス運動の減速 Download PDFInfo
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- JP2010008419A JP2010008419A JP2009151134A JP2009151134A JP2010008419A JP 2010008419 A JP2010008419 A JP 2010008419A JP 2009151134 A JP2009151134 A JP 2009151134A JP 2009151134 A JP2009151134 A JP 2009151134A JP 2010008419 A JP2010008419 A JP 2010008419A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
- G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
- G01C19/5719—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using planar vibrating masses driven in a translation vibration along an axis
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/02—Microstructural systems; Auxiliary parts of microstructural devices or systems containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0035—Constitution or structural means for controlling the movement of the flexible or deformable elements
- B81B3/0051—For defining the movement, i.e. structures that guide or limit the movement of an element
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0228—Inertial sensors
- B81B2201/0235—Accelerometers
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- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
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- Remote Sensing (AREA)
- Gyroscopes (AREA)
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Abstract
【解決手段】微小電子機械システム(MEMS)デバイス10は、少なくとも1つの固定具を備える基板と、そこから延びる第1および第2の減速延長部を有するプルーフマス12と、モータ駆動櫛18と、モータ感知櫛20と、基板の上でモータ駆動櫛18とモータ感知櫛20との間にプルーフマス10を懸架するように構成された複数の懸架部14とを含む。懸架部14は、基板に固定される。本体は、基板に取り付けられる。少なくとも1つの減速梁が、前記本体の第1の側面から延びる。この少なくとも1つの減速梁は、第1および第2の減速延長部のうちの少なくとも1つに係合し、かつ、プルーフマス10がモータ駆動櫛18およびモータ感知櫛20に接触する前に、このプルーフマス10を減速または停止させるように構成される。
【選択図】図1
Description
12 プルーフマス
14 懸架部
16 横梁
18 モータ駆動櫛
20 モータピックオフ櫛、モータ感知櫛
22 感知プレート
26 櫛状電極、延長部
28 櫛状電極、延長部、櫛
30 櫛状電極、延長部、櫛
50 減速止め
54 左プルーフマス
56 右プルーフマス
60 本体
62 固定延長部
64 減速梁
66 減速延長部
70 叉
72 叉
74 間隙
76 叉
78 叉
80 叉
82 減速梁
84 減速延長部
Claims (3)
- 少なくとも1つの固定具を備える基板と、
プルーフマス(12)であって、前記プルーフマス(12)から延びる第1および第2の減速延長部(50)を備えるプルーフマス(12)と、
モータ駆動櫛(18)と、
モータ感知櫛(20)と、
前記基板の上で前記モータ駆動櫛(18)と前記モータ感知櫛(20)との間に前記プルーフマス(12)を懸架するように構成された複数の懸架部(14)であって、前記基板に固定された、懸架部(14)と、
前記基板に取り付けられた本体(60)と、
前記本体(60)の第1の側面から延びる少なくとも1つの減速梁(64)であって、前記少なくとも1つの減速梁(64)が、前記第1および第2の減速延長部(50)のうちの少なくとも1つに係合し、かつ、前記プルーフマス(12)が前記モータ駆動櫛(18)および前記モータ感知櫛(20)に接触する前に、前記プルーフマス(12)を減速または停止させるように構成された、減速梁(64)と
を備える微小電子機械システム(MEMS)デバイス(10)。 - 前記デバイスが、前記懸架部(14)間に延びる少なくとも1つの横梁(16)と、前記横梁(16)および前記基板に取り付けられた固定具とをさらに備え、前記本体(60)が前記横梁(16)に接続された、請求項1に記載のデバイス。
- 前記少なくとも1つの減速梁が、
前記第1および第2の減速延長部の第1の側面に配置され、かつ第1の方向の前記プルーフマスの運動を減速または停止させるように構成された、第1および第2の減速梁と、
前記第1および第2の減速延長部の第2の側面に配置され、かつ第2の方向の前記プルーフマスの運動を減速または停止させるように構成された、第3および第4の減速梁とを備える、請求項1に記載のデバイス。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/147,354 US8011247B2 (en) | 2008-06-26 | 2008-06-26 | Multistage proof-mass movement deceleration within MEMS structures |
US12/147,354 | 2008-06-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010008419A true JP2010008419A (ja) | 2010-01-14 |
JP5400495B2 JP5400495B2 (ja) | 2014-01-29 |
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JP2009151134A Expired - Fee Related JP5400495B2 (ja) | 2008-06-26 | 2009-06-25 | Mems構造内の多段式のプルーフマス運動の減速 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8011247B2 (ja) |
EP (1) | EP2146182B1 (ja) |
JP (1) | JP5400495B2 (ja) |
KR (1) | KR20100002228A (ja) |
AT (1) | ATE533028T1 (ja) |
Families Citing this family (20)
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US8516891B2 (en) * | 2007-01-16 | 2013-08-27 | Analog Devices, Inc. | Multi-stage stopper system for MEMS devices |
US9171964B2 (en) | 2010-11-23 | 2015-10-27 | Honeywell International Inc. | Systems and methods for a three-layer chip-scale MEMS device |
US8748206B2 (en) | 2010-11-23 | 2014-06-10 | Honeywell International Inc. | Systems and methods for a four-layer chip-scale MEMS device |
US9493344B2 (en) | 2010-11-23 | 2016-11-15 | Honeywell International Inc. | MEMS vertical comb structure with linear drive/pickoff |
US8776601B2 (en) | 2010-11-23 | 2014-07-15 | Honeywell International Inc. | MEMS sensor using multi-layer movable combs |
CN102147423B (zh) * | 2011-02-25 | 2012-06-13 | 东南大学 | 双轴集成全解耦硅微谐振式加速度计 |
US20140260613A1 (en) * | 2013-03-15 | 2014-09-18 | Invensense, Inc. | Elastic bump stops for mems devices |
CN103145093B (zh) * | 2013-03-18 | 2015-04-08 | 厦门大学 | 一种具有高深宽比梳齿间隙硅微惯性器件的制备方法 |
US9534896B2 (en) * | 2013-03-27 | 2017-01-03 | Honeywell International Inc. | Oscillating voltage of sense electrodes in a MEMS tuning fork gyroscope |
US9476712B2 (en) | 2013-07-31 | 2016-10-25 | Honeywell International Inc. | MEMS device mechanism enhancement for robust operation through severe shock and acceleration |
JP2015123526A (ja) * | 2013-12-26 | 2015-07-06 | ソニー株式会社 | 機能素子、加速度センサおよびスイッチ |
JP6448793B2 (ja) * | 2014-11-27 | 2019-01-09 | ゴルテック.インク | 3軸memsジャイロ |
JP6400621B2 (ja) * | 2016-03-16 | 2018-10-03 | 株式会社東芝 | 角速度取得装置及び角速度取得用の電子部品 |
JP6562878B2 (ja) * | 2016-06-30 | 2019-08-21 | 株式会社東芝 | 角速度取得装置 |
DE102016214962A1 (de) * | 2016-08-11 | 2018-02-15 | Robert Bosch Gmbh | Mikromechanischer Sensorkern für Inertialsensor |
US20180180419A1 (en) * | 2016-10-05 | 2018-06-28 | Freescale Semiconductor, Inc. | Inertial sensor with motion limit structure |
JP6571065B2 (ja) * | 2016-12-08 | 2019-09-04 | 株式会社東芝 | 振動装置 |
JP6503032B2 (ja) * | 2017-09-14 | 2019-04-17 | 株式会社東芝 | センサ装置 |
US10502759B2 (en) | 2017-10-24 | 2019-12-10 | Nxp Usa, Inc. | MEMS device with two-stage motion limit structure |
DE102020210121A1 (de) | 2020-08-11 | 2022-02-17 | Robert Bosch Gesellschaft mit beschränkter Haftung | Mikromechanisches System, Verfahren zum Betreiben eines mikromechanischen Systems |
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2008
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2009
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- 2009-06-22 EP EP09163425A patent/EP2146182B1/en active Active
- 2009-06-25 JP JP2009151134A patent/JP5400495B2/ja not_active Expired - Fee Related
- 2009-06-26 KR KR1020090057952A patent/KR20100002228A/ko not_active Application Discontinuation
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Also Published As
Publication number | Publication date |
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US20090320592A1 (en) | 2009-12-31 |
EP2146182B1 (en) | 2011-11-09 |
EP2146182A1 (en) | 2010-01-20 |
KR20100002228A (ko) | 2010-01-06 |
JP5400495B2 (ja) | 2014-01-29 |
US8011247B2 (en) | 2011-09-06 |
ATE533028T1 (de) | 2011-11-15 |
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