JP2009545853A - 有機発光ダイオードデバイスのためのパターニング及び処理方法 - Google Patents

有機発光ダイオードデバイスのためのパターニング及び処理方法 Download PDF

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Publication number
JP2009545853A
JP2009545853A JP2009522915A JP2009522915A JP2009545853A JP 2009545853 A JP2009545853 A JP 2009545853A JP 2009522915 A JP2009522915 A JP 2009522915A JP 2009522915 A JP2009522915 A JP 2009522915A JP 2009545853 A JP2009545853 A JP 2009545853A
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Prior art keywords
layer
receptor
transfer
image
annealing
Prior art date
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Pending
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JP2009522915A
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English (en)
Japanese (ja)
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JP2009545853A5 (enExample
Inventor
エー. ラマンスキー,セルゲイ
ベルマン,エリカ
ティー.ティー. レ,ハ
エス. スタラル,ジョン
ピー. バートゾルード,ジョン
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of JP2009545853A publication Critical patent/JP2009545853A/ja
Publication of JP2009545853A5 publication Critical patent/JP2009545853A5/ja
Pending legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/50Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
    • B41M5/52Macromolecular coatings
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/20Duplicating or marking methods; Sheet materials for use therein using electric current
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M7/00After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock
    • B41M7/0081After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock using electromagnetic radiation or waves, e.g. ultraviolet radiation, electron beams
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M7/00After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock
    • B41M7/009After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock using thermal means, e.g. infrared radiation, heat
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/34Imagewise removal by selective transfer, e.g. peeling away
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/18Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146Laser beam

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Thermal Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Electroluminescent Light Sources (AREA)
  • Electronic Switches (AREA)
  • Optical Filters (AREA)
JP2009522915A 2006-07-31 2007-07-10 有機発光ダイオードデバイスのためのパターニング及び処理方法 Pending JP2009545853A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/461,194 US7670450B2 (en) 2006-07-31 2006-07-31 Patterning and treatment methods for organic light emitting diode devices
PCT/US2007/073101 WO2008016763A2 (en) 2006-07-31 2007-07-10 Patterning and treatment methods for organic light emitting diode devices

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013003083A Division JP5558594B2 (ja) 2006-07-31 2013-01-11 有機発光ダイオードデバイスのためのパターニング及び処理方法

Publications (2)

Publication Number Publication Date
JP2009545853A true JP2009545853A (ja) 2009-12-24
JP2009545853A5 JP2009545853A5 (enExample) 2010-09-02

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
JP2009522915A Pending JP2009545853A (ja) 2006-07-31 2007-07-10 有機発光ダイオードデバイスのためのパターニング及び処理方法
JP2013003083A Active JP5558594B2 (ja) 2006-07-31 2013-01-11 有機発光ダイオードデバイスのためのパターニング及び処理方法

Family Applications After (1)

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JP2013003083A Active JP5558594B2 (ja) 2006-07-31 2013-01-11 有機発光ダイオードデバイスのためのパターニング及び処理方法

Country Status (5)

Country Link
US (1) US7670450B2 (enExample)
JP (2) JP2009545853A (enExample)
KR (1) KR101333137B1 (enExample)
TW (1) TWI423494B (enExample)
WO (1) WO2008016763A2 (enExample)

Cited By (1)

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JP2016508893A (ja) * 2013-08-01 2016-03-24 エルジー・ケム・リミテッド 3次元構造の金属パターンの製造方法

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KR102050029B1 (ko) * 2011-08-26 2019-11-29 삼성디스플레이 주식회사 도너 기판, 도너 기판의 제조 방법, 유기 발광 표시 장치 및 유기 발광 표시 장치의 제조 방법
KR20130023643A (ko) * 2011-08-29 2013-03-08 삼성디스플레이 주식회사 유기 발광 디스플레이 패널 제조 장치와, 이를 이용한 유기 발광 디스플레이 패널의 제조 방법
DE102011082939B4 (de) * 2011-09-19 2015-11-26 Von Ardenne Gmbh Transfermaske und Verfahren zur Herstellung einer Transfermaske
EP2807685A1 (en) * 2012-01-27 2014-12-03 Wake Forest University Electroluminescent devices and applications thereof
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US8632943B2 (en) 2012-01-30 2014-01-21 Southern Lithoplate, Inc. Near-infrared sensitive, positive-working, image forming composition and photographic element containing a 1,1-di[(alkylphenoxy)ethoxy]cyclohexane
KR101904107B1 (ko) * 2012-02-20 2018-10-05 엘지디스플레이 주식회사 도너 필름 및 이를 이용한 평판 표시장치의 패턴 형성 방법
KR102175754B1 (ko) 2013-01-24 2020-11-06 도레이첨단소재 주식회사 레이저 열전사용 투명성 도너필름
KR102107661B1 (ko) 2013-01-30 2020-05-07 도레이첨단소재 주식회사 레이저 열전사용 도너필름
KR102081209B1 (ko) * 2013-03-26 2020-02-26 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법, 및 그 유기 발광 표시 장치의 제조에 사용되는 도너 기판 및 도너 기판 세트
DE102013108315B4 (de) * 2013-08-01 2016-08-04 Von Ardenne Gmbh Beschichtungsvorrichtung und Verfahren zum Herstellen einer Beschichtungsvorrichtung
US9861883B1 (en) 2016-06-17 2018-01-09 Mohawk Fine Papers Inc. Secure substrate for scratch-off products
KR20190103691A (ko) 2018-02-28 2019-09-05 도레이첨단소재 주식회사 레이저 열전사 필름
KR102095544B1 (ko) 2018-03-09 2020-03-31 도레이첨단소재 주식회사 레이저 열전사 필름
CN110148678A (zh) * 2019-04-29 2019-08-20 深圳市华星光电半导体显示技术有限公司 辅助电极转移结构及显示面板的制作方法
KR102773861B1 (ko) * 2019-10-08 2025-02-28 삼성디스플레이 주식회사 표시 장치 및 이의 제조 방법
JP2024502733A (ja) 2020-12-18 2024-01-23 スリーエム イノベイティブ プロパティズ カンパニー 構造化フィルム及び構造化フィルムを含む光学物品
JP7558919B2 (ja) 2021-11-30 2024-10-01 信越化学工業株式会社 レーザー光熱転写フィルム
CN114835183B (zh) * 2022-05-12 2023-06-27 南昌大学 一种具有定向结盐功能的用于处理高浓度盐水的三维太阳能蒸发器及其制备方法
CN115656101B (zh) * 2022-11-14 2025-07-22 浙江大学 一种全介质gmr型古斯汉森位移传感芯片

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WO2008016763A2 (en) 2008-02-07
KR20090034364A (ko) 2009-04-07
US7670450B2 (en) 2010-03-02
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