JP5117665B2 - Mems構造内でプルーフマスの運動を減速させる方法およびシステム - Google Patents
Mems構造内でプルーフマスの運動を減速させる方法およびシステム Download PDFInfo
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- JP5117665B2 JP5117665B2 JP2004563737A JP2004563737A JP5117665B2 JP 5117665 B2 JP5117665 B2 JP 5117665B2 JP 2004563737 A JP2004563737 A JP 2004563737A JP 2004563737 A JP2004563737 A JP 2004563737A JP 5117665 B2 JP5117665 B2 JP 5117665B2
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- 238000000034 method Methods 0.000 title description 12
- 239000000758 substrate Substances 0.000 claims description 38
- 239000000725 suspension Substances 0.000 claims description 22
- 238000007373 indentation Methods 0.000 claims description 10
- 239000003990 capacitor Substances 0.000 claims description 6
- 238000010586 diagram Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000013016 damping Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000005459 micromachining Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- 210000001520 comb Anatomy 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/02—Microstructural systems; Auxiliary parts of microstructural devices or systems containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
- G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
- G01C19/5719—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using planar vibrating masses driven in a translation vibration along an axis
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0035—Constitution or structural means for controlling the movement of the flexible or deformable elements
- B81B3/0051—For defining the movement, i.e. structures that guide or limit the movement of an element
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
- G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0228—Inertial sensors
- B81B2201/0242—Gyroscopes
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Radar, Positioning & Navigation (AREA)
- Remote Sensing (AREA)
- Gyroscopes (AREA)
- Micromachines (AREA)
- General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
- Pressure Sensors (AREA)
Description
Claims (4)
- 微小電気機械システム(MEMS)デバイス(10)であって、
基板と、
プルーフマス(12)とを備え、前記プルーフマスは、プルーフマスから延びる少なくとも1つの減速伸張部(66)か、プルーフマス内に形成される少なくとも1つの減速くぼみ部(158)のいずれか又は両方を備え、
前記プルーフマス(12)に平行なセンス板(22)であり、前記プルーフマス(12)とコンデンサを形成し、前記基板に垂直なセンス平面(Y軸)内の運動を検知するように構成された前記センス板(22)と、
前記基板に平行且つ前記センス平面に垂直であるドライブ平面(X軸)に沿って前記プルーフマス(12)を振動させるように構成されたモータドライブコム(18)と、
前記ドライブ平面内での前記プルーフマス(12)の運動を検知するように構成されたモータセンスコム(20)と、
前記プルーフマスを、前記基板の上で、かつ、前記モータドライブコムおよび前記モータセンスコムの間に懸垂保持するように構成される複数のサスペンション(14)とを備え、
前記基板に取り付けられた本体(60)と、前記本体から延びる少なくとも1つの減速梁(64)とを備える減速停止部(50)を備え、前記減速梁は、前記少なくとも1つの減速伸張部か、前記少なくとも1つの減速くぼみ部のいずれかに係合するように構成され、前記プルーフマスが、前記モータドライブコムおよび前記モータセンスコムに接触するのを防止するために、前記プルーフマスを前記ドライブ平面に沿って徐々に減速して停止させるように構成され、
前記減速伸張部(66)及び前記減速梁(64)は、それらが係合して前記ドライブ平面に沿って前記プルーフマス(12)に対する減速機能を提供する際に、曲がるように構成されている、デバイス(10)。 - 前記サスペンション(14)の間に延びる少なくとも1つの横梁(16)をさらに備え
、前記本体(60)は、前記横梁に接続され、前記基板に取り付けられる請求項1に記載のデバイス(10)。 - 前記本体(60)を前記横梁(16)に接続するのに利用される固定用伸張部(62)をさらに備える請求項2に記載のデバイス(10)。
- 微小電気機械システム(MEMS)デバイス(10)であって、
少なくとも1つのアンカ(124)を備える基板と、
プルーフマス(12)とを備え、前記プルーフマスは、プルーフマスから延びる少なくとも1つの減速伸張部(66)か、プルーフマス内に形成される少なくとも1つの減速くぼみ部(158)のいずれか又は両方を備え、
前記プルーフマス(12)に平行なセンス板(22)であり、前記プルーフマス(12)とコンデンサを形成し、前記基板に垂直なセンス平面(Y軸)内の運動を検知するように構成された前記センス板(22)と、
前記基板に平行且つ前記センス平面に垂直であるドライブ平面(X軸)に沿って前記プルーフマス(12)を振動させるように構成されたモータドライブコム(18)と、
前記ドライブ平面内での前記プルーフマス(12)の運動を検知するように構成されたモータセンスコム(20)と、
前記プルーフマスを、前記基板の上で、かつ、前記モータドライブコムおよび前記モータセンスコムの間に懸垂保持するように構成される複数のサスペンション(14)とを備え、
本体(126)と、前記本体から延びる少なくとも1つの減速梁(128)とを備える減速停止部を備え、前記減速梁は、前記少なくとも1つの減速伸張部か、前記少なくとも1つの減速くぼみ部のいずれかに係合するように構成され、前記プルーフマスが、前記モータドライブコムおよび前記モータセンスコムに接触するのを防止するために、前記プルーフマスを前記ドライブ平面に沿って徐々に減速して停止させるように構成され、
前記複数のサスペンション(14)の間に延びる少なくとも1つの横梁(122)を備え、前記本体は前記横梁(122)に接続され、
前記アンカ(124)と前記横梁(122)との間に延びる固定用伸張部(125)を備え、前記横梁(122)は前記固定用伸張部(125)および前記アンカ(124)を介して前記基板に接続され、
前記減速伸張部(66)及び前記減速梁(128)は、それらが係合して前記ドライブ平面に沿って前記プルーフマス(12)に対する減速機能を提供する際に、曲がるように構成されている、デバイス(10)。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/320,850 US6865944B2 (en) | 2002-12-16 | 2002-12-16 | Methods and systems for decelerating proof mass movements within MEMS structures |
US10/320,850 | 2002-12-16 | ||
PCT/US2003/040317 WO2004059250A2 (en) | 2002-12-16 | 2003-12-15 | Methods and systems for decelarating proof mass movements within mems structures |
Publications (2)
Publication Number | Publication Date |
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JP2006510029A JP2006510029A (ja) | 2006-03-23 |
JP5117665B2 true JP5117665B2 (ja) | 2013-01-16 |
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JP2004563737A Expired - Fee Related JP5117665B2 (ja) | 2002-12-16 | 2003-12-15 | Mems構造内でプルーフマスの運動を減速させる方法およびシステム |
Country Status (7)
Country | Link |
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US (1) | US6865944B2 (ja) |
EP (1) | EP1573272B1 (ja) |
JP (1) | JP5117665B2 (ja) |
KR (1) | KR20050086918A (ja) |
CN (1) | CN100520299C (ja) |
AU (1) | AU2003301040A1 (ja) |
WO (1) | WO2004059250A2 (ja) |
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-
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- 2002-12-16 US US10/320,850 patent/US6865944B2/en not_active Expired - Lifetime
-
2003
- 2003-12-15 CN CNB2003801097659A patent/CN100520299C/zh not_active Expired - Fee Related
- 2003-12-15 KR KR1020057011167A patent/KR20050086918A/ko not_active Application Discontinuation
- 2003-12-15 EP EP03814151.1A patent/EP1573272B1/en not_active Expired - Lifetime
- 2003-12-15 WO PCT/US2003/040317 patent/WO2004059250A2/en active Application Filing
- 2003-12-15 JP JP2004563737A patent/JP5117665B2/ja not_active Expired - Fee Related
- 2003-12-15 AU AU2003301040A patent/AU2003301040A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
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JP2006510029A (ja) | 2006-03-23 |
CN100520299C (zh) | 2009-07-29 |
WO2004059250A2 (en) | 2004-07-15 |
WO2004059250A3 (en) | 2004-08-19 |
US6865944B2 (en) | 2005-03-15 |
AU2003301040A1 (en) | 2004-07-22 |
CN1748121A (zh) | 2006-03-15 |
EP1573272B1 (en) | 2018-07-11 |
EP1573272A2 (en) | 2005-09-14 |
US20040112133A1 (en) | 2004-06-17 |
KR20050086918A (ko) | 2005-08-30 |
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